技术领域technical field
本发明涉及显示技术领域，尤其涉及一种掩模板及其制作方法、掩模组件。The invention relates to the field of display technology, in particular to a mask plate, a manufacturing method thereof, and a mask component.
背景技术Background technique
有机发光二极管(Organic Light Emitting Diode，简称OLED)是一种有机薄膜电致发光器件，其具有易形成柔性结构、视角宽等优点；因此，利用有机发光二极管的显示技术已成为一种重要的显示技术。Organic Light Emitting Diode (OLED) is an organic thin-film electroluminescent device, which has the advantages of easy formation of flexible structure and wide viewing angle; therefore, the display technology using OLED has become an important display technology. technology.
OLED的全彩显示一般包括R(红)G(绿)B(蓝)子像素独立发光、或白光OLED结合彩色滤光膜等方式。其中，RGB子像素独立发光是目前采用最多的彩色模式，其是利用子像素单元中的有机发光材料独立发光。The full-color display of OLED generally includes R (red) G (green) B (blue) sub-pixels to emit light independently, or a white light OLED combined with a color filter film. Among them, the independent light emission of RGB sub-pixels is currently the most widely used color mode, which utilizes the organic light-emitting materials in the sub-pixel units to emit light independently.
目前，有机发光材料层一般都是通过对有机材料进行真空蒸发镀膜形成。其中，对于RGB子像素独立发光的OLED，由于每个RGB子像素单元采用不同的有机发光材料，因而RGB子像素单元的有机发光层需要分别进行蒸镀，在此过程中一般采用金属材料的掩模板来控制有机材料在基板上的镀膜位置，然后依次在每个子像素单元中蒸镀相应的有机材料。At present, organic light-emitting material layers are generally formed by vacuum evaporation coating of organic materials. Among them, for OLEDs in which the RGB sub-pixels emit light independently, since each RGB sub-pixel unit uses a different organic light-emitting material, the organic light-emitting layer of the RGB sub-pixel unit needs to be evaporated separately. In this process, a metal material mask is generally used. The template is used to control the coating position of the organic material on the substrate, and then the corresponding organic material is evaporated in each sub-pixel unit in turn.
然而，由于金属材料的掩模板有其厚度的限制，当有机材料颗粒以较小的倾斜角度入射时，该部分有机材料颗粒会被蒸镀孔壁遮蔽而无法到达基板，从而使得每个子像素单元的边缘蒸镀厚度会明显低于子像素单元中间的蒸镀厚度，此称为“阴影效应”。However, due to the limitation of the thickness of the metal mask, when the organic material particles are incident at a small oblique angle, the part of the organic material particles will be blocked by the walls of the evaporation holes and cannot reach the substrate, so that each sub-pixel unit The evaporation thickness at the edge of the sub-pixel unit will be significantly lower than the evaporation thickness in the middle of the sub-pixel unit, which is called "shadow effect".
在此基础上，由于金属材料的掩模板材料的特性，在制作上述掩模板的蒸镀孔的过程中，只有在能量聚集到一定程度时，才能在其上形成蒸镀孔，在此过程中，如图1所示，通常会由于能量的聚集，使得蒸镀孔1012的表面不是完全垂直的，而是会存在夹角的问题，这就进一步加重“阴影效应”的产生。On this basis, due to the characteristics of the mask plate material of the metal material, in the process of making the evaporation hole of the above mask plate, the evaporation hole can only be formed on it when the energy is gathered to a certain extent. , as shown in FIG. 1 , usually due to the accumulation of energy, the surface of the evaporation hole 1012 is not completely vertical, but there is a problem of an included angle, which further aggravates the generation of the "shadow effect".
发明内容Contents of the invention
本发明的实施例提供一种掩模板及其制作方法、掩模组件，可以提高蒸镀的均匀性，从而改善显示效果。Embodiments of the present invention provide a mask plate, a manufacturing method thereof, and a mask component, which can improve the uniformity of evaporation, thereby improving the display effect.
为达到上述目的，本发明的实施例采用如下技术方案：In order to achieve the above object, embodiments of the present invention adopt the following technical solutions:
一方面，提供一种掩模板，包括：第一子掩模板和第二子掩模板；所述第一子掩模板和所述第二子掩模板均包括掩模板本体和设置在所述掩模板本体上的蒸镀孔；所述第一子掩模板和所述第二子掩模板上的所述蒸镀孔尺寸相等且完全重叠；In one aspect, a mask is provided, including: a first sub-mask and a second sub-mask; both the first sub-mask and the second sub-mask include a mask body and a Evaporation holes on the body; the evaporation holes on the first sub-mask and the second sub-mask are equal in size and completely overlap;
其中，所述第一子掩模板和所述第二子掩模板的所述掩模板本体的材料均为具有预定刚性的塑胶材料，且厚度为5～150μm。Wherein, the mask body of the first sub-mask and the second sub-mask are made of plastic material with predetermined rigidity, and the thickness is 5-150 μm.
优选的，所述掩模板本体的材料包括聚酰亚胺、聚碳酸酯、聚醚酰亚胺中的至少一种。Preferably, the material of the mask body includes at least one of polyimide, polycarbonate and polyetherimide.
优选的，所述第一子掩模板和所述第二子掩模板的厚度相等。Preferably, the first sub-mask and the second sub-mask have the same thickness.
进一步优选的，所述第一子掩模板和所述第二子掩模板的厚度为5～20μm。Further preferably, the thickness of the first sub-mask and the second sub-mask is 5-20 μm.
基于上述，优选的，所述第一子掩模板和所述第二子掩模板之间的间距为0～5μm。Based on the above, preferably, the distance between the first sub-mask and the second sub-mask is 0˜5 μm.
另一方面，提供一种掩模组件，包括上述的掩模板、以及用于固定拉平所述掩模板的掩模框。In another aspect, a mask assembly is provided, including the above-mentioned mask plate, and a mask frame for fixing and leveling the mask plate.
优选的，所述掩模框包括位于相对两侧的夹紧部分，所述夹紧部分夹紧所述掩模板的相对两侧边缘。Preferably, the mask frame includes clamping portions on opposite sides, and the clamping portions clamp the edges of the mask plate on opposite sides.
再一方面，提供一种掩模板的制作方法，包括：In another aspect, a method for manufacturing a mask plate is provided, including:
将具有预定刚性的塑胶薄膜作为第一掩模板本体，拉平固定在掩模框上；A plastic film with predetermined rigidity is used as the first mask body, flattened and fixed on the mask frame;
在所述第一掩模板本体的预定区域形成蒸镀孔；forming evaporation holes in predetermined regions of the first mask body;
将所述具有预定刚性的塑胶薄膜作为第二掩模板本体，拉平固定在所述掩模框上，并在与位于所述第一掩模板本体的蒸镀孔相对应的位置，在所述第二掩模板本体上形成所述蒸镀孔；The plastic film with predetermined rigidity is used as the second mask body, flattened and fixed on the mask frame, and at the position corresponding to the evaporation hole located in the first mask body, in the second mask body, Forming the vapor deposition holes on the mask body;
其中，位于所述第一掩模板本体上的所述蒸镀孔与位于所述第二掩模板本体上的所述蒸镀孔完全重叠，且所述第一掩模板本体和所述第二掩模板本体的厚度为5～150μm。Wherein, the evaporation hole on the first mask body completely overlaps the evaporation hole on the second mask body, and the first mask body and the second mask The thickness of the template body is 5-150 μm.
优选的，所述在所述第一掩模板本体的预定区域形成蒸镀孔，包括：通过激光工艺，在所述第一掩模板本体的预定区域形成蒸镀孔；Preferably, the forming the evaporation hole in the predetermined area of the first mask body includes: forming the evaporation hole in the predetermined area of the first mask body by a laser process;
所述在所述第二掩模板本体上形成所述蒸镀孔，包括：通过激光工艺，在所述第二掩模板本体上形成所述蒸镀孔。The forming the evaporation hole on the second mask body includes: forming the evaporation hole on the second mask body by a laser process.
进一步优选的，所述第一掩模板本体和所述第二掩模板本体的材料包括聚酰亚胺、聚碳酸酯、聚醚酰亚胺中的至少一种。Further preferably, the material of the first mask body and the second mask body includes at least one of polyimide, polycarbonate and polyetherimide.
本发明实施提供了一种掩模板及其制作方法、掩模组件，该掩模板包括第一子掩模板和第二子掩模板；所述第一子掩模板和所述第二子掩模板均包括掩模板本体和设置在所述掩模板本体上的蒸镀孔；所述第一子掩模板和所述第二子掩模板上的所述蒸镀孔尺寸相等且完全重叠；其中，所述第一子掩模板和所述第二子掩模板的所述掩模板本体的材料均为具有预定刚性的塑胶材料，且厚度为5～150μm。The implementation of the present invention provides a mask, its manufacturing method, and a mask assembly. The mask includes a first sub-mask and a second sub-mask; the first sub-mask and the second sub-mask Both include a mask body and evaporation holes provided on the mask body; the evaporation holes on the first sub-mask and the second sub-mask are equal in size and completely overlap; wherein, the The mask bodies of the first sub-mask and the second sub-mask are made of plastic material with predetermined rigidity, and the thickness is 5-150 μm.
一方面，通过将掩模板本体的材料选定为具有一定刚性的塑胶材料，并合理设置掩模板本体的厚度，相对现有技术中金属材料的掩模板，可以改善形成所述蒸镀孔时，由于能量的聚集而产生的夹角以及掩模板厚度的问题而产生的“阴影效应”；另一方面，通过设置两个子掩模板并将两个子掩模板的蒸镀孔的尺寸设置为相等且完全重叠，可以使远离蒸镀基板的一个子掩模板例如第一子掩模板来保证仅能使较大倾斜角(例如接近垂直角度)入射的蒸镀材料进入并通过第二子掩模板的蒸镀孔，在此过程中由于避免了其余小角度倾斜角入射的蒸镀材料对蒸镀均匀性的影响，从而可以提高蒸镀的均匀性，进而改善了显示效果。On the one hand, by selecting the material of the mask body as a plastic material with a certain rigidity, and reasonably setting the thickness of the mask body, compared with the metal material mask in the prior art, the formation of the evaporation hole can be improved. The "shadow effect" caused by the angle caused by energy accumulation and the thickness of the mask; on the other hand, by setting two sub-masks and setting the size of the evaporation holes of the two sub-masks to be equal and Overlap, a sub-mask far away from the evaporation substrate, such as the first sub-mask, can ensure that only the evaporation material incident at a relatively large oblique angle (for example, close to the vertical angle) can enter and pass through the evaporation of the second sub-mask During this process, the influence of the other vapor deposition materials incident on the vapor deposition uniformity at small oblique angles is avoided, so that the vapor deposition uniformity can be improved, thereby improving the display effect.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1为现有技术提供的掩模板的蒸镀孔的示意图；FIG. 1 is a schematic diagram of an evaporation hole of a mask plate provided by the prior art;
图2为本发明实施例提供的一种掩模板的结构示意图一；FIG. 2 is a first structural schematic diagram of a mask plate provided by an embodiment of the present invention;
图3为本发明实施例提供的一种掩模板的结构示意图二；FIG. 3 is a second structural schematic diagram of a mask plate provided by an embodiment of the present invention;
图4为本发明实施例提供的一种掩模组件的结构示意图；FIG. 4 is a schematic structural diagram of a mask assembly provided by an embodiment of the present invention;
图5为本发明实施例提供的制作掩模板的流程示意图。FIG. 5 is a schematic flow chart of manufacturing a mask provided by an embodiment of the present invention.
附图标记：Reference signs:
10-掩模板；101-第一子掩模板；102-第二子掩模板；1011-第一掩模板本体；1012-蒸镀孔；1021-第二掩模板本体；201-掩模框的夹紧部分。10-mask plate; 101-first sub-mask plate; 102-second sub-mask plate; 1011-first mask plate body; 1012-evaporation hole; 1021-second mask plate body; 201-mask frame clip tight part.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
本发明实施例提供了一种掩模板10，如图2和图3所示，该掩模板10包括：第一子掩模板101和第二子掩模板102；所述第一子掩模板101和所述第二子掩模板102均包括掩模板本体和设置在所述掩模板本体上的蒸镀孔1012；所述第一子掩模板101和所述第二子掩模板102上的所述蒸镀孔1012尺寸相等且完全重叠。An embodiment of the present invention provides a mask 10, as shown in FIG. 2 and FIG. 3, the mask 10 includes: a first sub-mask 101 and a second sub-mask 102; the first sub-mask 101 and Each of the second sub-masks 102 includes a mask body and evaporation holes 1012 disposed on the mask body; the evaporation holes 1012 on the first sub-mask 101 and the second sub-mask 102 The plated holes 1012 are equal in size and fully overlapping.
其中，所述第一子掩模板101和所述第二子掩模板102的所述掩模板本体的材料均为具有预定刚性的塑胶材料，且厚度为5～150μm。Wherein, the material of the mask body of the first sub-mask 101 and the second sub-mask 102 is a plastic material with predetermined rigidity, and the thickness is 5-150 μm.
这里，可将所述第一子掩模板101的掩模板本体称为第一掩模板本体1011，将所述第二子掩模板102的掩模板本体称为第二掩模板本体1021。Here, the reticle body of the first sub-mask 101 may be referred to as the first reticle body 1011 , and the reticle body of the second sub-mask 102 may be referred to as the second reticle body 1021 .
需要说明的是，第一，位于所述第一子掩模板101的所述蒸镀孔1012和位于所述第二子掩模板102的所述蒸镀孔1012一一对应。It should be noted that, firstly, the evaporation holes 1012 on the first sub-mask 101 correspond to the evaporation holes 1012 on the second sub-mask 102 one by one.
第二，本发明实施例中，所述第一掩模板本体1011和所述第二掩模板本体1021的材料为，不宜在进行有机材料蒸镀时，使该掩模板10产生形变的塑胶材料，即：具有低热膨胀系数且具有一定刚性的材料。Second, in the embodiment of the present invention, the material of the first mask body 1011 and the second mask body 1021 is a plastic material that is not suitable for deforming the mask 10 during evaporation of organic materials. That is: a material with a low coefficient of thermal expansion and a certain degree of rigidity.
第三，不对所述第一子掩模板101和所述第二子掩模板102之间的间距(可以直接接触，也可以具有一定的间距)进行限定，以能使通过所述蒸镀孔1012蒸镀到基板上的有机材料层均匀为准。Third, there is no limitation on the distance between the first sub-mask 101 and the second sub-mask 102 (they can be in direct contact or have a certain distance), so that the evaporation holes 1012 can pass through The organic material layer evaporated onto the substrate is uniform.
第四，本发明所有实施例的附图均示意性的绘示出与发明点有关的图案层，对于与发明点无关的图案层不进行绘示或仅绘示出部分。Fourth, the drawings of all the embodiments of the present invention schematically show the pattern layers related to the invention points, and do not draw or only partially show the pattern layers not related to the invention points.
本发明实施例提供了一种掩模板10，包括：第一子掩模板101和第二子掩模板102；所述第一子掩模板101和所述第二子掩模板102均包括掩模板本体和设置在所述掩模板本体上的蒸镀孔1012；所述第一子掩模板101和所述第二子掩模板102上的所述蒸镀孔1012尺寸相等且完全重叠。其中，所述第一子掩模板101和所述第二子掩模板102的所述掩模板本体的材料均为具有预定刚性的塑胶材料，且厚度为5～150μm。An embodiment of the present invention provides a mask 10, including: a first sub-mask 101 and a second sub-mask 102; both the first sub-mask 101 and the second sub-mask 102 include a mask body and the vapor deposition holes 1012 disposed on the mask body; the vapor deposition holes 1012 on the first sub-mask 101 and the second sub-mask 102 are equal in size and overlap completely. Wherein, the material of the mask body of the first sub-mask 101 and the second sub-mask 102 is a plastic material with predetermined rigidity, and the thickness is 5-150 μm.
一方面，通过将掩模板本体的材料选定为具有一定刚性的塑胶材料，并合理设置掩模板本体的厚度，相对现有技术中金属材料的掩模板，可以避免形成所述蒸镀孔1012时，由于能量的聚集而产生的夹角的问题，从而改善上述的“阴影效应”；另一方面，通过设置两个子掩模板并将两个子掩模板的蒸镀孔1012的尺寸设置为相等且完全重叠，可以使远离蒸镀基板的一个子掩模板例如第一子掩模板101来保证仅能使较大倾斜角(例如接近垂直角度)入射的蒸镀材料进入并通过第二子掩模板102的蒸镀孔1012，在此过程中由于避免了其余小角度倾斜角入射的蒸镀材料对蒸镀均匀性的影响，从而可以提高蒸镀的均匀性，进而改善了显示效果。On the one hand, by selecting the material of the mask body as a plastic material with a certain rigidity, and reasonably setting the thickness of the mask body, compared with the metal material mask in the prior art, it is possible to avoid the formation of the evaporation hole 1012. , the problem of the included angle due to energy accumulation, thereby improving the above-mentioned "shadow effect"; Overlap, a sub-mask far away from the evaporation substrate, such as the first sub-mask 101, can be used to ensure that only the evaporation material incident at a relatively large oblique angle (for example, close to a vertical angle) can enter and pass through the second sub-mask 102. The vapor deposition hole 1012 avoids the influence of other vapor deposition materials incident on the vapor deposition uniformity at a small oblique angle during this process, so that the vapor deposition uniformity can be improved, thereby improving the display effect.
优选的，所述第一掩模板本体1011和所述第二掩模板本体1021的材料包括聚酰亚胺、聚碳酸酯、聚醚酰亚胺中的至少一种。Preferably, the material of the first mask body 1011 and the second mask body 1021 includes at least one of polyimide, polycarbonate and polyetherimide.
其中，聚酰亚胺具有热膨胀系数低(可在2×10-5～3×10-5/℃之间)、耐高温(可达400℃)，并且其具有优良的机械性能、高刚性等特性。Among them, polyimide has low thermal expansion coefficient (can be between 2×10-5 ~ 3×10-5 /°C), high temperature resistance (up to 400°C), and it has excellent mechanical properties, high rigidity, etc. characteristic.
聚碳酸酯的具有热膨胀系数低(3.8×10-5/℃),135℃的热变形温度，高强度，高刚性等特性。Polycarbonate has the characteristics of low thermal expansion coefficient (3.8×10-5 /℃), heat distortion temperature of 135℃, high strength and high rigidity.
聚醚酰亚胺具有热膨胀系数低(5.6×10-5/℃)，200℃的热变形温度，高强度，高刚性等特性。Polyetherimide has the characteristics of low thermal expansion coefficient (5.6×10-5 /°C), heat distortion temperature of 200°C, high strength and high rigidity.
由于蒸镀过程中温度一般不会超过60℃度，因此，上述材料均可满足蒸镀过程中，对所述掩模板10不宜变形的需求。Since the temperature during the evaporation process generally does not exceed 60° C., the above-mentioned materials can meet the requirement that the mask plate 10 should not be deformed during the evaporation process.
优选的，如图3所示，所述第一子掩模板101和所述第二子掩模板102的厚度相等。Preferably, as shown in FIG. 3 , the thicknesses of the first sub-mask 101 and the second sub-mask 102 are equal.
这样，可以通过相同的工艺条件，以相同的方法在所述第一掩模板本体1011和所述第二掩模板本体1021的相同位置形成所述蒸镀孔1012，从而形成相同的两块第一子掩模板101和第二子掩模板102，使得制作过程更为简化。In this way, the vapor deposition holes 1012 can be formed at the same position of the first mask body 1011 and the second mask body 1021 by the same process conditions, so as to form the same two first The sub-mask 101 and the second sub-mask 102 simplify the manufacturing process.
进一步优选的，所述第一子掩模板101和所述第二子掩模板102的厚度为5～20μm。Further preferably, the thickness of the first sub-mask 101 and the second sub-mask 102 is 5-20 μm.
金属材料的掩模板目前能做到70μm的厚度，而本发明实施例采用具有一定刚性的塑胶材料作为掩模板时，可以将其厚度设定为5～20μm，这可以大大减小由于掩模板的厚度而导致的“阴影效应”，从而可以进一步提高蒸镀的均匀性。At present, the mask plate of metal material can achieve a thickness of 70 μm, and when a plastic material with a certain rigidity is used as the mask plate in the embodiment of the present invention, its thickness can be set to 5-20 μm, which can greatly reduce the thickness of the mask plate The "shadow effect" caused by the thickness can further improve the uniformity of evaporation.
基于上述，由于塑胶材料的所述第一子掩模板101和第二子掩模板102的表面比较粗糙，所述第一子掩模板101和第二子掩模板102不容易无间隙的完全贴合在一起，因此，本发明实施例优选为，所述第一子掩模板101和所述第二子掩模板102之间具有间距，且所述间距优选为0～5μm。Based on the above, since the surfaces of the first sub-mask 101 and the second sub-mask 102 made of plastic materials are relatively rough, it is not easy for the first sub-mask 101 and the second sub-mask 102 to fit together without gaps. Together, therefore, in this embodiment of the present invention, preferably, there is a distance between the first sub-mask 101 and the second sub-mask 102 , and the distance is preferably 0˜5 μm.
这样，既可以避免由于第一子掩模板101和第二子掩模板102的表面比较粗糙而不能完全贴合的问题，也可以避免由于该间距太大而使部分进入第一子掩模板101的蒸镀孔1012的蒸镀材料无法到达第二子掩模板101，从而造成蒸镀材料的浪费。In this way, it is possible to avoid the problem that the surface of the first sub-mask 101 and the second sub-mask 102 cannot be completely bonded due to the roughness of the surface, and it is also possible to avoid the problem that part of the first sub-mask 101 enters the first sub-mask 101 because the distance is too large. The vapor deposition material in the vapor deposition hole 1012 cannot reach the second sub-mask 101 , thus causing waste of the vapor deposition material.
本发明实施例还提供了一种掩模组件，该掩模组件包括上述的掩模板10、以及用于固定拉平所述掩模板的掩模框。An embodiment of the present invention also provides a mask assembly, which includes the above-mentioned mask plate 10 and a mask frame for fixing and leveling the mask plate.
需要说明的是，第一，此处不对所述掩模框的具体形状进行限定，以能将所述掩模板10的第一子掩模板101和第二子掩模板102固定并拉平，且在使用过程中不使位于所述第一子掩模板101上的所述蒸镀孔1012和位于所述第二子掩模板102上的所述蒸镀孔1012发生相对移动即可。It should be noted that, firstly, the specific shape of the mask frame is not limited here, so that the first sub-mask 101 and the second sub-mask 102 of the mask 10 can be fixed and flattened, and During use, it is sufficient that the vapor deposition holes 1012 on the first sub-mask 101 and the vapor deposition holes 1012 on the second sub-mask 102 do not move relative to each other.
第二，当所述掩模板10的第一子掩模板101和第二子掩模板102之间具有间距的情况下，可以通过所述掩模框的特定结构来使第一子掩模板101和第二子掩模板102之间具有间距，具体根据实际情况进行设定。Second, when there is a distance between the first sub-mask 101 and the second sub-mask 102 of the mask 10, the first sub-mask 101 and the second sub-mask 102 can be made There is a distance between the second sub-masks 102, which is specifically set according to actual conditions.
本发明实施例提供了一种掩模组件，包括上述的掩模板10、以及用于固定拉平所述掩模板的掩模框。一方面，通过将掩模板本体的材料选定为具有一定刚性的塑胶材料，并合理设置掩模板本体的厚度，相对现有技术中金属材料的掩模板，可以避免形成所述蒸镀孔1012时，由于能量的聚集而产生的夹角的问题，从而改善上述的“阴影效应”；另一方面，通过设置两个子掩模板并将两个子掩模板的蒸镀孔1012的尺寸设置为相等且完全重叠，可以使远离蒸镀基板的一个子掩模板例如第一子掩模板101来保证仅能使较大倾斜角(例如接近垂直角度)入射的蒸镀材料进入并通过第二子掩模板102的蒸镀孔1012，在此过程中由于避免了其余小角度倾斜角入射的蒸镀材料对蒸镀均匀性的影响，从而可以提高蒸镀的均匀性，进而改善了显示效果。An embodiment of the present invention provides a mask assembly, including the above-mentioned mask plate 10 and a mask frame for fixing and leveling the mask plate. On the one hand, by selecting the material of the mask body as a plastic material with a certain rigidity, and reasonably setting the thickness of the mask body, compared with the metal material mask in the prior art, it is possible to avoid the formation of the evaporation hole 1012. , the problem of the included angle due to energy accumulation, thereby improving the above-mentioned "shadow effect"; Overlap, a sub-mask far away from the evaporation substrate, such as the first sub-mask 101, can be used to ensure that only the evaporation material incident at a relatively large oblique angle (for example, close to a vertical angle) can enter and pass through the second sub-mask 102. The vapor deposition hole 1012 avoids the influence of other vapor deposition materials incident on the vapor deposition uniformity at a small oblique angle during this process, so that the vapor deposition uniformity can be improved, thereby improving the display effect.
可选的，如图4所示，所述掩模框包括位于相对两侧的夹紧部分201，所述夹紧部分201夹紧所述掩模板10的相对两侧边缘。Optionally, as shown in FIG. 4 , the mask frame includes clamping portions 201 on opposite sides, and the clamping portions 201 clamp the edges of the mask plate 10 on opposite sides.
由于掩模板通常情况下均会被制作成矩形，因此，在本发明实施例中，仅需要通过所述掩模框的位于相对两侧的夹紧部分201便可以拉平固定整个第一子掩模板101和第二子掩模板102，从而使得所述掩模框的制作、以及掩模组件的组装更为简便。Since the mask is usually made into a rectangle, in the embodiment of the present invention, the entire first sub-mask can be flattened and fixed only through the clamping portions 201 on opposite sides of the mask frame 101 and the second sub-mask 102, so that the fabrication of the mask frame and the assembly of the mask components are easier.
本发明实施例还提供了一种掩模板10的制作方法，如图5所示，该方法包括如下步骤：The embodiment of the present invention also provides a method for manufacturing the mask plate 10, as shown in FIG. 5, the method includes the following steps:
S10、将具有预定刚性的塑胶薄膜作为第一掩模板本体1011，拉平固定在掩模框上。S10. Using a plastic film with predetermined rigidity as the first mask body 1011, flatten and fix it on the mask frame.
所述具有预定刚性的塑胶薄膜可以为聚酰亚胺薄膜，或聚碳酸酯薄膜，或聚醚酰亚胺薄膜。The plastic film with predetermined rigidity can be polyimide film, polycarbonate film, or polyetherimide film.
所述掩模框包括位于相对两侧的夹紧部分201，所述夹紧部分201通过夹紧所述第一掩模板本体1011的相对两侧边缘来使所述第一掩模板本体1011拉平固定。The mask frame includes clamping portions 201 on opposite sides, and the clamping portion 201 flattens and fixes the first mask body 1011 by clamping the opposite side edges of the first mask body 1011 .
S11、在所述第一掩模板本体1011的预定区域形成蒸镀孔1012。S11 , forming an evaporation hole 1012 in a predetermined area of the first mask body 1011 .
S12、将具有预定刚性的塑胶薄膜作为第二掩模板本体1021，拉平固定在所述掩模框上，并在与位于所述第一掩模板本体1011的蒸镀孔1012相对应的位置，在所述第二掩模板本体1021上形成所述蒸镀孔1012。S12. Using a plastic film with a predetermined rigidity as the second mask body 1021, flatten and fix it on the mask frame, and at the position corresponding to the vapor deposition hole 1012 located in the first mask body 1011, The evaporation hole 1012 is formed on the second mask body 1021 .
其中，位于所述第一掩模板本体1011上的所述蒸镀孔1012与位于所述第二掩模板本体1021上的所述蒸镀孔1012完全重叠，且所述第一掩模板本体1011和所述第二掩模板本体1021的厚度为5～150μm。Wherein, the evaporation hole 1012 on the first mask body 1011 completely overlaps the evaporation hole 1012 on the second mask body 1021, and the first mask body 1011 and The thickness of the second mask body 1021 is 5-150 μm.
所述第二掩模板本体1021也通过上述的掩模框的夹紧部分201来固定拉平。The second mask body 1021 is also fixed and flattened by the above-mentioned clamping portion 201 of the mask frame.
需要说明的是，第一，不对在所述塑胶材料的掩模板本体上形成蒸镀孔1012的方法进行限定，以能快速且精确的形成所述蒸镀孔1012为准。It should be noted that, firstly, the method for forming the evaporation hole 1012 on the mask body of the plastic material is not limited, as long as the evaporation hole 1012 can be formed quickly and accurately.
第二，此处不对所述第一子掩模板101和所述第二子掩模板102之间的间距(可以直接接触，也可以具有一定的间距)进行限定，以能使通过所述蒸镀孔1012蒸镀到基板上的有机材料层均匀为准。Second, the spacing between the first sub-mask 101 and the second sub-mask 102 is not limited here (it can be in direct contact, or there can be a certain spacing), so that the vapor deposition The hole 1012 is subject to a uniform organic material layer evaporated onto the substrate.
本发明实施例提供了一种掩模板10的制作方法，包括：将具有预定刚性的塑胶薄膜作为第一掩模板本体1011，拉平固定在掩模框上；在所述第一掩模板本体1011的预定区域形成蒸镀孔1012；将所述具有预定刚性的塑胶薄膜作为第二掩模板本体1021，拉平固定在所述掩模框上，并在与位于所述第一掩模板本体1011的蒸镀孔1012相对应的位置，在所述第二掩模板本体1021上形成所述蒸镀孔1012；其中，位于所述第一掩模板本体1011上的所述蒸镀孔1012与位于所述第二掩模板本体1021上的所述蒸镀孔1012完全重叠，且所述第一掩模板本体1011和所述第二掩模板本体1021的厚度为5～150μm。An embodiment of the present invention provides a method for manufacturing a mask 10, comprising: using a plastic film with predetermined rigidity as the first mask body 1011, flattening and fixing it on the mask frame; An evaporation hole 1012 is formed in a predetermined area; the plastic film with predetermined rigidity is used as the second mask body 1021, flattened and fixed on the mask frame, and placed on the evaporation hole 1011 located on the first mask body 1011. At the position corresponding to the hole 1012, the evaporation hole 1012 is formed on the second mask body 1021; wherein, the evaporation hole 1012 located on the first mask body 1011 and the evaporation hole 1012 located on the second mask body The evaporation holes 1012 on the mask body 1021 completely overlap each other, and the thickness of the first mask body 1011 and the second mask body 1021 is 5˜150 μm.
一方面，通过将第一掩模板本体1011和第二掩模板本体1021的材料选定为具有一定刚性的塑胶材料，并合理设置第一掩模板本体1011和第二掩模板本体1021的厚度，相对现有技术中金属材料的掩模板，可以避免形成所述蒸镀孔1012时，由于能量的聚集而产生的夹角的问题，从而改善上述的“阴影效应”；另一方面，通过形成两个子掩模板并将两个子掩模板的蒸镀孔1012的尺寸设定为相等且完全重叠，可以使远离蒸镀基板的一个子掩模板例如第一子掩模板101来保证仅能使较大倾斜角(例如接近垂直角度)入射的蒸镀材料进入并通过第二子掩模板102的蒸镀孔1012，在此过程中由于避免了其余小角度倾斜角入射的蒸镀材料对蒸镀均匀性的影响，从而可以提高蒸镀的均匀性，进而改善了显示效果。On the one hand, by selecting the material of the first mask body 1011 and the second mask body 1021 as a plastic material with a certain rigidity, and setting the thicknesses of the first mask body 1011 and the second mask body 1021 reasonably, relatively The mask plate of metal material in the prior art can avoid the problem of the included angle caused by the accumulation of energy when forming the evaporation hole 1012, thereby improving the above-mentioned "shadow effect"; on the other hand, by forming two sub- The mask plate and the size of the evaporation holes 1012 of the two sub-mask plates are set to be equal and completely overlapped, so that a sub-mask plate far away from the evaporation substrate, such as the first sub-mask plate 101, can be guaranteed to only make a large tilt angle (For example, at an angle close to a vertical angle) the incident evaporation material enters and passes through the evaporation hole 1012 of the second sub-mask 102, and in this process, the impact of the remaining incident evaporation material at a small oblique angle on the evaporation uniformity is avoided. , so that the uniformity of vapor deposition can be improved, thereby improving the display effect.
基于上述，考虑到激光打孔具有速度快、效率高、精确度高等特定，因而，本发明实施例中，优选为，通过激光工艺，在所述第一掩模板本体1011的预定区域形成蒸镀孔1012；通过激光工艺，在所述第二掩模板本体1021上形成所述蒸镀孔1012。Based on the above, considering that laser drilling has the characteristics of fast speed, high efficiency, and high precision, it is preferred in this embodiment of the present invention to form a vapor-deposited hole in a predetermined area of the first mask body 1011 through a laser process. Hole 1012: the vapor deposition hole 1012 is formed on the second mask body 1021 by laser process.
基于上述的描述，本发明实施例通过一具体的实施例来描述通过上述的掩模板10制备OLED显示器的有机发光材料的过程，具体包括：Based on the above description, the embodiment of the present invention describes the process of preparing organic light-emitting materials for OLED displays through the above-mentioned mask plate 10 through a specific embodiment, specifically including:
S101、使所述掩模板10的蒸镀孔1012和OLED显示器的其中一种同色子像素单元例如红色子像素单元对位好，并进行有机发光材料的蒸镀。S101 , align the evaporation hole 1012 of the mask 10 with one of the same-color sub-pixel units of the OLED display, such as the red sub-pixel unit, and perform evaporation of an organic light-emitting material.
其中，所述蒸镀孔1012在掩模板10上的分布需与OLED显示器同色子像素单元的排布相同。Wherein, the distribution of the vapor deposition holes 1012 on the mask 10 needs to be the same as that of the same-color sub-pixel units of the OLED display.
S102、完成S101后，使所述掩模板10相对所述OLED显示器向相邻行移动一个子像素单元的距离，然后进行第二种同色子像素单元例如绿色子像素单元的有机发光材料的蒸镀。S102. After completing S101, move the mask plate 10 relative to the OLED display to an adjacent row by a distance of one sub-pixel unit, and then perform evaporation of an organic light-emitting material of a second sub-pixel unit of the same color, such as a green sub-pixel unit. .
S103、完成S102后，使所述掩模板10相对所述OLED显示器沿同一方向向相邻行移动一个子像素单元的距离，然后进行第三种同色子像素单元例如蓝色子像素单元的有机发光材料的蒸镀。S103. After completing S102, move the mask plate 10 relative to the OLED display to the adjacent row in the same direction for a distance of one sub-pixel unit, and then perform organic light emission of a third sub-pixel unit of the same color, such as a blue sub-pixel unit. Evaporation of materials.
当然，上述步骤S101-S103只体现了制备各子像素单元的有机发光材料的过程，对于有源矩阵型OLED显示器来说，在步骤S101之前还需形成薄膜晶体管，阳极，在S103之后还需形成阴极等，在此不再进行赘述。Of course, the above steps S101-S103 only reflect the process of preparing the organic luminescent material of each sub-pixel unit. For the active matrix OLED display, the thin film transistor and the anode need to be formed before step S101, and the anode needs to be formed after S103. The cathode, etc., will not be described in detail here.
以上所述，仅为本发明的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本发明的保护范围之内。因此，本发明的保护范围应以所述权利要求的保护范围为准。The above is only a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Anyone skilled in the art can easily think of changes or substitutions within the technical scope disclosed in the present invention. Should be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention should be determined by the protection scope of the claims.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410191585.XACN103966548B (en) | 2014-05-07 | 2014-05-07 | Mask plate, manufacturing method of mask plate and mask assembly with mask plate |
| PCT/CN2014/093819WO2015169087A1 (en) | 2014-05-07 | 2014-12-15 | Mask plate, manufacturing method therefor and mask assembly |
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410191585.XACN103966548B (en) | 2014-05-07 | 2014-05-07 | Mask plate, manufacturing method of mask plate and mask assembly with mask plate |
| Publication Number | Publication Date |
|---|---|
| CN103966548Atrue CN103966548A (en) | 2014-08-06 |
| CN103966548B CN103966548B (en) | 2015-07-01 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410191585.XAExpired - Fee RelatedCN103966548B (en) | 2014-05-07 | 2014-05-07 | Mask plate, manufacturing method of mask plate and mask assembly with mask plate |
| Country | Link |
|---|---|
| CN (1) | CN103966548B (en) |
| WO (1) | WO2015169087A1 (en) |
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| CN108277455A (en)* | 2018-04-25 | 2018-07-13 | 京东方科技集团股份有限公司 | Mask plate component and preparation method thereof |
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