Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.A lot of details have been set forth in the following description so that fully understand the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention is not subjected to the restriction of following public concrete enforcement.
See also Fig. 1, thetouch display screen 100 of an embodiment comprises followingpolaroid 10,TFT electrode 20, Liquid CrystalModule 30,public electrode 40,diaphragm 50 and the polarisation-optical filtering module 60 that stacks gradually.
TFT electrode 20 comprises glass-base 24 and theshow electrode 22 that is arranged on the glass-base 24.Liquid Crystal Module 30 comprisesliquid crystal 32 and is positioned at thealignment film 34 ofliquid crystal 32 both sides.
Be appreciated that when using backlight as polarized light source, as the OLED polarized light source, need not to use down polaroid 10.Structure and the function of the followingpolaroid 10 of present embodiment,TFT electrode 20, Liquid CrystalModule 30 andpublic electrode 40 can be identical with existing product, do not repeat them here.
Touch display screen 100 has touch operation, polarized light function and filtering functions simultaneously, makes display screen have the touch Presentation Function.Display screen can be the LCDs of straight-down negative or side entering type light source.
Following emphasis is described polarisation-optical filtering module 60.
Touch display device and comprise that also control drives chip and flexible circuit board, for the purpose of simplifying the description, these two parts do not illustrate in this application.
See also Fig. 2 and Fig. 3, the polarisation of an embodiment-optical filtering module 60 comprisesfiltering assembly 62 andpolarisation assembly 64.
Filtering assembly 62 comprisestransparent substrates 622, the first impression glue-line 623, firstconductive layer 624 and the light filter substrate.Transparent substrates 622 is generally clear glass.Light filter substrate comprisesshading matrix 626 and chromatic photoresist 628.The first impression glue-line 623 is coated a surface of the close substratum transparent 63 oftransparent substrates 622, and firstconductive layer 624 is embedded the surface away fromtransparent substrates 622 at the first impression glue-line 623.Light filter substrate is arranged on another surface (namely with the opposing surface of the first impression glue 623) of transparent substrates 622.Shading matrix 626 comprises cross one another ruling c, and cross one another ruling c forms grid, andchromatic photoresist 628 is formed in the grid.
Polarisation assembly 64 is arranged on firstconductive layer 624 away from a side of transparent substrates 622.Polarisation assembly 64 comprisespolaroid 642, second impression glue-line 646 and second conductive layer 644.The second impression glue-line 646 is coated a surface ofpolaroid 642, and secondconductive layer 644 is embedded on the surface of the second impression glue-line 646 away from polaroid 642.Firstconductive layer 624 offiltering assembly 62 andpolarisation assembly 64 are fitted by substratum transparent 63.
In conjunction with Fig. 3, firstconductive layer 624 comprises a plurality of firstconductive units 6242 along the space insulation that first direction extends.Distance between the first adjacentconductive unit 6242 can be 0.5 μ m~50 μ m.Firstconductive unit 6242 of space insulation obtains by firstconductive layer 624 is handled by broken string.
Each firstconductive unit 6242 comprises a plurality of continuous first conductive grids that intersected to form mutually by the first conductive thread a.
Projection and the ruling c of the first conductive thread a on light filter substrate aims at.
Shading matrix 626 is for having the photoresist of black dyes, and it can adopt exposure, develop and make.Chromatic photoresist 628 is for having the photoresist of coloured dye, and it can adopt exposure, develop and make.Thatchromatic photoresist 628 generally comprises is red (red, R) photoresistance, it is green that (green, G) (blue, B) photoresistance are used for making incident light be transformed into monochromatic light, realize filtering functions for photoresistance or indigo plant.
In conjunction with Fig. 3, secondconductive layer 644 comprises a plurality of secondconductive units 6442 along the space insulation that second direction is extended.Distance between the second adjacentconductive unit 6442 can be 0.5 μ m~50 μ m.Secondconductive unit 6442 of space insulation obtains by secondconductive layer 644 is handled by broken string.
Each secondconductive unit 6442 comprises a plurality of continuous second conductive grids that intersected to form mutually by the second conductive thread b.Projection and the ruling c of the second conductive thread b on light filter substrate aims at.
To detect the comprehensive and simplified processing process of touch location in order guaranteeing, to enhance productivity, first direction and second direction vertical setting mutually.In the present embodiment, the first direction horizontally set, second direction vertically arranges.In other embodiments, also can be that first direction is vertical setting, second direction is horizontally set, in addition, first direction and second direction also can be off plumbs.Firstconductive unit 6242 and secondconductive unit 6442 be space and insulation formation induction structure on thickness direction.
Firstconductive layer 624 and secondconductive layer 644 be by impressing out the conductive pattern groove at the first impression glue-line 623 and the second impression glue-line 646 respectively, and filled conductive material and solidifying makes in the conductive pattern groove again.
The degree of depth of conductive pattern groove is less than the thickness of the first impression glue-line 623, and simultaneously, the degree of depth of conductive pattern groove is less than the thickness of the second impression glue-line 642.
For convenience of description, not having below to specify is under the situation of first conductive thread or second conductive thread, and first conductive thread and second conductive thread are referred to as conductive thread.
Conductive thread thickness is not more than the degree of depth of conductive pattern groove.
Conductive material can be metal simple-substance, alloy, carbon nano-tube, Graphene, organic conductive macromolecule or tin indium oxide (ITO).In a more excellent embodiment, conductive material is metal, for example nanometer silver paste.
In the present embodiment, the material of the first impression glue-line is solvent-free ultra-violet curing acrylic resin.The first impression glue-line is transparence, does not influence whole transmitance.In other embodiments, the material of the first impression glue-line can also be visible-light curing resin or heat reactive resin.The thickness of the first impression glue-line can be 2 μ m~10 μ m.
In the present embodiment, the material of the second impression glue-line is solvent-free ultra-violet curing acrylic resin.The second impression glue-line is transparence, does not influence whole transmitance.In other embodiments, the material of the second impression glue-line can also be visible-light curing resin or heat reactive resin.The thickness of the second impression glue-line can be 2 μ m~10 μ m.Above-mentioned thickness direction refers to the thickness direction oftransparent substrates 622, the first impression glue-line 623, substratum transparent 63,polaroid 642 or the second impression glue-line 646.
In embodiment as shown in Figure 2,polaroid 642 is arranged on the surface of substratum transparent, separates bypolaroid 642 and substratum transparent between firstconductive layer 624 and second conductive layer 644.Certainly, in other embodiments, as shown in Figure 4, the second impression glue-line 642 is arranged on the surface of close substratum transparent ofpolaroid 646, secondconductive layer 644 is arranged on the surface of close substratum transparent of thesecond impression glue 642, separates by substratum transparent between firstconductive layer 624 and secondconductive layer 644.
Be appreciated that polarisation-optical filtering module 60 also can not arrange the first impression glue-line 623 and the second impression glue-line 646, please refer to Fig. 5 to Fig. 6.Certainly, polarisation-optical filtering module 60 also can not arrange the first impression glue-line 623 or the second impression glue-line 646, please refer to Fig. 7 to Fig. 8.
As shown in Figure 5 and Figure 6, polarisation-optical filtering module 60 does not arrange the first impression glue-line and the second impression glue-line.Firstconductive layer 624 is arranged on a surface of transparent substrates 622.Secondconductive layer 644 is arranged on a surface of polaroid 642.At this moment, firstconductive layer 624 and secondconductive layer 644 by be coated with or plate conductive layer more etched mode prepare.
In embodiment as shown in Figure 5,polaroid 642 is arranged on the surface of substratum transparent, separates bypolaroid 642 and substratum transparent between firstconductive layer 624 and second conductive layer 644.Certainly, in other embodiments, as shown in Figure 6, secondconductive layer 644 is set directly on the surface of close substratum transparent ofpolaroid 642, separates by substratum transparent between firstconductive layer 624 and secondconductive layer 644.
As shown in Figure 7 and Figure 8, polarisation-optical filtering module 60 is provided with the second impression glue-line 646, but the first impression glue-line is not set.Firstconductive layer 624 is arranged ontransparent substrates 622 away from the surface of light filter substrate.At this moment, firstconductive layer 624 by be coated with or plate conductive layer more etched mode prepare.644 embeddings of second conductive layer are arranged on the second seal glue-line 646 away from the surface of polaroid.Secondconductive layer 644 prepares by the impression mode.
Certainly, in other embodiments, polarisation-optical filtering module 60 can be provided with the first impression glue-line, but the second impression glue-line is not set.At this moment, secondconductive layer 644 by be coated with or plate conductive layer more etched mode prepare.Firstconductive layer 624 prepares by the impression mode.
In a more excellent embodiment, firstconductive layer 624 by be coated with or plate conductive layer more etched mode prepare.Secondconductive layer 644 prepares by the impression mode.This mainly is becausetransparent substrates 622 is more high temperature resistant with respect to the resin film ofpolaroid 642, is more suitable for carrying out plated film.
In embodiment as shown in Figure 7,polaroid 642 is arranged on the surface of substratum transparent, separates bypolaroid 642 and substratum transparent between firstconductive layer 624 and second conductive layer 644.Certainly, in other embodiments, as shown in Figure 8, secondconductive layer 644 is set directly at the surface of substratum transparent, separates by substratum transparent between firstconductive layer 624 and secondconductive layer 644.
In conjunction with Fig. 9, the first conductive thread a and the second conductive thread b spatially aim at the ruling c of shading matrix 626.The first conductive thread a can be straight line, also can be curve, and in other embodiment, the first conductive thread a can also be broken line.The second conductive thread b can be straight line, also can be curve, and in other embodiment, the second conductive thread b can also be broken line.Fig. 9 only shows firstconductive layer 624 and secondconductive layer 644 is the synoptic diagram that impression is made, and in actual applications, does not limit the preparation method of firstconductive layer 624 and second conductive layer 644.Above Fig. 4 to Fig. 9 substratum transparent that do not draw, but identical among the substratum transparent in Fig. 4 to Fig. 9 and Fig. 2, all be arranged between described filteringassembly 62 and the describedpolarisation assembly 64.
Please refer to Figure 10 to Figure 13, first conductive thread and second conductive thread are all aimed at the ruling ofshading matrix 626, and first conductive thread and second conductive thread are referred to as conductive thread A.First conductive grid and the projection of second conductive grid on light filter substrate can be surrounded integer complete R photoresistance, G photoresistance or a B photoresistance.
In embodiment as shown in figure 10, the projection of conductive grid on light filter substrate that conductive thread A forms is corresponding one by one with R photoresistance, G photoresistance or B photoresistance, and namely each first conductive grid surrounds R photoresistance, G photoresistance or a B photoresistance.
In embodiment as shown in figure 11, only on first axial (for example transverse axis), a plurality of complete R photoresistances, G photoresistance or B photoresistance are surrounded in the projection of conductive grid on light filter substrate that conductive thread A forms.
In embodiment as shown in figure 12, only on second axial (for example longitudinal axis), a plurality of complete R photoresistances, G photoresistance or B photoresistance are surrounded in the projection of conductive grid on light filter substrate that conductive thread A forms.
In embodiment as shown in figure 13, on first axial (transverse axis) and second axial (longitudinal axis), a plurality of complete R photoresistances, G photoresistance or B photoresistance are all surrounded in the projection of conductive grid on light filter substrate that conductive thread A forms.
As Fig. 2 and the polarisation with touch control operation function-optical filtering module 60 shown in Figure 4, when firstconductive layer 624 and secondconductive layer 644 all adopted the impression mode to prepare, its manufacturing process was as follows:
(1) surface oftransparent substrates 622 is at first carried out plasma (ionization) and handle, remove the dirty of surface, and make surface ionization, increase follow-up and cohesive force other material.
(2) a whole face in surface intransparent substrates 622 is coated with/plates the photoresist layer that has black dyes.
(3) adopt exposure-developing technique, the photoresist that has black dyes in chromatic photoresist zone is removed, form shading matrix.
(4) plate or coat the R/G/B chromatic photoresist in the regional gradation of having removed the photoresist that has black dyes.
(5) another surface coating intransparent substrates 622 impresses glue (present embodiment adopts PMMA UV cured resin), and the impression block of using the conductive pattern with first conductive layer to be nested impresses on the first impression glue surface and solidifies, and obtains the conductive pattern groove of required first conductive layer.
(6) filled conductive material and solidifying in the conductive pattern groove of first conductive layer.Conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms the conductive grid that first conductive thread constitutes.Preferably, conductive material is metal (as nanometer silver paste), obtains having the filteringassembly 62 of firstconductive layer 624.
(7) a surface coating atpolaroid 642 impresses glue (present embodiment employing polymethylmethacrylate (polymethylmethacrylate, PMMA) UV cured resin), and the impression block of using the conductive pattern with second conductive layer to be nested impresses on the second impression glue surface and solidifies, and obtains the conductive pattern groove of required second conductive layer.
(8) filled conductive material and solidifying in the conductive pattern groove of second conductive layer, conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms the conductive grid that first conductive thread constitutes.Preferably, conductive material is metal (as nanometer silver paste), obtains having thepolarisation assembly 64 of secondconductive layer 644.
(9) thepolarisation assembly 64 that will have thefiltering assembly 62 of firstconductive layer 624 and have secondconductive layer 644 bonds by transparent adhesive and solidifies, and obtains having the polarisation-optical filtering module 60 of touch control operation function.
The polarisation with touch control operation function-optical filtering module 60 as shown in Figure 5 and Figure 6, when firstconductive layer 624 and secondconductive layer 644 all when being coated with or plating conductive layer etched mode realizes again, its manufacturing process is as follows:
(1) surface oftransparent substrates 622 is at first carried out plasma and handle, remove the dirty of surface, and make surface ionization, increase follow-up and cohesive force other material.
(2) a whole face in surface intransparent substrates 622 is coated with or plates the photoresist layer that has black dyes.
(3) adopt exposure-developing technique, the photoresist that has black dyes in chromatic photoresist zone is removed, form shading matrix.
(4) plate or coat the R/G/B chromatic photoresist in the regional gradation of having removed the photoresist that has black dyes.
(5) at another surface whole plating conductive layer oftransparent substrates 622 or be coated with one deck conductive ink (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO; Conductive material is the Nano Silver ink in the present embodiment), form conductive layer.
(6) at conductive layer coating one deck photoresist, through overexposure-developing technique, only keep the photoresist of the conductive pattern portions that covers firstconductive layer 624, the photoresist that all the other are local is removed.
(7) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain first conductive unit separate, insulation, thereby obtain having the filteringassembly 62 of firstconductive layer 624.
(8) whole the plating conductive layer or be coated with one deck conductive ink (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on a surface of polaroid 642.In the present embodiment, conductive material is the Nano Silver ink), form conductive layer.
(9) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers secondconductive layer 644, and the photoresist that all the other are local is removed.
(10) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain second conductive unit separate, insulation, thereby obtain having thepolarisation assembly 64 of secondconductive layer 644.
(11) thepolarisation assembly 64 that will have thefiltering assembly 62 of firstconductive layer 624 and have secondconductive layer 644 bonds by transparent adhesive and solidifies, and obtains having the polarisation-optical filtering module 60 of touch control operation function.
The polarisation with touch control operation function-optical filtering module 60 as shown in Figure 7, when firstconductive layer 624 by be coated with or plate conductive layer more etched mode prepare, when secondconductive layer 644 adopted the impression modes to prepare, its manufacturing process was as follows:
(1) surface oftransparent substrates 622 is at first carried out plasma and handle, remove the dirty of surface, and make surface ionization, increase follow-up and cohesive force other material.
(2) a whole face in surface intransparent substrates 622 is coated with or plates the photoresist layer that has black dyes.
(3) adopt exposure-developing technique, the photoresist that has black dyes in chromatic photoresist zone is removed, form shading matrix.
(4) plate or coat the R/G/B chromatic photoresist in the regional gradation of having removed the photoresist that has black dyes.
(5) at whole the plating in another surface one deck ITO oftransparent substrates 622 film.
(6) at ITO film surface coating one deck photoresist, through overexposure-developing technique, only keep the photoresist of the conductive pattern portions that covers firstconductive layer 624, the photoresist that all the other are local is removed.
(7) utilize lithographic technique that above-mentioned ITO film is carried out etching, obtain first conductive unit separate, insulation, thereby obtain having the filteringassembly 62 of firstconductive layer 624.
(8) a surface coating atpolaroid 642 impresses glue (present embodiment adopts PMMA UV cured resin), and the impression block of using the conductive pattern with second conductive layer to be nested impresses on the second impression glue surface and solidifies, and obtains the conductive pattern groove of required second conductive layer.
(9) filled conductive material and solidifying in the conductive pattern groove of second conductive layer, conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms the conductive grid that first conductive thread constitutes; Preferably, conductive material is metal (as nanometer silver paste), obtains having thepolarisation assembly 64 of secondconductive layer 644.
(10) thepolarisation assembly 64 that will have thefiltering assembly 62 of firstconductive layer 624 and have secondconductive layer 644 bonds by transparent adhesive and solidifies, and obtains having the polarisation-optical filtering module 60 of touch control operation function.
Above-mentioned polarisation-optical filtering module 60 with touch control operation function prepares when firstconductive layer 624 adopts the impression modes, and secondconductive layer 644 is when being coated with or plating conductive layer etched mode prepares again, and its manufacturing process is as follows:
(1) surface oftransparent substrates 622 is at first carried out plasma and handle, remove the dirty of surface, and make surface ionization, increase follow-up and cohesive force other material.
(2) a whole face in surface intransparent substrates 622 is coated with/plates the photoresist layer that has black dyes.
(3) adopt exposure-developing technique, the photoresist that has black dyes in chromatic photoresist zone is removed,form shading matrix 626.
(4) plate or coat R/G/Bchromatic photoresist 628 in the regional gradation of having removed the photoresist that has black dyes.
(5) another surface coating intransparent substrates 622 impresses glue (present embodiment adopts PMMA UV cured resin), and the impression block of using the conductive pattern with first conductive layer to be nested impresses on the first impression glue surface and solidifies, and obtains the conductive pattern groove of required first conductive layer.
(6) filled conductive material and solidifying in the conductive pattern groove of first conductive layer.Conductive material can be metal simple-substance or alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO, forms the conductive grid that first conductive thread constitutes.Preferably, conductive material is metal (as nanometer silver paste), obtains having the filteringassembly 62 of firstconductive layer 624.
(7) whole the plating conductive layer or be coated with one deck conductive ink (conductive material can be metal simple-substance, metal alloy, carbon nano-tube, Graphene, organic conductive macromolecule or ITO on a surface of polaroid 642.In the present embodiment, conductive material is the Nano Silver ink), form conductive layer.
(8) coating one deck photoresist through overexposure-developing technique, only keeps the photoresist of the conductive pattern portions that covers secondconductive layer 644, and the photoresist that all the other are local is removed.
(9) utilize lithographic technique that above-mentioned conductive layer is carried out etching, obtain second conductive unit separate, insulation, thereby obtain having thepolarisation assembly 64 of secondconductive layer 644.
(10) thepolarisation assembly 64 that will have thefiltering assembly 62 of firstconductive layer 624 and have secondconductive layer 644 bonds by transparent adhesive and solidifies, and obtains having the polarisation-optical filtering module 60 of touch control operation function.
Above-mentioned polarisation-optical filtering module 60 can realize touch operation, polarized light function and filtering functions simultaneously, as an indispensable assembly in the display screen, above-mentioned polarisation-whenoptical filtering module 60 is used for display screen, can directly make display screen have touch controllable function, need not to assemble touch-screen at display screen again, not only be conducive to reduce the thickness of electronic product, also saved material and assembly cost simultaneously greatly.
First conductive thread and second conductive thread are spatially all aimed at the ruling of shading matrix, the zone that such first conductive thread and second conductive thread can not expose shading matrix to chromatic photoresist zone and influence chromatic photoresist go out light effect and product appearance effect.The width of first conductive thread and second conductive thread does not need too little, as long as satisfied first conductive thread and the projection of second conductive thread on light filter substrate drop on shading matrix.
The material that first conductive layer and second conductive layer are selected for use only expands all suitable conductive materials to transparent material by tradition; When conductive material is selected metal material for use, the energy consumption that can reduce resistance greatly and reduce touch-screen.
Above-mentioned polarisation-optical filtering module 60 with touch controllable function is double-deck conductive structure, and the design that need not to put up a bridge reduces task difficulty greatly.
Adopt above-mentioned polarisation-optical filtering module 60, because first conductive layer is located at transparent substrates away from a side of light filter substrate, second conductive layer is located at a side of polaroid, and (LiquidCrystalDisplay, LCD) signal to the touch-control effect disturbs can to reduce LCD.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.