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CN103364847B - Protective lens for electronic device and manufacturing method thereof - Google Patents

Protective lens for electronic device and manufacturing method thereof
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CN103364847B
CN103364847BCN201210103831.2ACN201210103831ACN103364847BCN 103364847 BCN103364847 BCN 103364847BCN 201210103831 ACN201210103831 ACN 201210103831ACN 103364847 BCN103364847 BCN 103364847B
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material layer
pattern
protective lens
laser
thickness
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CN103364847A (en
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陈少扬
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WEIDALI INDUSTRY (SHENZHEN) Co Ltd
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Winsky Technology Ltd
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Abstract

The present invention relates to a protective lens (cover lens) for an electronic device and a method for manufacturing the same. The disclosed method of forming a protective lens comprises: forming a first material layer on at least a portion of a substrate; and engraving the first material layer by using laser to form a first pattern. The invention can solve the problems of burr on the edge of the pattern formed by the existing screen printing, uneven size and the like, and can carry out continuous processing by a simple patterning method to further improve the productivity.

Description

Translated fromChinese
电子装置的保护镜片及其制造方法Protective lens for electronic device and manufacturing method thereof

技术领域technical field

本发明涉及一种保护镜片,特定来说涉及一种电子装置的保护镜片。The invention relates to a protective lens, in particular to a protective lens of an electronic device.

背景技术Background technique

图1A显示现有电子装置的保护镜片,图1B系其截面图。一般电子装置上具有品牌或控制按键的标示图式。现有的保护镜片中,这些标示图形系利用丝网印刷的方式形成,在基板101上依厚度需求重复多次形成油墨涂层102及图案103。由于重复印刷的对准困难,油墨涂层102在多次印刷间的对准偏移量a将造成图案尺寸偏差,因而在量产过程中不易掌握图案尺寸的均匀度。FIG. 1A shows a protective lens of a conventional electronic device, and FIG. 1B is a cross-sectional view thereof. Generally, the electronic device has a mark pattern of a brand or a control button. In the existing protective lens, these marking patterns are formed by screen printing, and the ink coating 102 and pattern 103 are formed on the substrate 101 repeatedly according to the thickness requirement. Due to the difficulty in the alignment of repeated printing, the alignment offset a of the ink coating 102 between multiple printings will cause pattern size deviation, so it is difficult to grasp the uniformity of the pattern size in the mass production process.

此外,现有丝网印刷制程受限于现有丝网尺寸,所形成的图案普遍有边缘毛刺不平整的问题。再者,受限于油墨黏滞性与丝网尺寸等因素,仅能制作简单的图案,无法进行复杂的图案的制作,因而进一步限制图形的设计。油墨的挥发性亦会影响丝网印刷连续制程的稳定度,而造成连续制程中所形成的图案差异性大及产出率低等问题。In addition, the existing screen printing process is limited by the size of the existing screen, and the formed pattern generally has the problem of edge burrs and unevenness. Furthermore, due to factors such as ink viscosity and screen size, only simple patterns can be produced, but complex patterns cannot be produced, thus further limiting the design of graphics. The volatility of the ink will also affect the stability of the continuous process of screen printing, resulting in problems such as large pattern differences and low output rate formed in the continuous process.

因此,亟需一种能够适于连续制程且成本低廉的图案化电子装置保护镜片的方法,并且改善图案品质及稳定度,并且进一步提高产能。Therefore, there is an urgent need for a low-cost method for patterning electronic device protection lenses that is suitable for continuous manufacturing, improves pattern quality and stability, and further increases productivity.

发明内容Contents of the invention

为在电子装置的保护镜片(cover lens)上形成大小稳定、边缘平整的图案,本发明藉由激光雕刻进行图案化,藉此可解决重复印刷的工艺步骤复杂,以及对准困难、边缘毛刺的问题,并有效提高图案化的保护镜片之产能。In order to form a pattern with stable size and flat edges on the cover lens of an electronic device, the present invention uses laser engraving for patterning, thereby solving the problems of complicated repeat printing process steps, difficult alignment, and edge burrs problems, and effectively improve the productivity of patterned protective lenses.

本发明的实施例揭示一种形成一电子装置的一保护镜片的方法,其包含在一基板的至少一部分上形成一第一材料层;及利用一激光雕刻所述第一材料层,以形成一第一图案。Embodiments of the present invention disclose a method of forming a protective lens of an electronic device, which includes forming a first material layer on at least a portion of a substrate; and engraving the first material layer by a laser to form a first pattern.

本发明的另一实施例揭示一种电子装置之保护镜片,其包含一第一材料层,形成于一基板的至少一部分上,及一第一图案,形成于所述第一材料层中,其中所述第一图案系以激光雕刻形成。Another embodiment of the present invention discloses a protective lens for an electronic device, which includes a first material layer formed on at least a part of a substrate, and a first pattern formed in the first material layer, wherein The first pattern is formed by laser engraving.

附图说明Description of drawings

图1A显示现有电子装置的保护镜片;FIG. 1A shows a protective lens of a conventional electronic device;

图1B显示现有电子装置的保护镜片之截面图;FIG. 1B shows a cross-sectional view of a protective lens of a conventional electronic device;

图2A及2B显示本发明的形成保护镜片的方法之实施例;2A and 2B show an embodiment of the method of forming a protective lens of the present invention;

图2C显示本发明所形成的保护镜片之一实施例;Figure 2C shows an embodiment of the protective lens formed by the present invention;

图3显示本发明所形成的保护镜片之另一实施例;及Figure 3 shows another embodiment of the protective lens formed by the present invention; and

图4显示本发明所形成的保护镜片之又一实施例。Fig. 4 shows another embodiment of the protective lens formed by the present invention.

具体实施方式Detailed ways

图2A-2B显示本发明所揭示之形成电子装置保护镜片的方法。首先,如图2A所示,在基板201的至少一部分上形成第一材料层202;接着,如图2B所示,利用激光203雕刻所述第一材料层202,形成第一图案204。图2C显示藉由本发明提供的方法所形成的第一图案204边缘平整,并且尺寸均匀。所形成之第一图案204可为品牌的标志、控制按键图式或其它所需要的图案。藉由本发明之方法,可简化现有的丝网印刷制程,以单一图案化的步骤形成所需的图案,简化工艺制程,解决多次丝网印刷对准不易、图案边缘毛刺不平整等等问题,而得到图形尺寸稳定,且边缘质量良好。2A-2B show a method for forming a protective lens for an electronic device disclosed in the present invention. First, as shown in FIG. 2A , a first material layer 202 is formed on at least a part of the substrate 201 ; then, as shown in FIG. 2B , the first material layer 202 is engraved by a laser 203 to form a first pattern 204 . FIG. 2C shows that the edge of the first pattern 204 formed by the method provided by the present invention is flat and uniform in size. The formed first pattern 204 can be a brand logo, a control button pattern or other desired patterns. With the method of the present invention, the existing screen printing process can be simplified, the required pattern can be formed in a single patterning step, the process can be simplified, and the problems such as difficult alignment of multiple screen printings and uneven burrs on the edge of the pattern can be solved. , and the obtained graphics are dimensionally stable with good edge quality.

在一优选实施例中,其中所述第一材料系一种油墨,可以系导电油墨,或不导电油墨,其系以印刷方式形成,包含丝网印刷、压印、喷墨印刷,亦或可以旋覆涂布等方式,将油墨形成于基板的至少一部分。更进一步地,第一材料层202的厚度范围约在100μm以下,依实际设计需求而定。在又一优选实施例中,厚度范围约在3-60μm之间,在另一优选实施例中,厚度范围约在10-70μm之间。In a preferred embodiment, wherein the first material is a kind of ink, which can be conductive ink, or non-conductive ink, which is formed by printing, including screen printing, embossing, inkjet printing, or can be The ink is formed on at least a part of the substrate by spin coating or the like. Furthermore, the thickness range of the first material layer 202 is approximately below 100 μm, which depends on actual design requirements. In yet another preferred embodiment, the thickness is in the range of about 3-60 μm, and in another preferred embodiment, the thickness is in the range of about 10-70 μm.

藉由激光刻印第一材料层202的深度d可以等于第一材料层202的厚度h,如图2B显示之截面图,或如图3所示第一图案204的深度d小于第一材料层202的厚度h,使在基板201上形成半镂空的的图形。在优选实施例中,可以通过控制激光的能量雕刻不同程度的半镂空图案,可使电子装置在操作中,图案形成背光半透的效果。The depth d of the first material layer 202 by laser marking can be equal to the thickness h of the first material layer 202, as shown in the cross-sectional view of FIG. 2B, or the depth d of the first pattern 204 is smaller than the first material layer 202 as shown in FIG. The thickness h is such that a semi-hollow pattern is formed on the substrate 201 . In a preferred embodiment, different degrees of semi-hollow patterns can be engraved by controlling the energy of the laser, so that the pattern forms a backlight semi-transparent effect during operation of the electronic device.

在优选实施例中,可以根据油墨的颜色、材料、厚度等状况,进一步调整激光的能量、焦距及点间距等至少一种参数,而达到所欲形成图案。此外,藉由调整激光的光点尺寸,甚至可以进行直径小于10μm的图案化,完成复杂图形的制作。更进一步的,可以在激光设备中设定连续操作的程序,即可以连续作业而进一步提高产出率。In a preferred embodiment, according to the color, material, thickness and other conditions of the ink, at least one parameter such as laser energy, focal length and dot pitch can be further adjusted to achieve the desired pattern formation. In addition, by adjusting the spot size of the laser, even patterning with a diameter of less than 10 μm can be performed to complete the production of complex graphics. Furthermore, a continuous operation program can be set in the laser equipment, that is, continuous operation can be performed to further increase the output rate.

在一优选实施例中,保护镜片之功能涂层的激光雕刻镂空图形工艺方法,主要工艺路径如下:In a preferred embodiment, the laser engraving hollow pattern process method of the functional coating of the protective lens, the main process path is as follows:

第一步:将所要镂空图形制作成电子图档(CAD,Coreldraw,Pro/E等);The first step: Make the hollowed out graphics into electronic graphics files (CAD, Coreldraw, Pro/E, etc.);

第二步:将电子图档导入到激光雕刻机连接的软件中,转换成激光雕刻程序;Step 2: Import the electronic graphic file into the software connected to the laser engraving machine, and convert it into a laser engraving program;

第三步:调试激光雕刻机,设置雕刻参数;及Step 3: Debug the laser engraving machine, set the engraving parameters; and

第四步:将印有功能涂层的保护镜片放置在激光雕刻机加工平台上,根据功能涂层的颜色、厚度调整焦距、能量、点间距等参数,至首件通过即可连续作业。Step 4: Place the protective lens printed with functional coating on the laser engraving machine processing platform, adjust parameters such as focal length, energy, and dot spacing according to the color and thickness of the functional coating, and continue to work until the first piece passes.

在优选实施例中,基板201可以系玻璃、塑料、树脂、压克力、聚甲基丙烯酸甲酯(PMMA)、硅或弹性基板,或其复合材料。In a preferred embodiment, the substrate 201 can be glass, plastic, resin, acrylic, polymethyl methacrylate (PMMA), silicon or elastic substrate, or composite materials thereof.

图4显示又一优选实施例的保护镜片。在第一材料层402上,可进一步形成一第二材料层405,再以激光403雕刻而形成第二图案404,其中第二材料可以系导电油墨,其包含银胶、导电碳、导电高分子、聚(二辛基-双硫酚)(PEDOT)、含有奈米金属粒子,例如奈米金、奈米银或包含有其它导电性材料的墨水等等。又一优选实施例中,第二材料层405可以系由丝网印刷、压印、喷墨印刷或旋覆涂布等方式形成于第一材料层402上。第二材料层405可以单独图案化,或与第一材料层402一并通过激光雕刻图案化。Figure 4 shows a protective lens of yet another preferred embodiment. On the first material layer 402, a second material layer 405 can be further formed, and then engraved with a laser 403 to form a second pattern 404, wherein the second material can be conductive ink, which includes silver glue, conductive carbon, conductive polymer , poly(dioctyl-dithiophenol) (PEDOT), ink containing nano-metal particles, such as nano-gold, nano-silver or other conductive materials, etc. In yet another preferred embodiment, the second material layer 405 can be formed on the first material layer 402 by screen printing, embossing, inkjet printing or spin coating. The second material layer 405 may be patterned alone, or together with the first material layer 402 by laser engraving.

又一优选实施例中第二图案404可包含电子装置所需的电路,例如感测电路、驱动电路、电极、导电边框、互连电路等等。所形成之保护镜片可应用到平板电脑,液晶电视,手机屏幕等视窗类电子产品以及其他玻璃镜片类产品(如打印机玻璃盖板等)。In yet another preferred embodiment, the second pattern 404 may include circuits required by electronic devices, such as sensing circuits, driving circuits, electrodes, conductive frames, interconnection circuits, and the like. The formed protective lens can be applied to window electronic products such as tablet computers, LCD TVs, and mobile phone screens, as well as other glass lens products (such as printer glass covers, etc.).

在一优选实施例中,可以依图形设计调整激光雕刻的深度,可以激光单独雕刻第二材料层405,亦可以一次雕刻第一材料层402及第二材料层405,亦即激光雕刻的深度可以小于或等于第一材料层402及第二材料层405的总厚度。In a preferred embodiment, the depth of laser engraving can be adjusted according to the graphic design, the second material layer 405 can be engraved by laser alone, or the first material layer 402 and the second material layer 405 can be engraved at one time, that is, the depth of laser engraving can be Less than or equal to the total thickness of the first material layer 402 and the second material layer 405 .

虽然本发明的技术内容与特征为如上所述,然而,所属领域的技术人员仍可在不背离本发明的教示与揭示内容的情况下进行许多变化与修改。因此,本发明的范围并不限定于已揭示的实施例,而是包含不背离本发明的其它变化与修改,其为如所附权利要求书所涵盖的范围。Although the technical content and features of the present invention are as described above, those skilled in the art can make many changes and modifications without departing from the teaching and disclosure of the present invention. Accordingly, the scope of the present invention is not limited to the disclosed embodiments, but includes other changes and modifications without departing from the invention, which are covered by the appended claims.

Claims (13)

Translated fromChinese
1.一种形成一电子装置的一保护镜片的方法,其包含:1. A method of forming a protective lens for an electronic device, comprising:在一基板的至少一部分上形成一第一材料层;forming a first material layer on at least a portion of a substrate;利用一激光雕刻所述第一材料层,以形成一第一图案;engraving the first material layer with a laser to form a first pattern;形成一第二材料层于所述第一材料层上;以及forming a second material layer on the first material layer; and利用所述激光雕刻所述第二材料层,以形成一第二图案,engraving the second material layer with the laser to form a second pattern,其中所述第一图案不同于所述第二图案。Wherein the first pattern is different from the second pattern.2.根据权利要求1所述的方法,其中形成所述第一材料层系以印刷方式形成,而所述第一材料层系一厚度范围在100μm以下之油墨层。2. The method according to claim 1, wherein forming the first material layer is formed by printing, and the first material layer is an ink layer with a thickness ranging below 100 μm.3.根据权利要求2所述的方法,其中所述第一材料层的厚度范围在3-60μm之间。3. The method according to claim 2, wherein the thickness of the first material layer is in the range of 3-60 μm.4.根据权利要求2所述的方法,其中所述第一图案之深度小于或等于所述第一材料层的厚度。4. The method of claim 2, wherein the depth of the first pattern is less than or equal to the thickness of the first material layer.5.根据权利要求1所述的方法,其中所述第二材料层的材料系一导电材料,且其中所述激光雕刻的深度小于所述第一材料层及所述第二材料层的总厚度。5. The method according to claim 1, wherein the material of the second material layer is a conductive material, and wherein the depth of the laser engraving is less than the total thickness of the first material layer and the second material layer .6.根据权利要求1所述的方法,其中所述激光雕刻之步骤包含根据所述第一材料层之颜色、厚度或材料,调整激光之焦距、能量及点间距之至少一种参数。6. The method of claim 1, wherein the step of laser engraving comprises adjusting at least one parameter of laser focus, energy and spot pitch according to the color, thickness or material of the first material layer.7.一种电子装置的保护镜片,其包含:7. A protective lens for an electronic device, comprising:一第一材料层,形成于一基板的至少一部分上,a first material layer formed on at least a portion of a substrate,一第一图案,形成于所述第一材料层中,其中所述第一图案系以激光雕刻形成,及a first pattern formed in the first material layer, wherein the first pattern is formed by laser engraving, and一第二材料层,其形成于所述第一材料层上且具有以激光雕刻的一第二图案,a second material layer formed on the first material layer and having a second pattern engraved by laser,其中所述第一图案不同于所述第二图案。Wherein the first pattern is different from the second pattern.8.根据权利要求7所述的保护镜片,其中所述第一材料层系一厚度范围在100μm以下之油墨层。8. The protective lens according to claim 7, wherein the first material layer is an ink layer with a thickness ranging below 100 μm.9.根据权利要求8所述的保护镜片,其中所述第一材料层的厚度范围在3-60μm之间。9. The protective lens according to claim 8, wherein the thickness of the first material layer is in the range of 3-60 μm.10.根据权利要求8所述的保护镜片,其中所述第一图案的深度小于或等于所述第一材料层的厚度。10. The protective lens of claim 8, wherein the depth of the first pattern is less than or equal to the thickness of the first material layer.11.根据权利要求7所述的保护镜片,其中所述第二材料层的材料系一导电材料。11. The protective lens according to claim 7, wherein the material of the second material layer is a conductive material.12.根据权利要求11所述的保护镜片,其中所述第二图案包含下列至少之一者:感测电路、驱动电路、电极及导电边框。12. The protective lens according to claim 11, wherein the second pattern comprises at least one of the following: a sensing circuit, a driving circuit, an electrode, and a conductive frame.13.根据权利要求7所述的保护镜片,其中所述基板系玻璃、塑料、聚甲基丙烯酸甲酯、硅、弹性基板或其复合材料。13. The protective lens according to claim 7, wherein the substrate is glass, plastic, polymethyl methacrylate, silicon, elastic substrate or a composite thereof.
CN201210103831.2A2012-04-102012-04-10 Protective lens for electronic device and manufacturing method thereofActiveCN103364847B (en)

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TW102101870ATWI508873B (en)2012-04-102013-01-17 Protective lens for electronic device and method of manufacturing the same
KR20130038432AKR101479837B1 (en)2012-04-102013-04-09Cover lens of electronic device and manufacturing method thereof

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN116719108B (en)*2023-06-082025-07-29西安电子科技大学Preparation method of electrodeless zoom terahertz liquid lens based on super oleophobic-oleophilic surface

Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
TW201115442A (en)*2009-10-232011-05-01M Solv LtdCapacitive touch panels
CN102236484A (en)*2010-04-302011-11-09永恒科技有限公司Method for patterning substrate and method for manufacturing capacitive touch panel
CN102236452A (en)*2010-04-302011-11-09永恒科技有限公司Touch panel
CN102243546A (en)*2010-05-132011-11-16永恒科技有限公司Touch panel and manufacturing method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US20100053114A1 (en)*2007-02-082010-03-04Hiroyuki KaigawaTouch panel apparatus and method for manufacturing the same
KR20110042943A (en)*2009-10-202011-04-27삼성전기주식회사 Marking method of substrate and substrate marked using same
KR101076326B1 (en)*2010-02-122011-10-26위아코퍼레이션 주식회사A method of forming fine pattern on multi-layer structure
TWM409514U (en)*2011-02-172011-08-11Ichia Tech IncKeypad structure having an engraved pattern and keypad panel semi-structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
TW201115442A (en)*2009-10-232011-05-01M Solv LtdCapacitive touch panels
CN102236484A (en)*2010-04-302011-11-09永恒科技有限公司Method for patterning substrate and method for manufacturing capacitive touch panel
CN102236452A (en)*2010-04-302011-11-09永恒科技有限公司Touch panel
CN102243546A (en)*2010-05-132011-11-16永恒科技有限公司Touch panel and manufacturing method thereof

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