CN103345321A - Optical filter box and touch display screen - Google Patents

Abstract

The invention relates to an optical filter box which comprises a transparent substrate, a first conducting layer, an imprinting glue layer, a second conducting layer, a shading matrix layer and a color photoresist layer. The transparent substrate comprises a first surface and a second surface, and the first surface and the second surface are arranged in an opposite mode. The first conducting layer comprises first conducting patterns arranged on the first surface. The imprinting glue layer is arranged on the first surface and the first conducting layer. The second conducting layer comprises second conducting patterns arranged on one side, far from the first surface, of the imprinting glue layer in an embedded mode. The first conducting patterns and the second conducting patterns are arranged at intervals in the thickness direction of the imprinting glue layer to form a sensing structure. The shading matrix layer is arranged on the second surface. The color photoresist layer is arranged on the second surface. The wire width of conducting wires of the first conducting layer and conducting wires of the second conducting layer is 0.2-5 micrometers. The optical filter box can achieve touch operation and filtering, is beneficial to reducing the thickness of electronic equipment, and saves materials and assembly cost. The invention further provides a touch display screen.

Description

Optical filter box and touch display screen

Technical field

The present invention relates to the plane and show the field, particularly relate to the touch display screen of a kind of optical filter box and this optical filter box of use.

Background technology

Touch-screen is a kind of inductive arrangement that touches input signal that receives.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.

At present, having the electronic product that touches Presentation Function includes display screen and is positioned at touch-screen on the display screen.Yet, touch-screen as with display screen assembly independently, when being used for the electronic product that some realize man-machine interactions, all need to order according to the size of display screen, assemble afterwards, with the formation touch display screen, but touch display screen can have touch control operation and Presentation Function simultaneously again.The assembling of existing touch-screen and display screen mainly contains dual mode, and namely frame pastes and full the applying.The frame subsides are to be fitted in the edge of touch-screen and display screen, and full applying is whole the applying of upper surface with lower surface and the display screen of touch-screen.

Display screen mainly comprises polaroid, optical filter box, Liquid Crystal Module and thin film transistor (TFT) (the Thin Film Transistor of stack successively, TFT), therefore display screen itself has had bigger thickness, and when continuing on the display screen applying touch-screen, to further increase its thickness, moreover, many one attaching process, just meaning has increased the bad probability of product, increases production cost of products greatly.

Summary of the invention

Based on this, be necessary to provide a kind of touch display screen that is conducive to reduce the optical filter box of electronic installation thickness and uses this optical filter box.

A kind of optical filter box comprises:

Transparent base; Comprise the first surface and the second surface that are oppositely arranged;

First conductive layer comprises first conductive pattern of being located on the described first surface, and described first conductive pattern comprises continuous conductive grid, and described conductive grid is intersected to form by conductive thread;

The impression glue-line is arranged on described first surface and described first conductive pattern, and described first conductive pattern is embedded in the side of described impression glue-line near described first surface;

Second conductive layer, comprise and being embedded at second conductive pattern of described impression glue-line away from a side of described first surface, described second conductive pattern comprises continuous conductive grid, described conductive grid is intersected to form by conductive thread, and described first conductive pattern and described second conductive pattern space on the thickness direction of described impression glue-line forms induction structure;

The shading matrix layer is arranged on the described second surface, and described shading matrix layer comprises cross one another ruling, and described ruling intersects to form a plurality of grid cells; And

The colorama resistance layer is arranged on the described second surface, comprises a plurality of chromatic photoresists unit, and each described chromatic photoresist unit is arranged in a described grid cell;

Wherein, the live width of the conductive thread of described first conductive pattern and described second conductive pattern is 0.2 micron～5 microns.

Among embodiment, described conductive thread intersects to form grid node mutually therein, and the distance between the two adjacent grid nodes is 50 microns～500 microns.

Among embodiment, the projection of conductive thread on described shading matrix layer of one of them layer falls on the ruling of described shading matrix layer in described first conductive pattern and described second conductive pattern therein.

Among embodiment, the live width of described conductive thread is less than the width of described ruling therein.

Among embodiment, described conductive grid comprises a plurality of grid cells therein, and a chromatic photoresist unit is held in the projection of each grid cell on described colorama resistance layer at least.

Therein among embodiment, described first conductive layer is handled first conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken, described second conductive layer is handled second conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken.

Therein among embodiment, the interval width of two adjacent described first conductive patterns in described first conductive layer is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive patterns in described second conductive layer is 0.5 micron～50 microns.

Among embodiment, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer therein.

Therein among embodiment, described impression glue-line offers the groove of shape and described second conductive pattern coupling, described second conductive pattern is contained in the described groove, the degree of depth of described groove is less than the thickness of described impression glue-line, and the thickness of described second conductive pattern is smaller or equal to the degree of depth of described groove.

A kind of touch display screen comprises the film crystal pipe electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, and described optical filter box is as above any described optical filter box.

Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be realized touch control operation and filtering functions simultaneously, combination as indispensable two assemblies in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not to assemble a touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.

Description of drawings

Fig. 1 is the structural representation of the touch display screen of an embodiment;

Fig. 2 is the diagrammatic cross-section of optical filter box shown in Figure 1;

Fig. 3 is the schematic perspective view of the optical filter box of an embodiment;

Fig. 4 is a conductive layer vertical view shown in Figure 3;

Fig. 5 is the diagrammatic cross-section of the optical filter box of another embodiment;

Fig. 6 is the diagrammatic cross-section of the optical filter box of another embodiment;

Fig. 7 is the structural representation of the conductive thread of an embodiment;

Fig. 8 is the structural representation of the conductive thread of another embodiment;

Fig. 9 is the structural representation of the conductive thread of another embodiment;

Figure 10 is the structural representation of the conductive thread of another embodiment;

Figure 11 is the diagrammatic cross-section of the optical filter box of another embodiment.

Embodiment

For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public concrete enforcement.

Need to prove that when element is called as " being fixed in " another element, can directly can there be element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be to be directly connected to another element or may to have element placed in the middle simultaneously.

Unless otherwise defined, the employed all technology of this paper are identical with the implication that belongs to those skilled in the art's common sense of the present invention with scientific terminology.Employed term is not intended to be restriction the present invention just in order to describe the purpose of specific embodiment in instructions of the present invention herein.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.

The present invention proposes a kind of optical filter box and uses the touch display screen of this optical filter box.This optical filter box can be realized touch operation and optical filter function, thereby makes touch display screen have the touch Presentation Function.

See also Fig. 1, the touch display screen 100 of an embodiment comprises the following polaroid 10, TFT electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50,optical filter box 200 and the polaroid 60 that stack gradually.

(Thin Film Transistor, TFT) structure and the function of electrode 20, Liquid Crystal Module 30, public electrode 40, diaphragm 50 and last polaroid 60 can be identical with existing product, do not repeat them here for the following polaroid 10 of present embodiment, thin film transistor (TFT).

Be appreciated that for using backlight as polarized light source, as the OLED polarized light source, then need not down polaroid 10, only need polaroid 60 to get final product.Diaphragm 50 also can omit.

Optical filter box 200 has tangible operation and filtering functions simultaneously, makes display screen have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side entering type light source.

Following emphasis is describedoptical filter box 200.

See also Fig. 2,optical filter box 200 comprisetransparent base 22, impression glue-line 24, firstconductive layer 25, secondconductive layer 26, shading matrix layer (Black Matrix, BM) 27, colorama resistance layer 28.Firstconductive layer 25 and secondconductive layer 26 space on the thickness direction of impression glue-line 24 forms induction structure.

Transparent base 22 comprisesfirst surface 222 and second surface 224.The material oftransparent base 22 is the transparent insulation material, as glass.Particularly, glass can be sillico aluminate glass or calcium soda-lime glass.

Impression glue-line 24 arranges on thefirst surface 222 and firstconductive layer 25 of transparent base 22.Impression glue-line 24 is transparence, and thickness is 2 microns～10 microns, does not therefore influence the transmittance ofoptical filter box 200 integral body.The material of impression glue-line 24 can be solvent-free ultra-violet curing acrylic resin, visible-light curing resin or heat reactive resin.

Firstconductive layer 25 arranges on thefirst surface 222, and is embedded in the side of impression glue-line 24 near thefirst surface 222 of transparent base 22.Firstconductive layer 25 comprises first conductive pattern 252.Firstconductive pattern 252 can obtain through etching by atfirst surface 222 plating/matel coated layers again.The material of metal level can be at least a in the metals such as gold, silver, copper, aluminium, zinc, tin and molybdenum.

See also Fig. 3, firstconductive pattern 252 comprises continuous conductive grid, and conductive grid is intersected to form by conductive thread a, and the basic grid that conductive thread a forms can be regular polygon, as square, rhombus, regular hexagon etc.The basic grid that conductive thread a forms can also be random grid.Conductive thread a can straight line, curve or broken line.The live width of conductive thread a is 0.2 micron～5 microns, satisfying under the condition of above-mentioned live width, can realize the transparent effect of conductive thread a, and namely naked eyes are invisible.Conductive thread a intersects to form grid node mutually, and the distance between adjacent two grid nodes is 50 microns～500 microns, so can further improve the transmittance of firstconductive pattern 252.

See also Fig. 2, secondconductive layer 26 is arranged on impression glue-line 24 away from a side of transparent base 22.Secondconductive layer 26 comprises second conductive pattern 262.Can be by offering the groove 242 that shape and secondconductive pattern 262 mate at impression glue-line 24 away from a side oftransparent base 22, make secondconductive pattern 262 after the filled conductive material solidifies again in the groove 242 again.The degree of depth of groove 242 is less than the thickness of impression glue-line 24, and the thickness of secondconductive pattern 262 is smaller or equal to the degree of depth of groove 242.In the present embodiment, the thickness of secondconductive pattern 262 equals the degree of depth of groove 242.The conductive material of filling can be metal, carbon nano-tube, and Graphene, organic conductive macromolecule and ITO are preferably metal, as nanometer silver paste.When adopting the impression mode, the degree of depth of groove 242 is less than the thickness of impression glue-line 24, and the thickness of the conductive material of accommodating in the groove 242 is smaller or equal to the degree of depth of groove 242, can avoid conductive layer in successive process by scratch.

See also Fig. 3, secondconductive pattern 262 comprises continuous conductive grid, and conductive grid is intersected to form by conductive thread a.The basic grid that conductive thread a forms can be regular polygon, as square, rhombus or regular hexagon etc.The basic grid that conductive thread a forms can also be random grid.Conductive thread a can straight line, curve or broken line.The live width of conductive thread a is 0.2 micron～5 microns, satisfying under the condition of above-mentioned live width, can realize the transparent effect of conductive thread a, and namely naked eyes are invisible.Conductive thread a intersects to form grid node mutually, and the distance between adjacent two grid nodes is 50 microns～500 microns, so can further improve the transmittance of firstconductive pattern 252.

See also Fig. 4, arbitrary conductive layer is handled the synoptic diagram of the space of a plurality of conductive patterns that obtain in firstconductive layer 25 and secondconductive layer 26 by broken string.Wherein, a plurality of firstconductive patterns 252 and the 262 difference space insulation of a plurality of second conductive pattern form induction structure.The processing (seeing square frame b place on the figure) of breaking obtains firstconductive pattern 252 of space insulation to the conductive thread a of whole firstconductive layer 25, and the internodal distance of conductive thread two broken strings is 0.5 micron～50 microns.252 separate, insulation that a plurality of first conductive patterns conduct electricity.Equally, the conductive thread a of whole secondconductive layer 26 broken handling breaks handles secondconductive pattern 262 that obtains the space insulation, the internodal distance of two broken strings of conductive thread a is 0.5 micron～50 microns.262 separate, insulation that a plurality of second conductive patterns conduct electricity.

In one embodiment, in firstconductive layer 25 and secondconductive layer 26, conductive thread a can aim at the ruling ofshading matrix layer 27, also can misalignment.As shown in Figure 2, conductive thread a in firstconductive layer 25 aims at ruling, and the conductive thread a of secondconductive layer 26 does not aim at ruling, because the live width of conductive thread a is 0.2 micron～5 microns, therefore conductive thread a itself is visually-clear, can not influence transmittance.

In another embodiment, see also Fig. 5, the conductive thread a in firstconductive layer 25 and secondconductive layer 26 all falls on the ruling ofshading matrix layer 27 in the projection of shading matrix layer 27.And the width of conductive thread a is exposed to the outer risk of ruling less than the width of ruling to reduce conductive thread a.

See also Fig. 6, in another embodiment, the conductive thread a in firstconductive layer 25 and secondconductive layer 26 all falls on the ruling ofshading matrix layer 27 in the projection of shading matrix layer 27.The live width of conductive thread a can equate with the width of ruling.What the live width of conductive thread a can be done like this is wideer, to reduce the manufacture difficulty of conductive thread.And that can not expose that shadingmatrix layer 27 influences chromatic photoresist to chromatic photoresist zone goes out light effect and product appearance effect.

The basic grid shape of the conductive thread a of firstconductive layer 25 and secondconductive layer 26 can with the similar fitgures that are shaped as ofshading matrix layer 27 grid, namely with the similar fitgures that are shaped as of thechromatic photoresist unit 282 ofcolorama resistance layer 28, the intersection point of the projection of grid onshading matrix layer 27 that conductive thread a forms overlaps with the ruling intersection point of shading matrix layer 27.At least onechromatic photoresist unit 282 is held in the projection of basic grid unit oncolorama resistance layer 27 of the conductive thread a of firstconductive layer 25 and secondconductive layer 26, wherein is divided into four kinds of situations:

1, the basic grid unit of conductive thread a is corresponding one by one withchromatic photoresist unit 282, and namely the mesh lines of conductive thread a is apart from being shadingmatrix layer 24 and adjacent two distance between center lines, as shown in Figure 7.2, only on first axial (for example transverse axis), the mesh lines of conductive thread a is apart from being theshading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, the i.e. projection of basic grid unit onshading matrix layer 24 at the conductive thread a of X direction comprises a plurality of completechromatic photoresist unit 282, as shown in Figure 8.3, only on second axial (for example longitudinal axis), the mesh lines of conductive thread a is apart from being theshading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, the i.e. projection of basic grid unit onshading matrix layer 24 at the conductive thread a of y direction comprises a plurality of completechromatic photoresist unit 282, as shown in Figure 9.4, first axially and second axially on, the mesh lines of conductive thread a is apart from all being theshading matrix layer 24 same axially integral multiple of adjacent two distance between center lines, the i.e. projection of basic grid unit onshading matrix layer 24 at the conductive thread a of transverse axis and y direction all comprises a plurality of completechromatic photoresist unit 282, as shown in figure 10.

See also Figure 11,shading matrix layer 27 is arranged on thesecond surface 224 of transparent base 22.Shading matrix layer 27 comprises cross one another ruling, and these rulings intersect to form a plurality of grid cells.Grid cell is used for accommodating the chromatic photoresist material.The material ofshading matrix layer 27 is photoresist or the crome metal that has black dyes, and it can adopt exposure, developing manufacture process to obtain.

Coloramaresistance layer 28 is arranged on thesecond surface 224 of transparent base 22.Coloramaresistance layer 28 comprises a plurality ofchromatic photoresists unit 282, and eachchromatic photoresist unit 282 is arranged in a corresponding grid cell.The material ofcolorama resistance layer 28 can be for having the photoresist of coloured dye, for example red (red, R), green (green, G), blue (colorama resistance layer 28 can adopt exposure, developing manufacture process acquisition for blue, color such as B).Coloramaresistance layer 28 is distributed among the grid cell ofshading matrix layer 27 formation, and namelycolorama resistance layer 28 andshading matrix layer 27 are distributed on thesecond surface 224 of transparent base 22.In the present embodiment, the chromatic photoresist ofcolorama resistance layer 28 is the R/G/B chromatic photoresist.

As shown in figure 11, the thickness ofcolorama resistance layer 28 can increase the light emission rate of light like this greater than the thickness of shading matrix layer 27.If the thickness ofcolorama resistance layer 28 is less than the thickness ofshading matrix layer 27, looking then thatcolorama resistance layer 28 is similar to is embedded inshading matrix layer 27,shading matrix layer 27 covers light, therefore 26 light that come out can only be seen from the front from the colorama resistance layer, the side is then blocked by shadingmatrix layer 27 easily, is unfavorable for bright dipping.And work as the thickness ofcolorama resistance layer 28 greater than the thickness ofshading matrix layer 27; the top ofcolorama resistance layer 28 is similar to and embeds in the impression glue-line 24; impression glue-line 24 is filled and led up the gap between the chromatic photoresist, and impression glue-line 24 plays the effect of protection chromatic photoresist and grid moulding simultaneously.In other embodiments, the thickness ofcolorama resistance layer 28 equals the thickness ofshading matrix layer 27.

The above-mentionedoptical filter box 200 that has the touch-control effect, its manufacturing process is as follows:

(1) first surface and the second surface at glass baseplate at first carries out the Plasma processing, removes the dirty of first, second surface of glass, and makes surface ionization, increases follow-up and cohesive force other material.

(2) at whole metal cladding of glass baseplate first surface or be coated with layer of metal conductive ink (present embodiment is adopted as argent),

(3) be coated with one deck photoresist then, through overexposure-developing technique, only keep the photoresist that covers first conductive pattern portions, the photoresist that all the other are local is removed;

(4) utilize metal etch liquid that above-mentioned metal level is carried out etching, obtain the conductive thread of first conductive pattern of required pattern.

(5) at above-mentioned whole coating impression of the glass basic surface glue (present embodiment adopts PMMA UV cured resin) that covers first conductive pattern, and use the impression block that is nested with second conductive pattern to impress on impression glue surface and solidify, obtain the grid groove of required second conductive pattern;

(6) filled conductive material and solidifying in the grid groove of second conductive pattern, conductive material can be metal, carbon nano-tube, Graphene, organic conductive macromolecule and ITO form the conductive grid that conductive thread constitutes; Be preferably metal (as nanometer silver paste);

(7) (can be the transparency protected rete that is coated with/plates, final products keep to cover layer protective layer at the whole face of impression glue-line and second conductive pattern surface; Also can be one deck intermediate process diaphragm, remove at last), to avoid when making the pattern of shading matrix layer and colorama resistance layer, influencing the effect of second conductive pattern.

(8) be coated with/plate light screening material at the whole face of the second surface of substrate of glass;

(9) adopt exposure-developing technique, the light screening material in chromatic photoresist zone is removed, obtain the shading matrix layer.

(10) plate/coat the R/G/B chromatic photoresist in the corresponding region gradation, obtain the colorama resistance layer.

Wherein, that uses in above-mentioned the 7th step is the intermediate process diaphragm, also needs it is removed after the 10th step)

In above-mentioned optical filter box and the touch display screen, in the touch display screen of above-mentioned optical filter box and this optical filter box of use, comprise glass substrate, be arranged on impression glue-line on the glass substrate, be distributed in the impression glue-line both sides first conductive layer and second conductive layer and be arranged on shading matrix layer and the colorama resistance layer of impression glue-line, first conductive layer and the insulation of the second conductive layer space form induction structure.Optical filter box can be realized touch control operation and filtering functions simultaneously, combination as indispensable two assemblies in the display screen, when being used for display screen, can directly make display screen have touch controllable function, need not again at display screen assembling one touch-screen, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.

Further, conductive layer is arranged on the both sides of impression glue-line, avoided the scratch of conductive layer, and the live width of the conductive thread of conductive layer is 0.2 micron～5 microns.Conductive thread is in above-mentioned live width scope, and no matter whether conductive thread is aimed at the ruling of shading matrix, can guarantee the visually-clear effect.

In addition, above-mentioned optical filter box and touch display screen also have following advantage:

(1) first conductive thread obtains by metal etch; Second conductive thread adopts the impression mode to make, by this dual mode, conductive filament in first conductive layer and second conductive layer all can be visually-clear, and therefore, the material that conductive pattern is selected for use can only expand all suitable conductive materials to transparent material by tradition.When the conductive material of conductive thread is selected metal material for use, the energy consumption that can reduce resistance greatly and reduce touch-screen.

(2) above-mentioned optical filter box with touch controllable function is double-deck conductive structure, and the design that need not to put up a bridge reduces task difficulty greatly.

(3) above-mentioned conductive pattern adopts the metal grill structure, adopts imprint process to make, compared to the technology of traditional ITO film as conductive layer, mesh shape can form in a step, and technology is simple, does not need expensive device such as sputter, evaporation, the yield height is fit to large tracts of land, production in enormous quantities.And if with metal replacement ITO, material cost reduces greatly, owing to do not need to use etching technics, can not cause the waste of conductive, and environmentally friendly.

The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. an optical filter box is characterized in that, comprising:

Transparent base; Comprise the first surface and the second surface that are oppositely arranged;

First conductive layer comprises first conductive pattern of being located on the described first surface, and described first conductive pattern comprises continuous conductive grid, and described conductive grid is intersected to form by conductive thread;

The impression glue-line is arranged on described first surface and described first conductive pattern, and described first conductive pattern is embedded in the side of described impression glue-line near described first surface;

Second conductive layer, comprise and being embedded at second conductive pattern of described impression glue-line away from a side of described first surface, described second conductive pattern comprises continuous conductive grid, described conductive grid is intersected to form by conductive thread, and described first conductive pattern and described second conductive pattern space on the thickness direction of described impression glue-line forms induction structure;

The shading matrix layer is arranged on the described second surface, and described shading matrix layer comprises cross one another ruling, and described ruling intersects to form a plurality of grid cells; And

The colorama resistance layer is arranged on the described second surface, comprises a plurality of chromatic photoresists unit, and each described chromatic photoresist unit is arranged in a described grid cell;

Wherein, the live width of the conductive thread of described first conductive pattern and described second conductive pattern is 0.2 micron～5 microns.

2. optical filter box according to claim 1 is characterized in that, described conductive thread intersects to form grid node mutually, and the distance between the two adjacent grid nodes is 50 microns～500 microns.

3. optical filter box according to claim 1 is characterized in that, the projection of conductive thread on described shading matrix layer of one of them layer falls on the ruling of described shading matrix layer in described first conductive pattern and described second conductive pattern.

4. optical filter box according to claim 3 is characterized in that, the live width of described conductive thread is less than the width of described ruling.

5. optical filter box according to claim 1 is characterized in that, described conductive grid comprises a plurality of grid cells, and a chromatic photoresist unit is held in the projection of each grid cell on described colorama resistance layer at least.

6. optical filter box according to claim 1, it is characterized in that, described first conductive layer is handled first conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken, described second conductive layer is handled second conductive pattern that obtains a plurality of spaces by whole complete conductive grid broken.

7. optical filter box according to claim 6, it is characterized in that, the interval width of two adjacent described first conductive patterns in described first conductive layer is 0.5 micron～50 microns, and the interval width of two adjacent described second conductive patterns in described second conductive layer is 0.5 micron～50 microns.

8. optical filter box according to claim 1 is characterized in that, the thickness of described colorama resistance layer is more than or equal to the thickness of described shading matrix layer.

9. optical filter box according to claim 1, it is characterized in that, described impression glue-line offers the groove of shape and described second conductive pattern coupling, described second conductive pattern is contained in the described groove, the degree of depth of described groove is less than the thickness of described impression glue-line, and the thickness of described second conductive pattern is smaller or equal to the degree of depth of described groove.

10. a touch display screen comprises the film crystal pipe electrode, Liquid Crystal Module, optical filter box and the polaroid that stack gradually, it is characterized in that, described optical filter box is as any described optical filter box of claim 1～9.

Images