Background technology
HVA light alignment techniques be TFT LCD (Thin Film Transistor Liquid Crystal Display, i.e.,Thin Film Transistor-LCD) liquid crystal panel production technology a kind of LCD alignment technology, refer to glass substrate apply electricityPressure is heated by support platform to glass substrate simultaneously in the case that, then pass through UV (Ultra-Violet Ray, i.e. ultraviolet)Light irradiation makes the monomer reaction of substrate inner macromolecule, so as to reach a kind of smooth alignment technique of purpose of LCD alignment.Because of itself and biographySystem friction matching is compared, and with high-contrast, wide viewing angle, few advantage such as electrostatic and particulate matter, progressively turns into large scale at presentThe mainstream technology of LCD production.
In HVA light orientation process of producing product, needed in secondary UV with workman backward to HVA light with substrate mould backwardIntend secondary lighting to carry out macro -graph (visual inspection), the condition for checking substrate detects product exception, is easy in advanceImprove in advance, then could enter secondary lighting program, it is to avoid substrate just finds that product is different after a lighting, secondary lightingOften, high-volume is caused to scrap.
The general principles of macro -graph are：The switching mechanism of macro -graph machine rotates substrate and lamp box near normal shapeState, then to the secondary lighting mode of glass substrate power-up simulation, light is from after the back side illuminaton of glass substrate, in front of glass substrateWorkman just can by observe carry out defect inspection, different defects, such as liquid crystal gas can be detected by different lighting picturesBubble, vertical/horizontal line defect, orientation exception etc..
Although however, current HVA macroscopic view detection machines can detect that most of orientation is abnormal, still having partOrientation can not detect that the orientation that a certain public electrode no signal input is caused during a such as UV orientation can not pass through extremely extremelyStatic image switching has pasted TFT (thin film transistor (TFT) array) polaroids and CF to observe, it is necessary to be pressed in secondary lightingThe substrate of (color filter, i.e. colored filter) polaroid is checked, if picture can recover within the short time (within 1s)Preceding state is pressed, then the substrate zero defect, if (can typically exceed more than 2s) can not recover the state to pressing to picture for a long time,The then substrate existing defects.Therefore, it is badly in need of a kind of abnormal macro -graph of orientation for being capable of detecting when that electrode signal input is causedMachine.
The content of the invention
In view of the deficiency that prior art is present, can the invention provides a kind of macro inspection apparatus and macro inspection methodThe orientation effectively caused to HVA light orientations is detected extremely, it is to avoid HVA orientations leakage extremely, which is put to secondary lighting, causes a large amount of reportsIt is useless, so as to lift product yield, lift line stability.
In order to realize above-mentioned purpose, present invention employs following technical scheme：
A kind of macro inspection apparatus, including：
Point lamp module, the panel without TFT side polaroid is lighted for simulating；
Module is lifted, compartment of terrain be may move located at described lamp module side, in the vertical direction, and inside, which is provided with, to be used to controlThe guidance panel of the system lifting module height；
Pressing mechanism, for contacting and pressing the panel surface, to observe the substrate surface after being pressed.
As one of which embodiment, described lamp module includes backlight and panel driving module, and the panel drivesDynamic model block is by the electrode contact of probe and substrate to provide the drive signal of change.
As one of which embodiment, the lifting module includes supporting part and the branch for fixing TFT side polaroidSupport part.
As one of which embodiment, camera, the fixed height of the camera are further fixed in the lifting moduleDegree is not less than the supporting part and relative to the supporting part further from described lamp module, makes the camera just to the branchTFT side polaroid on support part.
As one of which embodiment, the camera bottom is connected with for adjusting camera and described lamp moduleBetween spacing governor motion.
As one of which embodiment, the pressing mechanism includes extension, is hinged on the guarantor of the extension endHold block and the ball for contacting the panel；Through hole is offered in the maintainance block, and the through hole is kept close to describedThe diameter of block end is less than the ball, and the ball is contained in the through hole and part protrudes from the maintainance block end.
As one of which embodiment, the extension includes the extension sleeve and expansion link cooperated, and twoHold the rotating bar being hinged respectively with the expansion link and the maintainance block.
As one of which embodiment, the extension also includes the handle portion located at the extension sleeve end.
As one of which embodiment, the pressing mechanism is manipulator, is fixed in the lifting module and stretches outThe lifting module.
Another object of the present invention is to provide a kind of macro inspection method using described macro inspection apparatus, bagInclude：Make pressing mechanism contact and pressing panel surface；In panel surface stroke pressing mechanism；And control lifting module is verticalMove and pressed with the different zones of counter plate on direction.
Panel without TFT side polaroid is placed into by a lamp module by the present invention by simulating secondary lighting, andPanel opposite can move up and down provided with lifting module, TFT side polaroid and pressing mechanism with lifting module, and point lamp module startsAfterwards, macro -graph can be carried out to substrate, and substrate is pressed by pressing mechanism in lifting module through TFT side polaroidThe orientation that effectively can be caused to HVA light orientations of different parts detect extremely, it is to avoid abnormal leak of HVA orientations is put to secondaryLighting causes largely to scrap, so as to lift product yield and line stability.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and ExamplesThe present invention is further described.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and withoutIt is of the invention in limiting.
Refering to Fig. 1, the macro inspection apparatus of the embodiment of the present invention includes point lamp module 10, lifting module 20 and pressing mechanism30, wherein select lamp module 10 be used for simulate light the panel 1 without TFT side polaroid；Lifting module 20 is periodically installed at a littleThe side of lamp module 10, and in the vertical direction can be moved back and forth, and be internally provided with being used to control the height of lifting module 20Guidance panel；Pressing mechanism 30 is used for the substrate for contacting the simultaneously surface of pressing panel 1, to observe the substrate table after being pressedFace.
The one side of point lamp module 10 positioned at the back side of panel 1 can provide backlight for panel 1, on the other hand, moreover it is possible to rootDifferent pictures are shown according to pre-set mode Real Time Drive panel 1.Specifically, point lamp module 10 includes the He of backlight 11Panel driving module 12, drive signal generator built in panel driving module 12, by the probe 13a and substrate that power up toolElectrode contact is to provide the drive signal of change, and the power-up tool can be clamped at the circumferential side frame of panel 1.Drive signal is sent outRaw device can use computer control to send different signals and voltage, by electrodes of the probe 13a to substrate for powering up toolIt is powered, so as to realize that panel 1 switches different pictures, the drive signal is ac square wave signal, to ensure holding for pictureContinuous variability.For example, by the change of signal and voltage, it is (white that R (red), G (green), B (blueness), W can be presented in panel 1Color), the picture such as L (GTG), different defects, such as liquid crystal bubbles can be detected by different pictures, vertical/horizontal lacksFall into, orientation is abnormal etc..
In addition, macro inspection apparatus can also have for the supporting mechanism of support panel 1 and for turning-over support mechanismWith the switching mechanism of panel 1, power-up tool can be arranged on the supporting mechanism back side, utilize its elastic probe 13a Elastic ContactThe electrode at the back side of panel 1.
Set by such, when carrying out macro -graph, one layer of CF polaroid is first attached on the exiting surface of backlight 111b, point lamp module 10 is that panel 1 provides backlight and drive signal, and the display picture of panel 1 is that switching in real time, operation can be achievedPerson is located in lifting module 20, and the display picture on the surface of panel 1 is observed that through the TFT side polaroid 1a in front of it, andIt can in real time control to lift the movement of module 20 by lifting the guidance panel in module 20, and using pressing mechanism 30 in panel 1The diverse location on surface carries out stroke, realizes the inspection of substrate regional.
As one of which preferably embodiment, lifting module 20 includes supporting part 21 and for fixing TFT side polarisationPiece 1a supporting part 22, the supporting part 21 can carry operator or check equipment, what the supporting part 22 can be extended outSupport block or supporting table, TFT side polaroid 1a are fixed on the supporting part 22 by the mode such as clamping or stickup, aobvious with panel 1Show that face is parallel.Check that equipment carries camera, the human eye counter plate 1 that can substitute operator is scanned, camera and carryingPortion 21 is relatively fixed, and the level altitude of camera is not less than supporting part 22 and relative to supporting part 22 further from a lamp module10, make camera that to the TFT side polaroid 1a on supporting part 22, panel 1 just is observed through TFT side polaroid 1a.In addition, shootingHead bottom has been preferably connected governor motion, and the spacing between camera and point lamp module 10 can be adjusted according to actual needs, withOptimal viewing angle and definition are realized, the governor motion can be slide block structure or linkage.
As shown in Fig. 2 pressing mechanism 30 includes extension 31, is hinged on the maintainance block 32 of the end of extension 31 and is used forThe ball 33 of touch panel 1, is specifically that through hole is offered in maintainance block 32, and diameter of the through hole close to the end of maintainance block 32 is smallIn ball 33, the diameter of through hole other parts is more than ball 33 so that ball 33 is contained in through hole and part protrudes from holdingThe end of block 32 is without dropping out.The ball 33 of pressing mechanism 30 after assembling coordinates with the gap of maintainance block 32, and ball 33 can protectedHold in block 32 and roll without deviating from.
During pressing panel 1, pressing mechanism 30 is contacted by the ball 33 of its end with panel 1, and byPress mechanism 30 is during the surface stroke of panel 1, and ball 33 is rolled on the surface of panel 1, and substrate can be avoided to scratch quiltScratch, stress can also be avoided excessive and cause fragmentation.
Further, it is increase pressing scope, extension 31 has the extension sleeve 311 and expansion link 312 cooperated,And the rotating bar 313 that two ends are hinged with expansion link 312 and maintainance block 32 respectively, expansion link 312 can be relative to extension sleeve 311It is flexible so that the physical length of pressing mechanism 30 can be adjusted freely, and rotating bar 313 can be rotated relative to expansion link 312,Maintainance block 32 can also be rotated relative to rotating bar 313, improve the flexibility of pressing mechanism, it is to be understood that pressing machineStructure 30 can carry control system, and flexible/rotation of its various pieces is controlled respectively.
In addition, extension 31 also includes the handle portion 314 located at the end of extension sleeve 311, in lifting module 20Operator can be operated with the hand-held handle portion 314.Or pressing mechanism 30 can be manipulator, lifting module 20 is fixed onIt is interior and stretch out lifting module 20, the handle portion 314 as manipulator fixed part, it is corresponding by being pre-entered in control systemInstruction can realize more precise control.
As shown in figure 3, carrying out macro inspection method using the macro inspection apparatus of the present invention mainly includes：
S1：Make the contact of pressing mechanism 30 and the surface of pressing panel 1；
S2：In the surface stroke pressing mechanism 30 of panel 1；
S3：Control lifting module 20 in the vertical direction motion is pressed with the different zones of counter plate 1.
, it is necessary to which following what time whether accomplish is determined in advance before above-mentioned steps S1：
One layer of CF polaroids 1b is pasted with A, the exiting surface of backlight 11；
B, TFT side polaroid 1a are fixed in lifting module 20, and TFT side polaroid 1a is parallel to the display surface of panel 1；
C, operator/camera is located in lifting module 20, and TFT side polaroid 1a is between panel 1 and operator/take the photographAs between head.
After some confirms to finish more than, you can carry out ensuing checking process, checking process includes visually displaying that pictureFace, finds liquid crystal bubbles, vertical/horizontal line defect, the defect such as orientation is abnormal, and is using the pressing panel 1 of pressing mechanism 30Check that special orientation abnormal conditions whether there is afterwards.In step s 2, pressing mechanism 30 can be in the regional area of panel 1Carry out stroke, after all regions that pressing mechanism 30 can be touched, which are all checked, to be finished, then continue step S3 below, with afterIt is continuous that other regions on vertical direction are checked.
The picture at position after being pressed can recover to press preceding state at the appointed time, then judge that the substrate is intactFall into；And when picture can not recover the state to pressing at the appointed time, then judge the substrate existing defects.
Panel without TFT side polaroid is placed into by a lamp module by the present invention by simulating secondary lighting, andPanel opposite can move up and down provided with lifting module, TFT side polaroid and pressing mechanism with lifting module, and point lamp module startsAfterwards, macro -graph can be carried out to substrate, and substrate is pressed by pressing mechanism in lifting module through TFT side polaroidDifferent parts can improve ability of the HVA macro -graphs machine to orientation abnormal test, especially in tableaux (R/G/B/The pictures such as W/L) under the orientation that can not check have stronger detecting ability extremely, the abnormal generation of detecting orientation in time, keeps away in advanceThe orientation leakage extremely for exempting from HVA light orientation generation is put to secondary lighting and causes largely to scrap.
Described above is only the embodiment of the application, it is noted that for the ordinary skill people of the artFor member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also shouldIt is considered as the protection domain of the application.