技术领域technical field
本发明涉及一种新型智能材料的应用，属于光整加工领域，特别涉及一种磁流变抛光方法及抛光工具。The invention relates to the application of a novel intelligent material, belongs to the field of finishing processing, and in particular relates to a magnetorheological polishing method and a polishing tool.
背景技术Background technique
磁流变是一种智能材料，是由高磁导率、低磁滞性的微小软磁性颗粒和非导磁性液体混合而成的悬浮体。它在常态下是液体，当加载磁场时，发生液—固相变，当除去磁场时，又发生固—液相变。在一定的磁场强度范围内，磁流变液的表观粘度与磁场强度有关。这种现象称为磁流变效应。利用磁流变液的磁流变效应，可以将磨粒聚集于抛光区域形成柔性磨头，具有磨头硬度可调，磨粒自锐，面型贴合好等优点，用于抛光加工性能优良。Magnetorheology is a kind of intelligent material, which is a suspension composed of tiny soft magnetic particles with high magnetic permeability and low magnetic hysteresis and non-magnetic liquid. It is a liquid under normal conditions. When a magnetic field is applied, a liquid-solid phase transition occurs, and when the magnetic field is removed, a solid-liquid phase transition occurs again. Within a certain range of magnetic field strength, the apparent viscosity of magnetorheological fluid is related to the magnetic field strength. This phenomenon is called the magnetorheological effect. Utilizing the magnetorheological effect of the magnetorheological fluid, the abrasive particles can be gathered in the polishing area to form a flexible grinding head, which has the advantages of adjustable hardness of the grinding head, self-sharpening of the abrasive grains, good surface fit, etc., and excellent polishing performance .
现有磁流变抛光装置抛光作业时可以通过改变磁场强度改变磨头的硬度，但整个抛光区域的材料去除模型是固定的。对复杂曲面的抛光，需要精确设计抛光轨迹，才能实现达到抛光区域内各点材料的均匀去除，达到较好的抛光效果。The existing magnetorheological polishing device can change the hardness of the grinding head by changing the magnetic field strength during polishing, but the material removal model of the entire polishing area is fixed. For the polishing of complex curved surfaces, it is necessary to precisely design the polishing trajectory in order to achieve uniform removal of materials at each point in the polishing area and achieve a better polishing effect.
申请者获得授权的发明专利201110116955.X《一种去除率模型可控的磁流变均匀抛光方法与装置》，使用三只尖锥状的电磁铁改变抛光区域的磁场分布，从而达到改变去除模型的目的。这种方法抛光复杂曲面时，需要根据面型变化，计算合适的磁场分布，并从数据库中调用与之近似的磁场分布，改变各只电磁铁的电压，从而得到合适的去除率模型。这种方法可以实现均匀抛光，但在实践中磁场计算复杂，只能采用数据库调用的方式近似，因此抛光效果不够理想。The applicant obtained the authorized invention patent 201110116955.X "A method and device for magnetorheological uniform polishing with controllable removal rate model", using three pointed electromagnets to change the magnetic field distribution in the polishing area, so as to change the removal model the goal of. When this method polishes a complex curved surface, it is necessary to calculate the appropriate magnetic field distribution according to the change of the surface shape, and call the similar magnetic field distribution from the database to change the voltage of each electromagnet, so as to obtain a suitable removal rate model. This method can achieve uniform polishing, but in practice the calculation of the magnetic field is complicated and can only be approximated by calling the database, so the polishing effect is not ideal.
基于此，发明了新型磁流变抛光方法及由三层同心圆环形电磁铁构成的抛光工具，目的是达到理想的抛光效果，同时操作简便。Based on this, a new type of magnetorheological polishing method and a polishing tool composed of three layers of concentric circular electromagnets were invented, the purpose of which is to achieve an ideal polishing effect while being easy to operate.
发明内容Contents of the invention
为解决上述现有技术存在的问题，本发明的目的在于提供一种磁流变抛光方法及由三层同心圆环形电磁铁构成的抛光工具。本发明方法及工具相对现有技术能达到理想的抛光效果，同时操作简便。In order to solve the above-mentioned problems in the prior art, the purpose of the present invention is to provide a magnetorheological polishing method and a polishing tool composed of three layers of concentric circular electromagnets. Compared with the prior art, the method and tool of the invention can achieve an ideal polishing effect, and at the same time, the operation is simple and convenient.
为达到上述目的，本发明的技术方案为：To achieve the above object, the technical solution of the present invention is:
一种磁流变抛光方法，具体包括如下步骤：A magnetorheological polishing method, specifically comprising the steps of:
步骤一、已知工件面型信息；Step 1. The surface information of the workpiece is known;
步骤二、确定抛光工具的位置及抛光间隙；Step 2. Determine the position of the polishing tool and the polishing gap;
步骤三、在抛光间隙内注入磁流变液；Step 3, inject magnetorheological fluid into the polishing gap;
步骤四、由抛光区域的面形信息及抛光区域内各点线速度分布，计算获得均匀去除率时的抛光压力分布；Step 4, calculate the polishing pressure distribution when the uniform removal rate is obtained from the surface shape information of the polishing area and the linear velocity distribution of each point in the polishing area;
已知平面抛光时抛光速度ν＝ωr，则在抛光区域半径方向的抛光速度分布，圆心处线速度最低，沿半径方向线速度逐渐增大，在边缘处线速度最大，抛光去除率服从Preston方程，γ＝kpv，k为常系数，p为抛光压力，v为抛光线速度，磁流变抛光时，圆形抛光区域的抛光速度由中心向外沿半径方向逐渐增大，只有抛光压力逐渐减小，保证抛光速度与抛光压力的乘积为常数，才能保证对工件表面的均匀去除；It is known that the polishing speed ν=ωr in the plane polishing, the polishing speed distribution in the radial direction of the polished area, the linear speed at the center of the circle is the lowest, the linear speed increases gradually along the radial direction, and the linear speed is the largest at the edge, and the polishing removal rate obeys the Preston equation , γ=kpv, k is a constant coefficient, p is the polishing pressure, v is the polishing linear velocity, during magnetorheological polishing, the polishing speed of the circular polishing area gradually increases from the center to the outside along the radial direction, and only the polishing pressure gradually decreases Small, ensure that the product of polishing speed and polishing pressure is a constant, in order to ensure uniform removal of the workpiece surface;
步骤五、由压力分布反求磁场分布Step 5. Calculate the magnetic field distribution from the pressure distribution
由于磁流变抛光压强：Due to magnetorheological polishing pressure:
抛光压力P＝Ｐm*SPolishing pressure P=Pm *S
式中μ0、μf、μp、S均为定值，则抛光压力与磁场强度H成正比；In the formula, μ0 , μf , μp , and S are all fixed values, so the polishing pressure is proportional to the magnetic field strength H;
步骤六、由所得磁场分布模型，改变三层同心圆环形电磁铁各自的线圈电压，使沿半径方向的磁场分布符合要求；Step 6, by the obtained magnetic field distribution model, change the respective coil voltages of the three layers of concentric circular electromagnets, so that the magnetic field distribution along the radial direction meets the requirements;
步骤七、进行抛光作业。Step seven, perform polishing operation.
上述抛光方法所采用的磁流变抛光装置，由三层同心圆环形电磁铁构成，包括：电机，联轴器，铜环，电刷，中空集电环，电磁铁，电磁线圈，外壳，供电卡座，工作台底板；The magnetorheological polishing device used in the above polishing method is composed of three layers of concentric circular electromagnets, including: motor, coupling, copper ring, brush, hollow collector ring, electromagnet, electromagnetic coil, shell, Power supply deck, workbench bottom plate;
底部为三层嵌套在一起的圆柱型电磁铁，各层之间由绝缘层隔开，电磁铁间隙包绕电磁线圈，每层电磁铁单独供电，电磁铁顶端由外壳包围固定，外壳上端中心位置固连圆柱型中空集电环，集电环外圆柱面上相间开有6道凹槽，并镶嵌铜环，三层电磁铁中电磁线圈的6根导线由中空集电环内部分别与六个铜环相连，供电卡座包围中空集电环，供电卡座上与6道凹槽对应位置开6个通孔，嵌入电刷，使之与六个铜环分别接触，供电卡座底部通过螺钉固定于工作台面底板上，中空集电环的上端通过联轴器与主轴电机的电机轴相连。The bottom is three layers of cylindrical electromagnets nested together. Each layer is separated by an insulating layer. The gap between the electromagnets surrounds the electromagnetic coil. Each layer of electromagnet is powered separately. The position is fixedly connected to the cylindrical hollow collector ring. There are 6 grooves on the outer cylindrical surface of the collector ring, and copper rings are inlaid. The 6 wires of the electromagnetic coil in the three-layer electromagnet are respectively connected to the six Connected with two copper rings, the power supply card seat surrounds the hollow collector ring, and six through holes are opened on the power supply card seat corresponding to the 6 grooves, and the brushes are embedded to make contact with the six copper rings respectively, and the bottom of the power supply card seat passes through Screws are fixed on the bottom plate of the working table, and the upper end of the hollow collector ring is connected with the motor shaft of the spindle motor through a coupling.
进一步的，所述电磁铁至少为三层。Further, the electromagnet has at least three layers.
进一步的，所述结构中，供电卡座固定于工作台底板上，是静止部件；集电环、电磁铁、外壳共同组成了运动部件；外部电源通过6个电刷、集电环对三组旋转的电磁铁供电。Further, in the described structure, the power supply deck is fixed on the bottom plate of the workbench, which is a stationary part; the slip ring, electromagnet, and casing together form a moving part; the external power supply passes through 6 brushes and three sets of slip ring pairs The rotating electromagnet supplies power.
相对于现有技术，本发明的有益效果为：Compared with the prior art, the beneficial effects of the present invention are:
1、本发明抛光方法采用同心圆环型电磁铁嵌套结构，集电环分别供电，达到相同半径处的磁场强度相同，不同半径处的磁场强度可以单独控制的目的；1. The polishing method of the present invention adopts a nested structure of concentric ring-type electromagnets, and the collector rings are powered separately, so that the magnetic field strength at the same radius is the same, and the magnetic field strength at different radii can be controlled separately;
2、本发明抛光方法中不需要建立模型库，可以直接计算磁场分布，并通过电磁铁电压改变直接改变磁场。磁场分布控制精确，简便。更容易实现对工件的均匀抛光。2. The polishing method of the present invention does not need to establish a model library, and the magnetic field distribution can be directly calculated, and the magnetic field can be directly changed by changing the voltage of the electromagnet. The magnetic field distribution control is accurate and simple. It is easier to achieve uniform polishing of the workpiece.
3、在一抛光区域内，已知工件的曲面信息及各点上的抛光线速度，通过改变作用于抛光区域各点的抛光压力，获得各点均匀去除率，也相当于构造一个完全贴合工件表面的磨刀，可使各点获得均匀的材料去除。3. In a polishing area, the curved surface information of the workpiece and the polishing line speed at each point are known, and the uniform removal rate of each point is obtained by changing the polishing pressure acting on each point in the polishing area, which is equivalent to constructing a complete fit Grinding of the workpiece surface enables uniform material removal at all points.
4、本发明方法及装置适用面形广；抛光工具结构简单，制作简便。4. The method and device of the present invention are applicable to a wide range of surfaces; the polishing tool has a simple structure and is easy to manufacture.
附图说明Description of drawings
图1为本发明的结构示意图。Fig. 1 is a structural schematic diagram of the present invention.
其中，1-电机，2-联轴器，3-铜环，4-电刷，5-集电环，6-电磁铁，7-电磁线圈，8-外壳，9-供电卡座，10-工作台底板。Among them, 1-motor, 2-coupling, 3-copper ring, 4-brush, 5-collector ring, 6-electromagnet, 7-electromagnetic coil, 8-shell, 9-power supply card holder, 10- Workbench base.
具体实施方式detailed description
下面结合附图及具体实施方式对本发明方案做进一步详细描述，The solution of the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments,
一种磁流变抛光方法，具体包括如下步骤：A magnetorheological polishing method, specifically comprising the steps of:
步骤一、已知工件面型信息；Step 1. The surface information of the workpiece is known;
步骤二、确定抛光工具的位置及抛光间隙；Step 2. Determine the position of the polishing tool and the polishing gap;
步骤三、在抛光间隙内注入磁流变液；Step 3, inject magnetorheological fluid into the polishing gap;
步骤四、由抛光区域的面形信息及抛光区域内各点线速度分布，计算获得均匀去除率时的抛光压力分布；Step 4, calculate the polishing pressure distribution when the uniform removal rate is obtained from the surface shape information of the polishing area and the linear velocity distribution of each point in the polishing area;
已知平面抛光时抛光速度ν＝ωr，则在抛光区域半径方向的抛光速度分布，圆心处线速度最低，沿半径方向线速度逐渐增大，在边缘处线速度最大，抛光去除率服从Preston方程，γ＝kpv，k为常系数，p为抛光压力，v为抛光线速度，磁流变抛光时，圆形抛光区域的抛光速度由中心向外沿半径方向逐渐增大，只有抛光压力逐渐减小，保证抛光速度与抛光压力的乘积为常数，才能保证对工件表面的均匀去除；It is known that the polishing speed ν=ωr in the plane polishing, the polishing speed distribution in the radial direction of the polished area, the linear speed at the center of the circle is the lowest, the linear speed increases gradually along the radial direction, and the linear speed is the largest at the edge, and the polishing removal rate obeys the Preston equation , γ=kpv, k is a constant coefficient, p is the polishing pressure, v is the polishing linear velocity, during magnetorheological polishing, the polishing speed of the circular polishing area gradually increases from the center to the outside along the radial direction, and only the polishing pressure gradually decreases Small, ensure that the product of polishing speed and polishing pressure is a constant, in order to ensure uniform removal of the workpiece surface;
步骤五、由压力分布反求磁场分布Step 5. Calculate the magnetic field distribution from the pressure distribution
由于磁流变抛光压强：Due to magnetorheological polishing pressure:
抛光压力P＝Ｐm*SPolishing pressure P=Pm *S
式中μ0、μf、μp、S均为定值，则抛光压力与磁场强度H成正比；In the formula, μ0 , μf , μp , and S are all fixed values, so the polishing pressure is proportional to the magnetic field strength H;
步骤六、由所得磁场分布模型，改变三层同心圆环形电磁铁各自的线圈电压，使沿半径方向的磁场分布符合要求；Step 6, by the obtained magnetic field distribution model, change the respective coil voltages of the three layers of concentric circular electromagnets, so that the magnetic field distribution along the radial direction meets the requirements;
步骤七、进行抛光作业。Step seven, perform polishing operation.
上述抛光方法所采用的磁流变抛光装置，由三层同心圆环形电磁铁构成，包括：电机1，联轴器2，铜环3，电刷4，集电环5，电磁铁6，电磁线圈7，外壳8，供电卡座9，工作台底板10；The magnetorheological polishing device used in the above polishing method is composed of three layers of concentric circular electromagnets, including: motor 1, coupling 2, copper ring 3, brush 4, slip ring 5, electromagnet 6, Electromagnetic coil 7, shell 8, power supply deck 9, workbench bottom plate 10;
底部为三层嵌套在一起的圆柱型电磁铁6，各层之间由绝缘层隔开，电磁铁6间隙包绕电磁线圈7，每层电磁铁6单独供电，电磁铁6顶端由外壳8包围固定，外壳8上端中心位置固连圆柱型中空集电环5，集电环5外圆柱面上相间开有6道凹槽，并镶嵌铜环3，三层电磁铁6中电磁线圈7的6根导线由中空集电环5内部分别与六个铜环3相连，供电卡座9包围中空集电环5，供电卡座9上与6道凹槽对应位置开6个通孔，嵌入电刷4，使之与六个铜环3分别接触，供电卡座9底部通过螺钉固定于工作台面底板10上，中空集电环5的上端通过联轴器2与主轴电机1的电机轴相连。The bottom is three layers of cylindrical electromagnets 6 nested together, each layer is separated by an insulating layer, the gap between the electromagnets 6 surrounds the electromagnetic coil 7, each layer of electromagnets 6 is powered separately, and the top of the electromagnets 6 is covered by a shell 8 Surrounded and fixed, the center of the upper end of the shell 8 is fixed to the cylindrical hollow collector ring 5, and the outer cylindrical surface of the collector ring 5 is alternately provided with 6 grooves, and the copper ring 3 is inlaid, and the electromagnetic coil 7 in the three-layer electromagnet 6 The 6 wires are respectively connected to the six copper rings 3 inside the hollow collector ring 5, and the power supply holder 9 surrounds the hollow collector ring 5, and 6 through holes are opened on the power supply holder 9 corresponding to the 6 grooves, and embedded in the electric wire Brush 4 makes it contact with six copper rings 3 respectively, the bottom of power supply card holder 9 is fixed on the worktable bottom plate 10 by screws, and the upper end of hollow collector ring 5 is connected with the motor shaft of spindle motor 1 through coupling 2.
进一步的，所述电磁铁6至少为三层电磁铁层数越多，控制越精确，因此不限于三层，可以更多。Further, the electromagnet 6 has at least three layers. The more the number of electromagnet layers, the more precise the control is, so it is not limited to three layers, but can be more.
进一步的，所述结构中，供电卡座9固定于工作台底板10上，是静止部件；集电环5、电磁铁6、外壳8共同组成了运动部件；外部电源通过6个电刷4、集电环5对三组旋转的电磁铁6供电。Further, in the described structure, the power supply deck 9 is fixed on the workbench bottom plate 10, which is a stationary part; the slip ring 5, the electromagnet 6, and the casing 8 jointly form a moving part; the external power supply passes through 6 brushes 4, The slip ring 5 supplies power to the three sets of rotating electromagnets 6 .
本发明的工作原理为：抛光装置工作时，主轴电机1通过联轴器2带动集电环5、电磁铁6、外壳8旋转，外部电源通过6个电刷4、集电环5对三组旋转的电磁铁6供电。电磁铁6通电后，在底部形成磁场。三层电磁铁6由于各自施加的电压不同，电磁场的强度也不相同。也就是在抛光装置的圆形底部，由内到外各层的磁场强度不同。将抛光装置底部浸入混有磨料颗粒的磁流变液中，在磁场作用下，混有磨料颗粒的磁流变液在抛光装置的底部聚集。由于磁场分布的不同，沿半径方向，各层的磁流变液的粘度也是不同的。抛光作业时，反映出来的是抛光压力分布的不同。抛光压力的分布，可以通过调节各个电磁铁6的供电电压实现。The working principle of the present invention is: when the polishing device is working, the main shaft motor 1 drives the collector ring 5, the electromagnet 6, and the casing 8 to rotate through the coupling 2, and the external power supply passes through 6 brushes 4, and the collector ring 5 pairs in three groups The rotating electromagnet 6 is powered. After the electromagnet 6 is energized, a magnetic field is formed at the bottom. Three layers of electromagnets 6 have different strengths of electromagnetic fields due to the different applied voltages. That is, at the circular bottom of the polishing device, the magnetic field strength of each layer is different from the inside to the outside. The bottom of the polishing device is immersed in the magnetorheological fluid mixed with abrasive particles, and under the action of a magnetic field, the magnetorheological fluid mixed with abrasive particles gathers at the bottom of the polishing device. Due to the difference in the distribution of the magnetic field, the viscosity of the magnetorheological fluid in each layer is also different along the radial direction. During the polishing operation, it reflects the difference in the distribution of polishing pressure. The distribution of polishing pressure can be realized by adjusting the power supply voltage of each electromagnet 6 .
抛光方法：Polishing method:
抛光时将工件浸入混有磨料颗粒的磁流变抛光液。将抛光工具底部置于工件表面之上，两者之间保持1mm左右间隙。电磁铁通电，混有磨料颗粒的磁流变液在抛光工具底部聚集形成抛光头。主轴电机通电，带动抛光工具旋转。固化的磨料颗粒与工件表面之间相对运动，从而完成对工件表面的材料去除。由于抛光工具由三层同心圆环形电磁铁构成，每层电磁铁的磁场强度不同，则在抛光工具圆形底部不同半径处的磁场强度不同，而相同半径处的磁场强度相同。When polishing, the workpiece is immersed in a magnetorheological polishing fluid mixed with abrasive particles. Place the bottom of the polishing tool on the surface of the workpiece, keeping a gap of about 1mm between the two. The electromagnet is energized, and the magnetorheological fluid mixed with abrasive particles gathers at the bottom of the polishing tool to form a polishing head. The spindle motor is energized to drive the polishing tool to rotate. The solidified abrasive particles move relative to the surface of the workpiece, thereby completing the material removal from the surface of the workpiece. Since the polishing tool is composed of three layers of concentric circular electromagnets, and the magnetic field strength of each layer of electromagnets is different, the magnetic field strengths at different radii of the circular bottom of the polishing tool are different, while the magnetic field strengths at the same radius are the same.
抛光去除率服从Preston方程，γ＝kpvThe polishing removal rate obeys the Preston equation, γ=kpv
k为常系数，p为抛光压力，v为抛光线速度。磁流变抛光时，圆形抛光区域的抛光速度由中心向外沿半径方向逐渐增大，只有抛光压力逐渐减小，保证抛光速度与抛光压力的乘积为常数，才能保证对工件表面的均匀去除。根据工件抛光区域的面型信息，控制抛光去除率的分布，就实现了对工件的智能抛光。k is a constant coefficient, p is the polishing pressure, and v is the polishing line speed. During magnetorheological polishing, the polishing speed of the circular polishing area gradually increases from the center to the outside along the radial direction. Only when the polishing pressure gradually decreases and the product of the polishing speed and the polishing pressure is constant, can the uniform removal of the workpiece surface be guaranteed. . According to the surface information of the polished area of the workpiece, the distribution of the polishing removal rate is controlled, and the intelligent polishing of the workpiece is realized.
本发明涉及的抛光工具由三层同心圆环型电磁铁构成，三层电磁铁单独供电，可以获得每层不同的磁场强度。The polishing tool involved in the present invention is composed of three layers of concentric ring-type electromagnets, and the three layers of electromagnets are powered separately to obtain different magnetic field strengths for each layer.
由于磁流变抛光压强：Due to magnetorheological polishing pressure:
抛光压力P＝Ｐm*SPolishing pressure P=Pm *S
式中μ0、μf、μp、S均为定值，则抛光压力与磁场强度H成正比。Where μ0 , μf , μp , and S are all constant values, the polishing pressure is proportional to the magnetic field strength H.
则每层的抛光压力可以单独控制，从而达到均匀去除的目的。Then the polishing pressure of each layer can be controlled individually, so as to achieve the purpose of uniform removal.
以上所述，仅为本发明的具体实施方式，但本发明的保护范围并不局限于此，任何不经过创造性劳动想到的变化或替换，都应涵盖在本发明的保护范围之内。因此，本发明的保护范围应该以权利要求书所限定的保护范围为准。The above is only a specific implementation of the present invention, but the scope of protection of the present invention is not limited thereto, and any changes or replacements that do not come to mind through creative work shall be covered within the scope of protection of the present invention. Therefore, the protection scope of the present invention should be determined by the protection scope defined in the claims.
| Application Number | Priority Date | Filing Date | Title |
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| CN201410440862.6ACN104191318B (en) | 2014-09-01 | 2014-09-01 | Magneto-rheological polishing method and tool |
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| CN201410440862.6ACN104191318B (en) | 2014-09-01 | 2014-09-01 | Magneto-rheological polishing method and tool |
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