技术领域technical field
本发明涉及一种类金刚石膜涂层设备。The invention relates to a diamond-like film coating device.
背景技术Background technique
类金刚石膜涂层(Diamond-like Carbon)简称DLC涂层。类金刚石（DLC）薄膜是一种含有一定量金刚石键（sp2和sp3）的非晶碳的亚稳类的薄膜。薄膜的主要成分是碳，因为碳能以三种不同的杂化方式sp3、sp2和sp1存在,所以碳可以形成不同晶体的和无序的结构。这也使得对碳基薄膜的研究变得复杂化。在sp3杂化结构中，一个碳原子的四个价电子被分配到具有四面体结构的定向的sp3轨道中，碳原子与相邻的原子形成很强的♂键，这种键合方式我们通常也称之为金刚石键。在sp2杂化结构中，碳的四个价电子中的三个进入三角形的定向的sp2轨道中，并在一个平面上形成♂键，第四个电子位于同♂键一个平面的pπ轨道。π轨道同一个或多个相邻的原子形成弱的π键。而在sp1结构中，四个价电子中的两个进入π轨道后各自在沿着x轴的方向上形成♂键，而另外两个价电子则进入y轴和z轴的pπ轨道形成π键。DLC碳膜可以被掺杂不同的元素得到掺杂的DLC(N-DLC)薄膜。它们中的C都是以sp3、sp2和sp1的键合方式而存在，因而有诸多与金刚石膜相似的性能。Diamond-like Carbon coating (Diamond-like Carbon) referred to as DLC coating. Diamond-like carbon (DLC) films are metastable films of amorphous carbon containing a certain amount of diamond bonds (sp2 and sp3). The main component of the film is carbon, because carbon can exist in three different hybridization modes sp3, sp2 and sp1, so carbon can form different crystalline and disordered structures. This also complicates research on carbon-based thin films. In the sp3 hybrid structure, the four valence electrons of a carbon atom are assigned to the oriented sp3 orbital with a tetrahedral structure, and the carbon atom forms a strong ♂ bond with the adjacent atom, which we usually use Also known as a diamond bond. In the sp2 hybrid structure, three of the four valence electrons of carbon enter the triangular oriented sp2 orbital and form a ♂ bond on one plane, and the fourth electron is located in the pπ orbital on the same plane as the ♂ bond. π orbitals form weak π bonds with one or more adjacent atoms. In the sp1 structure, two of the four valence electrons enter the π orbitals to form ♂ bonds in the direction along the x-axis, while the other two valence electrons enter the pπ orbitals of the y-axis and z-axis to form π bonds. . The DLC carbon film can be doped with different elements to obtain a doped DLC (N-DLC) film. The C in them exists in the bonding mode of sp3, sp2 and sp1, so they have many properties similar to diamond films.
类金刚石(DLC)膜具有许多与金刚石相似或相近的优良性能，如硬度高、弹性模量高、摩擦系数低、生物相溶性好、声学性能好、电学性能佳等。DLC薄膜发展到今天，已经为越来越多的研究者和工业界所熟知和关注，在工业各领域都有极大的应用前景。目前DLC薄膜已经在航空航天、精密机械、微电子机械装置、磁盘存储器、汽车零部件、光学器材和生物医学等多个领域有广泛的应用，是具有重要应用前景的高性能的无机非金属薄膜材料。Diamond-like carbon (DLC) film has many excellent properties similar to or similar to diamond, such as high hardness, high elastic modulus, low friction coefficient, good biocompatibility, good acoustic performance, good electrical performance, etc. DLC thin films have been developed to this day, and have been known and paid attention to by more and more researchers and industrial circles, and have great application prospects in various fields of industry. At present, DLC films have been widely used in many fields such as aerospace, precision machinery, microelectronic mechanical devices, disk storage, auto parts, optical equipment and biomedicine, and are high-performance inorganic non-metallic films with important application prospects. Material.
美国已经将类金刚石薄膜材料作为21世纪的战略材料之一。目前类金刚石膜的研究、开发、制备及应用正向深度和广度推进。类金刚石制备的方法很多：如离子束辅助沉积、磁控溅射、真空阴极电弧沉积、等离子体增强化学气相沉积、离子注入法等。但不同的制备方法，DLC 膜的成分、结构和性能有很大的差别。要实现大批量、大面积、质优的DLC 膜的应用，还存在不少问题。如：目前大多数沉积设备或装置都属于实验室使用原理型的设备，制备成本高、单炉次产量小、不能连续生产。不能作工业企业大批量生产，实现产业化的设备。The United States has regarded diamond-like thin film materials as one of the strategic materials in the 21st century. At present, the research, development, preparation and application of diamond-like films are advancing in depth and breadth. There are many methods for preparing diamond-like carbon: such as ion beam-assisted deposition, magnetron sputtering, vacuum cathodic arc deposition, plasma-enhanced chemical vapor deposition, ion implantation, etc. However, with different preparation methods, the composition, structure and performance of DLC membranes are quite different. There are still many problems in order to realize the application of large-volume, large-area, and high-quality DLC films. For example, at present, most of the deposition equipment or devices belong to the principle-based equipment used in the laboratory, with high preparation costs, small output per furnace, and continuous production. It cannot be used as equipment for mass production and industrialization by industrial enterprises.
目前传统设备或者装置制备的涂层质量不稳定，涂层附着力差，膜层厚度极其微薄（1μm左右）等。不能满足实际应用特别是在高运动付，高频率摩擦的狭窄工件表面涂层DLC的质量要求。At present, the coating quality prepared by traditional equipment or devices is unstable, the coating adhesion is poor, and the film thickness is extremely thin (about 1 μm). It cannot meet the quality requirements of DLC for practical applications, especially in high-movement, high-frequency friction narrow workpiece surface coatings.
发明内容Contents of the invention
本发明是为了克服现有技术的不足，提供一种可规模化生产、实现产业化而且可实现高附着力、高硬度、低摩擦系数的类金刚石膜的涂层设备。The purpose of the present invention is to overcome the deficiencies of the prior art, and provide a coating device capable of large-scale production and industrialization, and capable of realizing a diamond-like film with high adhesion, high hardness and low coefficient of friction.
本发明是通过以下技术方案予以实现的：The present invention is achieved through the following technical solutions:
一种高附着力高硬度低摩擦系数类金刚石膜的涂层设备，它包括涂层室、行星旋转工件架、磁过滤弧源、分子泵、真空系统，所述涂层室为立式圆柱形，整体双层水冷式结构，所述涂层室前部设有进料门，所述涂层室的顶部设有管状加热器、热电偶接口，所述涂层室的底部设有进气口和行星旋转工件架，所述行星旋转工件架底部连接有驱动系统，所述涂层室的侧壁安装有磁过滤弧源，所述涂层室的后部安装有分子泵和真空系统。A coating device for a diamond-like carbon film with high adhesion, high hardness and low friction coefficient, which includes a coating chamber, a planetary rotating workpiece holder, a magnetic filter arc source, a molecular pump, and a vacuum system. The coating chamber is a vertical cylinder , the overall double-layer water-cooled structure, the front of the coating chamber is provided with a feed door, the top of the coating chamber is provided with a tubular heater and a thermocouple interface, and the bottom of the coating chamber is provided with an air inlet and a planetary rotary workpiece frame, a drive system is connected to the bottom of the planetary rotary workpiece frame, a magnetic filter arc source is installed on the side wall of the coating chamber, and a molecular pump and a vacuum system are installed at the rear of the coating chamber.
进一步的，所述磁过滤弧源由引弧电极、阴极支架、靶材、推弧电磁线圈、聚焦电磁线圈、弯头组成，所述靶材安装在阴极支架上，所述引弧电极和所述阴极支架外接引弧电源，所述推弧电磁线圈和所述聚焦电磁线圈安装在所述引弧电极和阴极支架产生电弧处的外围。Further, the magnetic filtered arc source is composed of an arc starting electrode, a cathode bracket, a target, an arc pushing electromagnetic coil, a focusing electromagnetic coil, and an elbow. The target is installed on the cathode bracket, and the arc starting electrode and the The cathode support is externally connected to an arc-starting power supply, and the arc-pushing electromagnetic coil and the focusing electromagnetic coil are installed on the periphery of the place where the arc-starting electrode and the cathode support generate an arc.
进一步的，所述弯头为锥度2°弯曲弧度为100°的锥度弯头，所述锥度弯头的外表面安装有多个弯曲弧电磁线圈，在锥度弯头内形成强度为0～20 mT的弯曲磁场。Further, the elbow is a tapered elbow with a taper of 2° and a curved arc of 100°. The outer surface of the tapered elbow is equipped with a plurality of bending arc electromagnetic coils, forming a strength of 0-20 mT in the tapered elbow. bending magnetic field.
本发明的工作原理：磁过滤弧源内的引弧电极和阴极支架外接引弧电源，聚焦电磁线圈产生的推动力将电弧推向前方，适当调节推弧电磁线圈和聚焦电磁线圈的线圈电流，还可以控制阴极斑点在阴极表面运动的范围，使阴极进行均匀刻蚀，得到一个稳定燃烧的冷等离子体电弧。锥度弯头为等离子体通过的管道，弯曲弧电磁线圈可以产生强度为0～20 mT的弯曲磁场，起到弯曲电弧过滤中性粒子等宏观粒子团的作用。最后，阴极材料离子通过锥度弯头出口进入涂层室。在涂层室内，根据工艺要求设置好加热温度、真空度，再充入N、C、H、O2、CH4等气体，磁过滤后的离子在工件表面进行镀膜。The working principle of the present invention: the arc starting electrode and the cathode bracket in the magnetic filter arc source are externally connected to the arc starting power supply, the driving force generated by the focusing electromagnetic coil pushes the arc forward, and the coil current of the arc pushing electromagnetic coil and the focusing electromagnetic coil is properly adjusted, and the The movement range of the cathode spot on the cathode surface can be controlled, so that the cathode can be etched uniformly, and a stable burning cold plasma arc can be obtained. The tapered elbow is the pipe through which the plasma passes, and the bending arc electromagnetic coil can generate a bending magnetic field with a strength of 0-20 mT, which plays the role of bending the arc to filter macroscopic particle clusters such as neutral particles. Finally, the cathode material ions enter the coating chamber through the outlet of the tapered elbow. In the coating chamber, set the heating temperature and vacuum degree according to the process requirements, and then fill in N, C, H, O2 , CH4 and other gases, and the magnetically filtered ions are coated on the surface of the workpiece.
本发明具有以下技术效果：The present invention has the following technical effects:
（1）本发明采用磁过滤功能与高真空多弧靶另加强大的离子源组合涂层法，多束弧源使其多方位触发电极和石墨阴极之间产生真空电弧放电，激发出高离化率的碳等离子体，采用磁过滤线圈过滤掉弧源产生的大颗粒和中性原子，可使到达衬底的几乎全部是碳离子，用较高的沉积速率制备出高质量，致密的无氢膜。(1) The present invention adopts the combined coating method of magnetic filtering function and high-vacuum multi-arc target plus a powerful ion source. The multi-beam arc source causes vacuum arc discharge to be generated between the multi-directional trigger electrode and the graphite cathode, and excites high ion The high-efficiency carbon plasma uses a magnetic filter coil to filter out the large particles and neutral atoms generated by the arc source, so that almost all of the carbon ions reaching the substrate are carbon ions, and a high-quality, dense, non-conductive plasma is prepared at a high deposition rate. hydrogen film.
（2）本发明设置多个磁过滤弧源用于沉积DLC涂层，多个磁过滤弧源分列均布于真空室侧壁及大门，各靶位具有互换性，方便功能扩展及沉积工艺调整；本设备真空系统配置分子泵为主抽泵，避免真空泵油在镀膜过程中的污染现象；本发明采用PLC+工控机手、自动一体的控制方式，人机界面触摸屏操作模式。(2) The present invention sets multiple magnetic filter arc sources for depositing DLC coatings, and multiple magnetic filter arc sources are evenly distributed on the side wall and the gate of the vacuum chamber. Each target position is interchangeable, which is convenient for function expansion and deposition Process adjustment; the vacuum system of this equipment is equipped with a molecular pump as the main pump to avoid the pollution of the vacuum pump oil during the coating process; the present invention adopts the control mode of PLC + industrial control machine, automatic integration, and the operation mode of the man-machine interface touch screen.
（3）本发明的特点是采用锥度弯头（锥2°弯100°）可以克服靶材引出的直角阻力，可以充分发挥引弧的吸力和推弧的作用，将靶材顺利的引入涂层室沉积在工件上。本发明的靶材利用率达到60%以上。(3) The feature of the present invention is that the taper elbow (cone 2° bend 100°) can overcome the right-angle resistance of the target lead out, and can fully exert the suction of arc striking and the function of arc pushing, and smoothly introduce the target into the coating Chambers are deposited on the workpiece. The target utilization rate of the present invention reaches more than 60%.
本发明涂层设备生产质量稳定可靠、可应用于大批量生产，有利于降低生产成本，实现产业化。The production quality of the coating equipment of the invention is stable and reliable, can be applied to mass production, and is conducive to reducing production costs and realizing industrialization.
附图说明Description of drawings
图1为本发明的俯视图。Figure 1 is a top view of the present invention.
图2为本发明的左视图。Fig. 2 is a left view of the present invention.
图3为磁过滤弧源的结构示意图。Fig. 3 is a structural schematic diagram of a magnetic filtered arc source.
图4为采用本发明设备制备的类金刚石膜涂层的表面形貌图。Fig. 4 is a surface topography diagram of a diamond-like carbon film coating prepared by the device of the present invention.
图5为采用本发明设备制备的类金刚石膜涂层的拉曼光谱图。Fig. 5 is a Raman spectrogram of a diamond-like carbon film coating prepared by the device of the present invention.
图6为采用本发明设备制备的类金刚石膜涂层的摩擦系数检测图。Fig. 6 is a diagram showing the detection of the friction coefficient of the diamond-like film coating prepared by the equipment of the present invention.
图7为采用本发明设备制备的类金刚石膜涂层的截面形貌图。Fig. 7 is a cross-sectional morphology diagram of a diamond-like carbon film coating prepared by the device of the present invention.
附图中：1—磁过滤弧源，2—涂层室，3—真空系统，4—机架，5—分子泵，6—行星旋转工件架，7—进料门，8—热电偶接口，9—管状加热器，10—驱动系统，11—进气口，12—阴极支架，13—引弧电极，14—推弧电磁线圈，15—靶材，16—弯头，17—弯曲弧电磁线圈，18—聚焦电磁线圈。In the attached drawings: 1—magnetic filter arc source, 2—coating chamber, 3—vacuum system, 4—frame, 5—molecular pump, 6—planetary rotating workpiece rack, 7—feeding door, 8—thermocouple interface . Electromagnetic coil, 18—focusing electromagnetic coil.
具体实施方式Detailed ways
下面结合附图，对本发明进一步详细阐述。Below in conjunction with accompanying drawing, the present invention is described in further detail.
如图1、图2所示，一种高附着力高硬度低摩擦系数类金刚石膜的涂层设备，包括涂层室2、行星旋转工件架6、磁过滤弧源1、分子泵5、机架4。As shown in Figure 1 and Figure 2, a coating equipment for diamond-like carbon film with high adhesion, high hardness and low friction coefficient includes a coating chamber 2, a planetary rotating workpiece holder 6, a magnetic filter arc source 1, a molecular pump 5, and a machine. rack 4.
涂层室2固定安装在机架4上，涂层室2采用立式圆柱形结构Ф900×900mm，不锈钢材质，整体双层水冷式结构，前开门结构，便于更换样品、靶材15及日常维护。真空室整体焊接后进行热处理消除焊接应力防止焊后变形。涂层室2前部开有进料门7和观察窗，涂层室2的顶部设有管状加热器9、热电偶接口8、充气阀及预留CF35法兰接口。所述涂层室2的后部安装有分子泵5和真空系统3。The coating chamber 2 is fixedly installed on the frame 4. The coating chamber 2 adopts a vertical cylindrical structure Ф900×900mm, made of stainless steel, an overall double-layer water-cooled structure, and a front-opening door structure, which is convenient for changing samples, targets 15 and daily maintenance. . After the overall welding of the vacuum chamber, heat treatment is carried out to eliminate welding stress and prevent post-welding deformation. The front part of the coating chamber 2 is provided with a feed door 7 and an observation window, and the top of the coating chamber 2 is provided with a tubular heater 9, a thermocouple interface 8, an inflation valve and a reserved CF35 flange interface. A molecular pump 5 and a vacuum system 3 are installed at the rear of the coating chamber 2 .
涂层室2的底部设有进气口11和行星旋转工件架6，所述行星旋转工件架6底部连接有驱动系统10，所述行星旋转工件架6是由直流电机将旋转动力传递给行星齿轮机构（行星齿轮机构由太阳齿轮、行星齿轮和内齿轮组成），驱动与行星齿轮连接的工件挂架作自转，同时又驱动与内齿轮连接的大圆盘作公转，从而实现工件在沉积过程中“自转”和“公转”保证工件全方位，均匀的沉积DLC膜层。行星旋转工件架6是专为大批量、产业化生产设计的，工位多，基片装载范围大，旋转速度为0～20RPM可调，装载量：以φ130件计算，可装2000件/炉。The bottom of the coating chamber 2 is provided with an air inlet 11 and a planetary rotary workpiece frame 6, and the bottom of the planetary rotary workpiece frame 6 is connected with a drive system 10, and the planetary rotary workpiece frame 6 transmits the rotational power to the planet by a DC motor. The gear mechanism (the planetary gear mechanism is composed of sun gear, planetary gear and internal gear), drives the workpiece hanger connected to the planetary gear to rotate, and at the same time drives the large disc connected to the internal gear to revolve, so as to realize the workpiece in the deposition process. The middle "rotation" and "revolution" ensure that the workpiece can deposit DLC film layer uniformly in all directions. The planetary rotary workpiece holder 6 is specially designed for mass production and industrialized production. It has many stations and a large substrate loading range. The rotation speed is adjustable from 0 to 20RPM. .
涂层室2的侧壁安装有多个磁过滤弧源1，如图3所示，所述磁过滤弧源1由引弧电极13、阴极支架12、靶材15、推弧电磁线圈14、聚焦电磁线圈18、弯头16组成。所述靶材15安装在阴极支架12上，所述引弧电极13和所述阴极支架12外接引弧电源，该引弧电源具有能够识别电弧的燃烧或熄灭状态环节，根据需要而发出引弧脉冲，进行启动时的自动引弧和熄弧后自动再引弧。所述推弧电磁线圈14和所述聚焦电磁线圈18安装在所述引弧电极13和阴极支架12产生电弧处的外围。推弧电磁线圈14可以使电弧引燃后迅速过渡到阴极的表面，也可以防止电弧引燃后向水冷阴极支架12根部燃烧。聚焦电磁线圈18产生的推动力将电弧推向前方，适当调节推弧电磁线圈14和聚焦电磁线圈18的线圈电流，还可以控制阴极斑点在阴极表面运动的范围，使阴极进行均匀刻蚀，得到一个稳定燃烧的冷等离子体电弧。两线圈均可产生0～40 mT的电磁场。The side wall of the coating chamber 2 is equipped with a plurality of magnetic filtering arc sources 1, as shown in Figure 3, the magnetic filtering arc source 1 is composed of an arc starting electrode 13, a cathode support 12, a target material 15, an arc pushing electromagnetic coil 14, The focusing electromagnetic coil 18 and the elbow 16 are composed. The target 15 is installed on the cathode support 12, the arc starting electrode 13 and the cathode support 12 are externally connected to the arc starting power supply, the arc starting power supply has a link that can identify the burning or extinguishing state of the arc, and emits the arc starting according to the need Pulse, automatic arc ignition at startup and automatic arc restart after arc extinguishment. The arc pushing electromagnetic coil 14 and the focusing electromagnetic coil 18 are installed on the periphery of the place where the arc starting electrode 13 and the cathode support 12 generate an arc. The arc pushing electromagnetic coil 14 can make the arc transition to the surface of the cathode quickly after ignition, and can also prevent the arc from burning to the root of the water-cooled cathode support 12 after ignition. The driving force generated by the focusing electromagnetic coil 18 pushes the arc forward, and properly adjusting the coil currents of the arc pushing electromagnetic coil 14 and the focusing electromagnetic coil 18 can also control the movement range of the cathode spots on the surface of the cathode, so that the cathode can be etched uniformly to obtain A stable burning cool plasma arc. Both coils can generate an electromagnetic field of 0-40 mT.
如图3所示，所述弯头16为锥度2°弯曲弧度为100°的锥度弯头16，所述锥度弯头16，所述锥度弯头16的外表面安装有多个弯曲弧电磁线圈17，在锥度弯头16内形成强度为0～20 mT的弯曲磁场，起到弯曲电弧过滤中性粒子等宏观粒子团的作用。系统采用的弧镀电源空载电压为65 V，额定电流为25～300 A。阴极通过阴极支架12接弧镀电源的负极性端，弧镀电源的阳极接地。整个装置中不采用专门的阳极，阳极由接地的锥度弯头16组成，简化了弯曲弧磁过滤器的结构。高真空多弧离子涂层是一种离化率最高(70%～100%)、高离子能量(40～100 eV)［1］、高速度、高效率的新型涂层技术。它是以被涂层材料为阴极，在真空中产生弧光放电，利用等离子体进行沉积镀膜的一种技术。As shown in Figure 3, the elbow 16 is a tapered elbow 16 with a taper of 2° and a curved arc of 100°. The tapered elbow 16 has a plurality of curved arc electromagnetic coils installed on the outer surface of the tapered elbow 16. 17. A bending magnetic field with a strength of 0-20 mT is formed in the tapered elbow 16 to play the role of bending arcs to filter macroscopic particle clusters such as neutral particles. The no-load voltage of the arc plating power supply used in the system is 65 V, and the rated current is 25-300 A. The cathode is connected to the negative terminal of the arc plating power supply through the cathode support 12, and the anode of the arc plating power supply is grounded. No special anode is used in the whole device, and the anode is composed of a grounded tapered elbow 16, which simplifies the structure of the curved arc magnetic filter. High vacuum multi-arc ion coating is a new coating technology with the highest ionization rate (70%-100%), high ion energy (40-100 eV) [1], high speed and high efficiency. It uses the material to be coated as the cathode, generates arc discharge in vacuum, and uses plasma to deposit and coat a technology.
在放电过程中，由于电弧在阴极斑点处具有很高的电流密度，高达106～108 A/cm2［2,3］，因而，在阴极斑点处仍然具有很高的温度。如果这个温度远远高于阴极的熔点，阴极表面出现单个或多个小的熔池(1～20 μm［1，4］)，蒸发出阴极材料蒸气，气压陡增。这样，在阴极斑点处产生与周围真空的压力梯度，在该压力梯度的作用下，可以使熔化的金属斑点爆发出包含有金属离子、金属蒸气、宏观粒子团等组成的电弧流。这种宏观粒子团如果到达涂层工件表面，就可能附着在上面，既造成工件表面粗糙，又可能在膜使用过程中首先剥落掉，形成膜破裂的引发源。另外，在高熔点阴极材料的电弧中(如石墨等烧结而成的阴极材料)，夹杂着大量的块状颗粒。这些颗粒到达膜的表面后脱落或附着，附着颗粒被随后生长的膜所覆盖，造成膜的夹杂物，成为膜的缺陷，降低膜的质量。因而，对真空阴极弧离子镀的弧源进行改进，以消除粗颗粒的粒子团。除了采用几何挡板外，利用磁场对带电粒子的洛伦兹力，改变等离子体到达工件表面的路径，达到对电弧过滤的目的，来获得高质量的薄膜。本发明采用100°锥度弯头16式磁过滤器的方法，采用无辅助阳极的结构，获得了很好的效果。During the discharge process, because the arc has a very high current density at the cathode spot, as high as 106-108 A/cm2 [2,3], therefore, the cathode spot still has a high temperature. If the temperature is much higher than the melting point of the cathode, single or multiple small molten pools (1-20 μm [1, 4]) appear on the surface of the cathode, evaporating cathode material vapor, and the pressure increases sharply. In this way, a pressure gradient between the cathode spot and the surrounding vacuum is generated, and under the action of the pressure gradient, the molten metal spot can burst into an arc flow consisting of metal ions, metal vapor, and macroscopic particle clusters. If this kind of macroscopic particle group reaches the surface of the coated workpiece, it may adhere to it, which will not only cause the surface of the workpiece to be rough, but also may peel off first during the use of the film, forming the source of film rupture. In addition, in the arc of high melting point cathode materials (such as sintered cathode materials such as graphite), there are a large number of lumpy particles mixed. These particles fall off or adhere to the surface of the membrane, and the attached particles are covered by the subsequently grown membrane, causing inclusions in the membrane, becoming defects of the membrane, and reducing the quality of the membrane. Therefore, the arc source of vacuum cathode arc ion plating is improved to eliminate coarse particle clusters. In addition to the geometric baffle, the Lorentz force of the magnetic field on the charged particles is used to change the path of the plasma reaching the surface of the workpiece, so as to achieve the purpose of filtering the arc and obtain a high-quality film. The present invention adopts the method of 16-type magnetic filter with 100° tapered elbow and adopts the structure without auxiliary anode, and obtains very good effect.
本发明采用磁过滤功能与高真空多弧靶另加强大的离子源组合涂层法，多束弧源使其多方位触发电极和石墨阴极之间产生真空电弧放电，激发出高离化率的碳等离子体，采用磁过滤线圈过滤掉弧源产生的大颗粒和中性原子，可使到达衬底的几乎全部是碳离子，用较高的沉积速率制备出高质量，致密的无氢膜。The present invention adopts the combined coating method of magnetic filtering function and high-vacuum multi-arc target plus a powerful ion source. The multi-beam arc source causes vacuum arc discharge to be generated between the multi-directional trigger electrode and the graphite cathode, and a high ionization rate is excited. For carbon plasma, magnetic filter coils are used to filter out large particles and neutral atoms generated by the arc source, so that almost all of the particles reaching the substrate are carbon ions, and a high-quality, dense hydrogen-free film is prepared with a high deposition rate.
采用本发明制作的类金刚石膜涂层的实际效果如下：The actual effect of the diamond-like film coating that adopts the present invention to make is as follows:
图4为检测样品表面在场发射电子扫描电镜下放大5000倍的形貌图。从检测结果可以看出，样品表面沉积了一层致密的薄膜。Fig. 4 is a 5000 times magnified topography of the surface of the test sample under a field emission scanning electron microscope. It can be seen from the test results that a dense film is deposited on the surface of the sample.
图5为检测样品表面的拉曼光谱图，从检测结果可以看出，所检测的两个位置的涂层均显示出出类金刚石的两个特征峰，即1350cm-1附近的无定形碳D峰及1580cm-1附近的石墨G峰。涂层为典型的类金刚石，涂层质量好。Figure 5 is the Raman spectrum of the surface of the test sample. It can be seen from the test results that the coatings at the two positions tested show two characteristic peaks of diamond-like carbon, that is, amorphous carbon D near 1350 cm-1 peak and graphite G peak near 1580cm-1. The coating is typical diamond-like carbon, and the coating quality is good.
图6为检测涂层在无润滑条件下与氮化硅陶瓷球对磨时的摩擦曲线图，由图可看出其平均摩擦系数约为0.13。Figure 6 is the friction curve of the test coating when it is rubbed against a silicon nitride ceramic ball under the condition of no lubrication. It can be seen from the figure that the average friction coefficient is about 0.13.
如图7所示，从检测结果可以看出，涂层与基底之间有明显的分界线，所检测的两个位置的涂层厚度均约为10微米，传统的镀膜装置和设备是很难达到这个厚度的，同时图7也显示出涂层在不同位置上厚度较为均匀。As shown in Figure 7, it can be seen from the test results that there is an obvious dividing line between the coating and the substrate, and the thickness of the coating at the two positions detected is about 10 microns, which is difficult for traditional coating devices and equipment. At the same time, Figure 7 also shows that the thickness of the coating is relatively uniform at different positions.
| Application Number | Priority Date | Filing Date | Title |
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| CN201310725837.8ACN103668061B (en) | 2013-12-25 | 2013-12-25 | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like |
| Application Number | Priority Date | Filing Date | Title |
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| CN201310725837.8ACN103668061B (en) | 2013-12-25 | 2013-12-25 | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like |
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| CN101768720A (en)* | 2010-03-31 | 2010-07-07 | 西安交通大学 | Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw |
| CN103205711A (en)* | 2013-04-16 | 2013-07-17 | 温州职业技术学院 | An unbalanced dynamic arch compatible axially guided magnetic field assisted ion plating device |
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