技术领域technical field
本发明涉及半导体制造技术领域，具体涉及一种高精度真空规管。The invention relates to the technical field of semiconductor manufacturing, in particular to a high-precision vacuum gauge.
背景技术Background technique
在半导体制造领域许多工艺步骤需要在高真空度下进行。薄膜型全电容真空规管被广泛应用于半导体设备中测量真空度。薄膜型真空规管主要靠可动薄膜在两侧大气压差发生形变而产生电容的变化。由于测量精度受薄膜应力而变化，当温度发生变化时薄膜与外壳的膨胀系数不同会导致测量产生误差。Many process steps in the field of semiconductor manufacturing need to be carried out under high vacuum. Film-type full-capacitance vacuum gauges are widely used in semiconductor equipment to measure vacuum. Thin-film vacuum gauges mainly rely on the deformation of the movable film on both sides of the atmospheric pressure difference to produce a change in capacitance. Since the measurement accuracy is changed by the stress of the film, when the temperature changes, the expansion coefficients of the film and the shell are different, which will cause errors in the measurement.
发明内容Contents of the invention
本发明的目的在于提供一种高精度真空规管，所述真空规管测量精确，适用于半导体工艺设备中真空测量。The object of the present invention is to provide a high-precision vacuum gauge, which has accurate measurement and is suitable for vacuum measurement in semiconductor process equipment.
为了达到上述目的，本发明采用的技术方案为：In order to achieve the above object, the technical scheme adopted in the present invention is:
一种高精度真空规管，包括：A high-precision vacuum gauge, including:
外壳；shell;
薄膜片，所述薄膜片固定设置在所述外壳内部，并将所述外壳内部空间分为真空空间和被测空间；所述薄膜片的材质为与所述外壳采用相同的材料；A thin film, the thin film is fixed inside the housing, and the inner space of the housing is divided into a vacuum space and a measured space; the material of the thin film is the same as that of the outer housing;
定电极，所述定电极固定设置在所述真空空间内，所述定电极与所述薄膜片相对的那一表面上设有主电极，所述定电极的另一表面上设有镀金层；所述定电极上设有通孔，所述镀金层通过所述通孔与所述主电极电连接；A fixed electrode, the fixed electrode is fixedly arranged in the vacuum space, the surface of the fixed electrode opposite to the thin film is provided with a main electrode, and the other surface of the fixed electrode is provided with a gold-plated layer; The fixed electrode is provided with a through hole, and the gold-plated layer is electrically connected to the main electrode through the through hole;
第一电极柱，所述第一电极柱一端与外部电容测量电路相接，另一端与所述外壳相接；A first electrode column, one end of the first electrode column is connected to the external capacitance measurement circuit, and the other end is connected to the outer shell;
第二电极柱，所述第二电极柱一端与所述外部电容测量电路相连，另一端穿过所述外壳与所述镀金层相接，且与所述外壳绝缘；A second electrode column, one end of the second electrode column is connected to the external capacitance measurement circuit, the other end passes through the shell to connect with the gold-plated layer, and is insulated from the shell;
进气口，所述进气口设置在所述外壳上，并位于所述被测空间所在的一侧。an air inlet, the air inlet is arranged on the casing and is located on the side where the space to be measured is located.
上述方案中，所述主电极周围设有一圈保护环，所述保护环位于所述定电极表面；所述镀金层通过所述通孔分别与所述主电极和所述保护环电连接；所述保护环与所述主电极的电位相同。In the above solution, a protective ring is provided around the main electrode, and the protective ring is located on the surface of the fixed electrode; the gold-plated layer is electrically connected to the main electrode and the protective ring through the through holes; The potential of the guard ring is the same as that of the main electrode.
上述方案中，所述真空规管还包括：In the above scheme, the vacuum gauge also includes:
支撑环，所述支撑环固定在所述外壳内，所述薄膜片焊接在所述支撑环上。A support ring, the support ring is fixed in the housing, and the film sheet is welded on the support ring.
上述方案中，所述薄膜片与所述主电极的距离为1毫米。In the above solution, the distance between the thin film sheet and the main electrode is 1 mm.
上述方案中，所述进气口入口处设有气体过滤片。In the above solution, a gas filter is provided at the inlet of the air inlet.
上述方案中，所述真空空间内设有吸气剂室，所述吸气剂室用于放置吸气剂。In the above scheme, a getter chamber is provided in the vacuum space, and the getter chamber is used to place the getter.
上述方案中，所述外壳的材质为哈氏合金。In the above solution, the material of the shell is Hastelloy.
上述方案中，所述外壳包括上盖外壳和下盖外壳，所述上盖外壳和所述下盖外壳焊接在一起。In the above solution, the shell includes an upper cover shell and a lower cover shell, and the upper cover shell and the lower cover shell are welded together.
上述方案中，所述薄膜片的材质为哈氏合金，所述薄膜片的厚度为30微米。In the above solution, the material of the thin film is Hastelloy, and the thickness of the thin film is 30 microns.
上述方案中，所述定电极为陶瓷片。In the above solution, the fixed electrode is a ceramic sheet.
与现有技术相比，本发明的有益效果是：Compared with prior art, the beneficial effect of the present invention is:
本发明中提供的真空规管中，薄膜片作为可变电极与定电极组成可变电容，薄膜片在其两侧真空空间和被测空间的气压差下发生形变而产生电容的变化，由电极柱接入的外部电容测量电路将电容变化转换为电信号，从而测量出被测空间的真空度；由于本发明中的外壳与薄膜片采用了相同的材质，所以测量精确，热漂移系数小，能够适用于半导体工艺设备中真空测量。In the vacuum gauge provided in the present invention, the film sheet is used as a variable electrode and a fixed electrode to form a variable capacitor, and the film sheet deforms under the pressure difference between the vacuum space on both sides of the film and the measured space to produce a change in capacitance. The external capacitance measurement circuit connected to the column converts the capacitance change into an electrical signal, thereby measuring the vacuum degree of the measured space; since the shell and the film in the present invention are made of the same material, the measurement is accurate and the thermal drift coefficient is small. It can be applied to vacuum measurement in semiconductor process equipment.
附图说明Description of drawings
图1为本发明实施例提供的一种高精度真空规管的结构示意图。FIG. 1 is a schematic structural diagram of a high-precision vacuum gauge provided by an embodiment of the present invention.
具体实施方式Detailed ways
为了更好的理解上述技术方案，下面将结合说明书附图以及具体的实施方式对上述技术方案进行详细的说明。In order to better understand the above-mentioned technical solution, the above-mentioned technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.
如图1所示，本发明实施例提供一种高精度真空规管，包括：外壳，薄膜片11，定电极6，第一电极柱3，第二电极柱2，进气口9，其中薄膜片11与定电极6组成一个可变电容。所述外壳包括上盖外壳1和下盖外壳8，所述上盖外壳1和所述下盖外壳8焊接在一起，所述外壳的材质为哈氏合金。所述薄膜片11固定设置在所述外壳内部，并将所述外壳内部空间分为真空空间和被测空间；所述薄膜片11的材质为哈氏合金，所述薄膜片11的厚度为30微米。所述定电极6通过粘接剂固定粘接在所述真空空间内，所述定电极6与所述薄膜片11相对的那一表面上设有主电极12，所述定电极6的另一表面上设有镀金层4；所述定电极6上设有通孔5，所述镀金层4通过所述通孔5与所述主电极电连接；所述定电极为陶瓷片。所述第一电极柱3一端与外部电容测量电路相接，另一端与所述外壳相接，所述外壳当作所述外部电容测量电路的地线。所述第二电极柱2一端与所述外部电容测量电路相连，另一端穿过所述外壳与所述镀金层4相接，且与所述外壳绝缘。所述进气口9设置在所述外壳上，并位于所述被测空间所在的一侧。As shown in Figure 1, the embodiment of the present invention provides a high-precision vacuum gauge, including: a housing, a membrane sheet 11, a fixed electrode 6, a first electrode column 3, a second electrode column 2, and an air inlet 9, wherein the membrane Sheet 11 and fixed electrode 6 form a variable capacitor. The shell includes an upper cover shell 1 and a lower cover shell 8, the upper cover shell 1 and the lower cover shell 8 are welded together, and the material of the shell is Hastelloy. The film sheet 11 is fixedly arranged inside the housing, and the internal space of the housing is divided into a vacuum space and a measured space; the material of the film sheet 11 is Hastelloy, and the thickness of the film sheet 11 is 30 Microns. The fixed electrode 6 is fixedly bonded in the vacuum space by an adhesive, the surface of the fixed electrode 6 opposite to the film sheet 11 is provided with a main electrode 12, and the other side of the fixed electrode 6 is A gold-plated layer 4 is provided on the surface; a through hole 5 is provided on the fixed electrode 6, and the gold-plated layer 4 is electrically connected to the main electrode through the through hole 5; the fixed electrode is a ceramic sheet. One end of the first electrode column 3 is connected to the external capacitance measuring circuit, and the other end is connected to the casing, and the casing is used as a ground wire of the external capacitance measuring circuit. One end of the second electrode column 2 is connected to the external capacitance measuring circuit, and the other end passes through the casing to connect with the gold-plated layer 4 and is insulated from the casing. The air inlet 9 is arranged on the casing, and is located on the side where the space to be measured is located.
本实施例中，所述主电极12周围电镀有一圈保护环7，所述保护环7位于所述定电极6表面；所述定电极6上设有通孔5，所述镀金层4通过所述通孔5分别与所述主电极12和所述保护环7电连接。所述保护环7的材质为也为金，并与主电极12的电位相同。在主电极12周围电镀一圈金作为保护环7，是为了减小电容的边缘效应。In this embodiment, a protective ring 7 is electroplated around the main electrode 12, and the protective ring 7 is located on the surface of the fixed electrode 6; a through hole 5 is provided on the fixed electrode 6, and the gold-plated layer 4 passes through the fixed electrode 6. The through holes 5 are electrically connected to the main electrode 12 and the guard ring 7 respectively. The guard ring 7 is also made of gold, and has the same potential as the main electrode 12 . A ring of gold is electroplated around the main electrode 12 as the guard ring 7 to reduce the edge effect of the capacitor.
本实施例中，所述真空规管还包括：支撑环10，所述支撑环10固定在所述外壳内，所述薄膜片11焊接在所述支撑环10上。由于薄膜片11的形变对张力很敏感因此在焊接过程中使用特定的仪器在焊接过程中保证薄膜片的张力。In this embodiment, the vacuum gauge further includes: a support ring 10 , the support ring 10 is fixed in the housing, and the membrane sheet 11 is welded on the support ring 10 . Since the deformation of the membrane sheet 11 is very sensitive to tension, special instruments are used to ensure the tension of the membrane sheet during the welding process.
本实施例中，所述薄膜片11与所述主电极12的距离为1毫米。为保证测量精度，需要选择合适的电容大小，然后计算得出该距离。In this embodiment, the distance between the thin film 11 and the main electrode 12 is 1 mm. In order to ensure the measurement accuracy, it is necessary to select the appropriate capacitance size, and then calculate the distance.
本实施例中，所述进气口9入口处设有气体过滤片，用于滤除被测气体中的颗粒物。In this embodiment, a gas filter is provided at the inlet of the air inlet 9 to filter out particulate matter in the gas to be measured.
本实施例中，所述真空空间内设有吸气剂室13，所述吸气剂室13用于放置吸气剂，用于长期保持真空规管内部所述真空空间的真空度。所述真空空间在抽真空前进行整体零排气处理。In this embodiment, a getter chamber 13 is provided in the vacuum space, and the getter chamber 13 is used to place a getter to maintain the vacuum degree of the vacuum space inside the vacuum gauge for a long time. The vacuum space is subjected to overall zero exhaust treatment before vacuuming.
本实施例在用于测量真空度时，待测真空度空间的气体通过进气口进入真空规管的被测空间，薄膜片在两侧两个空间的气压差下产生形变，进而产生电容的变化，由电极柱接入的外部电容测量电路将采集到的电容变化转换为电信号，再将电信号放大，模数转换后进行处理，最终得到待测真空度空间的真空度。When this embodiment is used to measure the vacuum degree, the gas in the vacuum degree space to be measured enters the measured space of the vacuum gauge through the air inlet, and the thin film deforms under the pressure difference between the two spaces on both sides, thereby generating capacitance. Change, the external capacitance measurement circuit connected by the electrode column converts the collected capacitance change into an electrical signal, then amplifies the electrical signal, processes it after analog-to-digital conversion, and finally obtains the vacuum degree of the vacuum space to be measured.
本发明的优点如下：The advantages of the present invention are as follows:
1、由于本发明中的薄膜片与外壳均采用哈氏合金材料，热膨胀系数相同，因此本发明在温度发生较大变化时测量仍然精确。1. Since both the film sheet and the shell in the present invention are made of Hastelloy material, and have the same thermal expansion coefficient, the present invention is still accurate in measurement when the temperature changes greatly.
2、由于本发明的进气口处设置了气体过滤片，可以滤除外界气体中的污染颗粒物，避免颗粒物对薄膜片的影响，保证了测量精度。2. Since the air inlet of the present invention is provided with a gas filter, it can filter out the polluting particles in the external air, avoid the influence of the particles on the film, and ensure the measurement accuracy.
以上所述的具体实施例，对本发明的目的、技术方案和有益效果进行了进一步详细说明，所应理解的是，以上所述仅为本发明的具体实施例而已，并不用于限制本发明，凡在本发明的精神和原则之内，所做的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。The specific embodiments described above have further described the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above descriptions are only specific embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832523.1ACN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610832523.1ACN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
| Publication Number | Publication Date |
|---|---|
| CN107845560Atrue CN107845560A (en) | 2018-03-27 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610832523.1APendingCN107845560A (en) | 2016-09-19 | 2016-09-19 | High-precision vacuum gauge tube |
| Country | Link |
|---|---|
| CN (1) | CN107845560A (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112781756A (en)* | 2020-12-11 | 2021-05-11 | 兰州空间技术物理研究所 | Capacitance pressure sensor for reducing welding stress of pressure sensing film |
| CN115386856A (en)* | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115540916A (en)* | 2022-11-29 | 2022-12-30 | 北京晨晶电子有限公司 | Vacuum gauge capacitor structure and vacuum gauge |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en)* | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| US20090158853A1 (en)* | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN101776502A (en)* | 2008-12-24 | 2010-07-14 | 佳能安内华股份有限公司 | Capacitance diaphragm gauge and vaccum apparatus |
| CN102944352A (en)* | 2012-11-12 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitance film type pressure sensor capable of enhancing stability of electrode plate |
| US20130055820A1 (en)* | 2011-09-01 | 2013-03-07 | Kevin M. Bourbeau | Pressure Measuring Instrument |
| CN102967408A (en)* | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1334451A (en)* | 2000-07-15 | 2002-02-06 | 山东省硅酸盐研究设计院 | Ceramic pressure sensor and differential pressure sensor |
| US20090158853A1 (en)* | 2007-12-20 | 2009-06-25 | Walter Christian Berner | Diaphragm pressure measuring cell arrangement |
| CN101776502A (en)* | 2008-12-24 | 2010-07-14 | 佳能安内华股份有限公司 | Capacitance diaphragm gauge and vaccum apparatus |
| US20130055820A1 (en)* | 2011-09-01 | 2013-03-07 | Kevin M. Bourbeau | Pressure Measuring Instrument |
| CN102944352A (en)* | 2012-11-12 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitance film type pressure sensor capable of enhancing stability of electrode plate |
| CN102967408A (en)* | 2012-11-27 | 2013-03-13 | 中国航天科技集团公司第五研究院第五一〇研究所 | Capacitive thin-film pressure sensor with stress relief function |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112781756A (en)* | 2020-12-11 | 2021-05-11 | 兰州空间技术物理研究所 | Capacitance pressure sensor for reducing welding stress of pressure sensing film |
| CN115386856A (en)* | 2022-10-19 | 2022-11-25 | 季华实验室 | Diamond thin film capacitor, manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115386856B (en)* | 2022-10-19 | 2023-06-02 | 季华实验室 | Diamond thin film capacitor and manufacturing method thereof, vacuum gauge and manufacturing method thereof |
| CN115540916A (en)* | 2022-11-29 | 2022-12-30 | 北京晨晶电子有限公司 | Vacuum gauge capacitor structure and vacuum gauge |
| Publication | Publication Date | Title |
|---|---|---|
| JP6253662B2 (en) | Method and apparatus for measuring vacuum pressure using a measurement cell configuration | |
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|---|---|---|---|
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| WD01 | Invention patent application deemed withdrawn after publication | Application publication date:20180327 | |
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