Specific embodiment
Present patent application requires the applying date on July 30th, 2018, application No. is 201810854491.4, invention namesA kind of referred to as domestic priority of the earlier application of " light-source structure, optical projection mould group, biological identification device and equipment ", the partAll the elements of application are described herein by reference.
Presently filed embodiment is described below in detail, the example of the embodiment is shown in the accompanying drawings, wherein from beginningSame or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginsengThe embodiment for examining attached drawing description is exemplary, and is only used for explaining the application, and should not be understood as the limitation to the application.?In the description of the present application, it is to be understood that term " first ", " second " are only used for describing, and should not be understood as instruction or darkShow relative importance or implicitly indicates the quantity of indicated technical characteristic or put in order.Define as a result, " first ",The technical characteristic of " second " can explicitly or implicitly include one or more technical characteristic.In retouching for the applicationIn stating, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise specific regulation or limit, term " installation ", " phaseEven ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integration connection；It canTo be mechanical connection, it is also possible to be electrically connected or is in communication with each other；It can be directly connected, the indirect phase of intermediary can also be passed throughEven, the connection inside two elements or the interaction relationship between two elements be can be.For the ordinary skill of this fieldFor personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
Following disclosure provides many different embodiments or example is used to realize the different structure of the application.In order toSimplify disclosure herein, hereafter only to the component of specific examples and being set for describing.Certainly, they are merely examples, andAnd purpose does not lie in limitation the application.In addition, the application can reuse reference number and/or reference word in different examplesMother, this reuse are itself not indicate the various embodiments discussed to simplify and clearly state the applicationAnd/or the particular kind of relationship between setting.In addition, the application in the following description provided by various specific techniques and material onlyFor the example for realizing technical scheme, but those of ordinary skill in the art should be aware that the technical solution of the applicationIt can be realized by other techniques for not describing hereafter and/or other materials.
Further, described feature, structure can be incorporated in one or more embodiment party in any suitable mannerIn formula.In the following description, many details are provided so as to fully understand presently filed embodiment.However, thisField technical staff will be appreciated that even if without one or more in the specific detail, or using other structures, groupMember etc. can also practice the technical solution of the application.In other cases, it is not shown in detail or describes known features or operationTo avoid the emphasis of fuzzy the application.
It should be understood that embodiments described herein and/or method are exemplary in itself, it is not construed as pairThe limitation of technical scheme.Embodiment or method described herein are only that the application the relevant technologies thought is coveredOne of numerous technical solutions are a variety of, therefore each step of described method and technology scheme can be according to being indicatedOrder executes, and can execute, may be performed simultaneously, or be omitted in some cases, above-mentioned change according to other orderIt is regarded as the range that the application technical solution claimed is covered.
As shown in Figure 1, the application first embodiment provides a kind of light-source structure 1, for emitting light beam to one testedIt is sensed on object.The light beam can be the light beam with specific wavelength according to sensing principle and application scenarios.At thisIn embodiment, the light beam is used to sense the three-dimensional information of measured target object, can be infrared or near-infrared wavelength light beam, waveLong range is 750 nanometers (Nanometer, nm) to 1650nm.
The light-source structure 1 includes the first emission part 10 and the second emission part 12.First emission part 10 issues firstLight beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object tested for sensingThe floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.Described secondThe second light beam that emission part 12 issues is used to form the pattern beam that predetermined pattern can be projected on measured target object.It is describedPredetermined pattern can be used for the three-dimensional information for sensing the measured target object.
First emission part 10 is formed in the same substrate 14 with the second emission part 12 or is connected with each other to be integrated intoOverall structure.The first light emitting region 122 in the middle part of semiconductor base 14 is defined on the semiconductor base 14 and is enclosedAround the second light emitting region 102 of first light emitting region 122 setting.
The integration mode of first emission part 10 and the second emission part 12 includes being directly connected to, be indirectly connected with or distinguishing shapeAt on the same substrate 14 etc..In the present embodiment, first light beam and the second light beam are the identical near-infrared of wavelengthLight.
In the present embodiment, first emission part 10 includes multiple for emitting the first illuminator of the first light beam100.Second emission part 12 includes multiple for emitting the second illuminator 120 of the second light beam.First illuminator 100It is formed on the same semiconductor base 14 with the second illuminator 120.First illuminator 100 in semiconductor base 14It is uniformly distributed in two light emitting regions 102 according to preset same intervals.Second illuminator 120 is in the semiconductor base 14The first light emitting region 122 in irregular distribution.
First illuminator 100 and the second illuminator 120 can be semiconductor laser.Preferably, in this embodiment partyIn formula, first illuminator 100 and the second illuminator 120 are vertical cavity surface emitting laser (Vertical CavitySurface Emitting Laser, VCSEL), it is made up on the semiconductor base 14 of the techniques such as photoetching and etching.InstituteThe pattern beam that the flood beam and the second illuminator 120 for stating the sending of the first illuminator 100 issue is that wavelength is identical infraredOr near infrared light, wave-length coverage are 750nm to 1650nm.
In the present embodiment, first light emitting region 122 positioned at 14 middle part of semiconductor base is rectangle.DescribedTwo light emitting regions 102 are correspondingly arranged at four edges of the first light emitting region 122.First illuminator 100 is in the second hairIt uniformly arranges along two sides of each corner in the second light emitting region 102 according to same intervals four corners in light region 102Multilayer, first light emitting region 122 be dotted line described in Fig. 1 surround envelope the first light emitting region 102 each be straightFour right angle frame bar-shaped zones at angle.Second illuminator 102 is randomly distributed in the first light emitting region 122, is used forLaunch the second light beam with irregular distribution pattern when lighting.
It is provided on the semiconductor base 14 and connect with external circuit for controlling in first light emitting region 122First pad 104 of light.It is provided with and connect with external circuit for controlling described on the semiconductor base 14Second pad 124 of the light in two light emitting regions 102.So being located at the first light emitting region 122 in present embodimentThe second interior illuminator 120 and the first illuminator 100 in the second light emitting region 102 can pass through different control signalsIndependently work.
As shown in Fig. 2, the second embodiment of the application provides a kind of light-source structure 2, in first embodimentLight-source structure 1 it is essentially identical, difference be that first illuminator 200 is evenly distributed according to preset same intervalsIn first light emitting region 222.The irregular distribution of second illuminator 220 is in the second light emitting region 202.
Also referring to shown in Fig. 3 and Fig. 4, the application third embodiment provides a kind of light-source structure 3, with firstLight-source structure 1 in embodiment is essentially identical, and difference is that second light emitting region 302 is in first luminous zoneThe blocked areas that first light emitting region 322 1 is enclosed is surrounded outside domain 322.Second light emitting region 302 and the first luminous zoneThe size of minimum spacing D is it is ensured that the light beam sent out from the first light emitting region 322 and the second light emitting region 302 between domain 322The light beam sent out is arranged above light-source structure 3 before tactic first optical element 31 between each other not in arrivalIt crosses.
Since manufacturing process is there are a degree of error, first illuminator 300 is issued with the second illuminator 320The dispersion angle of light beam can not accomplish it is just the same, but can be within the scope of preset dispersion angle.Because of first illuminator 300It is bigger with the dispersion angle of the issued light beam of the second illuminator 320, in light-source structure 3 and tactic first optics in topThe spacing of element 31 is sent out under the premise of remaining unchanged in order to meet first light emitting region 322 with the second light emitting region 302Light beam does not cross out, it is required that the distance between the first light emitting region 322 and the second light emitting region 302 D are bigger.Assuming that from firstThe maximum dispersion angle of the issued light beam in light emitting region 322 and the second light emitting region 302 is θ, the light-emitting surface of the light-source structure 3It is H with the distance between tactic first optical element 31 is disposed there above, according to trigonometric function relationship, firstDescribed first under the critical condition that the issued light beam in light emitting region 322 just intersects with the issued light beam in the second light emitting region 302Minimum spacing D between light emitting region 322 and the second light emitting region 302 meets formulaSo the light beam in order to ensure being sent out from the first light emitting region 322 andThe light beam that two light emitting regions 302 are sent out reaches setting tactic first optical element 31 above light-source structure 3It does not cross mutually before, the minimum spacing D between first light emitting region 322 and the second light emitting region 302 should meetWhen because meeting above-mentioned condition, respectively from the first light emitting region 322 and the second hairThe light beam that light region 302 issues before reaching first optical element 31 being arranged in light-source structure 3 above it is mutual notIt crosses, adjusts beam direction so not needing to be arranged again in the light emission side of the first light emitting region 322 or the second light emitting region 302Other elements.
In the present embodiment, the irregular distribution of the second illuminator 320 is in the first luminous zone of semiconductor base 34In domain 322.First illuminator 300 is equably arranged in the second light emitting region 302 according to identical preset interval.
As shown in figure 5, the 4th embodiment of the application provides a kind of light-source structure 4, in third embodimentLight-source structure 3 it is essentially identical, difference be that first illuminator 400 is evenly distributed according to preset same intervalsIn first light emitting region 422.The irregular distribution of second illuminator 420 is in the second light emitting region 402.
As shown in fig. 6, the 5th embodiment of the application provides a kind of light-source structure 5, in first embodimentLight-source structure 1 is essentially identical, and difference is that second light emitting region 502 is that the semiconductor base 54 is formed with illuminatorSurface on other regions other than the first light emitting region 522.First illuminator 500 is arranged in the second light emitting regionIn 502.Second illuminator 520 is arranged in first light emitting region 522.First illuminator 500 and the second hairBody of light 520 is equably arranged all in accordance with preset same intervals.
In the present embodiment, the second light beam cooperation that the second illuminator 520 of first light emitting region 522 is issuedThe optical element that 5 top of light-source structure is arranged in can be formed can project irregular distribution hot spot figure on measured target objectCase, the striped design of regular array or the pattern beam along the cross one another regular grid pattern of different directions.
It is understood that being arranged in second in the first light emitting region 522 in other embodiments out not shownIlluminator 520 can also be randomly distributed.
It is understood that first illuminator 500 can also be according to pre- in other embodiments out not shownIf same intervals be evenly distributed in the first light emitting region 522.The irregular distribution of second illuminator 520 is in the second hairIn light region 502.
Referring to Figure 7 together and Fig. 8, the application sixth embodiment provides a kind of light-source structure 6, for emitting light beamIt is sensed on to a measured target object.The light beam can be the light with specific wavelength according to sensing principle and application scenariosBeam.In the present embodiment, the light beam is used for recognition of face, can be for infrared or near-infrared wavelength light beam, wave-length coverage750 nanometers (Nanometer, nm) to 1650nm.
The light-source structure 6 includes the first emission part 60 and the second emission part 62.First emission part 60 issues firstLight beam is used to form the flood beam of optical power detection.The flood beam is projected on measured target object for sensing quiltSurvey the floodlight image of object.For example, the flood beam can be used for sensing whether the measured target object is face.DescribedTwo emission parts 62 issue the second light beam and are used to form the pattern beam that can project predetermined pattern on measured target object.It is describedPredetermined pattern can be used for the three-dimensional information for sensing the measured target object.In the present embodiment, first light beam andTwo light beams are the identical near infrared light of wavelength.
First emission part 60 includes the first illuminator 600 and the light guide plate being formed on the first semiconductor base 601602.The light guide plate 602 includes incidence surface 6020 and light-emitting surface 6022.In the present embodiment, the light guide plate 602 is substantiallyIn rectangular shape, the incidence surface 6020 is perpendicular to light-emitting surface 6022.The corresponding light guide plate 602 of first illuminator 600Incidence surface 6020 is arranged, so that the first light beam that first illuminator 600 is issued injects light guide plate from incidence surface 6020Flood beam is projected from light-emitting surface 6022 after evenly mixing in 602.
The middle position of 602 light-emitting surface 6022 of light guide plate is arranged in second emission part 62.Second transmittingPortion 62 includes the second illuminator of one or more 620 being formed on the second semiconductor base 621.In the present embodiment, instituteIt states multiple second illuminators 620 to be randomly distributed on the second semiconductor base 621, be used for and is arranged above light-source structure 6Optical element cooperation irregular distribution spot pattern is projected on measured target object.It is understood that in other implementationsIn mode, the multiple second illuminator 620 can also equably arrange according to preset same intervals, can be used for existing with settingThe optical element cooperation of 6 top of light-source structure projects the striped design of regular array or along difference on measured target objectThe cross one another regular grid pattern in direction.
In the present embodiment, first illuminator 600 and the second illuminator 620 can be semiconductor laser, exampleSuch as: VCSEL.Unlike, because first illuminator 600 is different from the position where the second illuminator 620, need shape respectivelyAt on different the first semiconductor bases 601 and the second semiconductor base 621.The shape of first semiconductor base 601It is corresponding with 6020 shape of incidence surface.
Also referring to Fig. 1 and Fig. 9, the 7th embodiment of the application provides a kind of light-source structure 7, implements with firstLight-source structure 1 in mode is essentially identical, and difference is that first illumination region 70 includes each second light emitting region 702Inside respectively correspond single first illuminator 700 of setting, first illuminator 700 is the wide face type VCSEL of single hole, to replace theIt is multiple according to evenly arranged first illuminator of preset same intervals in second light emitting region 102 described in one embodiment100.Described wide only one lightening hole of face type VCSEL of single hole, but the aperture that shines is larger, several times in making in first embodimentFor one of VCSEL of the first illuminator 100.It is equal that the illumination effect of the wide face type VCSEL of single hole is equal to luminous intensityEven area source.The light-emitting surface shape of the wide face type VCSEL of single hole can be the shape of rule, such as rectangle；OrIrregular shape, such as the light-emitting surface shape of the wide face type VCSEL of the single hole is described second luminous in the present embodimentThe right angle moulding shape in region 702.
Also referring to Fig. 1 and Figure 10, the 8th embodiment of the application provides a kind of light-source structure 8, real with firstThe light-source structure 1 applied in mode is essentially identical, and difference is that second emission part 82 includes being arranged in the first light emitting regionSingle second illuminator 820 in 822, second illuminator 820 are the wide face type VCSEL of single hole, to replace the first embodiment partyThe second illuminator 120 being randomly distributed in first light emitting region 122 described in formula.First emission part 80 includes each theSingle first illuminator 800 of setting is respectively corresponded in one light emitting region 802, first illuminator 800 is the wide face type of single holeVCSEL multiple is uniformly arranged with replace described in first embodiment in the second light emitting region 102 according to preset same intervalsFirst illuminator 100 of cloth.Described wide only one lightening hole of face type VCSEL of single hole, but the aperture that shines is larger, several times in theOne of VCSEL in one embodiment as the first illuminator 100 and the second illuminator 120.The wide face type of single holeThe illumination effect of VCSEL is similar to the uniform area source of luminous intensity.The light-emitting surface shape of the wide face type VCSEL of single hole can be withFor the shape of rule, such as rectangle；It may be irregular shape, such as second light emitting region in the present embodiment802 right angle moulding shape.
As shown in figure 11, the 9th embodiment of the application provides a kind of optical projection mould group 11, for projecting specific lightIt is sensed on beam to measured target object.The optical projection mould group 11 includes beam modulation element 110 and above-mentioned first to theLight-source structure 1 in eight embodiments.
The beam modulation element 110 includes diffusion part 111 and patterning portion 112.The 111 corresponding light source knot of diffusion partFirst emission part 10 of structure 1 is arranged, the first beam spread for issuing first illuminator 100 of the first emission part 10Form the flood beam of optical power detection.Second emission part 12 of the 112 corresponding light source structure 1 of patterning portion is arranged, and usesIt can be projected on measured target object in the second light beam formation for issuing second illuminator 120 of the second emission part 12The pattern beam of predetermined pattern is with the three-dimensional information for sensing measured target object.
It is arranged in the first light emitting region 122 corresponding to second illuminator 120 to issue and be used to form pattern beamThe second light beam situation, first illuminator 100 is arranged in the second light emitting region 102 to issue and be used to form floodlight figureThe case where first light beam of case, the patterning portion 112 be arranged in the middle position of beam modulation element 110 with setting theThe second illuminator 120 in one light emitting region 122 is corresponding.The diffusion part 111 surround be arranged in patterning portion 112 periphery withIt is corresponding with the first illuminator 100 being arranged in the second light emitting region 102.
As shown in figure 12, correspond to second illuminator 220 to be arranged in the second light emitting region 202 to issue and be used for shapeAt the situation of the second light beam of pattern beam, first illuminator 100 is arranged in the first light emitting region 122 to issue and be used forFormed flood light pattern the first light beam the case where, the diffusion part 111 be arranged in the middle position of beam modulation element 110 withThe first illuminator 120 being arranged in the first light emitting region 122 is corresponding.The patterning portion 112 is around setting in diffusion part 111Periphery with corresponding with the second illuminator 120 being arranged in the second light emitting region 102.
The function of the patterning portion 112 and diffusion part 111 in the corresponding position of transparent substrate 113 by forming specificallyOptical grains are realized.In the present embodiment, the patterning portion 112 of the beam modulation element 110 and diffusion part 111 are arrangedOn the same transparent substrate 113.That is, the middle position of the transparent substrate 113 is formed with the figure for rearrangement light fieldCase optical grains 1120 are used as the patterning portion 112, and the transparent substrate 113 is in the patterned optical lines 1120Periphery position corresponding with 1 first light emitting region 102 of light-source structure has been formed with the diffusion optical grains 1100 of light diffusionAs the diffusion part 111.The patterned optical lines 1120 includes but is not limited to diffraction optics lines, optical microlens battle arrayColumn, grating and combinations thereof.
As shown in figure 13, detection route 134 can also be formed on the surface of the transparent substrate 113.The detection routeIt can be made of an electrically conducting material, which is provided with multiple test points 135.It can by being detected to any two of them test point 135Knowing whether 113 surface of transparent substrate that route between the two o'clock passes through has to burst apart etc. influences the flaw of optical element integrality.
As shown in figure 14, the tenth embodiment of the application provides a kind of optical projection mould group 15, with the 9th embodiment partyOptical projection mould group 11 in formula is essentially identical, and difference is that the optical projection mould group 15 further includes optical path director element 16.
The optical path director element 16 is arranged between light-source structure 1 and beam modulation element 110, and with the light source knotAt the corresponding position of light-emitting surface of first emission part 10 of structure 1.The optical path director element 16 is used for the first emission part 10The first light beam guidance of divergent shape outgoing is irradiated to the diffusion part 111 of the beam modulation element 110.The optical path director element16 setting is the technical solution in order to avoid being closer in the first emission part 10 of light-source structure 1 and the second emission part 12In, issued from the first emission part 10 be used to form floodlight irradiation the first light beam of a part light can by beam modulation memberThe patterning portion 112 of part 110 projects away the pattern beam for forming luminous intensity irregular distribution, to influence flood beamUniformity.The optical path director element 16 includes but is not limited to prism, lenticule and grating.The optical path director element 16 is setRegion is set to be consistent with the region where the first emission part 10 of light-source structure 1.
As shown in figure 15, the 11st embodiment of the application provides a kind of optical projection mould group 17, implements with the 9thOptical projection mould group 11 in mode is essentially identical, and difference is the diffusion part 171 and pattern of the beam modulation element 170Change portion 172 is respectively formed on different transparent substrates.
The transparent substrate for being formed with patterning portion 172 is defined as patterned substrate 1721.The patterned substrateIt is formed at position corresponding with the second emission part 12 of light-source structure 1 on 1721 and the light field of light beam is subjected to rearrangementPatterned optical lines 1720.In the present embodiment, 1 middle part of light-source structure is set corresponding to second emission part 12Situation, the patterned optical lines 1720 are formed in the middle position of patterned substrate 1721.
The transparent substrate for being formed with diffusion part 171 is defined as diffusion substrate 1710.On the diffusion substrate 1710 withThe diffusion optical grains 1711 for playing light diffusion are formed at the corresponding position of the first emission part 10 of light-source structure 1.The diffusion substrate 1710 region corresponding with patterned optical lines 1720 on patterned substrate 1721 keeps light transmission, the figureThe region corresponding with optical grains 1711 are spread on diffusion substrate 1710 of case substrate 1721 keeps light transmission, is defined as transmission region1712.In the present embodiment, the light-source structure 1 of the second emission part 12 setting, institute are surrounded corresponding to first emission part 10Diffusion substrate 1710 is stated to be formed at the periphery position corresponding with 1 first emission part 10 of light-source structure of the transmission region 1712There are the diffusion optical grains 1711.
The patterned substrate 1721 and diffusion substrate 1710 can be stacked together, and can also be thrown along the opticsThe projecting light path of shadow mould group 17 is respectively and independently arranged at the different location in optical path.It is understood that needing only assure that describedIt corresponds to optical grains position on diffusion substrate 1710 and patterned substrate 1721 to be mutually aligned, for diffusion substrate 1710 and patternChange substrate 1721 not specially require along putting in order for the projecting light path.
As shown in FIG. 16 and 17, the 12nd embodiment of the application provides a kind of sensing device 18, is used to senseThe spatial information of measured target object.The spatial information includes, but are not limited to the depth information on measured target object surface, is testedObject location information in space, the dimension information etc. of measured target object other three-dimensional letters relevant to measured target objectBreath.The spatial information of the measured target object sensed can be used for identifying measured target object or construct the three-dimensional of measured target objectModel.
The sensing device 18 include the optical projection mould group 11 as provided by above-mentioned 9th to the 11st embodiment andSense mould group 180.The optical projection mould group 11 is for projecting particular beam to measured target object.The sensing mould group 180Including camera lens 181, imaging sensor 182 and image analysis processor 183.Described image sensor 182 is sensed by camera lens 181The image that the particular beam is formed on measured target object.Described image analysis processor 183 analyzes sensed projectionImage on measured target object obtains the three-dimensional information of measured target object.
In the present embodiment, the sensing device 18 is to sense the three-dimensional information on measured target object surface and identify accordinglyThe 3D face authentification device of measured target object identity.
The particular beam includes the flood beam of even intensity and can project default figure on measured target objectThe pattern beam of case.The sensing mould group 180 according to the image that the flood beam sensed is formed on measured target object comeIdentify whether close measured target object is face.The sensing mould group 180 is according to the pattern beam sensed testedThe change in shape of the predetermined pattern projected on object is to analyze the three-dimensional information on measured target object surface and accordingly to quiltIt surveys object and carries out face recognition.
Also referring to Figure 11, Figure 12, Figure 14 to Figure 18, the application, which also provides, a kind of to be provided using above embodimentSensing device 18 sense measured target object three-dimensional information method for sensing.The method for sensing includes the following steps:
Step S01 issues the first light beam of optical power detection.First light beam is sent out by the first of the first emission part 10The diffusion part 111 of body of light 100 towards beam modulation element 110 issues.
It may include multiple according to evenly arranged first illuminator 100 of same intervals in each first emission part 10.The multiple first illuminator 100 be multiple array VCSEL luminescence units, issue respectively evenly spaced multiple beamlets withForm the first light beam of optical power detection.
Each first emission part 10 can also be the wide face type VCSEL of a single hole.Each described wide face type of single holeVCSEL is the single lightening hole with wider bore diameter, the first light beam of the capable of emitting optical power detection similar to area source.
Entire first emission part 10 can also be single area source, issue the of complete uniform intensity aloneOne light beam.
First light beam is uniformly diffused into flood beam around and is irradiated on measured target object by step S02.
First light beam is diffused via the diffusion part 111 of beam modulation element 110.Because being used to form flood beamFirst light beam need to be integrated in the same light-source structure 1 with the second light beam of projection specific pattern, it is described to issue theThe position of first illuminator 100 of one light beam can not cover the entire light-emitting surface of light-source structure 1, need by the diffusion part111 spread the first light beam uniformly around to form the flood beam for covering entire crevice projection angle range.The diffusion part 111It is realized by the way that diffusion optical grains 1100 corresponding with first emission part 10 are arranged on transparent substrate 113 to the first lightThe diffusion function of beam.
Step S03 obtains floodlight image of the measured target object under flood beam irradiation.The measured target objectFloodlight image cooperates relevant camera lens 181 to obtain via the imaging sensor 182 of sensing mould group 180.Described image sensor182 be the photoelectric sensor to the photaesthesia in the wave-length coverage of first light beam.In the present embodiment, described image passesSensor 182 is infrared or near-infrared image sensor.
Step S04 analyzes acquired floodlight image and judges whether the measured target object is interested sensing object.
Floodlight floodlight image of the image analysis processor 183 of the sensing mould group 180 to acquired measured target objectIt is analyzed to seize the characteristic of measured target object, and the characteristic of obtained measured target object and preset sense is emergingThe common feature data of the sensing object of interest are compared to judge whether the measured target object is interested sensing object.
The sensing mould group 180 calculates the characteristic of the measured target object and the general character spy of interested sensing objectLevy the degree of agreement of data.Judge that the measured target object is if calculating the degree of agreement come and being more than preset identical threshold valueInterested sensing object, can continue the sensing of next step.If calculating the degree of agreement come and being lower than preset identical threshold valueJudge that the measured target object is not interested sensing object, sensing operation can be terminated.
Step S05 issues the second light beam of optical power detection or irregular distribution.Second light beam is by being arranged inSecond illuminator 120 of two emission parts 12 is issued towards the patterning portion 112 of beam modulation element 110.
First light beam and the second light beam are required to not by the interference of visible light and should reduce to the greatest extent to measured targetObject impacts.In the present embodiment, first light beam and the second light beam are infrared or near infrared light, and wave-length coverage is750nm to 1650nm.
Second emission part 12 may include the second illuminator 120 of multiple irregular distributions.Each second illuminator120 be a VCSEL luminescence unit.Second illuminator 120 of the multiple irregular distribution, which issues, has irregular distribution lightSecond light beam of spot pattern is to the patterning portion 112 of the beam modulation element 110.
Second emission part 12 can also include multiple according to evenly arranged second illuminator 120 of same intervals.InstituteStating multiple second illuminators 120 is multiple array VCSEL luminescence units, issues evenly spaced multiple beamlets respectively with groupAt the second light beam of optical power detection.
Each described wide face type VCSEL of single hole is the single lightening hole with wider bore diameter, capable of emitting to be similar to face lightSecond light beam of source sending optical power detection.
It is preset to project on measured target object to be carried out rearrangement by step S06 for the light field of second light beamPattern.
The patterning portion 112 is corresponding with second emission part 12 on the transparent substrate 113 of beam modulation element 110Position, realized by forming patterned optical lines 1120 on the transparent substrate 113 to the light field of the second light beam intoThe function of row rearrangement.The patterned optical lines 1120 includes but is not limited to diffraction optics lines, optical microlens battle arrayColumn, grating etc..
Include the case where the second illuminator 120 of multiple irregular distributions, the pattern for second emission part 12Change portion 112 will have the second beam replication of irregular distribution spot pattern multiple and be unfolded within the scope of preset expanded- angleAnd form the more patterns of irregular distribution number of spots being incident upon on measured target object.
It include multiple feelings according to evenly arranged second illuminator 120 of same intervals for second emission part 12Condition, the patterning portion 112 can be in tested mesh by the light field rearrangement formation of the optical power detection of second light beamMark the pattern beam of projection irregular distribution spot pattern on object.
It include multiple feelings according to evenly arranged second illuminator 120 of same intervals for second emission part 12Condition, the light that the patterning portion 112 can also issue respectively second illuminator 120 along the arrangement of the same preset directionBeam is fused to the pattern beam with regular array candy strip.
The case where being a single hole wide face type VCSEL for second emission part 82, the patterning portion 112 will be describedThe light field rearrangement formation of the optical power detection of second light beam can project irregular distribution pattern on measured target objectPattern beam.
Step S07 obtains the patterning light image of the predetermined pattern projected on the measured target object.The tested meshThe patterning light image for marking object cooperates relevant camera lens 181 to obtain via the imaging sensor 182 of sensing mould group 180.It is describedImaging sensor 182 is the photoelectric sensor to the photaesthesia in the wave-length coverage of second light beam.In the present embodiment,Described image sensor 182 is infrared or near-infrared image sensor.
Step S08 analyzes acquired floodlight image and patterning light image to sense the three-dimensional of the measured target objectInformation.
The patterned beam is incident upon measured target by the image analysis processor 183 of the sensing mould group 180 respectivelyThe patterning reference picture that the patterning light image formed on object is formed in the plane with projection is mutually compared.
Described image analysis processor 183 by the patterning light image that is formed on analysis measured target object be formed in it is flatDeviation situation of the patterning reference picture on respective corresponding position on face calculates measured target object in the corresponding positionThree-dimensional information.
The floodlight image can be used for the analysis of 183 pairs of assisted image analysis processor patterning images, such as: the figureAs analysis processor 183 can adjust calculating three-dimensional information according to the characteristic of the measured target object obtained from floodlight imageAlgorithm or to extracted depth information be filtered with remove obviously do not meet floodlight image characteristic noise.
Step S09, according to being patterned on the measured target object sensed in light image institute coverage area at each positionDepth information build up the threedimensional model of measured target object.
Compared with existing sensing device needs to be respectively set the structure of floodlight transmitter and light pattern transmitter, the applicationProvided sensing device 18 integrates the transmitter for projecting flood beam and pattern beam, and not only volume is smaller advantageousIn the design of equipment, and also further reduce the cost of device.
In the description of this specification, reference term " embodiment ", " certain embodiments ", " schematically implementationWhat the description of mode ", " example ", " specific example " or " some examples " etc. meant to describe in conjunction with the embodiment or exampleParticular features, structures, materials, or characteristics are contained at least one embodiment or example of the application.In this specificationIn, schematic expression of the above terms are not necessarily referring to identical embodiment or example.Moreover, the specific spy of descriptionSign, structure, material or feature can be combined in any suitable manner in any one or more embodiments or example.
The foregoing is merely the better embodiments of the application, all the application's not to limit the applicationMade any modifications, equivalent replacements, and improvements etc., should be included within the scope of protection of this application within spirit and principle.