Summary of the invention
Based on this, the polarisation that provides a kind of thickness less-optical filtering module is provided and uses the touch display screen of this polarisation-optical filtering module.
A kind of polarisation-optical filtering module comprises
Filtering assembly comprises transparent substrates; And
Filter layer, comprise light shielding part and optical filtering section, described light shielding part is intersected to form mutually by gridline, and described gridline intersects to form a plurality of grid cells mutually, described optical filtering section comprises a plurality of filter units, and each described filter unit is contained in the corresponding described grid cell; And
The first impression glue-line is arranged at described transparent substrates homonymy with described filter layer is stacked, and described the first impression glue-line offers the first groove; And
The first conductive layer, be embedded at described the first impression glue-line, comprise a plurality of the first conductive units that arrange along the first direction parallel interval, described the first conductive unit comprises the first conductive grid, described the first conductive grid is intersected to form mutually by the first conductive thread, described the first conductive thread intersects to form grid node, and described the first conductive thread is contained in described the first groove;
The polarisation assembly is attached to described transparent substrates away from a side of described the first conductive layer; Comprise polaroid, and the second conductive layer that is arranged at described polaroid one side, described the second conductive layer comprises a plurality of the second conductive units that arrange along the second direction parallel interval, described the second conductive unit comprises the second conductive grid, described the second conductive grid is intersected to form mutually by the second conductive thread, and described the second conductive thread intersects to form grid node;
Described first direction and described second direction are not parallel, described the first conductive unit and described the second conductive unit mutually insulated on the thickness direction of described transparent substrates, the live width of the wherein one in described the first conductive thread and the second conductive thread is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m, and another one all falls into described gridline in the projection of described filter layer.
Among embodiment, the live width of described the first conductive thread is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m therein, and described the second conductive thread all falls into described gridline in the projection of described filter layer.
Among embodiment, the live width of described the second conductive thread is not more than the live width of described gridline therein.
Among embodiment, described the first conductive thread all falls within described gridline in the projection of described filter layer therein.
Among embodiment, described the second conductive layer directly is formed at the surface of described polaroid therein.
Among embodiment, described polarisation assembly also comprises the second impression glue-line therein, and described the second impression glue-line is coated a side of described polaroid, and described the second impression glue-line offers the second groove, and described the second conductive thread is contained in described the second groove.
Among embodiment, the thickness of described the first conductive layer is not more than the degree of depth of described the first groove therein, and the thickness of described the second conductive layer is not more than the degree of depth of described the second groove.
Among embodiment, the interval width of two adjacent the first conductive units of described the first conductive layer is 0.5~50 μ m therein, and the interval width of two adjacent the second conductive units of described the second conductive layer is the width of a filter unit.
Among embodiment, be provided with the first impression glue-line of the first conductive layer between described transparent substrates and described filter layer therein.
Among embodiment, the first impression glue-line that is provided with the first conductive layer is positioned at described filter layer away from a side of described transparent substrates therein.
A kind of touch display screen comprises the TFT electrode, Liquid Crystal Module and the described polarisation-optical filtering module that stack gradually.
Above-mentioned polarisation-optical filtering module and use the touch display screen of this polarisation-optical filtering module, polarisation-optical filtering module can realize touch operation, polarized light function and filtering functions simultaneously, combination as indispensable three assemblies in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also greatly saved simultaneously material and assembly cost.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement in the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public implementation.
See also Fig. 1, thetouch display screen 100 of an embodiment comprises theTFT electrode 20, LiquidCrystal Module 30 and the polarisation that stack gradually-optical filtering module 60.Wherein, can away from a side of LiquidCrystal Module 30lower polaroid 10 be set atTFT electrode 20, betweenLiquid Crystal Module 30 and polarisation-optical filtering module 60,public electrode 40,diaphragm 50 be set.
TFT electrode 20 comprises glass-base 24 and theshow electrode 22 that is arranged on the glass-base 24.Liquid Crystal Module 30 comprisesliquid crystal 32 and is held on thealignment film 34 ofliquid crystal 32 both sides.The firstconductive layer 628 of polarisation-optical filtering module 60 is towards Liquid CrystalModule 30.
Be appreciated that when using backlight as polarized light source, such as the OLED polarized light source, need not to use lower polaroid 10.In certain embodiments, when describedtouch display screen 100 was the wide-angle liquid crystal display, describedliquid crystal 32 drove for theTFT electrode 20 that is positioned at the one side, so can not establish in addition public electrode 40.Structure and the function of thelower polaroid 10 of present embodiment,TFT electrode 20, Liquid Crystal Module 30 andpublic electrode 40 can be identical with existing product, do not repeat them here.
Polarisation-optical filtering module 60 has touch control operation, polarized light function and filtering functions simultaneously, makestouch display screen 100 have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side entering type light source.
Following emphasis is described polarisation-optical filtering module 60.
Touch display device and comprise that also control drives chip and flexible circuit board, for the purpose of simplifying the description, these two parts do not illustrate in this application.
See also Fig. 2 and Fig. 3, the polarisation of an embodiment-optical filtering module 60 comprisesfiltering assembly 62 andpolarisation assembly 64.
Optical filter box 62 comprisestransparent substrates 622,filter layer 624, the first impression glue-line 626 and the first conductive layer 628.Filter layer 624 and the first impression glue-line 626 stackedtransparent substrates 622 homonymies that are arranged at.Transparent substrates 622 is the material of transparent insulation, such as glass, can be sillico aluminate glass and calcium soda-lime glass particularly, has good cohesive force through the plasma treatment rear surface.General, the thickness range oftransparent substrates 622 can be 0.1mm~0.5mm.
Filter layer 624 compriseslight shielding part 6242 and optical filtering section 6244.Light shielding part 6242 is intersected to form mutually by gridline, and gridline intersects to form a plurality ofgrid cells 6243 mutually, andoptical filtering section 6244 comprises a plurality offilter units 6245, and eachfilter unit 6245 is contained in the corresponding grid cell 6243.General, the thickness range oflight shielding part 6242 andoptical filtering section 6244 is 0.5 μ m~2 μ m.
It is the groove of mesh shape that the first impression glue-line 626 offers thefirst groove 6262, thefirst grooves 6262 away from the surface oftransparent substrates 622, and mesh shape can be preset to required figure as required.The firstconductive layer 628 is embedded at the first impression glue-line 626, namely the firstconductive layer 628, the first impression glue-line 626 andfilter layer 624 all are positioned attransparent substrates 622 homonymies, as shown in Figure 2, expression is to be provided with the first impression glue-line 626 of the firstconductive layer 628 betweenfilter layer 624 and transparent substrates 622.As shown in Figure 4, expression is that the first impression glue-line 626 that is provided with the firstconductive layer 628 is positioned atfilter layer 624 away from a side of transparent substrates 622.The firstconductive layer 628 comprises a plurality of the firstconductive units 6282 that arrange along the first direction parallel interval, so that 6282 insulation of a plurality of the first conductive unit.The firstconductive unit 6282 comprises some the first conductive grids, and the first conductive grid is intersected to form mutually by the firstconductive thread 6284, and the firstconductive thread 6284 intersects to form grid node, and the firstconductive thread 6284 is contained in the first groove 6262.In other embodiments, can also offer thefirst groove 6262 in a side of the first impression glue-line 626 closetransparent substrates 622.
Polarisation assembly 64 is attached in the side oftransparent substrates 622 away from the first conductive layer 628.Polarisation assembly 64 comprisespolaroid 642 and the second conductive layer 644.The second impression glue-line 646 is arranged atpolaroid 642 1 sides, and the secondconductive layer 644 comprises a plurality of the secondconductive units 6442 that arrange along the second direction parallel interval, so that 6442 insulation of a plurality of the second conductive unit.The secondconductive unit 6442 comprises some the second conductive grids, and the second conductive grid is intersected to form mutually by the secondconductive thread 6444, and the secondconductive thread 6444 intersects to form grid node.
Wherein, first direction and second direction are not parallel, and the firstconductive unit 6282 and the secondconductive unit 6442 mutually insulated ontransparent substrates 622 thickness directions forms induction structure.The live width of the wherein one in the firstconductive thread 6284 and the secondconductive thread 6444 is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m, and another one all falls into gridline in the projection offilter layer 624.
Above-mentioned polarisation-optical filtering module 60, the firstconductive layer 628 is arranged atoptical filter box 62, the secondconductive layer 644 is arranged atpolarisation assembly 64, againoptical filter box 62 andpolarisation assembly 64 are fitted, the firstconductive layer 628 and the secondconductive layer 644 intervals arrange and consist of the capacitive sensing structure, can realize simultaneously touch operation, polarized light function and filtering functions, and the design that need not to put up a bridge, task difficulty reduced.With polarisation-whenoptical filtering module 60 is applied to display screen, can directly make display screen have touch controllable function, need not again not only to be conducive to reduce the thickness of electronic product at display screen assembling one touch-screen, also greatly saved material and assembly cost.When the firstconductive layer 628 and the secondconductive layer 644 wherein the live width of the conductive thread of one be the distance of adjacent two grid nodes in 0.2~5 μ m and this conductive layer when being 50~500 μ m, can reach visually-clear, reduced fraction defective and production cost; Becauselight shielding part 6242 has opaqueness, the conductive thread of another conductive layer all falls into gridline in the projection offilter layer 624, can make conductive thread a not exceed gridline, thereby can not blockfilter layer 624, guarantees thatfilter layer 624 has good transmittance.
Among embodiment, the live width of the firstconductive thread 6284 is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~800 μ m therein, and the secondconductive thread 6444 all falls into gridline in the projection of filter layer 624.As shown in Figure 2, expression be that the live width of the firstconductive thread 6284 is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~800 μ m, the secondconductive thread 6444 all falls into gridline in the projection offilter layer 624, and the live width of the secondconductive thread 6444 is less than the live width of gridline.In other embodiments, the live width of the secondconductive thread 6444 can also equal the live width of gridline.When polarisation-optical filter module application during in product, be generally speakingtransparent substrates 622 be provided with the second conductive layer 644 a side towards the user, affect user's experience sense so be arranged at the secondconductive layer 644 easier being seen by user's naked eyes of polaroid 642.So the projection of the secondconductive thread 6444 atfilter layer 624 all fallen into gridline and do not exceeded gridline, the live width of the firstconductive thread 6284 is that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m, make visually-clear, be conducive to improve user's experience sense.In other embodiments, the projection that the firstconductive thread 6284 can also be arranged infilter layer 624 all falls within gridline, further improves user's experience sense.
As shown in Figure 4, in embodiment two, what represent is that the firstconductive thread 6284 all falls into gridline in the projection offilter layer 624, the secondconductive thread 6444 live widths are that the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m, and the live width of this secondconductive thread 6444 is less than the live width of gridline.In other embodiments, the live width of the firstconductive thread 6284 also can equal the live width of gridline.Wherein, the firstconductive thread 6284 and the secondconductive thread 6444 are straight line, curve or broken line.The firstconductive thread 6284 and the secondconductive thread 6444 have reduced production requirement without the given shape requirement.
See also Fig. 4 and Fig. 5, in embodiment two and embodiment three, the secondconductive layer 644 directly is formed at the surface of described polaroid 642.Surface atpolaroid 642 applies or plates and establish conductive material, and the coating photoresist carries out exposure imaging to described photoresist, makes photoresist form a plurality of the secondconductive units 6442; Etching to remove the secondconductive unit 6442 districts conductive material exposed part in addition, forms the secondconductive layer 644 with a plurality of second conductive units 6442.So, the secondconductive layer 644 is directly formed and polaroid 642 surfaces, be conducive to reduce the thickness of polarisation assembly 64.Such as Fig. 4, expression be that the secondconductive layer 644 is formed atpolaroid 642 away from the surface of transparent substrates 622.Such as Fig. 5, expression be that the secondconductive layer 644 is formed atpolaroid 642 near the surface oftransparent substrates 622.
See also Fig. 6 and Fig. 7, in embodiment four and embodiment five,polarisation assembly 64 comprises the second impression glue-line 646, the second impression glue-line 646 is coated a side ofpolaroid 642, the second impression glue-line 646 is contained in thesecond groove 6462 away from the conductive thread that the surface ofpolaroid 642 offers thesecond groove 6462, the second conductive layers 644.Form the second impression glue-line 646 atpolarisation assembly 64 surface-coateds impression glue, offer thesecond groove 6462 at the second impression glue-line 646 away from the surface ofpolaroid 642, thesecond groove 6462 is the groove of mesh shape, mesh shape can be preset to required figure as required, the filled conductive material solidify to form the secondconductive thread 6444, the secondconductive threads 6444 in thesecond groove 6462 and mutually intersects to form the second conductive layer 644.By the second impression glue-line 646 is set, and to the second impression glue-line 646 impressions thesecond groove 6462, and then second filled conductive material in thegroove 6462 and sintering curing form the secondconductive layer 644, easy and simple to handle and cost is lower, can also guarantee that polarisation-optical filtering module 60 has lower sheet resistance, higher transmittance and less thickness etc. simultaneously.In other embodiments, can also offer thesecond groove 6462 near a side ofpolaroid 642 at the second impression glue-line 646.
In the present embodiment, the material of the first impression glue-line 626 and the second impression glue-line 646 is solvent-free ultra-violet curing acrylic resin, and thickness is 2~10 μ m.The first impression glue-line 626 and the second impression glue-line 646 are transparence, do not affect whole transmitance.In other embodiments, the material of the first impression glue-line 626 and the second impression glue-line 646 can also be On Visible Light Cured Resin or heat reactive resin.
Conductive material can be metal, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms the conductive grid that is made of conductive thread.Be preferably metal, such as nanometer silver paste.When selecting metal, the energy consumption that can reduce resistance and reduce touch display screen.So, the material selected of the firstconductive layer 628 and the secondconductive layer 644 only expands all suitable conductive materials to transparent material by tradition; When conductive material is selected metal material, the energy consumption that can greatly reduce resistance and reduce touch display screen.
See also Fig. 6 and Fig. 7, in embodiment four and embodiment five, the thickness of the firstconductive layer 628 is not more than the degree of depth of thefirst groove 6262, and/or the thickness of the secondconductive layer 644 is not more than the degree of depth of the second groove 6462.In present embodiment, the thickness of the firstconductive layer 628 is less than the thickness of thefirst groove 6262, and the degree of depth of thefirst groove 6262 is less than the thickness of the first impression glue-line 626.The secondconductive layer 644 is less than the degree of depth of thesecond groove 6462, and the degree of depth of thesecond groove 6462 is less than the thickness of the second impression glue-line 646, can prevent the firstconductive layer 628 and the secondconductive layer 644 form after in subsequent technique by scratch.
See also Fig. 6 and Fig. 7, in embodiment four and embodiment five,optical filtering section 6244 comprises a plurality of filter units 6245.Filter unit 6245 is the chromatic photoresist of printing opacity, and the photoresist that is specially with coloured dye forms, and can adopt exposure-developing manufactureprocess.Filter unit 6245 is generally red (red, R) photoresistance, green (green, G) photoresistance or indigo plant (blue, B) photoresistance, is used for making incident light be transformed into monochromatic light, realizes filtering functions.Light shielding part 6242 is for being formed at a side oftransparent substrates 622 with the photoresist of black dyes, andlight shielding part 6242 is lattice-shaped, has opaqueness, can adopt exposure-developing manufactureprocess.Grid cell 6243 is square in the lattice-shaped, so that the photoresistance ofoptical filtering section 6244 is arranged compacter reaching evenly.Light shielding part 6242 can effectively be avoided each other colour contamination of chromatic photoresist, and can increase the contrast of R, G, B light.
Above-mentionedoptical filter box 62 with touch controllable function, the polarisation with touch control operation function as shown in Figure 6 and Figure 7-optical filtering module 60, when the firstconductive layer 628 and the secondconductive layer 644 all adopt the impression mode to prepare, and the firstconductive layer 628 and the first impression glue-line 626 cover infilter layer 624 during away fromtransparent substrates 622 1 side, and its manufacturing process is as follows:
(1) surface ofglass baseplate 622 is at first carried out plasma (Plasma) and process, remove the dirty of surface, and make surface ion, increase follow-up and cohesive force other material.
(2) be coated with/plate photoresist layer with black dyes at a whole face in surface ofglass baseplate 622.
(3) adopt exposure-developing technique, the photoresist infilter unit 6245 zones is removed, form thelight shielding part 6242 of lattice-shaped.
(4) ingrid cell 6243 gradation the R/G/B chromatic photoresist is set, formsoptical filtering section 6244, to obtain thefilter layer 624 of concretelight shielding part 6242 andoptical filtering section 6244.
(5) at the surface-coated impression glue (present embodiment adopt PMMA UV cured resin) offilter layer 624 away fromglass baseplate 622, form the first impression glue-line 626, and the impression block of using the conductive grid with the firstconductive layer 628 to be nested impresses on the first impression glue surface and solidifies, thefirst groove 6262, thefirst grooves 6262 that obtain mating with required the firstconductive layer 628 are latticed.
(6) to thefirst groove 6262 interior filled conductive materials and curing.Conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms by conductive thread mutually to intersect the conductive grid that consists of.Preferably, conductive material is metal (such as nanometer silver paste), obtains theoptical filter box 62 with the firstconductive layer 628.
(7) surface-coated atpolaroid 642 impresses glue (present embodiment employing polymethylmethacrylate (polymethylmethacrylate, PMMA) UV cured resin), form the second impression glue-line 646, and the impression block of using the conductive grid with the secondconductive layer 644 to be nested impresses on the second impression glue surface and solidifies, thesecond groove 6462, thesecond grooves 6462 that obtain mating with required the secondconductive layer 644 are latticed.
(8) to thesecond groove 6462 interior filled conductive materials and solidify, conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms by conductive thread mutually to intersect the conductive grid that consists of.Preferably, conductive material is metal (such as nanometer silver paste), obtains thepolarisation assembly 64 with the secondconductive layer 644.
(9)optical filter box 62 is bondd by transparent adhesive and solidifies away from a side of the firstconductive layer 628 with thepolarisation assembly 64 of the secondconductive layer 644, obtain having the polarisation of touch control operation function-optical filtering module 60.
The polarisation with touch control operation function as shown in Figure 2-optical filtering module 60, when the firstconductive layer 628 prepares by the impression mode, the firstconductive layer 628 and the first impression glue-line 626 are all betweenfilter layer 624 andtransparent substrates 622, and when the secondconductive layer 644 prepared by being coated with or plating again etched mode, its manufacturing process was as follows:
(1) surface ofglass baseplate 622 is at first carried out plasma (Plasma) and process, remove the dirty of surface, and make surface ion, increase follow-up and cohesive force other material.
(2) surface-coated atglass baseplate 622 impresses glue (present embodiment adopts PMMA UV cured resin), form the first impression glue-line 626, and the impression block of using the conductive grid with the firstconductive layer 628 to be nested impresses on the first impression glue surface and solidifies, thefirst groove 6262, thefirst grooves 6262 that obtain mating with required the firstconductive layer 628 are latticed.
(3) to thefirst groove 6262 interior filled conductive materials and curing.Conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms by conductive thread mutually to intersect the conductive grid that consists of.Preferably, conductive material is metal (such as nanometer silver paste), obtains the firstconductive layer 628.
(4) be coated with or plate photoresist layer with black dyes on the surface that the first impression glue-line 626 is provided with the firstconductive layer 628.
(5) adopt exposure-developing technique, the photoresist infilter unit 6245 zones is removed, form thelight shielding part 6242 of lattice-shaped.
(6) ingrid cell 6243 gradation the R/G/B chromatic photoresist is set, formsoptical filtering section 6244, obtain having thefilter layer 624 oflight shielding part 6242 andoptical filtering section 6244, thereby obtain theoptical filter box 62 with the firstconductive layer 628.
(7) the surperficial whole face atpolaroid 642 is coated with/plates conductive material, and conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO.
(8) thepolaroid 642 surface-coated one deck photoresists that are being provided with conductive material, utilize the mask plate corresponding with the conductive grid of the secondconductive layer 644 that photoresist is exposed-develops, only keep the photoresist of the conductive grid part that covers the secondconductive layer 644, the photoresist that all the other are local is removed.
(9) utilize lithographic technique that above-mentioned conductive material is carried out etching, obtain the secondconductive unit 6442 separate, insulation, thereby obtain thepolarisation assembly 64 with the secondconductive layer 644.
(10)optical filter box 62 is bondd by transparent adhesive and solidifies away from a side of the firstconductive layer 628 with thepolarisation assembly 64 of the secondconductive layer 644, obtain having the polarisation of touch control operation function-optical filtering module 60.
Among embodiment, the thickness ofoptical filtering section 6244 is not less than the thickness oflight shielding part 6242 therein.That is to say that the thickness offilter unit 6245 is greater than or equal to the thickness of gridline.When the thickness ofoptical filtering section 6244 during greater than the thickness oflight shielding part 6242, from the light thatoptical filtering section 6244 appears, not only can see from the front, also can see from the side, thereby can increase the light emission rate ofoptical filtering section 6244.
Among embodiment, the second conductive grid andfilter unit 6245 be similar fitgures each other therein, and the center line of the secondconductive thread 6444 is in the projection offilter layer 624 and the central lines of gridline, i.e. the secondconductive thread 6444 alignment grid rulings.The second conductive grid is intersected to form by the secondconductive thread 6444, andgrid cell 6243 is cut apart by gridline and formed, andfilter unit 6245 is formed at grid cell 6243.Vary in size so the shape that can make the second conductive grid is identical with the shape offilter unit 6245, namely the second conductive grid andfilter unit 6245 similar fitgures each other guarantee that simultaneously the secondconductive thread 6444 does not exceed gridline in the projection of filter layer 624.Further reduce the secondconductive thread 6444 and exposed the probability in gridline zone.
Among embodiment, adjacent the first conductive unit 6282 is provided with the interval therein, and the second adjacent conductive unit 6442 is provided with the interval, with mutually insulated.As shown in Figure 9, expression is the interval synoptic diagram of a plurality of first conductive units 6282 of the first conductive layer 628 as shown in Figure 2.As shown in Figure 8, expression is the interval synoptic diagram of a plurality of the second conductive units 6442 in as shown in Figure 2 the second conductive layer 644.Particularly, the interval width of two adjacent the first conductive units 6282 of the first conductive layer 6282 is 0.5~50 μ m, and can by full line or permutation conductive thread disappearance, cut off this moment.The interval width of two adjacent the second conductive units 6442 of described the second conductive layer 644 is the width of a filter unit 6245, and this moment can be by cutting off conductive thread marginal portion disappearance.In other embodiments, when the first conductive thread 6284 of the first conductive layer 628 when the projection of filter layer 624 all falls within on the gridline, two the first adjacent conductive units 6282 of the first conductive layer 628 also can be the same with the interval width of two the second adjacent conductive units 6442 of the second conductive layer 644, be the width of a filter unit 6245, as shown in Figure 8.
As shown in figure 10, expression be the secondconductive thread 6444 of the secondconductive layer 644 as shown in Figure 2 when projecting to filterlayer 624, each second conductive grid accommodates a filter unit 6245.As shown in figure 14, expression be the firstconductive thread 6284 of the firstconductive layer 628 as shown in Figure 2 when projecting to filterlayer 624, each first conductive grid accommodates at least one filter unit 6245.Because eachgrid cell 6243 is to there being a conductive grid, so the density of conductive grid is larger, electric conductivity is better.
Extremely shown in Figure 13 such as Figure 11, expression be that the secondconductive thread 6444 of the secondconductive layer 644 as shown in Figure 2 is when projecting on thefilter layer 624, each second conductive grid accommodates at least twofilter unit 6245, can be according to the resistance of the secondconductive layer 644 being required and the requirement of the coating weight of conductive material decidesfilter unit 6245 quantity of holding.Can be divided into three kinds of situations this moment, and take laterally as X-axis, the direction of vertical transverse is Y-axis.As shown in figure 11, only on X-direction, at least twofilter units 6245 are held in each the second conductive grid projection onfilter layer 624 of the second conductive layer 644.As shown in figure 12, only on Y direction, at least twofilter units 6245 are held in each the second conductive grid projection onfilter layer 624 of the second conductive layer 644.As shown in figure 13, on X-axis and Y direction, at least twofilter units 6245 are held in each the second conductive grid projection onfilter layer 624 of the secondconductive layer 644 simultaneously.
Extremely shown in Figure 17 such as Figure 15, expression be that the firstconductive thread 6284 of the firstconductive layer 628 as shown in Figure 2 is when projecting to filterlayer 624, each first conductive grid accommodates at least twofilter units 6245, can be according to the resistance of the firstconductive layer 628 being required and the requirement of the coating weight of conductive material decidesfilter unit 6245 quantity of holding.Also can be divided into three kinds of situations this moment, and take laterally as X-axis, the direction of vertical transverse is Y-axis.As shown in figure 15, only on X-direction, at least twofilter units 6245 are held in each the first conductive grid projection onfilter layer 624 of the first conductive layer 628.As shown in figure 16, only on Y direction, at least twofilter units 6245 are held in each the first conductive grid projection onfilter layer 624 of the first conductive layer 628230.As shown in figure 17, on X-axis and Y direction, at least twofilter units 6245 are held in each the first conductive grid projection onfilter layer 624 of the firstconductive layer 628 simultaneously.
In present embodiment,filter unit 6245 quantity that described the first conductive grid holds in the projection of describedfilter layer 624 are not more thanfilter unit 6245 quantity that described the second conductive grid holds in the projection of described filter layer 624.Because the live width of the firstconductive thread 6284 of the first conductive grid is the distance of 0.2~5 μ m and adjacent two grid nodes is 50~500 μ m, as long as the secondconductive thread 6444 of the second conductive grid is not more than the live width of gridline.So the live width of the secondconductive thread 6444 is larger, the resistanceless.So filter unit 6245 quantity that described the first conductive grid holds in the projection of describedfilter layer 624 are arranged to be not more thanfilter unit 6245 quantity that described the second conductive grid holds in the projection of describedfilter layer 624, that is to say that the density of the first conductive grid is greater than the density of the second conductive grid, thereby reduce the resistance of the firstconductive layer 628, avoid the resistance difference of two conductive layers too large.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.