A kind of substratum for chrysophyceaeTechnical field
The present invention relates to algae media technical field, particularly relate to the substratum of a kind of chrysophyceae.
Background technology
Chrysophyceae, is mostly the unicellular algae that swims of size 2-7 micron.Because of its acellular wall, be rich in unsaturated fatty acids and ecological suitability is strong, long speed is fast, is suitable for large-scale breeding, is considered to the desirable bait of marine animal artificial breeding, as the high-quality starter diet of the famous and precious fishery products such as mussel, oyster, mud blood clam, prawn.Now need a kind of substratum, can promote that Isochrysis galbana grows fast.Naphthalene acetamide is a kind of plant growth regulating substance, has very good effect to promotion cell fission.Polydimethylsiloxane is a kind of well sequestrant, can promote that frustule is to the absorption of nutritive element.
Summary of the invention
Based on the technical problem that background technology exists, the present invention proposes a kind of ball chrysophyceae substratum, when cultivating chrysophyceae, Isochrysis galbana is had growth velocity is fast, cell density is large feature.
For solving the problems of the technologies described above, a kind of ball chrysophyceae substratum comprises the component of following mass concentration: NaNO360-120mg/L, phosphoric acid salt (NaH2pO4, KH2pO4) 8-12mg/L, ferric ammonium citrate 2.5-3.5mg/L and Na2eDTA 10-12mg/L.
As preferred technical scheme, a kind of ball chrysophyceae substratum comprises the component of following mass concentration: NaNO360-120mg/L, phosphoric acid salt (NaH2pO4, KH2pO4) 8-12mg/L, ferric ammonium citrate 2.5-3.5mg/L, Na2eDTA 10-12mg/L, naphthalene acetamide 0.1-1mg/L and polydimethylsiloxane 1ml/L.
Advantage of the present invention is: substratum of the present invention, when cultivating chrysophyceae, has chrysophyceae is had growth velocity is fast, cell density is large feature.
Embodiment
Below in conjunction with specific embodiment, the substratum of chrysophyceae provided by the invention is described in detail.
Embodiment 1
A kind of Isochrysis galbana substratum that the present invention proposes, comprises following component: NaNO3120mg/L, KH2pO412mg/L, ferric ammonium citrate 3.5mg/L, Na2eDTA 12mg/L, naphthalene acetamide 0.1mg/L and polydimethylsiloxane 1ml/L.
Embodiment 2
A kind of Isochrysis galbana substratum that the present invention proposes, comprises following component: NaNO360mg/L, KH2pO48mg/L, ferric ammonium citrate 2.5mg/L, Na2eDTA 10mg/L, naphthalene acetamide 1mg/L and polydimethylsiloxane 1ml/L.
With the substratum of embodiment 1 and embodiment 2 gained for experimental group, with seawater F/2 substratum as a control group.The Isochrysis galbana 3011 of taking the logarithm vegetative period is inoculated in this substratum to be cultivated, illumination every day 10h, and intensity of illumination is about 50 μm of ol/ (m2s), training case temperature controls at 25 ± 1 DEG C, records frustule concentration in substratum at set intervals.Experimental result is as shown in the table:
Experimentally result is carried out drawing and is obtained table 1.
| 0th day | 3rd day | 5th day | 7th day | 9th day |
| Embodiment 1 | 180 | 1360 | 1500 | 1730 | 1800 |
| Embodiment 2 | 180 | 1380 | 1580 | 1770 | 1800 |
| Seawater f/2 substratum | 180 | 1080 | 1202 | 1400 | 1500 |
As can be seen from this table, use substratum provided by the present invention than using contrast substratum that Isochrysis galbana 3011 can be made to breed more quickly, the time reaching density peak is faster 2 days than use control group, and the maximum concentration that Isochrysis galbana can reach is also higher than the seawater F/2 substratum about 20% of control group, the substratum describing confession of the present invention has clear superiority.
The above; be only the present invention's preferably embodiment; but protection scope of the present invention is not limited thereto; anyly be familiar with those skilled in the art in the technical scope that the present invention discloses; be equal to according to technical scheme of the present invention and inventive concept thereof and replace or change, all should be encompassed within protection scope of the present invention.