Specific embodiment
Hereinafter, according to appended attached drawing, the preferred embodiment that the present invention will be described in detail.
[the 1st embodiment]
Illustrate the structure of lamp optical system involved in the 1st embodiment.The lamp optical system of present embodiment isSuch as it is carried to the lamp optical system of exposure device, it is for being directed to the light from light source as irradiation object object (objectBody) the figuratum mask of formation (master) device.
Fig. 1 is the skeleton diagram for showing the structure of lamp optical system involved in present embodiment.Lamp optical system 100The 1st optical system 301 is included, shaping is carried out to the light from the 1st light source portion 120a；2nd optical system 302, to from the 2ndThe light of light source portion 120b carries out shaping；And the 3rd optical system 303, shaping is carried out to the light from the 3rd light source portion 120c.SeparatelyOutside, lamp optical system 100 have combining optical 500, light integrator (compound eye optical system) 109, σ diaphragm 110,112, optical system 150, slit 111, optical system 160.
Light source portion 120a~c is made of light source 101 and elliptical reflector 102.High-pressure sodium lamp is used in light source 101.It removesOther than this, light source portion 120a~c can also use xenon lamp, excimer laser etc..Elliptical reflector 102 is for from light sourceThe light of 101 outputs carries out the condensing optical system of optically focused, the shape of a part using elliptical shape is formed, by light source 101It is configured at a side of elliptical 2 focal positions.
It is exported from light source 101 and the focus position in elliptical another party is condensed to by the light that elliptical reflector 102 reflectsThe entrance for the optical system 301~303 set.
Optical system 301,302,303 is configured to change entering in light integrator 109 by each optical systemPenetrate the light intensity distributions of face formation.Optical system 301,302,303 is respectively provided on the direction vertical with the direction of travel of lightThe 1st optical section 311, the 2nd optical section 312, the 3rd optical section 313, the 4th optical section 314 of arrangement.Optical section 311,312,313,1 in 314 is selected and is configured in optical path.Optical system 301,302,303 has for handover configurations in optical pathThe mechanism of optical section.Optical section 311,312,313,314 forms mutually different luminous intensity in the plane of incidence of light integrator 109Distribution.Wherein, optical section has 4, but is not limited to 4.
(A) of Fig. 2~(D) shows the schematic structural diagram of optical section 311,312,313,314.Hacures portion indicates that light passes throughOptical path.Optical section 311 is to roll over the light beam exported from plane of incidence OBJ by lens L1, L2, L3, L4 as shown in Fig. 2 (A)It penetrates and forms the imaging optical system of image in outgoing plane IMG.
Optical section 312 is to reflect the light beam exported from plane of incidence OBJ by lens L5, L6 as shown in Fig. 2 (B), is led toThe cylindric reflecting mirror for crossing axicon PR1 and the outlet configuration in axicon PR1, transforms on annulus in outgoing plane IMGOptical system.Optical section 313 is to reflect the light beam exported from plane of incidence OBJ by lens L7 as shown in Fig. 2 (C), is led toCross the optical system that axicon PR2 focuses on the mode conversion in smaller region in outgoing plane IMG.Optical section 312 and lightThe department of the Chinese Academy of Sciences 313 is known as illumination profile and shifts optical system.
Optical section 314 is to make the light beam exported from plane of incidence OBJ optical bar (photoconductive tube) OL's as shown in Fig. 2 (D)Inner face reflection is multiple, in its outgoing plane IMG so that its light intensity distributions becomes the optical system of the mode conversion of homogenization.
Fig. 3 shows that (preceding: OBJ, rear: light intensity distributions IMG) are (with light by the front and back of optical section 311,312,313,314Two dimensional cross-section centered on axis).Firstly, showing the brightness point of light source 101 by elliptical reflector 102 in plane of incidence OBJCloth, so becoming the light intensity distributions near optical axis center with stronger characteristic.
Through the light after optical section 311 on outgoing plane IMG, present substantially equal with the light intensity distributions of plane of incidence OBJDistribution.Optical section 312 forms annulus shape on outgoing plane IMG.Optical section 313 is formed in center tool on outgoing plane IMGThe intensity distribution of slightly pointed peak value.Optical section 314 forms uniform flat intensity distribution on outgoing plane IMG.Outgoing plane IMGIt is conjugated with the plane of incidence of light integrator 109.
Combining optical 500 is made of 3 optical systems, 105,2 deflection mirrors 107 and optical system 140, synthesis (guidance) from multiple optical paths corresponding with the light from multiple light sources and light beam reflection and refraction optical system.Directional light is transformed to by optical system 105 via the light of any optical section in optical section 311~314, reaches combining unit108.At this point, the deflection mirror 107 for deflecting the direction of travel of light reflects in the optical path of a part in multiple.?In present embodiment, 2 deflected reflecting mirrors 107 in 3 optical paths reflect.
In the present embodiment, light source portion has 3, but as long as the quantity of light source is 2 or more multiple.In addition,According to the difference of the quantity of light source, the structure of combining optical 500 is varied, in order to reduce the loss (damage of illumination lightConsumption), the optical system of compound lens and deflection mirror preferably as described in this embodiment.But combining optical 500Both it can be only made of lens, optical waveguide can also be used in part of.In addition, as combining optical 500, it can alsoTo use optical fiber.
Optical system 105, which is configured to combining unit 108, becomes the outgoing plane IMG in optical system portion 311,312,313,314Substantial Fourier transform position.The light exported from combining unit 108 is directed into light integrator by optical system 140109.At this point, the plane of incidence that optical system 140 is configured to light integrator 109 becomes the substantial Fourier of combining unit 108It shifts one's position.That is, the plane of incidence of outgoing plane IMG and light integrator 109 is optically in the positional relationship of conjugation.
Fig. 4 is the figure for showing light integrator 109.As shown in figure 4, light integrator 109 is by with a large amount of plano-convex lensSplit is that planar 2 lens groups 131,132 are constituted.So that pairs of plano-convex lens, which are in, constitutes the 1 of lens group 131,132The mode of the focal position of a 1 plano-convex lens, configures curvature surface face to face.By using such light integrator109, a large amount of secondary souce distribution of equal value with light source 101 is formed (effectively in 110 position of outgoing plane of light integrator 109Distribution of light sources).
Near the outgoing plane of light integrator 109, it is configured with σ diaphragm (aperture diaphragm) 110.Light integrator 109Outgoing plane is the pupil face of lamp optical system, and the light intensity distributions formed in the pupil face are known as efficient light sources distribution.With σ lightThe direction of travel of the light of door screen 110 is configured with σ diaphragm 112 on vertical direction.σ diaphragm 110 and σ diaphragm 112 are provided with mutuallyThe opening of different shapes.σ diaphragm 110 and σ diaphragm 112 can for example select aperture diaphragm in (A)~(D) of Fig. 5231, any aperture diaphragm in 232,233,234.Aperture diaphragm 231~234 is such diaphragm, i.e. the one of shielding lightPoint, 225,226,227,228 transmitted light of opening indicated using only white.Each opening is opening 225, the small circle of ring-band shapeOpening 226, the opening 227 of moderate circular shape, the opening 228 of big circular shape of shape.In addition, in this implementationIn mode, constitute as can optionally by diverse σ diaphragm σ switching mechanism 113.
The light beam projected from the outgoing plane 110 of light integrator 109 is directed into slit 111 by optical system 150.ThisWhen, optical system 150 is configured to substantial Fourier transform of the slit 111 as the outgoing plane 110 of light integrator 109Face.A large amount of secondary souce distribution, by optical system 150, the light from each secondary souce are formed in the position of outgoing plane 110It overlaps on outgoing plane 110, so becoming uniform light intensity distributions on slit 111.
Fig. 6 shows the shape of slit 111, and the light other than the opening 23 of the circular shape indicated with white is by shading.Later,Plane of illumination ILP is irradiated to by optical system 160 by the illuminating bundle of the circular shape after opening.In present embodimentIn, slit is using the slit that opening is circular shape but it is also possible to be other shapes, such as rectangular shape.
According to the present embodiment, illumination light can not be lost and forms various efficient light sources distributions.
[embodiment 1]
When the pattern for being depicted in mask is transferred to substrate using exposure device, make effectively preferably by the pattern formThe shape of distribution of light sources becomes best.The incident angle distribution of the illumination light of mask is still incident in efficient light sources distribution.
According to the difference of the pattern of mask, the contrast of image is improved when reducing coherence sometimes, improves coherence sometimesAnd depth of focus expands when forming the efficient light sources distribution of ring-band shape.That is, changing efficient light sources distribution by the pattern using maskShape can reach good imaging performance in various patterns.
By using the 1st optical system 301, the 2nd optical system 302, the 3rd optical system recorded in the 1st embodimentSystem 303 can utilize the pattern of mask M, and efficient light sources distribution is changed to various shape.
Using table 1 and Fig. 7, illustrate the optical section 311 by each middle composition in optical system 301,302,303,312,313,314 selection, the example for the change in shape for being distributed efficient light sources.
Table 1 shows the combination of the optical section configured in the optical path of optical system 301,302,303.Fig. 7 is to show to pass throughThe optical section for being configured at each optical path is formed in the light intensity distributions of outgoing plane IMG and closes them by combining optical 500At light intensity distributions (plane of incidence or outgoing plane (efficient light sources distribution) of light integrator 109) shape outlineFigure.
[table 1]
In the case where synthesis is from the light of multiple optical paths, the intensity distribution of the light of synthesis can use the light intensity of each optical pathThe phase Calais of degree distribution indicates.That is, make the light beam from the 1st optical system 301, the light beam from the 2nd optical system 302 andLight beam from the 3rd optical system 303 is overlapped in the plane of incidence of light integrator 109.Therefore, become will be by for efficient light sources distributionThe intensity distribution that the light intensity distributions of each formation of optical system 301,302,303 add up.
P1 is the case where using optical section 313 in the whole of optical system 301~303.In this case, efficient light sourcesIt is distributed as the small σ illumination that light intensity distributions focus on center.
P2, P3 are in optical system 301~303 and with the combination of optical section 311 and optical section 313, efficient light sources shapeShape is middle σ.The luminous intensity that center and periphery can be changed by the number of combinations of optical section 311 and optical section 313, so energyEnough optimal combination is selected using the pattern of mask.P4 is the configuration optical section 311 in the whole of optical system 301~303Situation.In this case, efficient light sources distribution shape is middle σ.
P5 is the case where configuring optical section 312 in the whole of optical system 301~303.In this case, efficient light sourcesDistribution shape is annulus.
P6 is in optical system 301~303 and with the combination of optical section 312,314, and efficient light sources distribution shape is bigσ.P7 is in optical system 301~303 and with the combination of optical section 311,312, and efficient light sources distribution shape is big σ.Pass throughThe combination of optical section can change the center of big σ and the luminous intensity on periphery, so the pattern using mask selects optimal groupConjunction.In addition, P8 is the case where using optical section 314 in the whole of optical system 301~303.At this point, efficient light sources pointCloth is flat big σ.In addition, the σ diaphragm that should be used in P1~P8 is displayed in Table 1.
Illustrate that the efficient light sources of 8 patterns are formed in the present embodiment, but according to the quantity of light source or by synthesizing lightThe difference of the number of the quantity and optical section for the light path that system 500 synthesizes can also make various effective in addition to thisDistribution of light sources.For stringent, even if using the optical section of identical type in each optical system 301~303, pass through synthesizing opticalThe contribution to efficient light sources distribution that the result of system 500 is realized also can be different.
For example, as table 2 P6, P6 ', P6 ", about the optical section used in optical system 301~303, optical section 312For 2 and optical section 314 be 1 be it is identical, but efficient light sources distribution it is entirely different.
[table 2]
Therefore, the quantity of light path (optical system 301 etc.) is being set as N, the type (quantity) of optical section is set as MWhen, theoretically it is capable of forming MNThe efficient light sources of a pattern are distributed.
More than, it according to the present embodiment, can reduce the loss of illumination light, form that big small circle, annulus etc. are various to be hadImitate distribution of light sources.
[the 2nd embodiment]
Next, exposure device 200 of the explanation as the 2nd embodiment.Fig. 8 is the exposure dress for showing the 2nd embodimentSet 200 figure.The part described in the 1st embodiment omits the description.
The mask M as master for the illuminated surface ILP for being configured at lamp optical system 100 is illuminated.Illumination lightA part be imaged in substrate P via projection optical system PO, so that transfer is depicted in the pattern of mask M.
Multiple light intensity sensors are configured in exposure device 200.Firstly, near mask M, it is incident configured with measurementTo the angular transducer JS (measurement portion) of the incident angle distribution (light intensity distributions) of the illumination light of mask M.Angular transducer JSAs shown in figure 9, being made of pin hole 351 and CCD camera 352 (light receiving element).Pin hole 351 is configured near mask M,CCD camera 352 is configured from the position that pin hole leaves abundant distance.By the light of pin hole 351 it is corresponding with its incident angle,The position different from CCD camera 352 is detected.Therefore, pass through the control unit using exposure device, external machine solutionThe pixel value (luminous intensity) for analysing the image obtained by CCD camera 352, can learn the incident angle for being incident on the light of mask MCharacteristic.
In order to according to the incident angle characteristic of the illumination light obtained using the angular transducer JS for being configured at exposure device 200It is distributed to obtain desired efficient light sources, at least one in multiple light sources 101a, 101b, 101c, which has, adjusts its input voltageControl unit (adjustment section).That is, there is adjustment to be formed in light by the 1st optical system 301 using the light from the 1st light source portion 101aLearn the 1st adjustment section of the 1st light intensity distributions of the plane of incidence of integrator 109.Alternatively, it is also possible to go back other than the 1st adjustment sectionIt is formed in the incidence of light integrator 109 by the 2nd optical system 302 using the light from the 2nd light source portion 101b with adjustment2nd adjustment section of the 2nd light intensity distributions in face.Efficient light sources distribution is the addition of the intensity distribution of the light from each light source, instituteTo change the luminous intensity from each optical path by the adjustment of the input voltage using each light source, efficient light sources can be distributedIt is micro-adjusted.
In addition, as the intensity distribution (the 1st light intensity distributions, the 2nd light intensity distributions) for changing the light from each optical pathUnit, the adjustment section for thering is the position to the optical element in the position of light source or each optical path to be micro-adjusted.For example, parsing existsMultiple images that the position of the position or the optical element in each optical path that make light source is obtained when mobile with angular transducer JS, rootAccording to the difference of the pixel value of multiple images, determined in a manner of becoming the distribution of desired efficient light sources light source position or each lightThe position of optical element in road.
In addition, though not showing in fig. 8, but filtered by being configured in the optical path from each light source or not configuring dim lightPiece can change the intensity distribution of the light from each optical path.In this case, for example, being subtracted near optical system 105The configuration of light optical filter or not.
In the exposure device 200 of present embodiment, other than near mask M, it is also configured near substrate PAngular transducer JS.But near mask M, near substrate P it is optically mutually conjugate position, so whereinAt least one position arrangement angles sensor JS.
Near substrate P, the photograph of the illumination (luminous intensity) in the exposure area configured with the arc-shaped in measurement substrate PSpend distribution sensor 304.Illumination Distribution sensor 304 is as shown in figure 8, by slit 303, utilize the optics of lens or reflecting mirrorSystem 306 and sensor 305 are constituted.As shown in Figure 10, make the exposure area 401 of the opposite light being imaged in substrate P of slit 303It scans (movement).At this point, being only imaged on the opening portion 306 (white) of slit 303 in the light being imaged in exposure area 401Light be incident in Illumination Distribution sensor 304.The light in Illumination Distribution sensor 304 is incident on via 306 quilt of optical systemIt is directed to sensor 305.Slit 303 is scanned in X-direction shown in Fig. 10 by one side, reads reach sensor on one sideThe energy of 305 light measures the accumulated illumination of each X position in exposure area 401.It is tired in substrate P thereby, it is possible to calculateCount uneven illumination.
In the case where changing efficient light sources distribution in the 1st embodiment, the 2nd embodiment, it is illuminated to there is generationFace or a possibility that with uneven illumination in the position optically of illuminated surface.Therefore, lamp optical system can be replacedSlit 111 and use slit mechanism 182 (adjustment mechanism) in 100.By according to the survey measured by Illumination Distribution sensor 304The opening width as a result, adjusting slit mechanism 181 is measured, can reduce uneven illumination.For example, being set as through Illumination Distribution sensor304 measure the uneven illumination as shown in (A) of Figure 12.In this case, make the part (position in the direction x) of luminance reductionThe width in the direction y of the opening of slit mechanism 182 locally broadens, the slit for the part (position in the direction x) for increase illuminationThe width in the direction y of the opening of mechanism 182 locally narrows.Thereby, it is possible to so that Illumination Distribution is become equal shown in (B) of such as Figure 12It is even.
The structural example of Figure 11 illustration slit mechanism 182.Slit mechanism 182 has the lighting area formed in regulation illuminated surface1st barn door 175,176 of the opening portion 172 of the shape in domain.Light-blocking member 175 is the upstream of the Y-direction of regulation opening portion 172The component of the position on the boundary of side.Light-blocking member 176 is the component on the boundary at the both ends of the X-direction of regulation opening portion 172.
In addition, slit mechanism 181 has the position in the Y-direction of the 1st barn door 175 of adjustment to change in illuminated surfaceThe adjustment section 53 of illumination region.Position adjustment section 53 includes actuator.By changing barn door 175 using position adjustment section 53The position on the boundary of the upstream side of the Y-direction in illumination region is changed in position in Y-direction.
Opening portion 172 is, for example, the slit for the circular shape that light passes through.Adjustment section 91 may include the 1st barn door 171 of adjustmentY-direction (the 1st direction) on position the 1st adjustment section 53 and adjustment Y-direction on opening portion 172 shape the 2nd adjustmentPortion 173.1st adjustment section 53 is connect with control unit, and the movement of the 1st adjustment section 53 can be controlled by control unit.
In an end of the arc-shaped for forming opening portion 172, it is formed with the 2nd barn door 170.2nd light shielding part 170 is to useThe component of the shape on the boundary in the downstream side of the Y-direction in change illumination region.2nd barn door 170 is provided with X-directionThe 2nd adjustment section 173 (push-and-pull portion) that each position of the 2nd barn door 170 on (the 2nd direction) pushes and pulls in the Y direction.2nd adjustmentPortion 173 can be multiple actuators.These multiple actuators are connect via wiring 174 with control unit respectively.Multiple actuatings as a result,Device is driven by the control of control unit 50 respectively.The 2nd barn door 170 is changed by driving the actuator of the 2nd adjustment section 173End shape, to change the shape on the boundary in the downstream side of the Y-direction in illumination region.In addition, the 2nd barn door 170Also it is configurable to the shape on the boundary of the upstream side of the Y-direction in change illumination region.
There can also be setting for the angular distribution for setting the light illuminated to mask in the control unit of exposure device 200Determine portion.In this case, it is also configured to the efficient light sources distribution being desirable for configuration part setting user, wishes changeEfficient light sources distribution changes above-mentioned 1st light intensity distributions or the 2nd optical system according to the angular distribution using configuration part settingSystem.
[the 3rd embodiment]
(article manufacturing method)
Next, article (semiconducter IC element, liquid crystal display element, colorized optical filtering of the explanation using above-mentioned exposure devicePiece, MEMS etc.) manufacturing method.By using above-mentioned exposure device to substrate (chip, glass substrate for being coated with emulsionDeng) process that is exposed, the process developed to the substrate (emulsion) and handled with other well known manufacturing procedureThe process of substrate after development, to manufacture article.Other well known process includes etching, resist removing, cutting, bonding, envelopeDress etc..According to this manufacturing method, it can manufacture compared to previous method, in the performance of article, quality, productivity, be produced intoMore favorable article in this at least one.
Although describing the present invention referring to exemplary embodiment, it should be appreciated that, the present invention is not limited to disclosedExemplary embodiment.The range of claims below should be endowed broadest explanation with cover all such modifications withAnd equivalent structure and function.