



技术领域technical field
本发明涉及液晶显示技术领域,尤其涉及一种液晶面板的断线修复方法。The present invention relates to the technical field of liquid crystal display, and in particular, to a method for repairing broken wires of a liquid crystal panel.
背景技术Background technique
薄膜晶体管液晶显示器(TFT-LCD)是液晶显示器的一种,它具有低能耗、高亮度、高对比度、高响应速度、环保等特点,被广泛应用于电视、平板显示器及投影仪上。阵列工序是整个液晶显示制造流程中最核心的工序,制程工艺复杂度高、工期长、投资大,故阵列基板的良率至关重要。Thin-film transistor liquid crystal display (TFT-LCD) is a type of liquid crystal display. It has the characteristics of low energy consumption, high brightness, high contrast, high response speed, and environmental protection. It is widely used in TVs, flat panel displays and projectors. The array process is the core process in the entire liquid crystal display manufacturing process. The process has high complexity, long construction period and large investment, so the yield of the array substrate is very important.
阵列工序一般需经过多次“成膜-曝光-显影-蚀刻”完成阵列基板的制作,在透明玻璃基板上做成薄膜晶体管阵列,用来驱动液晶分子的旋转。制程工艺复杂,环境中异物很容易导致金属层断线,从而影响整个驱动控制电路正常导通。The array process generally requires multiple "film formation-exposure-development-etching" to complete the fabrication of the array substrate, and a thin film transistor array is formed on the transparent glass substrate to drive the rotation of the liquid crystal molecules. The manufacturing process is complicated, and foreign objects in the environment can easily lead to disconnection of the metal layer, thereby affecting the normal conduction of the entire drive control circuit.
现有技术中,阵列工序完成后金属层断线均利用激光化学沉积(Laser chemicalvapor deposition,LCVD)方式进行修复。激光化学沉积是金属源六羰 基钨W(CO)6在激光束作用下发生光解反应,分离出金属钨成膜在断线处,从而使信号线导通。In the prior art, after the array process is completed, the broken lines of the metal layer are repaired by means of laser chemical vapor deposition (LCVD). Laser chemical deposition is a photolysis reaction of metal source tungsten hexacarbonyl W(CO)6 under the action of a laser beam, and the metal tungsten is separated to form a film at the broken line, so that the signal line is turned on.
如图1所示,液晶面板的阵列基板包括矩阵状排列的第一像素区域01、第二像素区域02、第三像素区域03和第四像素区域04,位于同一列且相邻的第一像素区域01和第二像素区域02共用一条数据线11,针对跨像素区域数据线(source line)断线,数据线11的线缺陷110一部分位于第一像素区域01 内,一部分位于第二像素区域02内。As shown in FIG. 1 , the array substrate of the liquid crystal panel includes a
现行跨像素区域的数据线断线修复方法如图2所示,步骤简要地包括:The current method for repairing broken data lines across pixel areas is shown in Figure 2, and the steps briefly include:
步骤S11:找到跨像素区域的数据线线缺陷110的位置;Step S11: find the position of the
步骤S12:首先在线缺陷110两侧的数据线11上方使用激光打出修复通孔21,使数据线11暴露在表面;然后,利用激光化学沉积方式进行修复,形成连接桥22,连接桥22的两端分别与两个修复通孔21内的数据线11电性连接,使线缺陷110两侧的数据线11导通;Step S12: First, use a laser to punch repair through
步骤S13:使用激光在连接桥22外围剥除第一透明导电膜,形成剥除区域 23,剥除区域23一侧的连接桥22与剥除区域23另一侧的像素电极17断开。Step S13: use a laser to peel off the first transparent conductive film on the periphery of the connecting
该方法为本领域内通用修复手法,修复成功率约90%,修复失败可能形成多连结,多连结是指3个或3个以上相邻像素区域出现暗点或者亮点缺陷。步骤S12在镀膜时金属溅射或者步骤S13中剥除区域23处的像素电极17剥除不干净可能导致第一像素区域01和第二像素区域02变成亮点。若周边像素区域有异常(以第三像素区域03、第四像素区域04为例),就会形成多连结,导致液晶面板报废。This method is a common repair method in the field, and the repair success rate is about 90%. If the repair fails, multiple connections may be formed. Multi-connection refers to the occurrence of dark or bright defects in three or more adjacent pixel regions. Metal sputtering during coating in step S12 or unclean peeling of the
发明内容SUMMARY OF THE INVENTION
为解决上述技术问题,本发明提供一种液晶面板的断线修复方法,可以提高跨像素区域数据线断线的修复成功率,避免形成多连结。In order to solve the above-mentioned technical problems, the present invention provides a method for repairing a broken line of a liquid crystal panel, which can improve the success rate of repairing a broken data line across a pixel area and avoid the formation of multiple connections.
本发明提供的技术方案如下:The technical scheme provided by the present invention is as follows:
本发明公开了一种液晶面板的断线修复方法,当液晶面板内的数据线发生跨像素区域断线时,该修复方法包括以下步骤:The invention discloses a method for repairing a broken line of a liquid crystal panel. When a data line in the liquid crystal panel is broken across a pixel area, the repairing method includes the following steps:
第一步:确定数据线的线缺陷所在位置,线缺陷的一部分位于第一像素区域内,另一部分位于与第一像素区域相邻的第二像素区域内;The first step: determine the location of the line defect of the data line, a part of the line defect is located in the first pixel area, and the other part is located in the second pixel area adjacent to the first pixel area;
第二步:首先,在线缺陷两侧的数据线上方形成两个修复通孔,然后,形成连接桥,连接桥的两端分别与两个修复通孔内的数据线电性连接;Step 2: First, two repair through holes are formed above the data lines on both sides of the line defect, and then a connection bridge is formed, and the two ends of the connection bridge are respectively electrically connected to the data lines in the two repair through holes;
第三步:剥除连接桥外围的第一透明导电膜,形成剥除区域;分别在第一像素区域和第二像素区域内,剥除区域一侧的连接桥与剥除区域另一侧的像素电极断开;The third step: peel off the first transparent conductive film on the periphery of the connecting bridge to form a peeling area; in the first pixel area and the second pixel area, the connecting bridge on one side of the peeling area and the one on the other side of the peeling area are respectively in the first pixel area and the second pixel area. The pixel electrode is disconnected;
第四步:在第一像素区域和第二像素区域中,形成熔接点使公共电极线和漏极电性连接;The fourth step: in the first pixel area and the second pixel area, forming a welding point to electrically connect the common electrode line and the drain;
第五步:在第一像素区域中和第二像素区域中,分别在漏极接触孔外部两侧的公共电极线上方剥除第二透明导电膜,各形成两个剥除孔;Step 5: in the first pixel area and in the second pixel area, peel off the second transparent conductive film on the common electrode lines on both sides outside the drain contact hole, respectively, to form two peeling holes;
第六步:判断第一像素区域和第二像素区域周边是否存在异常像素区域,若无异常像素区域,则修复结束;若有异常像素区域,则在第一像素区域或第二像素区域的所述两个剥除孔处进行公共电极线的切断;Step 6: Determine whether there are abnormal pixel areas around the first pixel area and the second pixel area. If there is no abnormal pixel area, the repair is over; The common electrode line is cut off at the two stripping holes;
其中,第一透明导电膜、第二透明导电膜和像素电极均由透明导电材料形成。Wherein, the first transparent conductive film, the second transparent conductive film and the pixel electrode are all formed of transparent conductive materials.
优选地,第二步中的修复通孔由激光打点处理形成。Preferably, the repaired through holes in the second step are formed by laser spotting.
优选地,第二步中的连接桥由激光化学沉积方法形成。Preferably, the connecting bridge in the second step is formed by a laser chemical deposition method.
优选地,激光化学沉积方法使用的金属源为六羰 基钨。Preferably, the metal source used in the laser chemical deposition method is tungsten hexacarbonyl.
优选地,第四步中的熔接点位于所述漏极接触孔内。Preferably, the welding point in the fourth step is located in the drain contact hole.
优选地,第四步中的所述熔接点由激光照射处理形成。Preferably, the welding point in the fourth step is formed by laser irradiation treatment.
优选地,第三步中的剥除区域和第五步中的剥除孔由激光照射处理形成。Preferably, the stripped regions in the third step and the stripped holes in the fifth step are formed by laser irradiation processing.
优选地,上述第一步至第五步在液晶面板的正面进行,上述第六步中公共电极线的切断在液晶面板的背面进行。Preferably, the first to fifth steps are performed on the front side of the liquid crystal panel, and the cutting of the common electrode lines in the sixth step is performed on the back side of the liquid crystal panel.
优选地,公共电极线包括垂直于数据线的横向公共电极线和平行于数据线的纵向公共电极线。Preferably, the common electrode lines include lateral common electrode lines perpendicular to the data lines and vertical common electrode lines parallel to the data lines.
本发明还公开了一种液晶面板,该液晶面板采用上述任一项所述的断线修复方法进行修复,所述液晶面板包括相对设置的阵列基板、彩膜基板和夹置在阵列基板和彩膜基板之间的液晶;The invention also discloses a liquid crystal panel, the liquid crystal panel is repaired by using the broken wire repairing method described in any one of the above, the liquid crystal panel includes an array substrate, a color filter substrate arranged oppositely, and a color filter substrate sandwiched between the array substrate and the color filter. Liquid crystal between film substrates;
阵列基板包括纵横交错的扫描线和数据线、位于扫描线和数据线交叉处的 TFT开关、由扫描线和数据线交叉限定的像素区域、位于像素区域内的像素电极、与扫描线同时形成的公共电极线、覆盖扫描线的栅极绝缘层、以及位于数据线和像素电极之间的绝缘层;The array substrate includes criss-cross scan lines and data lines, TFT switches located at the intersections of the scan lines and the data lines, a pixel area defined by the intersection of the scan lines and the data lines, pixel electrodes located in the pixel area, and formed at the same time as the scan lines. Common electrode lines, a gate insulating layer covering the scan lines, and an insulating layer between the data lines and the pixel electrodes;
TFT开关包括与扫描线连接的栅极、与数据线连接的源极、以及与像素电极连接的漏极The TFT switch includes a gate connected to the scan line, a source connected to the data line, and a drain connected to the pixel electrode
与现有技术相比,本发明能够带来以下至少一项有益效果:Compared with the prior art, the present invention can bring at least one of the following beneficial effects:
1、首先将线缺陷两边的第一像素区域和第二像素区域修复为暗点,避免了镀膜金属溅射或者剥除区域处的像素电极剥除不干净可能导致的亮点缺陷,降低了缺陷的影响;1. First, repair the first pixel area and the second pixel area on both sides of the line defect as dark spots, which avoids the bright spot defects that may be caused by the sputtering of the coated metal or the pixel electrode in the stripping area is not stripped cleanly, and reduces the defect rate. influences;
2、若第一像素区域和第二像素区域周边存在异常像素区域,则将第一像素区域或第二像素区域由暗点修复为正常点,避免产生多连结缺陷,提高了修复的成功率;2. If there is an abnormal pixel area around the first pixel area and the second pixel area, the first pixel area or the second pixel area is repaired from a dark spot to a normal spot to avoid multiple connection defects and improve the success rate of repair;
3、在阵列工艺段进行像素电极剥除孔的预剥除,便于在后续点灯检测段 (SL工艺)可能进行的公共电极线切断,以将暗点恢复成正常点,避免产生多连结缺陷。3. The pixel electrode stripping hole is pre-stripped in the array process section, which is convenient for the common electrode line to be cut in the subsequent lighting detection section (SL process), so as to restore the dark point to a normal point and avoid multi-connection defects.
附图说明Description of drawings
下面将以明确易懂的方式,结合附图说明优选实施方式,对本发明予以进一步说明。The present invention will be further described below by describing preferred embodiments in a clear and easy-to-understand manner with reference to the accompanying drawings.
图1为液晶面板中跨像素区域的数据线断线的平面示意图;1 is a schematic plan view of a broken data line across a pixel region in a liquid crystal panel;
图2为现有方法跨像素区域的数据线断线修复的示意图;2 is a schematic diagram of a data line disconnection repair across pixel regions in an existing method;
图3为本发明跨像素区域的数据线断线修复的示意图之一;3 is one of the schematic diagrams of the data line disconnection repair across the pixel area of the present invention;
图4为本发明跨像素区域的数据线断线修复的示意图之二。FIG. 4 is the second schematic diagram of the data line disconnection repairing across the pixel area according to the present invention.
具体实施方式Detailed ways
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对照附图说明本发明的具体实施方式。显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图,并获得其他的实施方式。In order to more clearly describe the embodiments of the present invention or the technical solutions in the prior art, the specific embodiments of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative efforts, and obtain other implementations.
为使图面简洁,各图中只示意性地表示出了与本发明相关的部分,它们并不代表其作为产品的实际结构。另外,以使图面简洁便于理解,在有些图中具有相同结构或功能的部件,仅示意性地绘示了其中的一个,或仅标出了其中的一个。在本文中,“一个”不仅表示“仅此一个”,也可以表示“多于一个”的情形。In order to keep the drawings concise, the drawings only schematically show the parts related to the present invention, and they do not represent its actual structure as a product. In addition, in order to make the drawings concise and easy to understand, in some drawings, only one of the components having the same structure or function is schematically shown, or only one of them is marked. As used herein, "one" not only means "only one", but also "more than one".
本发明液晶面板包括相对设置的阵列基板、彩膜基板和夹置在阵列基板和彩膜基板之间的液晶,其中阵列基板包括矩阵状排列的多个像素区域,像素区域结构如图1所示,液晶面板的阵列基板的制作包括以下步骤:The liquid crystal panel of the present invention includes an array substrate, a color filter substrate and a liquid crystal sandwiched between the array substrate and the color filter substrate, wherein the array substrate includes a plurality of pixel regions arranged in a matrix, and the structure of the pixel region is shown in FIG. 1 . , the fabrication of the array substrate of the liquid crystal panel includes the following steps:
步骤S21:在玻璃基板上形成由第一金属形成的扫描线12、栅极和公共电极线16;Step S21 : forming the
步骤S22:形成覆盖第一金属层的栅极绝缘层;Step S22: forming a gate insulating layer covering the first metal layer;
步骤S23:形成岛状的半导体层;Step S23: forming an island-shaped semiconductor layer;
步骤S24:在半导体层上形成刻蚀阻挡层;Step S24: forming an etching barrier layer on the semiconductor layer;
步骤S25:由第二金属层形成与扫描线12纵横交错的数据线11、与半导体层电性连接的源极13和漏极14,漏极14的至少一部分与公共电极线16隔着栅极绝缘层重叠,源极13在扫描线12和数据线11的交叉处与扫描线12电性连接;Step S25 : forming the data lines 11 crisscrossed with the
步骤S26:形成绝缘膜(绝缘层为有机绝缘层如JAS层或无机绝缘层和有机绝缘层的叠层结构);Step S26: forming an insulating film (the insulating layer is an organic insulating layer such as a JAS layer or a stacked structure of an inorganic insulating layer and an organic insulating layer);
步骤S27:在绝缘膜上形成位于漏极14上方的漏极接触孔15;Step S27: forming a
步骤S28:由透明导电材料(如ITO)形成像素电极17,透明导电材料通过漏极接触孔15将像素电极17和漏极14电性连接,像素电极17和相对的公共电极线16形成存储电容。Step S28: The
阵列基板包括纵横交错的扫描线12和数据线11、扫描线12和数据线11交叉处的TFT开关、由扫描线12和数据线11交叉限定的像素区域、位于像素区域内的像素电极17、与扫描线12同时形成的公共电极线16、覆盖扫描线12的栅极绝缘层、以及位于数据线11和像素电极17之间的绝缘层。TFT开关包括与扫描线 12连接的栅极、与数据线11连接的源极13、以及与像素电极17连接的漏极14。The array substrate includes criss-
其中,形成阵列基板的工艺称为阵列工艺段。The process of forming the array substrate is called an array process section.
为方便表述,将阵列基板靠近像素电极17的一面称为正面,将阵列基板靠近玻璃基板和栅极的一面称为背面。图1中数据线11的线缺陷110为跨像素区域断线,线缺陷110一部分位于第一像素区域01内,一部分位于与第一像素区域 01相邻的第二像素区域02内。For convenience of description, the side of the array substrate close to the
如图3所示,本发明的跨像素区域数据线11断线的修复方法包括以下步骤:As shown in FIG. 3 , the method for repairing the disconnection of the
首先,按照现有步骤在阵列工艺段完成镀膜架桥修补,阵列工艺段在阵列基板的正面进行,包括:First, complete the coating bridge repair in the array process section according to the existing steps, and the array process section is carried out on the front side of the array substrate, including:
步骤S31:找到跨像素区域的数据线线缺陷110的位置(即线缺陷110位于数据线11的上方);Step S31: Find the position of the
步骤S32:在线缺陷110两侧的数据线11上方使用激光打穿绝缘膜以形成位于数据线11上的修复通孔21,通过修复通孔21使数据线11暴露在表面,利用激光化学沉积方式形成连接桥22,导电的连接桥22连接位于线缺陷110 两侧的数据线11;Step S32 : using a laser to punch through the insulating film on the data lines 11 on both sides of the
步骤S33:步骤S13:使用激光在连接桥22外围剥除第一透明导电膜,形成剥除区域23,剥除区域23一侧的连接桥22与剥除区域23另一侧的像素电极17断开,避免第一像素区域01和第二像素区域02成为亮点。Step S33: Step S13: Use a laser to peel off the first transparent conductive film on the periphery of the connecting
其中激光化学沉积方法是金属源六羰 基钨W(CO)6在一定波长的激光束作用下发生光解反应,分离出金属钨成膜形成连接桥22,连接桥22的两端分别与两个修复通孔21内的数据线11电性连接,从而使数据线11的断线两端导通。The laser chemical deposition method is that the metal source tungsten hexacarbonyl W(CO)6 undergoes a photolysis reaction under the action of a laser beam of a certain wavelength, and the metal tungsten is separated to form a film to form a connecting
如图3所示,本发明的断线修复方法在阵列工艺段还包括以下步骤:As shown in FIG. 3, the broken wire repair method of the present invention further comprises the following steps in the array process section:
步骤S34:在第一像素区域01和第二像素区域02中,使用激光在漏极接触孔15的两侧形成两个熔接点24,使公共电极线16和漏极14电性连接,第一像素区域01和第二像素区域02变成暗点;Step S34: In the
步骤S35:在第一像素区域01和第二像素区域02中(即:连接桥22所在的像素区域),分别在漏极接触孔15外部两侧的公共电极线16上方剥除第二透明导电膜,各形成两个剥除孔25。Step S35 : in the
其中,第一透明导电膜、第二透明导电膜和像素电极17均由透明导电材料在同一层形成。步骤S33和步骤S35中像素电极17的剥除由一定波长的激光照射处理完成。由于暗点缺陷的影响远小于亮点缺陷,在步骤S34中对第一像素区域01和第二像素区域02均进行常暗化处理,排除了步骤S32中镀膜时金属溅射或者步骤S33中剥除区域23内的像素电极17剥除不干净而导致亮点缺陷的可能。Wherein, the first transparent conductive film, the second transparent conductive film and the
SL工艺段的修复在面板的背部进行,无法进行像素电极17的剥除,因此需要在阵列工艺段进行预剥除。在步骤S35中形成两个剥除孔25是为了便于在后续点灯检测段(SL工艺)可能进行的公共电极线16切断,以将第一像素区域01或第二像素区域02由暗点恢复为正常点,剥除孔25的形状可以为矩形、椭圆形等,形状和大小以方便公共电极线16的激光切断为准。The repair of the SL process section is performed on the back of the panel, and the stripping of the
以上阵列工艺段的断线修补全部完成,若在后续制程中发现周边像素区域异常(图4中以第三像素区域03、第四像素区域04为例,但包括第一像素区域 01和第二像素区域02周边所有像素区域),可能由于3个及3个以上相邻像素区域异常造成多连结缺陷致使液晶面板报废。The wire break repairs in the above array process segments are all completed. If abnormality is found in the surrounding pixel area in the subsequent process (the
进行判断,若没有发生周边像素区域异常,则跨像素区域的数据线11断线修复完成;若发生周边像素区域异常,如图4所示,可以在后续SL工艺段进行以下步骤:It is judged that if there is no abnormality in the surrounding pixel area, the
步骤S36:根据异常像素区域的位置,在第一像素区域01或第二像素区域 02内(下面以第一像素区域01为例,也可根据情况同时在第一像素区域01和第二像素区域02内进行),使用激光进行公共电极线16的切断,两个切断位置26 分别位于步骤S35所形成的两个剥除孔25内。Step S36: According to the position of the abnormal pixel area, in the
在本实施例中,公共电极线16包括多条垂直于数据线11的横向公共电极线 161和多条平行于数据线11的纵向公共电极线162,其中位于第一像素区域01内的纵向公共电极线162和位于第四像素区域04内的纵向公共电极线162相连,位于第二像素区域02内的纵向公共电极线162和位于第三像素区域03内的纵向公共电极线162相连。进行步骤S36后,熔接点24两侧的公共电极16与熔接点24断开,同时使第一像素区域01内的漏极14与公共电极16断开,漏极14的电压恢复正常,使第一像素区域01由暗点恢复为正常点,避免形成多连结,减少了液晶面板报废带来的损失,提高了跨像素区域数据线断线的修复成功率。In this embodiment, the
本发明还公开了一种液晶面板,该液晶面板阵列基板包括相对设置的阵列基板、彩膜基板和夹置在阵列基板和彩膜基板之间的液晶;阵列基板包括纵横交错的扫描线12和数据线11、扫描线12和数据线11交叉处的TFT开关、由扫描线12和数据线11交叉限定的像素区域、位于像素区域内的像素电极17、与扫描线12同时形成的公共电极线16、覆盖扫描线12的栅极绝缘层、以及位于数据线 11和像素电极17之间的绝缘层。TFT开关包括与扫描线12连接的栅极、与数据线11连接的源极13、以及与像素电极17连接的漏极14;该液晶面板采用上述断线修复方法进行修复。The invention also discloses a liquid crystal panel. The liquid crystal panel array substrate includes an array substrate disposed oppositely, a color filter substrate, and a liquid crystal sandwiched between the array substrate and the color filter substrate; the array substrate includes
本发明的断线修复方法针对跨像素区域的数据线断线,首先将线缺陷110 两端的数据线11进行镀膜架桥连接并将第一像素区域01和第二像素区域02修复为暗点,同时在漏极接触孔15外部两侧的公共电极16上方形成两个剥除孔 25;若周边存在异常像素区域,则切断公共电极16将第一像素区域01或第二像素区域修复02为正常点,避免产生多连结缺陷,提高了修复的成功率。The broken wire repair method of the present invention is aimed at the broken data line across the pixel area. First, the data lines 11 at both ends of the
应当说明的是,上述实施例均可根据需要自由组合。以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出多个改进和润饰,这些改进和润饰也应视为本发明的保护范围。It should be noted that the above embodiments can be freely combined as required. The above are only the preferred embodiments of the present invention, and it should be pointed out that for those skilled in the art, without departing from the principles of the present invention, many improvements and modifications can also be made. It should also be regarded as the protection scope of the present invention.
| Application Number | Priority Date | Filing Date | Title |
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| CN201810238595.2ACN108646476B (en) | 2018-03-22 | 2018-03-22 | Broken line repairing method of liquid crystal panel |
| Application Number | Priority Date | Filing Date | Title |
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| CN201810238595.2ACN108646476B (en) | 2018-03-22 | 2018-03-22 | Broken line repairing method of liquid crystal panel |
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| CN108646476A CN108646476A (en) | 2018-10-12 |
| CN108646476Btrue CN108646476B (en) | 2020-12-25 |
| Application Number | Title | Priority Date | Filing Date |
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| CN201810238595.2AExpired - Fee RelatedCN108646476B (en) | 2018-03-22 | 2018-03-22 | Broken line repairing method of liquid crystal panel |
| Country | Link |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110221497B (en)* | 2019-06-06 | 2022-03-01 | 成都中电熊猫显示科技有限公司 | Wiring repairing method, array substrate and display panel |
| CN110333631B (en)* | 2019-06-28 | 2021-02-26 | 惠科股份有限公司 | Driving array substrate, display panel and display device |
| CN110764289B (en)* | 2019-10-29 | 2022-03-29 | Tcl华星光电技术有限公司 | Liquid crystal panel repairing method |
| CN111326530A (en)* | 2020-03-03 | 2020-06-23 | Tcl华星光电技术有限公司 | Array substrate and long film repair method |
| US12009369B2 (en)* | 2021-04-29 | 2024-06-11 | Tcl China Star Optoelectronics Technology Co., Ltd. | Display panel and display device |
| CN114624928A (en)* | 2022-02-28 | 2022-06-14 | 长沙惠科光电有限公司 | Array substrate, display panel and display device |
| WO2025184765A1 (en)* | 2024-03-04 | 2025-09-12 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method therefor, and display panel |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006064789A1 (en)* | 2004-12-14 | 2006-06-22 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus and defect correction method for liquid crystal display apparatus |
| TW200925751A (en)* | 2007-12-13 | 2009-06-16 | Au Optronics Corp | Pixel sturctur and repairing method thereof |
| CN101581856A (en)* | 2008-05-16 | 2009-11-18 | 上海广电Nec液晶显示器有限公司 | Repairing method of array substrate |
| CN103135303A (en)* | 2011-12-05 | 2013-06-05 | 上海中航光电子有限公司 | Thin film transistor (TFT) pixel structure and point defect restoring method thereof |
| CN104730790A (en)* | 2015-03-25 | 2015-06-24 | 深圳市华星光电技术有限公司 | Liquid crystal display device, liquid crystal displayer and manufacturing method and dark spot working method of liquid crystal displayer |
| CN105425433A (en)* | 2015-11-10 | 2016-03-23 | 深圳市华星光电技术有限公司 | Method for restoring pixel with bright spot defect, array substrate and liquid crystal panel |
| CN106353942A (en)* | 2016-10-10 | 2017-01-25 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display panel and restoration method thereof |
| CN106597699A (en)* | 2016-11-25 | 2017-04-26 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display panel and method of manufacturing and restoring the same |
| CN107132712A (en)* | 2017-06-20 | 2017-09-05 | 深圳市华星光电技术有限公司 | Array base palte method for repairing and mending, array base palte and liquid crystal display |
| CN107367879A (en)* | 2017-08-25 | 2017-11-21 | 上海天马微电子有限公司 | Electrophoresis display panel and data line and scanning line repairing method thereof |
| CN107479290A (en)* | 2017-09-21 | 2017-12-15 | 京东方科技集团股份有限公司 | A kind of array base palte and its broken wire repair method, display device |
| CN107703657A (en)* | 2017-11-23 | 2018-02-16 | 武汉华星光电半导体显示技术有限公司 | Array base palte defect mending method |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101006434B1 (en)* | 2003-06-26 | 2011-01-06 | 삼성전자주식회사 | Thin film transistor array panel and repair method of liquid crystal display including the same |
| CN101581840B (en)* | 2008-05-16 | 2012-05-30 | 北京京东方光电科技有限公司 | Liquid crystal display and method for restoring broken wires |
| KR101309364B1 (en)* | 2008-12-24 | 2013-09-17 | 엘지디스플레이 주식회사 | Electrophoretic Display Device and Method for manufacturing the same and Method for Repairing the same |
| TWI421812B (en)* | 2010-10-08 | 2014-01-01 | Au Optronics Corp | Array substrate of display panel and repairing method thereof |
| KR20140112288A (en)* | 2013-03-13 | 2014-09-23 | 삼성디스플레이 주식회사 | Liquid crystal display and method of manufacturing the same |
| CN203337963U (en)* | 2013-04-18 | 2013-12-11 | 合肥京东方光电科技有限公司 | A kind of array substrate and liquid crystal display device |
| CN104201151B (en)* | 2014-08-26 | 2017-05-17 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and pixel darkening processing method thereof |
| CN104460071A (en)* | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Thin film transistor array substrate and liquid crystal display panel |
| CN104849883A (en)* | 2015-05-20 | 2015-08-19 | 武汉华星光电技术有限公司 | Bright point repair method and device for liquid crystal panel and liquid crystal panel with bright points repaired |
| CN105759522B (en)* | 2016-05-11 | 2019-01-22 | 深圳市华星光电技术有限公司 | Breakage repair method of TFT substrate |
| CN105892186A (en)* | 2016-06-13 | 2016-08-24 | 深圳市华星光电技术有限公司 | Array substrate structure and data wire breakage repairing method thereof as well as display device |
| CN106684098B (en)* | 2017-01-06 | 2019-09-10 | 深圳市华星光电技术有限公司 | Micro- LED display panel and its restorative procedure |
| CN106876436B (en)* | 2017-03-06 | 2020-03-13 | 京东方科技集团股份有限公司 | Array substrate and repairing method thereof |
| CN107329296B (en)* | 2017-08-25 | 2020-05-29 | 深圳市华星光电技术有限公司 | Liquid crystal panel dark spot repair method and array substrate structure |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006064789A1 (en)* | 2004-12-14 | 2006-06-22 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus and defect correction method for liquid crystal display apparatus |
| TW200925751A (en)* | 2007-12-13 | 2009-06-16 | Au Optronics Corp | Pixel sturctur and repairing method thereof |
| CN101581856A (en)* | 2008-05-16 | 2009-11-18 | 上海广电Nec液晶显示器有限公司 | Repairing method of array substrate |
| CN103135303A (en)* | 2011-12-05 | 2013-06-05 | 上海中航光电子有限公司 | Thin film transistor (TFT) pixel structure and point defect restoring method thereof |
| CN104730790A (en)* | 2015-03-25 | 2015-06-24 | 深圳市华星光电技术有限公司 | Liquid crystal display device, liquid crystal displayer and manufacturing method and dark spot working method of liquid crystal displayer |
| CN105425433A (en)* | 2015-11-10 | 2016-03-23 | 深圳市华星光电技术有限公司 | Method for restoring pixel with bright spot defect, array substrate and liquid crystal panel |
| CN106353942A (en)* | 2016-10-10 | 2017-01-25 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display panel and restoration method thereof |
| CN106597699A (en)* | 2016-11-25 | 2017-04-26 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display panel and method of manufacturing and restoring the same |
| CN107132712A (en)* | 2017-06-20 | 2017-09-05 | 深圳市华星光电技术有限公司 | Array base palte method for repairing and mending, array base palte and liquid crystal display |
| CN107367879A (en)* | 2017-08-25 | 2017-11-21 | 上海天马微电子有限公司 | Electrophoresis display panel and data line and scanning line repairing method thereof |
| CN107479290A (en)* | 2017-09-21 | 2017-12-15 | 京东方科技集团股份有限公司 | A kind of array base palte and its broken wire repair method, display device |
| CN107703657A (en)* | 2017-11-23 | 2018-02-16 | 武汉华星光电半导体显示技术有限公司 | Array base palte defect mending method |
| Publication number | Publication date |
|---|---|
| CN108646476A (en) | 2018-10-12 |
| Publication | Publication Date | Title |
|---|---|---|
| CN108646476B (en) | Broken line repairing method of liquid crystal panel | |
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| TA01 | Transfer of patent application right | Effective date of registration:20200911 Address after:No.7 Tianyou Road, Qixia District, Nanjing City, Jiangsu Province Applicant after:NANJING CEC PANDA LCD TECHNOLOGY Co.,Ltd. Address before:Nanjing Crystal Valley Road in Qixia District of Nanjing City Tianyou 210033 Jiangsu province No. 7 Applicant before:NANJING CEC PANDA LCD TECHNOLOGY Co.,Ltd. Applicant before:NANJING CEC PANDA FPD TECHNOLOGY Co.,Ltd. Applicant before:NANJING HUADONG ELECTRONICS INFORMATION & TECHNOLOGY Co.,Ltd. | |
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