技术领域technical field
本发明关于一种近端治疗装置，尤指一种近端治疗装置的放射源。The invention relates to a proximal treatment device, in particular to a radiation source of the proximal treatment device.
背景技术Background technique
近端治疗(brachytherapy)也称作近距离治疗或近接治疗，是一种放射治疗方法，其将放射源放置于需要治疗的部位内部或附近。近端治疗被广泛应用于子宫颈癌、前列腺癌、乳腺癌、皮肤癌和脑部肿瘤，也同样适用于许多其他部位的肿瘤治疗。近端放疗可单独进行或与其他疗法，如外科手术、外照射放疗和化疗结合。Brachytherapy, also known as brachytherapy or brachytherapy, is a form of radiation therapy in which a radiation source is placed in or near the area to be treated. Proximal therapy is widely used in cancers of the cervix, prostate, breast, skin, and brain, as well as many other tumor sites. Proximal radiation therapy can be given alone or in combination with other therapies such as surgery, external beam radiation therapy, and chemotherapy.
不同于外照射放射治疗，高能量的X射线从体外照射肿瘤。近端治疗是将放射源准确地放置于癌症或肿瘤的病变区域。近端治疗最大的特点是：照射只影响到放射源周围十分有限的区域，使得肿瘤接受高剂量的照射，而距离放射源较远的周遭正常组织的所照射到的剂量会快速的降低。此外，在治疗过程中，如果病人或体内的肿瘤发生移动，放射源还能保持相对于肿瘤的正确位置。近距离治疗的这些特色使其具备了外照射无法达到多种优点：肿瘤可以接受局部高剂量治疗，同时周围的健康组织所获得的不必要的损伤也大大降低。Unlike external beam radiation therapy, high-energy X-rays hit the tumor from outside the body. Proximal therapy is the precise placement of radiation sources in the diseased area of the cancer or tumor. The biggest feature of proximal therapy is that the radiation only affects a very limited area around the radiation source, so that the tumor receives high doses of radiation, while the dose to surrounding normal tissues that are far away from the radiation source will be rapidly reduced. In addition, if the patient or the tumor in the body moves during treatment, the radiation source remains in the correct position relative to the tumor. These characteristics of brachytherapy give it many advantages that external radiation cannot achieve: the tumor can receive local high-dose treatment, and the unnecessary damage to the surrounding healthy tissue is also greatly reduced.
同其他放射治疗技术相比，近端治疗的疗程更短，有助于降低在每次治疗间隙存活癌细胞分裂与生长的机率。与外照射治疗相比，患者可以减少来院就医的次数。治疗通常是以门诊的形式进行，为患者提供了更加直接、便捷的就医方式。近距离治疗的这些特点保证了大多数患者对近距离放疗良好的耐受性。近距离放疗可有效治疗多种类型的癌症。治疗结果表明，近距离治疗的治愈率与手术或外照射相近。当这些技术相结合时，治愈率更高。另 外，近距离治疗产生副作用的风险更低。Compared with other radiation therapy techniques, the treatment duration of proximal therapy is shorter, which helps to reduce the chance of surviving cancer cells dividing and growing between each treatment. Compared with external radiation therapy, patients can reduce the number of hospital visits. Treatment is usually carried out in the form of an outpatient clinic, providing patients with a more direct and convenient way to seek medical treatment. These features of brachytherapy ensure that brachytherapy is well tolerated by most patients. Brachytherapy is effective in treating many types of cancer. Treatment results show that brachytherapy has similar cure rates as surgery or external beam radiation. When these techniques are combined, the cure rate is higher. In addition, there is a lower risk of side effects with brachytherapy.
在近端治疗程序中，通常先以X影像确认放置于人体内的施用器(applicator)的位置后，再将放射源经由机器导管自动导入至预定治疗的正确位置并停留一段时间至预定的剂量。然而为了使得肿瘤接受到足够的治疗照射剂量，却又不影响或伤害周遭正常组织，所述放射源的照射剂量必须十分精确，然而传统的放射源却往往无法产生精确的放射剂量。除此之外，传统的近端治疗装置的放射源通常为反射式的，即当电子束撞击至阳极后所产生的放射方向经过反射(即与电子束进行的方向不同)，反射式的近端治疗装置的放射源出光角度小且仅产生1％辐射，而99％能量转换为热能，能量转换效能低下，若要达到可治疗肿瘤的放射剂量，需使用更大的输入功率，相对也需要可将更多热能带走的散热装置，故整体装置无法微型化。因此势必要发展出能够产生精确放射剂量以及具有高能量转换效能的近端治疗装置或近端治疗装置的放射源。In the proximal treatment procedure, the position of the applicator (applicator) placed in the human body is usually confirmed by X-ray images, and then the radiation source is automatically introduced to the correct position for the predetermined treatment through the mechanical catheter and stays for a period of time to reach the predetermined dose . However, in order to allow the tumor to receive sufficient therapeutic radiation dose without affecting or damaging the surrounding normal tissues, the radiation dose of the radiation source must be very precise. However, traditional radiation sources are often unable to produce precise radiation doses. In addition, the radiation source of the traditional proximal treatment device is usually reflective, that is, the radiation direction generated when the electron beam hits the anode is reflected (that is, it is different from the direction of the electron beam), and the reflective proximal The radiation source of the terminal treatment device has a small light output angle and only produces 1% of the radiation, while 99% of the energy is converted into heat energy, and the energy conversion efficiency is low. A cooling device that can take away more heat energy, so the overall device cannot be miniaturized. Therefore, it is necessary to develop a proximal treatment device or a radiation source of the proximal treatment device capable of producing precise radiation doses and having high energy conversion efficiency.
发明内容Contents of the invention
本发明的目的，在于提供一种可以精确调控放射剂量以及具有高能量转换效能的近端治疗装置的放射源，包括：The purpose of the present invention is to provide a radiation source that can precisely regulate the radiation dose and has a high energy conversion efficiency proximal treatment device, including:
一阴极组件，被构造以发射一电子束，并且包括：一热阴极，被加温以产生游离电子，所述游离电子受一加速电场的作用而射向一阳极组件而形成一电子束；一聚焦元件，部分围绕所述热阴极，并具有一聚焦电场，所述电子束通过所述聚焦电场而缩小其直径；A cathode assembly configured to emit an electron beam, and comprising: a hot cathode heated to generate free electrons, which are projected toward an anode assembly by an accelerating electric field to form an electron beam; a focusing element partially surrounding the hot cathode and having a focusing electric field through which the electron beam is reduced in diameter;
所述阳极组件，被构造以接收所述电子束而产生放射，并且包括：一阳极管柱，被构造以接触或进入一病变处或是进入一施用器的内腔中；一靶元件，位于所述阳极管柱的末端，被所述电子束撞击而产生所述放射；The anode assembly is configured to receive the electron beam to generate radiation, and includes: an anode column configured to contact or enter a lesion or enter the lumen of an applicator; a target element located at the end of said anode string struck by said electron beam to generate said radiation;
一电源被构造以驱动所述热阴极产生所述游离电子，提供偏压于所述聚焦元件而产生所述聚焦电场，以及提供电压于所述阴极组件与所述阳极组件 以在所述阴极组件与所述阳极组件之间产生所述加速电场；a power supply configured to drive the hot cathode to generate the free electrons, provide a bias voltage to the focusing element to generate the focusing electric field, and provide a voltage to the cathode assembly and the anode assembly to generate the electric field in the cathode assembly generating the accelerating electric field with the anode assembly;
一壳体，被构造以使所述阴极组件与阳极组件绝缘；以及a housing configured to insulate the cathode assembly from the anode assembly; and
一控制模组，被构造以控制施加于所述聚焦元件上的所述偏压，以调整所述聚焦元件的聚焦电场，从而调整所述电子束的直径大小。A control module is configured to control the bias voltage applied to the focusing element to adjust the focusing electric field of the focusing element, thereby adjusting the diameter of the electron beam.
在本发明的一实施例中，所述靶元件所产生的放射直接穿透所述靶元件，且无经过反射。In an embodiment of the present invention, the radiation generated by the target element directly penetrates the target element without being reflected.
在本发明的一实施例中，所述控制模组，还被构造以控制所述电源所驱动的管电流或是所述加速电场的电压。In an embodiment of the present invention, the control module is further configured to control the tube current driven by the power supply or the voltage of the accelerating electric field.
在本发明的一实施例中，所述阴极组件与阳极组件分别在所述壳体的两端。In an embodiment of the present invention, the cathode assembly and the anode assembly are respectively at two ends of the casing.
在本发明的一实施例中，所述聚焦元件为一杯型结构、盆型结构或管柱型结构。In an embodiment of the present invention, the focusing element is a cup-shaped structure, a basin-shaped structure or a column-shaped structure.
在本发明的一实施例中，所述靶元件的材质为金。In an embodiment of the present invention, the material of the target element is gold.
在本发明的一实施例中，所述电子束的一管电流的范围介于40-60uA之间、所述偏压的范围介于0-300V之间，或所述加速电场的范围介于40-60kV之间。In an embodiment of the present invention, the range of a tube current of the electron beam is between 40-60uA, the range of the bias voltage is between 0-300V, or the range of the accelerating electric field is between Between 40-60kV.
在本发明的一实施例中，所述阳极管柱的末端的材质为一辐射可穿透的材质。In an embodiment of the present invention, the material of the end of the anode column is a radiation-transmissible material.
在本发明的一实施例中，所述壳体的材质为陶瓷。In an embodiment of the present invention, the material of the housing is ceramics.
在本发明的一实施例中，所述热阴极为一钨丝。In one embodiment of the invention, the hot cathode is a tungsten wire.
本发明的目的，在于提供一种可以精确调控放射剂量以及具有高能量转换效能的近端治疗装置的放射源一种近端治疗装置，包括：The object of the present invention is to provide a radiation source of a proximal treatment device that can precisely regulate the radiation dose and has high energy conversion efficiency, a proximal treatment device, including:
一施用器，被构造以与一病变处接触；以及an applicator configured to contact a lesion; and
一放射源，被构造以产生放射，其包括：A radioactive source, constructed to produce radiation, comprising:
一阴极组件，被构造以发射一电子束，并且包括：一热阴极，被加温 以产生游离电子，所述游离电子受一加速电场的作用而射向一阳极组件而形成一电子束；一聚焦元件，部分围绕所述热阴极，并具有一聚焦电场，所述电子束通过所述聚焦电场而缩小其直径；A cathode assembly configured to emit an electron beam, and comprising: a hot cathode heated to generate free electrons, which are projected toward an anode assembly by an accelerating electric field to form an electron beam; a focusing element partially surrounding the hot cathode and having a focusing electric field through which the electron beam is reduced in diameter;
所述阳极组件，被构造以接收所述电子束而产生放射，并且包括：一阳极管柱，被构造以接触或进入一病变处或是进入一施用器的内腔中；一靶元件，位于所述阳极管柱的末端，被所述电子束撞击而产生所述放射；The anode assembly is configured to receive the electron beam to generate radiation, and includes: an anode column configured to contact or enter a lesion or enter the lumen of an applicator; a target element located at the end of said anode string struck by said electron beam to generate said radiation;
一电源被构造以驱动所述热阴极产生所述游离电子，提供偏压于所述聚焦元件而产生所述聚焦电场，以及提供电压于所述阴极组件与所述阳极组件以在所述阴极组件与所述阳极组件之间产生所述加速电场；a power supply configured to drive the hot cathode to generate the free electrons, provide a bias voltage to the focusing element to generate the focusing electric field, and provide a voltage to the cathode assembly and the anode assembly to generate the electric field in the cathode assembly generating the accelerating electric field with the anode assembly;
一壳体，被构造以使所述阴极组件与阳极组件绝缘；以及a housing configured to insulate the cathode assembly from the anode assembly; and
一控制模组，被构造以控制施加于所述聚焦元件上的所述偏压，以调整所述聚焦元件的聚焦电场，从而调整所述电子束的直径大小。A control module is configured to control the bias voltage applied to the focusing element to adjust the focusing electric field of the focusing element, thereby adjusting the diameter of the electron beam.
在本发明的一实施例中，所述靶元件所产生的放射直接穿透所述靶元件，且无经过反射。In an embodiment of the present invention, the radiation generated by the target element directly penetrates the target element without being reflected.
在本发明的一实施例中，所述控制模组，还被构造以控制所述电源所驱动的管电流或是所述加速电场的电压。In an embodiment of the present invention, the control module is further configured to control the tube current driven by the power supply or the voltage of the accelerating electric field.
在本发明的一实施例中，所述阴极组件与阳极组件分别在所述壳体的两端。In an embodiment of the present invention, the cathode assembly and the anode assembly are respectively at two ends of the casing.
在本发明的一实施例中，所述聚焦元件为一杯型结构、盆型结构或管柱型结构。In an embodiment of the present invention, the focusing element is a cup-shaped structure, a basin-shaped structure or a column-shaped structure.
在本发明的一实施例中，所述靶元件的材质为金。In an embodiment of the present invention, the material of the target element is gold.
在本发明的一实施例中，所述电子束的一管电流的范围介于40-60uA之间、所述偏压的范围介于0-300V之间，或所述加速电场的范围介于40-60kV之间。In an embodiment of the present invention, the range of a tube current of the electron beam is between 40-60uA, the range of the bias voltage is between 0-300V, or the range of the accelerating electric field is between Between 40-60kV.
在本发明的一实施例中，所述阳极管柱的末端的材质为一辐射可穿透的 材质。In an embodiment of the present invention, the material of the end of the anode column is a radiation-transmissible material.
在本发明的一实施例中，所述壳体的材质为陶瓷。In an embodiment of the present invention, the material of the housing is ceramics.
在本发明的一实施例中，所述热阴极为一钨丝。In one embodiment of the invention, the hot cathode is a tungsten wire.
本发明的近端治疗装置的放射源通过提供偏压于所述聚焦元件而产生所述聚焦电场，以及控制施加于所述聚焦元件上的所述偏压，以调整所述聚焦元件的聚焦电场，从而调整所述电子束的直径大小。当所述偏压较大时，所述电子束的直径较小，所述位于所述阳极管柱的末端的靶元件被电子束撞击的面积较小，所产生的放射剂量较低；当所述偏压较小时，所述电子束的直径较大，所述位于所述阳极管柱的末端的靶元件被电子束撞击的面积较大，所产生的放射剂量较高，通过此方式精确调控锁产生的放射剂量。The radiation source of the proximal treatment device of the present invention generates the focusing electric field by providing a bias voltage to the focusing element, and controls the bias voltage applied to the focusing element to adjust the focusing electric field of the focusing element , thereby adjusting the diameter of the electron beam. When the bias voltage is larger, the diameter of the electron beam is smaller, and the area of the target element at the end of the anode column being hit by the electron beam is smaller, resulting in a lower radiation dose; When the bias voltage is small, the diameter of the electron beam is relatively large, and the area of the target element at the end of the anode column hit by the electron beam is relatively large, resulting in a relatively high radiation dose. The radiation dose generated by the lock.
除此之外，本发明的近端治疗装置的放射源为穿透式，电子束撞击所述靶元件，所产生的放射直接穿透所述靶元件，而未经过反射，因此输入能量中有99％用于产生放射，仅1％能量转变为热能，故可使用较小功率可达到更高放射剂量输出，也无须增加额外的散热装置，使本发明的近端治疗装置微型化。In addition, the radiation source of the proximal treatment device of the present invention is penetrating, and the electron beam hits the target element, and the generated radiation directly penetrates the target element without being reflected, so the input energy has 99% of the energy is used to generate radiation, and only 1% of the energy is converted into heat energy, so a higher radiation dose output can be achieved with less power, and there is no need to add additional heat dissipation devices, making the proximal treatment device of the present invention miniaturized.
附图说明Description of drawings
图1系根据本发明的一实施例中，一近端治疗装置的放射源的一元件关系示意图；Fig. 1 is a schematic diagram of the relationship between components of a radioactive source of a proximal treatment device according to an embodiment of the present invention;
图2系根据本发明的一实施例中，一近端治疗装置的放射源的一结构示意图；Fig. 2 is a schematic structural diagram of a radiation source of a proximal treatment device according to an embodiment of the present invention;
图3根据本发明的一实施例中，一近端治疗装置的放射源的一原理示意图；以及FIG. 3 is a schematic diagram of a radiation source of a proximal treatment device according to an embodiment of the present invention; and
图4根据本发明的一实施例中，一近端治疗装置的放射源的电子束直径测量实验的一示意图。FIG. 4 is a schematic diagram of an electron beam diameter measurement experiment of a radioactive source of a proximal treatment device according to an embodiment of the present invention.
具体实施方式detailed description
请参考图1与图2，其分别为根据本发明的一实施例中，一近端治疗装置的放射源的一元件关系示意图以及结构示意图。所述近端治疗装置(brachytherapy apparatus)的放射源1(radiation source)用于产生放射(radiation)，其包括一阴极组件10(cathode assembly)、一阳极组件20(anode assembly)、一电源30(power source)、一壳体40(housing)以及一控制模组50(control module)。Please refer to FIG. 1 and FIG. 2 , which are respectively a schematic diagram of the relationship between components and a schematic structural diagram of a radiation source of a proximal treatment device according to an embodiment of the present invention. The radiation source 1 (radiation source) of the proximal treatment apparatus (brachytherapy apparatus) is used to generate radiation (radiation), which includes a cathode assembly 10 (cathode assembly), an anode assembly 20 (anode assembly), a power supply 30 ( power source), a casing 40 (housing) and a control module 50 (control module).
所述阴极组件10，用于发射一电子束，并且包括一阴极11(cathode)与一聚焦元件12(focusing element)。所述阴极11可以为在被加热高温的激发下产生出游离电子的一热阴极11(hot cathode)，例如一热丝11(hot filament)，或是受到可见光或不可见光的激发下产生游离电子的光阴极(photo cathode)，或是任何其他类型的阴极。在本发明的一优选的实施例中，使用热丝11作为所述阴极，其材质可以选自于含钡化合物、含锶化合物、含钇化合物及含钨化合物所组成的一群组中的至少一者。在本发明的一优选实施例中，使用钨丝做为所述热丝。所述游离电子在一高压的加速电场的作用下而射向所述阳极组件20而形成一电子束，所述高压的加速电场在阴极为负电位，在阳极为正电位，并可以介于1kV至100kV之间的范围，在本发明的一优选实施例中，所述加速电场介于40kV至60kV之间的范围。所述聚焦元件12部分围绕所述阴极11，其形状为一中空形状，至少在其一端有开口，例如一杯型、盆型、或一管形等，在本发明一实施例中，所述聚焦元件12为一杯型，所述阴极11置于所述聚焦元件12的内部空间中，所述阴极11所发射的电子束从所述聚焦元件12的开口通过。所述聚焦元件12在一偏压的作用下带有负电位而产生一聚焦电场。当所述电子束通过所述聚焦元件12时，所述聚焦电场缩小电子束直径。以上所述的阴极(或热阴极)11与聚焦元件12的材质或形状，仅为实施范例，本发明的近端治疗装置的放射源的阴极11适用于多种材质而聚焦元件12适用于多种形状，因此不应以此限制本发 明的应用范围。The cathode assembly 10 is used for emitting an electron beam, and includes a cathode 11 (cathode) and a focusing element 12 (focusing element). The cathode 11 can be a hot cathode 11 (hot cathode) that generates free electrons under the excitation of heated high temperature, such as a hot filament 11 (hot filament), or generates free electrons under the excitation of visible light or invisible light photo cathode (photo cathode), or any other type of cathode. In a preferred embodiment of the present invention, the hot wire 11 is used as the cathode, and its material can be selected from the group consisting of barium-containing compounds, strontium-containing compounds, yttrium-containing compounds and tungsten-containing compounds. one. In a preferred embodiment of the present invention, a tungsten wire is used as the heating wire. The free electrons shoot toward the anode assembly 20 under the action of a high-voltage accelerating electric field to form an electron beam. The high-voltage accelerating electric field has a negative potential at the cathode and a positive potential at the anode, and can be between 1 kV In a preferred embodiment of the present invention, the accelerating electric field ranges from 40 kV to 60 kV. The focus element 12 partially surrounds the cathode 11, and its shape is a hollow shape with an opening at least at one end thereof, such as a cup shape, a basin shape, or a tube shape, etc. In an embodiment of the present invention, the focus The element 12 is cup-shaped, the cathode 11 is placed in the inner space of the focusing element 12 , and the electron beam emitted by the cathode 11 passes through the opening of the focusing element 12 . The focusing element 12 has a negative potential under the action of a bias voltage to generate a focusing electric field. When the electron beam passes through the focusing element 12, the focusing electric field reduces the diameter of the electron beam. The material or shape of the above-mentioned cathode (or hot cathode) 11 and focusing element 12 is only an example of implementation. The cathode 11 of the radioactive source of the proximal treatment device of the present invention is applicable to various materials and the focusing element 12 is applicable to many A shape, therefore should not limit the scope of application of the present invention.
所述阳极组件20，用于接收所述电子束而产生放射，并且包括一阳极管柱22(anode tube)以及一靶元件21(target element)。所述阳极管柱为一长形管状元件，所述电子束通过其中，并且被用于进入一施用器的内腔中，或是进入或接触一病变处，例如一肿瘤或是恶性组织中。所述靶元件，位于所述阳极管柱的末端，在被所述电子束撞击时被激发而产生所述放射。在本发明的一优选实施例中，所述靶元件所产生的放射直接穿透所述靶元件，而未经过反射。举例而言，所述靶元件的厚度很薄，例如为涂覆于所述阳极管柱末端的管腔内侧的一涂层，其材质可以为钽、铂及金，在本发明的一优选实施例中，所述靶元件涂层的材质为金。而所述阳极管柱的末端的材质为放射可穿透的材质，例如玻璃。因此本发明的近端治疗装置的输入能量中有99％用于产生放射，仅1％能量转变为热能，故可使用较小功率可达到更高放射剂量输出。如果靶元件的厚度太厚，放射无法直接穿透所述靶元件，必须经过反射的方式改变放射方向(即与电子束进行的方向不同)，会使得所述装置的放射源出光角度小且仅产生1％辐射，而99％能量转换为热能，能量转换效能低下。The anode assembly 20 is used for receiving the electron beam to generate radiation, and includes an anode tube 22 (anode tube) and a target element 21 (target element). The anode string is an elongated tubular element through which the electron beam passes and is used to enter the lumen of an applicator, or to enter or contact a lesion, such as a tumor or malignant tissue. The target element, located at the end of the anode column, is excited to generate the radiation when struck by the electron beam. In a preferred embodiment of the present invention, the radiation generated by the target element directly penetrates the target element without being reflected. For example, the thickness of the target element is very thin, such as a coating coated on the inside of the lumen at the end of the anode column, and its material can be tantalum, platinum and gold. In a preferred implementation of the present invention In an example, the material of the coating of the target element is gold. And the material of the end of the anode column is radiopaque material, such as glass. Therefore, 99% of the input energy of the proximal treatment device of the present invention is used to generate radiation, and only 1% of the energy is converted into heat energy, so a higher radiation dose output can be achieved with less power. If the thickness of the target element is too thick, the radiation cannot directly penetrate the target element, and the direction of the radiation must be changed through reflection (that is, the direction different from the direction of the electron beam), which will cause the radiation source of the device to have a small light emission angle and only 1% radiation is produced, and 99% of energy is converted into heat energy, and the energy conversion efficiency is low.
所述电源30通过一对馈通引线31提供能量以加热所述热阴极11，驱动其产生所述游离电子。所述电源30并提供高电压于所述阴极组件10与所述阳极组件20，以在所述阴极组件10与所述阳极组件20之间产生所述加速电场。游离电子在所述高压的加速电场的作用下而射向所述阳极组件20而形成电子束，所述加速电场在阴极为负电位，在阳极为正电位。举例而言，所述高压的加速电场可以介于1kV至100kV之间的范围，而所述电子束的管电流可以介于1uA至100uA之间的范围。在本发明的一优选实施例中，所述加速电场介于40kV至60kV之间的范围，而所述电子束的管电流可以介于40uA至60uA之间的范围。除此之外，所述电源30还提供偏压于所述聚焦元件12 而产生带有负电位的所述聚焦电场，使得所述电子束通过所述聚焦元件12时，所述聚焦电场缩小电子束直径。在本发明的一实施例中，所述偏压的范围介于0-300V之间的范围。以上所述加速电场的电压、聚焦电场的偏压以及管电流的范围，仅为实施范例，本发明的近端治疗装置的放射源适用于多种电压与电流范围，因此不应以此限制本发明的应用范围。The power supply 30 provides energy through a pair of feedthrough leads 31 to heat the hot cathode 11 and drive it to generate the free electrons. The power supply 30 also provides a high voltage to the cathode assembly 10 and the anode assembly 20 to generate the accelerating electric field between the cathode assembly 10 and the anode assembly 20 . The free electrons shoot toward the anode assembly 20 under the action of the high-voltage accelerating electric field to form an electron beam. The accelerating electric field has a negative potential at the cathode and a positive potential at the anode. For example, the accelerating electric field of the high voltage may range from 1 kV to 100 kV, and the tube current of the electron beam may range from 1 uA to 100 uA. In a preferred embodiment of the present invention, the accelerating electric field is in the range of 40kV to 60kV, and the tube current of the electron beam can be in the range of 40uA to 60uA. In addition, the power supply 30 also provides a bias voltage to the focusing element 12 to generate the focusing electric field with a negative potential, so that when the electron beam passes through the focusing element 12, the focusing electric field shrinks the electron beam. bundle diameter. In an embodiment of the invention, the range of the bias voltage is between 0-300V. The voltage of the accelerating electric field, the bias voltage of the focusing electric field, and the range of the tube current mentioned above are only examples. The radiation source of the proximal treatment device of the present invention is applicable to various voltage and current ranges, so this should not be limited by this. The scope of application of the invention.
所述壳体40被构造以使所述阴极组件10与阳极组件20绝缘，由于所述阴极组件10与阳极组件20之间的电位差非常高(介于1kV至100kV之间的范围)，因此所述壳体是否能够确实使所述阴极组件10与阳极组件20绝缘是很重要的。在本发明的一优选实施例中，所述阴极组件10与阳极组件20分别在所述壳体的两端而所述壳体40的材质为陶瓷。以上所述的壳体40的材质，仅为一实施范例，本发明的近端治疗装置的放射源的壳体适用于多种材质，因此不应以此限制本发明的应用范围。The casing 40 is configured to insulate the cathode assembly 10 from the anode assembly 20, since the potential difference between the cathode assembly 10 and the anode assembly 20 is very high (range between 1 kV to 100 kV), therefore It is important whether the casing can actually insulate the cathode assembly 10 from the anode assembly 20 . In a preferred embodiment of the present invention, the cathode assembly 10 and the anode assembly 20 are respectively located at two ends of the casing, and the casing 40 is made of ceramics. The above-mentioned material of the casing 40 is only an example of implementation. The casing of the radiation source of the proximal treatment device of the present invention is applicable to various materials, so the scope of application of the present invention should not be limited by this.
所述控制模组50被构造以控制施加于所述聚焦元件12上的所述偏压，以调整所述聚焦元件12的聚焦电场，从而调整所述电子束的直径大小，以调整所产生的放射剂量。请见图3，其为根据本发明的一实施例中，一近端治疗装置的放射源1的一原理示意图。当所述偏压较大时(上图)，所述电子束的直径较小，上述位于所述阳极管柱22的末端的靶元件21被电子束撞击的面积较小，所产生的放射剂量较低；当所述偏压较小时(下图)，所述电子束的直径较大，上述位于所述阳极管柱22的末端的靶元件21被电子束撞击的面积较大，所产生的放射剂量较高，通过此方式精确调控锁产生的放射剂量。The control module 50 is configured to control the bias voltage applied to the focusing element 12 to adjust the focusing electric field of the focusing element 12, thereby adjusting the diameter of the electron beam to adjust the generated radiation dose. Please refer to FIG. 3 , which is a schematic diagram of a radiation source 1 of a proximal treatment device according to an embodiment of the present invention. When the bias voltage was larger (top figure), the diameter of the electron beam was smaller, and the above-mentioned target element 21 located at the end of the anode column 22 had a smaller area hit by the electron beam, and the resulting radiation dose lower; when the bias voltage was small (the figure below), the diameter of the electron beam was larger, and the above-mentioned target element 21 located at the end of the anode column 22 had a larger area hit by the electron beam, and the resulting The radiation dose is high, and the radiation dose generated by the lock is precisely regulated in this way.
在本发明的另一优选实施例中，所述控制模组，不但可以控制施加于所述聚焦元件上的所述偏压，还可以控制所述电源所驱动的管电流，从而调整所述电子束的密度。当所述电子束的密度较大，所产生的放射剂量较高；当所述电子束的密度较小，所产生的放射剂量较低(图未显示)。通过同时控制 所述偏压以及所述管电流以更精确地调整所产生的放射剂量。In another preferred embodiment of the present invention, the control module can not only control the bias voltage applied to the focusing element, but also control the tube current driven by the power supply, thereby adjusting the electronic bundle density. When the density of the electron beam is higher, the generated radiation dose is higher; when the density of the electron beam is lower, the generated radiation dose is lower (not shown in the figure). By simultaneously controlling the bias voltage and the tube current, the generated radiation dose can be adjusted more precisely.
本发明的近端治疗装置，包括一施用器(applicator)以及上述的放射源1。所述施用器被构造以与一病变处接触，其形状适于与病变处贴合，或是覆盖大面积的病变处，或是撑开病变处所位于的体腔，或是牵引病变处等，以使得病变处能够接近产生放射的靶元件21。举例而言，所述施用器可以为长管形、球囊形、盘形、杯形、多管形、多球囊型或锥形等，或是以上形状的组合。所述放射源1的阳极管柱22的末端与靶元件21可插入于所述施用器之中，以被所述施用器定位靠近于病变处。以上所述的施用器的形状，仅为实施范例，本发明的近端治疗装置适用于各种施用器，因此不应以此限制本发明的应用范围。The proximal treatment device of the present invention includes an applicator and the above-mentioned radiation source 1 . The applicator is configured to be in contact with a lesion, and its shape is suitable for fitting with the lesion, or covering a large area of the lesion, or expanding the body cavity where the lesion is located, or pulling the lesion, etc., to This allows the lesion to approach the radiation-generating target element 21 . For example, the applicator may be in the shape of a long tube, a balloon, a disc, a cup, a multi-tube, a multi-balloon, or a cone, or a combination of the above shapes. The end of the anode string 22 of the radiation source 1 and the target element 21 can be inserted into the applicator to be positioned close to the lesion by the applicator. The above-mentioned shape of the applicator is only an example, and the proximal treatment device of the present invention is applicable to various applicators, so the scope of application of the present invention should not be limited thereto.
电子束的直径无法用肉眼直接观察，但其直径大小可以经由间接的方法测量。请参考图4，其为根据本发明的一实施例中，一近端治疗装置的放射源1的电子束直径测量实验的一示意图。在距离所述近端治疗装置的放射源1的末端50公分处放置一感光屏幕100，以感测所述放射源1的靶元件21所产生的放射，在所述感光屏幕100与所述放射源1的末端之间的一特定位置放置一直径5毫米的钨丸200(tungsten bead)，所述钨丸会阻挡所述放射源的靶元件21所产生的放射，使得所述感光屏幕100产生一无感光的光斑300。当电子束直径越大，所产生的光斑300直径与光斑外缘的模糊区301也会越大，当电子束直径越小，所产生的光斑300直径与光斑外缘的模糊区301则会越小。可以通过光斑300直径与光斑外缘的模糊区301计算出，实际的电子束宽度。请参考下表1，其为电子束直径测量实验的结果，显示在各偏压下(1-300V)所束光斑300的大小，以及其对应的等效剂量，本次实验中使用三重复，其分别使用根据本发明的具有相同规格的三个不同近端治疗装置的放射源。从表1中可以看出，当偏压越高，光斑的直径越小，代表所述聚焦电场确实缩小了电子束的直径，使得所述靶元件21被电子束撞击的面 积缩小，而产生较低的剂量；相反的，当偏压越低，光斑的直径与电子束的直径也越大，而产生较高的剂量。此外，三重复在相同偏压下的光斑大小与等效剂量之间的差异不大，因此可知利用偏压(或聚焦电场)调整放射剂量为一种调精确可靠的方法。以上所述的实验结果，仅为表示本发明的近端治疗装置的放射源实际应用于时的功效，因此不应以此实验结果限制本发明的应用范围。The diameter of the electron beam cannot be observed directly with the naked eye, but its diameter can be measured indirectly. Please refer to FIG. 4 , which is a schematic diagram of an electron beam diameter measurement experiment of the radiation source 1 of a proximal treatment device according to an embodiment of the present invention. A photosensitive screen 100 is placed at the end 50 centimeters of the radiation source 1 of the proximal treatment device to sense the radiation generated by the target element 21 of the radiation source 1, and the photosensitive screen 100 and the radiation A tungsten bead 200 (tungsten bead) with a diameter of 5 mm is placed at a specific position between the ends of the source 1, and the tungsten bead will block the radiation generated by the target element 21 of the radiation source, so that the photosensitive screen 100 generates A light spot 300 without light sensitivity. When the diameter of the electron beam is larger, the blurred area 301 between the diameter of the produced light spot 300 and the outer edge of the light spot will also be larger. small. The actual electron beam width can be calculated from the diameter of the spot 300 and the blurred area 301 at the outer edge of the spot. Please refer to Table 1 below, which is the result of the electron beam diameter measurement experiment, showing the size of the beam spot 300 under each bias voltage (1-300V), and its corresponding equivalent dose. In this experiment, three repetitions were used. It respectively uses the radiation sources of three different proximal treatment devices according to the invention having the same specifications. It can be seen from Table 1 that when the bias voltage is higher, the diameter of the light spot is smaller, which means that the focusing electric field does reduce the diameter of the electron beam, so that the area of the target element 21 hit by the electron beam is reduced, resulting in a smaller Low dose; On the contrary, when the bias voltage is lower, the diameter of the spot and the diameter of the electron beam are also larger, resulting in a higher dose. In addition, there is little difference between the spot size and the equivalent dose of the three repetitions under the same bias voltage, so it can be seen that adjusting the radiation dose by using the bias voltage (or focusing electric field) is an accurate and reliable method. The above-mentioned experimental results only show the efficacy of the radiation source of the proximal treatment device of the present invention when it is actually applied, so the experimental results should not limit the scope of application of the present invention.
表1：Table 1:
所属领域的技术人员当可了解，在不违背本发明精神下，依据本发明实施样态所能进行的各种变化。因此，显见所列的实施态样并非用以限制本发明，而是企图在所附权利要求书的定义下，涵盖于本发明的精神与范畴中所做的修改。Those skilled in the art will be able to understand various changes that can be made according to the implementation aspects of the present invention without departing from the spirit of the present invention. Therefore, it is obvious that the listed embodiments are not intended to limit the present invention, but are intended to cover modifications made within the spirit and scope of the present invention under the definition of the appended claims.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610357520.7ACN107432992B (en) | 2016-05-26 | 2016-05-26 | Near-end treatment device and radioactive source thereof |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610357520.7ACN107432992B (en) | 2016-05-26 | 2016-05-26 | Near-end treatment device and radioactive source thereof |
| Publication Number | Publication Date |
|---|---|
| CN107432992Atrue CN107432992A (en) | 2017-12-05 |
| CN107432992B CN107432992B (en) | 2019-08-13 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610357520.7AActiveCN107432992B (en) | 2016-05-26 | 2016-05-26 | Near-end treatment device and radioactive source thereof |
| Country | Link |
|---|---|
| CN (1) | CN107432992B (en) |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109125958A (en)* | 2018-11-05 | 2019-01-04 | 深圳铭杰医疗科技有限公司 | The connection structure and radiotherapy apparatus of accelerating tube and line needle |
| WO2022021942A1 (en)* | 2020-07-27 | 2022-02-03 | Shanghai United Imaging Healthcare Co., Ltd. | Radiotherapy device and microwave source thereof |
| CN115038496A (en)* | 2020-03-18 | 2022-09-09 | 光线搜索实验室公司 | Method of generating a radiation therapy treatment plan, computer program and computer system for generating a radiation therapy treatment plan, and radiation therapy delivery system |
| CN115645761A (en)* | 2022-12-28 | 2023-01-31 | 广东省新兴激光等离子体技术研究院 | Tumor radiotherapy equipment and control method thereof |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6134300A (en)* | 1998-11-05 | 2000-10-17 | The Regents Of The University Of California | Miniature x-ray source |
| CN1596140A (en)* | 2001-06-19 | 2005-03-16 | 光电子公司 | Optically driven therapeutic radiation source |
| CN101521135A (en)* | 2009-03-26 | 2009-09-02 | 公安部第一研究所 | Grid-control nanocarbon cathode field emission X-ray pipe |
| KR20130122249A (en)* | 2012-04-30 | 2013-11-07 | 이화여자대학교 산학협력단 | Super miniature ionization beam tube for epithelial cancer brachytherapy |
| CN104411081A (en)* | 2014-11-13 | 2015-03-11 | 重庆大学 | Linear array micro-nano focus X-ray source for micro-nano CT (computer tomography) system |
| CN105590816A (en)* | 2016-02-02 | 2016-05-18 | 赵文天 | A Cold Cathode High Power Electron Beam Gun |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6134300A (en)* | 1998-11-05 | 2000-10-17 | The Regents Of The University Of California | Miniature x-ray source |
| CN1596140A (en)* | 2001-06-19 | 2005-03-16 | 光电子公司 | Optically driven therapeutic radiation source |
| CN101521135A (en)* | 2009-03-26 | 2009-09-02 | 公安部第一研究所 | Grid-control nanocarbon cathode field emission X-ray pipe |
| KR20130122249A (en)* | 2012-04-30 | 2013-11-07 | 이화여자대학교 산학협력단 | Super miniature ionization beam tube for epithelial cancer brachytherapy |
| CN104411081A (en)* | 2014-11-13 | 2015-03-11 | 重庆大学 | Linear array micro-nano focus X-ray source for micro-nano CT (computer tomography) system |
| CN105590816A (en)* | 2016-02-02 | 2016-05-18 | 赵文天 | A Cold Cathode High Power Electron Beam Gun |
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109125958A (en)* | 2018-11-05 | 2019-01-04 | 深圳铭杰医疗科技有限公司 | The connection structure and radiotherapy apparatus of accelerating tube and line needle |
| WO2020093690A1 (en)* | 2018-11-05 | 2020-05-14 | 深圳铭杰医疗科技有限公司 | Electronic radiotherapy apparatus and electron beam transmission structure applied to apparatus, and beam needle |
| CN115038496A (en)* | 2020-03-18 | 2022-09-09 | 光线搜索实验室公司 | Method of generating a radiation therapy treatment plan, computer program and computer system for generating a radiation therapy treatment plan, and radiation therapy delivery system |
| WO2022021942A1 (en)* | 2020-07-27 | 2022-02-03 | Shanghai United Imaging Healthcare Co., Ltd. | Radiotherapy device and microwave source thereof |
| US11984292B2 (en) | 2020-07-27 | 2024-05-14 | Shanghai United Imaging Healthcare Co., Ltd. | Radiotherapy device and microwave source thereof |
| US12412723B2 (en) | 2020-07-27 | 2025-09-09 | Shanghai United Imaging Healthcare Co., Ltd. | Radiotherapy device and microwave source thereof |
| CN115645761A (en)* | 2022-12-28 | 2023-01-31 | 广东省新兴激光等离子体技术研究院 | Tumor radiotherapy equipment and control method thereof |
| CN115645761B (en)* | 2022-12-28 | 2023-03-28 | 广东省新兴激光等离子体技术研究院 | Tumor radiotherapy equipment and control method thereof |
| Publication number | Publication date |
|---|---|
| CN107432992B (en) | 2019-08-13 |
| Publication | Publication Date | Title |
|---|---|---|
| US6890346B2 (en) | Apparatus and method for debilitating or killing microorganisms within the body | |
| US6320932B2 (en) | Miniature radiation source with flexible probe and laser driven thermionic emitter | |
| RU2140111C1 (en) | Method and device for exposure of external surface of body cavity to x-rays | |
| JP4436139B2 (en) | X-ray apparatus and method with current control of field emission | |
| CN111481841A (en) | A flash radiotherapy device | |
| US6556651B1 (en) | Array of miniature radiation sources | |
| CN107432992B (en) | Near-end treatment device and radioactive source thereof | |
| CN101689408A (en) | Laser activated micro accelerator platform | |
| US6920202B1 (en) | Therapeutic radiation source with in situ radiation detecting system | |
| JP2005515812A (en) | Control device for arrangement of small radiation sources | |
| US7382857B2 (en) | X-ray catheter assembly | |
| US20040218724A1 (en) | Miniature x-ray emitter | |
| US20060126789A1 (en) | Catheter with inflatable balloon assembly and optically activated x-ray source | |
| US20040218721A1 (en) | Miniature x-ray apparatus | |
| TWI577413B (en) | Brachytherapy apparatus and radiation source thereof | |
| US6856668B1 (en) | Method of treating a tumor by pre-irradiation | |
| RU2519772C2 (en) | Method for exposing human body pathologies to radiation and device for implementing same (versions) | |
| WO2013171491A1 (en) | Radiotherapy apparatus |
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |