CN103472936A - Touch screen and display device - Google Patents

Abstract

Translated fromChinese

本发明提供一种触摸屏，其包括一基板、一透明导电层及一抗反射层；所述基板采用蓝宝石制成，其包括一上表面及一与所述上表面相对的下表面；所述透明导电层设置在所述上表面；所述抗反射层设置在所述下表面，其用于提高投射至所述基板的光线的透射率。本发明提供的触摸屏通过采用蓝宝石作为基板，由于蓝宝石具有较大的硬度和屈服强度，从而有效提高了触摸屏的硬度和屈服强度；进一步通过在基板上设置抗反射层，有效提高了触摸屏对光线的透射率。本发明还提供一种使用该触摸屏的显示装置。

The invention provides a touch screen, which includes a substrate, a transparent conductive layer and an anti-reflection layer; the substrate is made of sapphire, and includes an upper surface and a lower surface opposite to the upper surface; the transparent The conductive layer is arranged on the upper surface; the anti-reflection layer is arranged on the lower surface, which is used to increase the transmittance of light projected to the substrate. The touch screen provided by the present invention adopts sapphire as the substrate, because sapphire has relatively large hardness and yield strength, thereby effectively improving the hardness and yield strength of the touch screen; Transmittance. The invention also provides a display device using the touch screen.

Description

Translated fromChinese

触摸屏及显示装置Touch screen and display device

技术领域technical field

本发明涉及一种触控面板，特别涉及一种使用蓝宝石的触控面板。The invention relates to a touch panel, in particular to a touch panel using sapphire.

背景技术Background technique

传统的触摸屏都包括一基板及一设置在所述基板上的透明导电层。为了提高所述触摸屏的硬度和屈服强度，都会对传统的基板进行物理或化学强化处理。然而，由于对所述基板的强化过程复杂，不利于批量生产。A conventional touch screen includes a substrate and a transparent conductive layer disposed on the substrate. In order to improve the hardness and yield strength of the touch screen, physical or chemical strengthening treatment will be performed on the traditional substrate. However, due to the complicated strengthening process of the substrate, it is not conducive to mass production.

发明内容Contents of the invention

有鉴于此，有必要提供一种具有较大硬度和屈服强度的触摸屏以及使用该触摸屏的显示装置。In view of this, it is necessary to provide a touch screen with greater hardness and yield strength and a display device using the touch screen.

一种触摸屏，其包括一基板、一透明导电层及一抗反射层。所述基板采用蓝宝石制成，其包括一上表面及一与所述上表面相对的下表面。所述透明导电层设置在所述上表面。所述抗反射层设置在所述下表面，其用于提高投射至所述基板的光线的透射率。A touch screen includes a substrate, a transparent conductive layer and an anti-reflection layer. The substrate is made of sapphire and includes an upper surface and a lower surface opposite to the upper surface. The transparent conductive layer is disposed on the upper surface. The anti-reflection layer is disposed on the lower surface, and is used to increase the transmittance of light projected onto the substrate.

一种显示装置，其包括一显示器及一设置在所述显示器的表面的触摸屏。所述触摸屏包括一基板、一透明导电层及一抗反射层。所述基板采用蓝宝石制成，其包括一上表面及一与所述上表面相对的下表面。所述透明导电层设置在所述上表面。所述抗反射层设置在所述下表面，其用于提高投射至所述基板的光线的透射率。A display device includes a display and a touch screen arranged on the surface of the display. The touch screen includes a substrate, a transparent conductive layer and an anti-reflection layer. The substrate is made of sapphire and includes an upper surface and a lower surface opposite to the upper surface. The transparent conductive layer is disposed on the upper surface. The anti-reflection layer is disposed on the lower surface, and is used to increase the transmittance of light projected onto the substrate.

本发明提供的触摸屏通过采用蓝宝石作为基板，由于蓝宝石具有较大的硬度和屈服强度，从而有效提高了触摸屏的硬度和屈服强度，另外，通过在基板上设置抗反射层，有效提高了触摸屏对光线的透射率。The touch screen provided by the present invention adopts sapphire as the substrate, and since sapphire has relatively large hardness and yield strength, the hardness and yield strength of the touch screen are effectively improved. In addition, by setting an anti-reflection layer on the substrate, the touch screen is effectively improved. transmittance.

附图说明Description of drawings

图1是本发明实施方式提供的触摸屏的结构示意图。FIG. 1 is a schematic structural diagram of a touch screen provided by an embodiment of the present invention.

图2是使用图1中的触摸屏的显示装置的结构示意图。FIG. 2 is a schematic structural diagram of a display device using the touch screen in FIG. 1 .

主要元件符号说明Description of main component symbols

触摸屏touch screen100100基板Substrate1010上表面upper surface1111下表面lower surface1212透明导电层transparent conductive layer2020抗反射层antireflection layer3030显示装置display device200200显示器monitor210210

如下具体实施方式将结合上述附图进一步说明本发明。The following specific embodiments will further illustrate the present invention in conjunction with the above-mentioned drawings.

具体实施方式Detailed ways

如图1所示，为本发明实施方式提供的一触摸屏100，其包括一基板10，一透明导电层20及一抗反射层30。As shown in FIG. 1 , atouch screen 100 provided by an embodiment of the present invention includes asubstrate 10 , a transparent conductive layer 20 and ananti-reflection layer 30 .

所述基板10呈平板状，其采用蓝宝石材料制成。所述蓝宝石属于刚玉族矿物，三方晶系，具有六方结构。所述蓝宝石的主要化学成分为三氧化二铝（Al₂O₃），其折射率为1.760-1.757，该蓝宝石的结晶方向为a轴（11                                               

0），c轴（0001），m轴（100）。所述蓝宝石对波长为420-700nm的可见光线的透射率小于86%。所述基板10包括一上表面11及与所述上表面11相对的下表面12。Thesubstrate 10 is flat and made of sapphire material. The sapphire belongs to the corundum minerals, has a trigonal crystal system, and has a hexagonal structure. The main chemical composition of the sapphire is aluminum oxide (Al₂ O₃ ), its refractive index is 1.760-1.757, and the crystallization direction of the sapphire is the a-axis (11

0), c axis (0001), m axis (10 0). The transmittance of the sapphire to visible light with a wavelength of 420-700nm is less than 86%. Thesubstrate 10 includes an upper surface 11 and alower surface 12 opposite to the upper surface 11 .

本实施方式中，所述蓝宝石采用纯净的Al₂O₃模造成型。所述片状的蓝宝石是采用激光对长方体的蓝宝石切割而成。可以根据触摸屏100的尺寸大小切割不同大小和厚度的片状的蓝宝石。In this embodiment, the sapphire is molded with pure Al₂ O₃ . The flaky sapphire is cut by a laser on a cuboid sapphire. Slab-shaped sapphires of different sizes and thicknesses can be cut according to the size of thetouch screen 100 .

所述透明导电层20设置在所述基板10的上表面11。该透明导电层20为一层碳纳米管薄膜，该碳纳米管薄膜包括多个定向排列的碳纳米管。由于所述透明导电层20中的碳纳米管平行且等间距设置，从而使得所述透明导电层20具有均匀的阻值分布和透光特性，提高了触摸屏100的分辨率和准确率。The transparent conductive layer 20 is disposed on the upper surface 11 of thesubstrate 10 . The transparent conductive layer 20 is a carbon nanotube film, and the carbon nanotube film includes a plurality of aligned carbon nanotubes. Since the carbon nanotubes in the transparent conductive layer 20 are arranged in parallel and at equal intervals, the transparent conductive layer 20 has uniform resistance distribution and light transmission characteristics, which improves the resolution and accuracy of thetouch screen 100 .

本实施方式中，所述碳纳米管薄膜是通过在一硅片上化学气相沉积而制成。然后，将所述成型的碳纳米管薄膜从所述硅片上剥离。最后，将所述碳纳米管薄膜贴附在所述基板10的上表面11。In this embodiment, the carbon nanotube film is made by chemical vapor deposition on a silicon wafer. Then, the shaped carbon nanotube film is peeled off from the silicon wafer. Finally, attach the carbon nanotube film on the upper surface 11 of thesubstrate 10 .

所述抗反射层30是通过溅镀或者蒸镀的方式镀设在所述基板10的下表面12，其用于提高对可见光线的透射率。所述抗反射层30由多个高折射率层和低折射率层沿所述下表面12至远离该下表面12的方向堆叠而成。所述抗反射层30的膜系结构为（xHyL）^η，4≤η≤8，1＜x＜2，1＜y＜2；η为正整数；其中H为1/4中心波长厚度的高折射率层，L为1/4中心波长厚度的低折射率层，xH为x/4中心波长厚度的高折射率层，yL为y/4中心波长厚度的低折射率层，η为高折射率层和低折射率层堆叠的周期数。本实施方式中，中心波长为透过或滤除光线的波长范围的中间值。Theantireflection layer 30 is deposited on thelower surface 12 of thesubstrate 10 by sputtering or vapor deposition, and is used to increase the transmittance of visible light. Theanti-reflection layer 30 is formed by stacking a plurality of high-refractive-index layers and low-refractive-index layers along thelower surface 12 to a direction away from thelower surface 12 . The film structure of theanti-reflection layer 30 is (xHyL)^η , 4≤η≤8, 1<x<2, 1<y<2; η is a positive integer; where H is the height of the thickness of 1/4 of the center wavelength Refractive index layer, L is a low refractive index layer with a thickness of 1/4 central wavelength, xH is a high refractive index layer with a thickness of x/4 central wavelength, yL is a low refractive index layer with a thickness of y/4 central wavelength, and η is a high refractive index layer The number of cycles of stacking the index layer and the low index layer. In this embodiment, the central wavelength is the middle value of the wavelength range of the transmitted or filtered light.

所述高折射率层选择二氧化钛（TiO₂）层，其折射率为2.705；所述低折射率层为二氧化硅（SiO₂）层，其折射率为1.499。可以理解，所述高折射率层和所述低折射率层也可以由其他折射率相当之材料形成。The high refractive index layer is titanium dioxide (TiO₂ ) layer, whose refractive index is 2.705; the low refractive index layer is silicon dioxide (SiO₂ ) layer, whose refractive index is 1.499. It can be understood that the high-refractive-index layer and the low-refractive-index layer may also be formed of other materials with comparable refractive indices.

本实施方式所提供的所述触摸屏100的硬度达到1500-200Kg/mm²、屈服强度达到300-400MPa、抗压强度达到2GPa、温差范围为-40-2000℃，并具有抗高电压和抗高频等性质。所述触摸屏100对可见光线的透射率为90%-99.5%。Thetouch screen 100 provided in this embodiment has a hardness of 1500-200Kg/mm² , a yield strength of 300-400MPa, a compressive strength of 2GPa, a temperature range of -40-2000°C, and high voltage and high resistance. frequency etc. The transmittance of thetouch screen 100 to visible light is 90%-99.5%.

如图2所示，为使用本发明实施方式提供的触摸屏100的显示装置200。所述显示装置200还包括一显示器210，所述触摸屏100设置在所述显示器210的表面。所述显示器210根据所述触摸屏100所感触的信号而显示不同的图像。首先，由于触摸屏100具有较强的硬度和强度，可有效保护显示器210受到损伤。其次，由于触摸屏100具有抗高电压和抗高频的性质，所述显示装置200可用于工业环境中。再次，由于触摸屏100对可见光线的透射率为90%-99.5%，有效保证了显示装置200的清晰度和分辨率。As shown in FIG. 2 , it is adisplay device 200 using atouch screen 100 provided by an embodiment of the present invention. Thedisplay device 200 further includes adisplay 210 , and thetouch screen 100 is disposed on a surface of thedisplay 210 . Thedisplay 210 displays different images according to the signals sensed by thetouch screen 100 . Firstly, since thetouch screen 100 has strong hardness and strength, it can effectively protect thedisplay 210 from being damaged. Secondly, since thetouch screen 100 is resistant to high voltage and high frequency, thedisplay device 200 can be used in an industrial environment. Thirdly, since the transmittance of thetouch screen 100 to visible light is 90%-99.5%, the clarity and resolution of thedisplay device 200 are effectively guaranteed.

发明提供的触摸屏通过采用蓝宝石作为基板，由于蓝宝石具有较大的硬度和屈服强度，从而有效提高了触摸屏的硬度和屈服强度；进一步通过在基板上设置抗反射层，有效提高了触摸屏对光线的透射率。The touch screen provided by the invention adopts sapphire as the substrate, because sapphire has relatively large hardness and yield strength, thereby effectively improving the hardness and yield strength of the touch screen; furthermore, by setting an anti-reflection layer on the substrate, the transmission of light by the touch screen is effectively improved Rate.

可以理解的是，对于本领域的普通技术人员来说，可以根据本发明的技术构思做出其它各种像应的改变与变形，而所有这些改变与变形都应属于本发明权利要求的保护范围。It can be understood that, for those skilled in the art, various other corresponding changes and deformations can be made according to the technical concept of the present invention, and all these changes and deformations should belong to the protection scope of the claims of the present invention .

Claims (10)

Translated fromChinese

1.一种触摸屏，其包括一基板、一透明导电层及一抗反射层；所述基板采用蓝宝石制成，其包括一上表面及一与所述上表面相对的下表面；所述透明导电层设置在所述上表面；所述抗反射层设置在所述下表面，其用于提高投射至所述基板的光线的透射率。1. A kind of touch screen, it comprises a substrate, a transparent conductive layer and an anti-reflection layer; Described substrate adopts sapphire to make, and it comprises an upper surface and a lower surface opposite with described upper surface; Described transparent conductive A layer is arranged on the upper surface; the anti-reflection layer is arranged on the lower surface, which is used to improve the transmittance of light projected to the substrate.2.如权利要求1所述的触摸屏，其特征在于：所述透明导电层为碳纳米管薄膜。2. The touch screen according to claim 1, wherein the transparent conductive layer is a carbon nanotube film.3.如权利要求1所述的触摸屏，其特征在于：所述蓝宝石的折射率为1.760-1.757；该蓝宝石的结晶方向为a轴（11                                               0），c轴（0001），m轴（10

0）。3. The touch screen according to claim 1, characterized in that: the refractive index of the sapphire is 1.760-1.757; the crystallographic direction of the sapphire is the a axis (11 0), c axis (0001), m axis (10

0).4.如权利要求1所述的触摸屏，其特征在于：所述抗反射层的膜系结构为（xHyL）^η，4≤η≤8，1＜x＜2，1＜y＜2；η为正整数；其中H为1/4中心波长厚度的高折射率层，L为1/4中心波长厚度的低折射率层，xH为x/4中心波长厚度的高折射率层，yL为y/4中心波长厚度的低折射率层，η为高折射率层和低折射率层堆叠的周期数。4. The touch screen according to claim 1, characterized in that: the film structure of the antireflection layer is (xHyL)^η , 4≤η≤8, 1<x<2, 1<y<2; η is Positive integer; where H is a high refractive index layer with a thickness of 1/4 central wavelength, L is a low refractive index layer with a thickness of 1/4 central wavelength, xH is a high refractive index layer with a thickness of x/4 central wavelength, and yL is y/ A low-refractive-index layer with a thickness of 4 central wavelengths, and η is the number of cycles of stacking the high-refractive-index layer and the low-refractive-index layer.5.如权利要求4所述的触摸屏，其特征在于：所述高折射率层选择二氧化钛层，其折射率为2.705；所述低折射率层为二氧化硅层，其折射率为1.499。5 . The touch screen according to claim 4 , wherein the high refractive index layer is a titanium dioxide layer with a refractive index of 2.705; the low refractive index layer is a silicon dioxide layer with a refractive index of 1.499.6.一种显示装置，其包括一显示器及一设置在所述显示器的表面的触摸屏；所述触摸屏包括一基板、一透明导电层及一抗反射层；所述基板采用蓝宝石制成，其包括一上表面及一与所述上表面相对的下表面；所述透明导电层设置在所述上表面；所述抗反射层设置在所述下表面，其用于提高投射至所述基板的光线的透射率。6. A display device, which includes a display and a touch screen arranged on the surface of the display; the touch screen includes a substrate, a transparent conductive layer and an anti-reflection layer; the substrate is made of sapphire, which includes An upper surface and a lower surface opposite to the upper surface; the transparent conductive layer is arranged on the upper surface; the anti-reflection layer is arranged on the lower surface, which is used to improve the light projected to the substrate transmittance.7.如权利要求6所述的显示装置，其特征在于：所述透明导电层为碳纳米管薄膜。7. The display device according to claim 6, wherein the transparent conductive layer is a carbon nanotube film.8.如权利要求6所述的显示装置，其特征在于：所述蓝宝石的折射率为1.760-1.757；该蓝宝石的结晶方向为a轴（11

0），c轴（0001），m轴（10

0）。8. The display device according to claim 6, characterized in that: the refractive index of the sapphire is 1.760-1.757; the crystal direction of the sapphire is the a axis (11

0), c axis (0001), m axis (10

0).9.如权利要求6所述的显示装置，其特征在于：所述抗反射层的膜系结构为（xHyL）^η，4≤η≤8，1＜x＜2，1＜y＜2；η为正整数；其中H为1/4中心波长厚度的高折射率层，L为1/4中心波长厚度的低折射率层，xH为x/4中心波长厚度的高折射率层，yL为y/4中心波长厚度的低折射率层，η为高折射率层和低折射率层堆叠的周期数。9. The display device according to claim 6, characterized in that: the film structure of the anti-reflection layer is (xHyL)^η , 4≤η≤8, 1<x<2, 1<y<2; η is a positive integer; where H is a high refractive index layer with a thickness of 1/4 central wavelength, L is a low refractive index layer with a thickness of 1/4 central wavelength, xH is a high refractive index layer with a thickness of x/4 central wavelength, and yL is y A low-refractive-index layer with a thickness of /4 central wavelength, and η is the number of periods in which the high-refractive-index layer and the low-refractive-index layer are stacked.10.如权利要求9所述的显示装置，其特征在于：所述高折射率层选择二氧化钛层，其折射率为2.705；所述低折射率层为二氧化硅层，其折射率为1.499。10. The display device according to claim 9, wherein: the high refractive index layer is a titanium dioxide layer with a refractive index of 2.705; the low refractive index layer is a silicon dioxide layer with a refractive index of 1.499.

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