技术领域technical field
本发明涉及一种减小弹性印章变形的新型压印方法，属于微纳米加工技术领域。The invention relates to a novel embossing method for reducing the deformation of an elastic stamp, which belongs to the technical field of micro-nano processing.
背景技术Background technique
传统的紫外压印方法是在填充印章的胶体被紫外光辐照固化后再去除外力，这时弹性印章已发生变形，胶体填充的是变形后的印章空腔，导致复制精度不高、胶体残留层厚度分布不均匀等缺点。The traditional UV imprinting method is to remove the external force after the colloid filling the stamp is cured by ultraviolet radiation. At this time, the elastic stamp has been deformed, and the colloid fills the cavity of the deformed stamp, resulting in low replication accuracy and residual colloid. Disadvantages such as uneven layer thickness distribution.
发明内容Contents of the invention
为了克服现有技术的缺陷，本发明提出一种减小弹性印章变形的新型压印方法，提出在填充印章的胶体被紫外光辐照固化之前即去除外力，这样弹性印章会在无压力情况下自行恢复原状，胶体填充到原状印章的空腔中，可以提高复制精度，并增加残留层厚度分布的均匀性。In order to overcome the defects of the prior art, the present invention proposes a novel embossing method that reduces the deformation of the elastic stamp, and proposes to remove the external force before the colloid that fills the stamp is cured by ultraviolet light, so that the elastic stamp will be under no pressure Self-recovery, the colloid is filled into the cavity of the original stamp, which can improve the reproduction accuracy and increase the uniformity of the thickness distribution of the residual layer.
为达到上述目的，本发明的技术方案是这样实现的：In order to achieve the above object, technical solution of the present invention is achieved in that way:
一种减小弹性印章变形的压印方法，该方法的工艺步骤如下：An embossing method for reducing the deformation of an elastic seal, the process steps of the method are as follows:
（1）准备弹性印章、压印衬底及压印胶；(1) Prepare elastic stamp, embossing substrate and embossing glue;
（2）通过施加外力将印章压印到涂有压印胶的压印衬底上；(2) Embossing the stamp onto an embossing substrate coated with embossing glue by applying external force;
（3）撤销外力，并等待一段时间让弹性印章恢复原状；(3) Remove the external force and wait for a period of time for the elastic seal to return to its original state;
（4）通过紫外光对压印胶体进行固化；(4) Curing the embossed colloid by ultraviolet light;
（5）将印章从压印胶分离。(5) Separate the stamp from the stamping glue.
优选地，所述步骤(1)中所述弹性印章为具有柔性和弹性的材料，所述压印衬底为硅、玻璃、金属或在其表面涂覆有薄膜的叠层（此处叠层指的是在硅、玻璃或金属表面涂覆有薄膜形成的叠层），所述压印胶为对紫外光敏感的聚合物。Preferably, the elastic stamp described in the step (1) is a material with flexibility and elasticity, and the imprinted substrate is silicon, glass, metal or a lamination (here lamination is coated with a thin film) on its surface Refers to the laminate formed by coating the surface of silicon, glass or metal with a thin film), and the embossing glue is a polymer sensitive to ultraviolet light.
优选地，步骤(2)中施加外力压强数值范围为0.02MPa-2MPa，压强维持时间范围为10s-120s。Preferably, in the step (2), the value range of the external force pressure is 0.02MPa-2MPa, and the pressure maintenance time range is 10s-120s.
优选地，步骤(3)中等待时间范围为1min-30min。Preferably, the waiting time in step (3) ranges from 1 min to 30 min.
优选地，步骤(4)中紫外光波长为365nm，紫外光照射时间为20s-80s。Preferably, in step (4), the wavelength of ultraviolet light is 365nm, and the irradiation time of ultraviolet light is 20s-80s.
优选地，所述具有柔性和弹性的材料为硅橡胶材料，包括聚二甲基硅氧烷。Preferably, the flexible and elastic material is a silicone rubber material, including polydimethylsiloxane.
优选地，所述薄膜为二氧化硅薄膜或氮化硅薄膜。Preferably, the film is a silicon dioxide film or a silicon nitride film.
有益效果：本发明提供一种减小弹性印章变形的压印方法，可以减小印章变形、提高复制精度、增加残留层厚度分布的均匀性。Beneficial effects: the invention provides an embossing method for reducing the deformation of the elastic stamp, which can reduce the deformation of the stamp, improve the reproduction accuracy, and increase the uniformity of the thickness distribution of the residual layer.
具体实施方式Detailed ways
为了使本技术领域的人员更好地理解本申请中的技术方案，下面对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都应当属于本申请保护的范围。In order to enable those skilled in the art to better understand the technical solutions in the application, the technical solutions in the embodiments of the application are clearly and completely described below. Obviously, the described embodiments are only part of the embodiments of the application, and Not all examples. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the scope of protection of this application.
一种减小弹性印章变形的压印方法，该方法的工艺步骤如下：An embossing method for reducing the deformation of an elastic seal, the process steps of the method are as follows:
（1）准备弹性印章、压印衬底及压印胶；(1) Prepare elastic stamp, embossing substrate and embossing glue;
（2）通过施加外力将印章压印到涂有压印胶的压印衬底上；(2) Embossing the stamp onto an embossing substrate coated with embossing glue by applying external force;
（3）撤销外力，并等待一段时间让弹性印章恢复原状；(3) Remove the external force and wait for a period of time for the elastic seal to return to its original state;
（4）通过紫外光对压印胶体进行固化；(4) Curing the embossed colloid by ultraviolet light;
（5）将印章从压印胶分离。(5) Separate the stamp from the stamping glue.
优选地，所述步骤(1)中所述弹性印章为具有柔性和弹性的材料，所述压印衬底为硅、玻璃、金属及在其上涂覆有薄膜的叠层，所述压印胶为对紫外光敏感的聚合物。Preferably, the elastic stamp in the step (1) is a material with flexibility and elasticity, and the embossed substrate is silicon, glass, metal and a laminate coated with a thin film thereon, and the embossed The glue is a polymer sensitive to ultraviolet light.
优选地，步骤(2)中施加外力压强数值范围为0.02MPa-2MPa，压强维持时间范围为10s-120s。Preferably, in the step (2), the value range of the external force pressure is 0.02MPa-2MPa, and the pressure maintenance time range is 10s-120s.
优选地，步骤(3)中等待时间范围为1min-30min。Preferably, the waiting time in step (3) ranges from 1 min to 30 min.
优选地，步骤(4)中紫外光波长为365nm，紫外光照射时间为20s-80s。Preferably, in step (4), the wavelength of ultraviolet light is 365nm, and the irradiation time of ultraviolet light is 20s-80s.
优选地，所述具有柔性和弹性的材料为硅橡胶材料，包括聚二甲基硅氧烷。Preferably, the flexible and elastic material is a silicone rubber material, including polydimethylsiloxane.
优选地，所述薄膜为二氧化硅薄膜或氮化硅薄膜。Preferably, the film is a silicon dioxide film or a silicon nitride film.
实施例一：Embodiment one:
一种减小弹性印章变形的新型压印方法，该方法的工艺步骤如下：A novel embossing method for reducing the deformation of elastic stamps, the process steps of the method are as follows:
（1）准备弹性聚二甲基硅氧烷印章、压印衬底硅及紫外压印胶；(1) Prepare elastic polydimethylsiloxane stamp, imprint substrate silicon and UV imprint glue;
（2）通过施加外压强0.1MPa将印章压印到涂有压印胶的压印衬底上，维持50s；(2) Imprint the stamp on the embossing substrate coated with embossing glue by applying an external pressure of 0.1MPa and keep it for 50s;
（3）撤销外力，并等待1min让弹性印章恢复原状；(3) Remove the external force and wait for 1 minute for the elastic seal to return to its original state;
（4）通过365nm波长的紫外光对压印胶体进行固化，紫外光辐照时间为40s；(4) The imprint colloid is cured by ultraviolet light with a wavelength of 365nm, and the irradiation time of ultraviolet light is 40s;
（5）将印章从压印胶分离。(5) Separate the stamp from the stamping glue.
实施例二：Embodiment two:
一种减小弹性印章变形的新型压印方法，该方法的工艺步骤如下：A novel embossing method for reducing the deformation of elastic stamps, the process steps of the method are as follows:
（1）准备弹性聚二甲基硅氧烷印章、压印衬底为覆盖有二氧化硅薄膜的硅及紫外压印胶；(1) Prepare an elastic polydimethylsiloxane stamp, and the imprinting substrate is silicon covered with a silicon dioxide film and UV embossing glue;
（2）通过施加外压强0.2MPa将印章压印到涂有压印胶的压印衬底上，维持30s；(2) Imprint the stamp on the embossing substrate coated with embossing glue by applying an external pressure of 0.2MPa and keep it for 30s;
（3）撤销外力，并等待3min让弹性印章恢复原状；(3) Remove the external force and wait for 3 minutes for the elastic seal to return to its original state;
（4）通过365nm波长的紫外光对压印胶体进行固化，紫外光辐照时间为30s；(4) The imprint colloid is cured by ultraviolet light with a wavelength of 365nm, and the irradiation time of ultraviolet light is 30s;
（5）将印章从压印胶分离。(5) Separate the stamp from the stamping glue.
对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本发明。对这些实施例的两种修改对本领域的专业技术人员来说将是显而易见的，本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下，在其它实施例中实现。因此，本发明将不会被限制于本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围 。The above description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the invention. Both modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention will not be limited to these embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810371410.5ACN108556501A (en) | 2018-04-24 | 2018-04-24 | A kind of method for stamping reducing elastomeric stamp deformation |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810371410.5ACN108556501A (en) | 2018-04-24 | 2018-04-24 | A kind of method for stamping reducing elastomeric stamp deformation |
| Publication Number | Publication Date |
|---|---|
| CN108556501Atrue CN108556501A (en) | 2018-09-21 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810371410.5APendingCN108556501A (en) | 2018-04-24 | 2018-04-24 | A kind of method for stamping reducing elastomeric stamp deformation |
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