技术领域technical field
本发明涉及天线测试领域，更具体地说，涉及一种基于超材料的紧缩场产生装置。The invention relates to the field of antenna testing, and more specifically, relates to a compact field generating device based on metamaterials.
背景技术Background technique
紧缩场是一种在近距离内靠光滑的反射面，包括单反射面和双反射面，将馈源发出的球面波变为平面波的测试设备。它所产生的平面波环境，可以充分满足天线方向图的测试要求，从而达到在近距离内对天线进行测试的目的。紧缩场系统上可以分为紧缩场天线部分和微波暗室部分。在现有技术中，紧缩场天线部分是采用精密的反射面，将点源产生的球面波在近距离内变换为平面波的一套装置，通常按照设计要求，将天线部分的位置准确地安装于微波暗室中，并调节好水平度，通过对紧缩场天线反射面边缘的处理和微波暗室的配合，在空间测试区域创造出一个静区，在静区里可以模拟被测物在无反射的自由空间中的辐射特性。The compact field is a test device that changes the spherical wave emitted by the feed source into a plane wave by relying on smooth reflectors, including single reflectors and double reflectors, within a short distance. The plane wave environment it generates can fully meet the test requirements of the antenna pattern, so as to achieve the purpose of testing the antenna in a short distance. The compact field system can be divided into a compact field antenna part and a microwave anechoic chamber part. In the prior art, the compact field antenna part is a set of equipment that uses a precise reflector to convert the spherical wave generated by the point source into a plane wave within a short distance. Usually, the position of the antenna part is accurately installed on the In the microwave anechoic chamber, and adjust the level, through the processing of the edge of the reflection surface of the compact field antenna and the cooperation of the microwave anechoic chamber, a quiet zone is created in the space test area. In the quiet zone, the measured object can be simulated without reflection. Radiation properties in space.
与室外远场和室内近场比较，紧缩场主要具有以下特点：Compared with the outdoor far field and indoor near field, the compact field mainly has the following characteristics:
1、安装在微波暗室的紧缩场具有较好的保密性；1. The compression field installed in the microwave anechoic chamber has good confidentiality;
2、安装在室内的紧缩场受气候环境影响小，改善了测试条件，进而提高了RCS(Radar Cross-Section，雷达散射截面)的测量效率；2. The compact field installed indoors is less affected by the climate environment, which improves the test conditions and improves the measurement efficiency of RCS (Radar Cross-Section).
3、可以将室外远场测试问题转换为暗室内近距离测试问题。3. The outdoor far-field test problem can be converted into the close-range test problem in the dark room.
这些特点决定了紧缩场是研究电磁散射的重要测试设备，也是高性能雷达天线测试、卫星整星测试、飞机反射特性测试等系统性能测试的重要基础设施。同时，紧缩场技术在军事领域越来越发挥着不可替代的作用。无论是卫星、飞机，还是导弹、坦克、大炮等大型武器装备的隐身性能测试、调整等，都依赖于发挥紧缩场的技术作用。可以说，紧缩场的技术水平如何，不仅制约着军队武器装备的性能与质量，也关系到一个国家的国防安全问题。因此，当今各大军事强国都把紧缩场系统作为国防战略技术之一，重点加以研究和发展。These characteristics determine that the compact field is an important test equipment for the study of electromagnetic scattering, and also an important infrastructure for system performance tests such as high-performance radar antenna tests, satellite satellite tests, and aircraft reflection characteristics tests. At the same time, compact field technology is increasingly playing an irreplaceable role in the military field. Whether it is satellites, aircraft, or the stealth performance testing and adjustment of large-scale weapons and equipment such as missiles, tanks, and cannons, all rely on the technical role of the compact field. It can be said that the technical level of the compact field not only restricts the performance and quality of military weapons and equipment, but also affects the national defense security of a country. Therefore, today's major military powers regard the compact field system as one of the national defense strategic technologies, and focus on research and development.
目前，国内外从事电磁产品研发和技术研究的公司及科研院所，一般都建立了自己的紧缩场系统，使用起来非常方便和快捷。紧缩场系统作为现代天线测试的先进设备，无疑具有越来越重要的技术进步意义和极其广泛的运用前景。At present, domestic and foreign companies and research institutes engaged in research and development of electromagnetic products and technical research generally have established their own compact field systems, which are very convenient and fast to use. As an advanced equipment for modern antenna testing, the compact field system undoubtedly has more and more important technical significance and extremely wide application prospects.
但现有设计仍存在一定的问题：采用的光滑反射面是抛物面状，且反射面必须很大，大约比测试静区大三倍，制造抛物面状反射面的机械平台十分复杂，要达到较好的反射面工艺也比较困难，表面处理依赖度高，造价昂贵，且馈源位置必须置于反射面的焦点上，否则没法达到球面波与平面波的转换，而反射面的焦点与光滑反射面的距离给制造工艺精度造成了很大困难。However, there are still some problems in the existing design: the smooth reflective surface used is parabolic, and the reflective surface must be very large, about three times larger than the quiet area of the test. The mechanical platform for manufacturing the parabolic reflective surface is very complicated. The reflective surface technology is also relatively difficult, the surface treatment is highly dependent, the cost is expensive, and the feed position must be placed on the focus of the reflective surface, otherwise the conversion between spherical waves and plane waves cannot be achieved, and the focus of the reflective surface and the smooth reflective surface The distance has caused great difficulties to the precision of the manufacturing process.
发明内容Contents of the invention
本发明的目的在于克服现有技术制造光滑反射面必须很大，且工艺困难、复杂，造价昂贵的缺陷，提供一种基于超材料的紧缩场产生装置，该装置采用超材料制造紧缩场的天线部分，将球面电磁波转换为平面电磁波，制造简单，价格便宜。The purpose of the present invention is to overcome the shortcomings of the prior art that the production of smooth reflective surfaces must be large, and the process is difficult, complicated, and expensive, and to provide a compact field generator based on metamaterials, which uses metamaterials to manufacture compact field antennas The part converts spherical electromagnetic waves into planar electromagnetic waves, which is easy to manufacture and cheap.
为了达到上述目的，本发明采用的如下技术方案：In order to achieve the above object, the following technical solutions adopted in the present invention:
一种紧缩场产生装置，所述装置包括馈源以及设置在馈源后方的超材料面板，所述馈源设置在超材料面板的下沿，所述超材料面板包括核心层及设置在核心层一侧表面的反射板，所述核心层包括厚度相同且折射率分布相同的多个核心层片层，所述核心层片层包括片状的第一基材以及设置在第一基材上的多个第一人造微结构，所述核心层片层的折射率分布满足如下公式：A kind of compression field generation device, described device comprises feed source and the metamaterial panel that is arranged on the back of feed source, and described feed source is arranged on the lower edge of metamaterial panel, and described metamaterial panel comprises core layer and is arranged on core layer A reflection plate on one side surface, the core layer includes a plurality of core layer sheets with the same thickness and the same refractive index distribution, and the core layer sheet includes a sheet-shaped first substrate and a A plurality of first artificial microstructures, the refractive index distribution of the core layer sheet satisfies the following formula:
Vseg＝s+λ*NUMseg；Vseg=s+λ*NUMseg;
其中，n(r)表示核心层片层上半径为r处的折射率值；Wherein, n(r) represents the refractive index value at the r place on the core layer sheet;
s为馈源等效点到超材料面板的垂直距离；s is the vertical distance from the feed equivalent point to the metamaterial panel;
nmax表示核心层片层的折射率的最大值；nmax represents the maximum value of the refractive index of the core layer sheet;
nmin表示核心层片层的折射率的最小值；nmin represents the minimum value of the refractive index of the core layer sheet;
λ表示电磁波的波长；λ represents the wavelength of the electromagnetic wave;
floor表示向下取整。floor represents rounding down.
进一步地，所述第一基材包括片状的第一前基板及第一后基板，所述多个第一人造微结构夹设在第一前基板与第一后基板之间。Further, the first substrate includes a sheet-shaped first front substrate and a first rear substrate, and the plurality of first artificial microstructures are sandwiched between the first front substrate and the first rear substrate.
进一步地，所述超材料面板还包括设置在核心层另一侧表面的阻抗匹配层，所述阻抗匹配层包括厚度相同的多个阻抗匹配层片层，所述阻抗匹配层片层包括片状的第二基材以及设置在第二基材上的多个第二人造微结构，所述阻抗匹配层片层的折射率分布满足如下公式：Further, the metamaterial panel also includes an impedance matching layer arranged on the surface of the other side of the core layer, the impedance matching layer includes a plurality of impedance matching layer sheets with the same thickness, and the impedance matching layer includes sheet-shaped The second substrate of the second substrate and a plurality of second artificial microstructures arranged on the second substrate, the refractive index distribution of the impedance matching layer satisfies the following formula:
λ＝(nmax-nmin)*(d1+2*d2)；λ=(nmax -nmin )*(d1+2*d2);
其中，i表示阻抗匹配层片层的编号，靠近馈源的阻抗匹配层片层的编号为m，由馈源向核心层方向，编号依次减小，靠近核心层的阻抗匹配层片层的编号为1；Among them, i represents the number of the impedance matching layer, the number of the impedance matching layer near the feed source is m, and the number decreases in turn from the feed source to the core layer, and the number of the impedance matching layer near the core layer is 1;
上述的nmax与nmin与核心层片层的折射率的最大值与最小值相同；The above-mentioned nmax and nmin are the same as the maximum and minimum values of the refractive index of the core layer sheet;
d1为阻抗匹配层的厚度；d1 is the thickness of the impedance matching layer;
d2为核心层的厚度。d2 is the thickness of the core layer.
进一步地，所述第二基材包括片状的第二前基板及第二后基板，所述多个第二人造微结构夹设在第二前基板与第二后基板之间。Further, the second substrate includes a sheet-shaped second front substrate and a second rear substrate, and the plurality of second artificial microstructures are sandwiched between the second front substrate and the second rear substrate.
进一步地，所述超材料面板的纵截面为方形、圆形或椭圆形。Further, the longitudinal section of the metamaterial panel is square, circular or oval.
进一步地，所述第一人造微结构及第二人造微结构均为由铜线或银线构成的金属微结构，所述金属微结构通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法分别附着在第一基材及第二基材上。Further, both the first artificial microstructure and the second artificial microstructure are metal microstructures composed of copper wires or silver wires, and the metal microstructures are formed by etching, electroplating, drilling, photolithography, electronic engraving or ionization. The method of engraving is respectively attached to the first base material and the second base material.
进一步地，所述金属微结构呈平面雪花状，所述金属微结构具有相互垂直平分的第一金属线及第二金属线，所述第一金属线与第二金属线的长度相同，所述第一金属线两端连接有相同长度的两个第一金属分支，所述第一金属线两端连接在两个第一金属分支的中点上，所述第二金属线两端连接有相同长度的两个第二金属分支，所述第二金属线两端连接在两个第二金属分支的中点上，所述第一金属分支与第二金属分支的长度相等。Further, the metal microstructure is in the shape of a plane snowflake, the metal microstructure has a first metal line and a second metal line that are perpendicular to each other, and the length of the first metal line is the same as that of the second metal line. Two first metal branches of the same length are connected at both ends of the first metal line, the two ends of the first metal line are connected at the midpoint of the two first metal branches, and the two ends of the second metal line are connected with the same Two second metal branches of the same length, the two ends of the second metal wire are connected to the midpoint of the two second metal branches, and the length of the first metal branch is equal to that of the second metal branch.
进一步地，所述平面雪花状的金属微结构的每个第一金属分支及每个第二金属分支的两端还连接有完全相同的第三金属分支，相应的第三金属分支的中点分别与第一金属分支及第二金属分支的端点相连。Further, the two ends of each first metal branch and each second metal branch of the planar snowflake-shaped metal microstructure are also connected to identical third metal branches, and the midpoints of the corresponding third metal branches are respectively It is connected with the terminals of the first metal branch and the second metal branch.
进一步地，所述平面雪花状的金属微结构的第一金属线与第二金属线均设置有两个弯折部，所述平面雪花状的金属微结构绕垂直于第一金属线与第二金属线交点的轴线向任意方向旋转90度的图形都与原图重合。Further, the first metal wire and the second metal wire of the planar snowflake-shaped metal microstructure are both provided with two bending parts, and the planar snowflake-shaped metal microstructure is wound perpendicular to the first metal wire and the second metal wire. The graph of the axis of the intersection of the metal lines rotated 90 degrees in any direction coincides with the original graph.
根据本发明的紧缩场产生装置，由片状的超材料面板代替了传统的抛物状反射面，制造加工更加容易，成本更加低廉。According to the compact field generating device of the present invention, the traditional parabolic reflective surface is replaced by a sheet-shaped metamaterial panel, and the manufacturing process is easier and the cost is lower.
附图说明Description of drawings
图1是本发明的紧缩场产生装置的结构示意图；Fig. 1 is a structural schematic diagram of a compact field generating device of the present invention;
图2是本发明的核心层片层其中一个超材料单元的透视示意图；Fig. 2 is a schematic perspective view of one of the metamaterial units in the core layer of the present invention;
图3是本发明的核心层片层的结构示意图；Fig. 3 is a schematic structural view of the core layer sheet of the present invention;
图4是本发明的阻抗匹配层片层的结构示意图；Fig. 4 is a schematic structural view of the impedance matching layer of the present invention;
图5是本发明的平面雪花状的金属微结构的示意图；Fig. 5 is the schematic diagram of the metal microstructure of plane snowflake shape of the present invention;
图6是图5所示的平面雪花状的金属微结构的一种衍生结构；Fig. 6 is a kind of derivation structure of the metal microstructure of plane snowflake shape shown in Fig. 5;
图7是图5所示的平面雪花状的金属微结构的一种变形结构。FIG. 7 is a deformed structure of the planar snowflake-shaped metal microstructure shown in FIG. 5 .
图8是平面雪花状的金属微结构的拓扑形状的演变的第一阶段；Figure 8 is the first stage of the evolution of the topological shape of the planar snowflake-like metal microstructure;
图9是平面雪花状的金属微结构的拓扑形状的演变的第二阶段。Figure 9 is the second stage of the evolution of the topological shape of the planar snowflake-like metal microstructure.
具体实施方式detailed description
如图1至图3所示，根据本发明一种紧缩场产生装置包括馈源1以及设置在馈源1后方的超材料面板100，所述馈源1设置在超材料面板100的下沿，所述超材料面板100包括核心层10及设置在核心层一侧表面上的反射板200，所述核心层10包括厚度相同且折射率分布相同的多个核心层片层11，所述核心层片层包括片状的第一基材13以及设置在第一基材13上的多个第一人造微结构12，馈源中心轴Z1与超材料面板100的中轴线Z2具有一定的夹角θ，即图1中的中轴线Z1与直线Z3的夹角(Z3为Z1的平行线)馈源1不在超材料面板100的中轴线Z2上。另外馈源为传统的波纹喇叭。核心层片层的纵截面形状根据不同需要可以方形、圆形或椭圆形。另外，本发明中，反射板为具有光滑的表面的金属反射板，例如可以是抛光的铜板、铝板或铁板等，也可是PEC(理想电导体)反射面。As shown in Figures 1 to 3, a compact field generating device according to the present invention includes a feed source 1 and a metamaterial panel 100 arranged behind the feed source 1, and the feed source 1 is arranged on the lower edge of the metamaterial panel 100, The metamaterial panel 100 includes a core layer 10 and a reflection plate 200 disposed on one side of the core layer. The core layer 10 includes a plurality of core layer sheets 11 with the same thickness and the same refractive index distribution. The core layer The sheet layer includes a sheet-shaped first substrate 13 and a plurality of first artificial microstructures 12 disposed on the first substrate 13, and the central axis Z1 of the feed source and the central axis Z2 of the metamaterial panel 100 have a certain angle θ , that is, the angle between the central axis Z1 and the straight line Z3 in FIG. In addition, the feed source is a traditional corrugated horn. The longitudinal cross-sectional shape of the core layer sheet can be square, circular or elliptical according to different needs. In addition, in the present invention, the reflective plate is a metal reflective plate with a smooth surface, such as a polished copper plate, aluminum plate or iron plate, or a PEC (Perfect Electric Conductor) reflective surface.
本发明中，所述核心层片层的折射率分布满足如下公式：In the present invention, the refractive index distribution of the core layer sheet satisfies the following formula:
Vseg＝s+λ*NUMseg (2)；Vseg=s+λ*NUMseg (2);
其中，n(r)表示核心层片层上半径为r处的折射率值；Wherein, n(r) represents the refractive index value at the r place on the core layer sheet;
s为馈源等效点X到超材料面板的垂直距离；馈源中心轴Z1与超材料面板100的中轴线Z2的夹角θ发生变化时，s也会发生细微变化。s is the vertical distance from the feed equivalent point X to the metamaterial panel; when the angle θ between the central axis Z1 of the feed source and the central axis Z2 of the metamaterial panel 100 changes, s will also change slightly.
nmax表示核心层片层的折射率的最大值；nmax represents the maximum value of the refractive index of the core layer sheet;
nmin表示核心层片层的折射率的最小值；nmin represents the minimum value of the refractive index of the core layer sheet;
λ表示电磁波的波长；λ represents the wavelength of the electromagnetic wave;
floor表示向下取整，例如，当(r处于某一数值范围)大于等于0小于1时，NUMseg取0，当(r处于某一数值范围)大于等于1小于2时，NUMseg取1，依此类推。floor represents rounding down, for example, when (r is in a certain value range) greater than or equal to 0 and less than 1, NUMseg takes 0, when (r is in a certain value range) When it is greater than or equal to 1 and less than 2, NUMseg takes 1, and so on.
由公式(1)至公式(4)所确定的超材料面板，能够使得馈源发出的电磁波经超材料面板后能够以平面波的形式出射。The metamaterial panel determined by the formula (1) to formula (4) can make the electromagnetic wave emitted by the feed source exit in the form of a plane wave after passing through the metamaterial panel.
本发明中，如图3所示，所述第一基材13包括片状的第一前基板131及第一后基板132，所述多个第一人造微结构12夹设在第一前基板131与第一后基板132之间。优选地，所述核心层片层的厚度为0.818mm，其中，第一前基板及第一后基板的厚度均为0.4mm，多个第一人造微结构的厚度为0.018mm。In the present invention, as shown in FIG. 3 , the first substrate 13 includes a sheet-shaped first front substrate 131 and a first rear substrate 132, and the plurality of first artificial microstructures 12 are interposed on the first front substrate. 131 and the first rear substrate 132 . Preferably, the core layer has a thickness of 0.818mm, wherein the first front substrate and the first rear substrate both have a thickness of 0.4mm, and the plurality of first artificial microstructures have a thickness of 0.018mm.
本发明中，所述超材料面板100还包括设置在核心层10另一侧表面的阻抗匹配层20，所述阻抗匹配层20包括厚度相同的多个阻抗匹配层片层21，所述阻抗匹配层片层21包括片状的第二基材23以及设置在第二基材23上的多个第二人造微结构(图中未标示)，所述阻抗匹配层片层的折射率分布满足如下公式：In the present invention, the metamaterial panel 100 also includes an impedance matching layer 20 disposed on the surface of the other side of the core layer 10, the impedance matching layer 20 includes a plurality of impedance matching layers 21 with the same thickness, and the impedance matching The layer 21 includes a sheet-shaped second substrate 23 and a plurality of second artificial microstructures (not shown in the figure) disposed on the second substrate 23, and the refractive index distribution of the impedance matching layer satisfies the following formula:
λ＝(nmax-nmin)*(d1+2*d2) (6)；λ=(nmax -nmin )*(d1+2*d2) (6);
其中，i表示阻抗匹配层片层的编号，靠近馈源的阻抗匹配层片层的编号为m，由馈源向核心层方向，编号依次减小，靠近核心层的阻抗匹配层片层的编号为1；Among them, i represents the number of the impedance matching layer, the number of the impedance matching layer near the feed source is m, and the number decreases in turn from the feed source to the core layer, and the number of the impedance matching layer near the core layer is 1;
上述的nmax与nmin与核心层片层的折射率的最大值与最小值相同；The above-mentioned nmax and nmin are the same as the maximum and minimum values of the refractive index of the core layer sheet;
d1为阻抗匹配层的厚度，即阻抗匹配层片层的厚度与层数的乘积。d1 is the thickness of the impedance matching layer, that is, the product of the thickness of the impedance matching layer and the number of layers.
d2为核心层的厚度，即核心层片层的厚度与层数的乘积。d2 is the thickness of the core layer, that is, the product of the thickness of the core layer and the number of layers.
本发明中，如图4所示，所述第二基材23包括片状的第二前基板231及第二后基板232，所述多个第二人造微结构夹设在第二前基板231与第二后基板232之间。优选地，所述阻抗匹配层片层的厚度为0.818mm，其中，第二前基板及第二后基板的厚度均为0.4mm，多个第二人造微结构的厚度为0.018mm。In the present invention, as shown in FIG. 4 , the second base material 23 includes a sheet-shaped second front substrate 231 and a second rear substrate 232, and the plurality of second artificial microstructures are interposed on the second front substrate 231. and the second rear substrate 232 . Preferably, the thickness of the impedance matching layer is 0.818 mm, wherein the thickness of the second front substrate and the second rear substrate are both 0.4 mm, and the thickness of the plurality of second artificial microstructures is 0.018 mm.
公式(6)用于确定核心层与匹配层的厚度，当核心层的厚度确定后，利用公式(6)即可得到匹配层的厚度，用此厚度除以每层的厚度即得到阻抗匹配层的层数m。Formula (6) is used to determine the thickness of the core layer and the matching layer. When the thickness of the core layer is determined, the thickness of the matching layer can be obtained by using the formula (6). Divide this thickness by the thickness of each layer to obtain the impedance matching layer The number of layers m.
本发明中，所述超材料面板任一纵截面具有相同的形状与面积，即核心层与匹配层具有相同的形状与面积的纵截面，此处的纵截面是指超材料面板中与超材料面板的中轴线垂直的剖面。所述超材料面板的纵截面为方形、圆形或椭圆形，优选地，所述超材料平板透镜的纵截面为方形，这样得到的超材料面板容易加工。优选地，本发明的超材料面板的纵截面为边长为400mm的正方形。In the present invention, any longitudinal section of the metamaterial panel has the same shape and area, that is, the core layer and the matching layer have the same shape and area of the longitudinal section, and the longitudinal section here refers to the metamaterial panel and the metamaterial The section perpendicular to the central axis of the panel. The longitudinal section of the metamaterial panel is square, circular or elliptical. Preferably, the longitudinal section of the metamaterial flat lens is square, so that the obtained metamaterial panel is easy to process. Preferably, the longitudinal section of the metamaterial panel of the present invention is a square with a side length of 400 mm.
本发明中，所述第一人造微结构、第二人造微结构均为由铜线或银线构成的金属微结构，所述金属微结构通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法分别附着在第一基材、第二基材。优选地，所述第一人造微结构、第二人造微结构均为图5所示的平面雪花状的金属微结构通过拓扑形状演变得到的多个不同的拓扑形状的金属微结构。In the present invention, the first artificial microstructure and the second artificial microstructure are metal microstructures composed of copper wires or silver wires, and the metal microstructures are formed by etching, electroplating, drilling, photolithography, electronic engraving or The method of ion etching is attached to the first base material and the second base material respectively. Preferably, the first artificial microstructure and the second artificial microstructure are metal microstructures of multiple different topological shapes obtained by evolution of the planar snowflake-shaped metal microstructure shown in FIG. 5 through topological shape.
本发明中，核心层片层可以通过如下方法得到，即在第一前基板与第一后基板的任意一个的表面上覆铜，再通过蚀刻的方法得到多个第一金属微结构(多个第一金属微结构的形状与排布事先通过计算机仿真获得)，最后将第一前基板与第一后基板分别压合在一起，即得到本发明的核心层片层，压合的方法可以是直接热压，也可以是利用热熔胶连接，当然也可是其它机械式的连接，例如螺栓连接。In the present invention, the core layer sheet can be obtained by the following method, that is, copper is coated on the surface of any one of the first front substrate and the first rear substrate, and then a plurality of first metal microstructures (multiple first metal microstructures) are obtained by etching. The shape and arrangement of the first metal microstructure are obtained by computer simulation in advance), and finally the first front substrate and the first rear substrate are respectively pressed together to obtain the core layer of the present invention. The method of pressing can be Direct hot pressing can also be connected by hot melt adhesive, and of course it can also be connected by other mechanical methods, such as bolted connection.
同理，阻抗匹配层片层也可以利用相同的方法得到。然后分别将多个核心层片层压合一体，即形成了本发明的核心层；同样，将多个阻抗匹配层片层压合一体，即形成了本发明的阻抗匹配层；将核心层、阻抗匹配层压合一体即得到本发明的超材料面板。Similarly, the impedance matching layer can also be obtained by the same method. Then a plurality of core layers are laminated together to form the core layer of the present invention; similarly, a plurality of impedance matching layers are laminated to form the impedance matching layer of the present invention; the core layer, The impedance matching layers are laminated together to obtain the metamaterial panel of the present invention.
本发明中，所述第一基材、第二基材由陶瓷材料、高分子材料、铁电材料、铁氧材料或铁磁材料等制得。高分子材料可选用的有F4B复合材料、FR-4复合材料等。优选地，本发明中，所述第一基材的第一前基板与第一后基板采用相同的FR-4复合材料；同样，本发明中，所述第二基材的第二前基板与第二后基板也采用相同的FR-4复合材料。In the present invention, the first substrate and the second substrate are made of ceramic materials, polymer materials, ferroelectric materials, ferrite materials or ferromagnetic materials. Polymer materials can be selected from F4B composite materials, FR-4 composite materials, etc. Preferably, in the present invention, the first front substrate and the first rear substrate of the first substrate are made of the same FR-4 composite material; similarly, in the present invention, the second front substrate and the first rear substrate of the second substrate are The second rear substrate is also made of the same FR-4 composite.
图5所示为平面雪花状的金属微结构的示意图，所述的雪花状的金属微结构具有相互垂直平分的第一金属线J1及第二金属线J2，所述第一金属线J1与第二金属线J2的长度相同，所述第一金属线J1两端连接有相同长度的两个第一金属分支F1，所述第一金属线J1两端连接在两个第一金属分支F1的中点上，所述第二金属线J2两端连接有相同长度的两个第二金属分支F2，所述第二金属线J2两端连接在两个第二金属分支F2的中点上，所述第一金属分支F1与第二金属分支F2的长度相等。5 is a schematic diagram of a plane snowflake-shaped metal microstructure. The snowflake-shaped metal microstructure has a first metal line J1 and a second metal line J2 that are perpendicular to each other. The lengths of the two metal wires J2 are the same, and the two ends of the first metal wire J1 are connected to two first metal branches F1 of the same length, and the two ends of the first metal wire J1 are connected to the center of the two first metal branches F1. In terms of point, the two ends of the second metal line J2 are connected to two second metal branches F2 of the same length, and the two ends of the second metal line J2 are connected to the midpoint of the two second metal branches F2. The lengths of the first metal branch F1 and the second metal branch F2 are equal.
图6是图5所示的平面雪花状的金属微结构的一种衍生结构。其在每个第一金属分支F1及每个第二金属分支F2的两端均连接有完全相同的第三金属分支F3，并且相应的第三金属分支F3的中点分别与第一金属分支F1及第二金属分支F2的端点相连。依此类推，本发明还可以衍生出其它形式的金属微结构。FIG. 6 is a derivative structure of the planar snowflake-like metal microstructure shown in FIG. 5 . Both ends of each first metal branch F1 and each second metal branch F2 are connected to identical third metal branches F3, and the midpoints of the corresponding third metal branches F3 are respectively connected to the first metal branch F1. and the terminal of the second metal branch F2. By analogy, the present invention can also derive other forms of metal microstructures.
图7是图5所示的平面雪花状的金属微结构的一种变形结构，此种结构的金属微结构，第一金属线J1与第二金属线J2不是直线，而是弯折线，第一金属线J1与第二金属线J2均设置有两个弯折部WZ，但是第一金属线J1与第二金属线J2仍然是垂直平分，通过设置弯折部的朝向与弯折部在第一金属线与第二金属线上的相对位置，使得图7所示的金属微结构绕垂直于第一金属线与第二金属线交点的轴线向任意方向旋转90度的图形都与原图重合。另外，还可以有其它变形，例如，第一金属线J1与第二金属线J2均设置多个弯折部WZ。FIG. 7 is a deformed structure of the plane snowflake-shaped metal microstructure shown in FIG. Both the metal wire J1 and the second metal wire J2 are provided with two bending parts WZ, but the first metal wire J1 and the second metal wire J2 are still perpendicularly bisected. The relative position of the metal line and the second metal line makes the pattern of the metal microstructure shown in FIG. 7 rotated 90 degrees in any direction around the axis perpendicular to the intersection of the first metal line and the second metal line coincide with the original figure. In addition, other deformations are also possible, for example, the first metal line J1 and the second metal line J2 are both provided with a plurality of bent portions WZ.
本发明中，所述核心层片层11可以划分为阵列排布的多个如图2所示的超材料单元D，每个超材料单元D包括前基板单元U、后基板单元V及设置在基板单元U、后基板单元V之间的第一人造微结构12，通常超材料单元D的长宽高均不大于五分之一波长，优选为十分之一波长，因此，根据紧缩场的工作频率可以确定超材料单元D的尺寸。图2为透视的画法，以表示第一人造微结构的超材料单元D中的位置，如图2所示，所述第一人造微结构夹于基板单元U、后基板单元V之间，其所在表面用SR表示。In the present invention, the core layer sheet 11 can be divided into a plurality of metamaterial units D arranged in an array as shown in FIG. For the first artificial microstructure 12 between the substrate unit U and the rear substrate unit V, usually the length, width and height of the metamaterial unit D are not greater than one-fifth of the wavelength, preferably one-tenth of the wavelength. Therefore, according to the contraction field The operating frequency can determine the size of the metamaterial unit D. Fig. 2 is a perspective drawing, to represent the position in the metamaterial unit D of the first artificial microstructure, as shown in Fig. 2, the first artificial microstructure is sandwiched between the substrate unit U and the rear substrate unit V, The surface on which it is located is represented by SR.
已知折射率其中μ为相对磁导率，ε为相对介电常数，μ与ε合称为电磁参数。实验证明，电磁波通过折射率非均匀的介质材料时，会向折射率大的方向偏折。在相对磁导率一定的情况下(通常接近1)，折射率只与介电常数有关，在第一基材选定的情况下，利用只对电场响应的第一人造微结构可以实现超材料单元折射率的任意值(在一定范围内)，在该紧缩场工作频率(12.5GHZ)下，利用仿真软件，如CST、MATLAB等，通过仿真获得某一特定形状的人造微结构(如图5所示的平面雪花状的金属微结构)的介电常数随着拓扑形状的变化折射率变化的情况，即可列出一一对应的数据，即可设计出我们需要的特定折射率分布的核心层片层11，同理可以得到阻抗匹配层片层的折射率分布，从而得到整个超材料面板100的折射率分布。known refractive index Among them, μ is the relative magnetic permeability, ε is the relative permittivity, and μ and ε are collectively called electromagnetic parameters. Experiments have proved that when electromagnetic waves pass through a dielectric material with a non-uniform refractive index, they will be deflected toward the direction with a large refractive index. In the case of a certain relative magnetic permeability (usually close to 1), the refractive index is only related to the dielectric constant. In the case of the first substrate selected, metamaterials can be realized by using the first artificial microstructure that only responds to the electric field. Any value of the unit refractive index (within a certain range), under the working frequency of the compact field (12.5GHZ), use simulation software, such as CST, MATLAB, etc., to obtain an artificial microstructure of a specific shape through simulation (as shown in Figure 5 The dielectric constant of the shown planar snowflake-like metal microstructure) changes with the change of the topological shape, and the data corresponding to each other can be listed, and the core of the specific refractive index distribution we need can be designed. For the layer 11 , similarly, the refractive index distribution of the impedance matching layer can be obtained, so as to obtain the refractive index distribution of the entire metamaterial panel 100 .
本发明中，核心层片层的结构设计可通过计算机仿真(CST仿真)得到，具体如下：In the present invention, the structural design of the core layer sheet can be obtained by computer simulation (CST simulation), specifically as follows:
(1)确定第一金属微结构的附着基材(第一基材)。本明中，所述第一基材的第一前基板与第一后基板采用相同的FR-4复合材料制成，所述的FR-4复合材料制成具有一个预定的介电常数，例如介电常数为3.3的FR-4复合材料。(1) Determine the attachment substrate (first substrate) of the first metal microstructure. In the present invention, the first front substrate and the first rear substrate of the first substrate are made of the same FR-4 composite material, and the FR-4 composite material is made to have a predetermined dielectric constant, for example FR-4 composite material with a dielectric constant of 3.3.
(2)确定超材料单元的尺寸。超材料单元的尺寸的尺寸由紧缩场的工作频率得到，利用频率得到其波长，再取小于波长的五分之一的一个数值做为超材料单元D的长度CD与宽度KD。本发明中，所述超材料单元D为如图2所示的长CD与宽KD均为2.5mm、厚度HD为0.818mm的方形小板。(2) Determine the size of the metamaterial unit. The size of the metamaterial unit is obtained from the operating frequency of the compact field, its wavelength is obtained by using the frequency, and a value less than one-fifth of the wavelength is taken as the length CD and width KD of the metamaterial unit D. In the present invention, the metamaterial unit D is a small square plate with a length CD and a width KD of 2.5 mm and a thickness HD of 0.818 mm as shown in FIG. 2 .
(3)确定金属微结构的材料及拓扑结构。本发明中，金属微结构的材料为铜，金属微结构的拓扑结构为图5所示的平面雪花状的金属微结构，其线宽W各处一致；此处的拓扑结构，是指拓扑形状演变的基本形状。(3) Determine the material and topology of the metal microstructure. In the present invention, the material of the metal microstructure is copper, and the topological structure of the metal microstructure is a plane snowflake-like metal microstructure shown in Figure 5, and its line width W is consistent everywhere; the topological structure here refers to the topological shape Evolved basic shapes.
(4)确定金属微结构的拓扑形状参数。如图5所示，本发明中，平面雪花状的金属微结构的拓扑形状参数包括金属微结构的线宽W，第一金属线J1的长度a，第一金属分支F1的长度b。(4) Determine the topological shape parameters of the metal microstructure. As shown in FIG. 5 , in the present invention, the topological shape parameters of the planar snowflake-like metal microstructure include the line width W of the metal microstructure, the length a of the first metal line J1 , and the length b of the first metal branch F1 .
(5)确定金属微结构的拓扑形状的演变限制条件。本发明中，金属微结构的拓扑形状的演变限制条件有，金属微结构之间的最小间距WL(即如图8所示，金属微结构与超材料单元的长边或宽边的距离为WL/2)，金属微结构的线宽W，超材料单元的尺寸；由于加工工艺限制，WL大于等于0.1mm，同样，线宽W也是要大于等于0.1mm。本发明中，WL取0.1mm，W取0.3mm，超材料单元的尺寸为长与宽为2.5mm，厚度为0.818mm，此时金属微结构的拓扑形状参数只有a和b两个变量。金属微结构的拓扑形状的通过如图8至图9所示的演变方式，对应于某一特定频率(例如12.5GHZ)，可以得到一个连续的折射率变化范围。(5) Determine the evolution constraints of the topological shape of the metal microstructure. In the present invention, the evolution restriction condition of the topological shape of the metal microstructure has, the minimum spacing WL between metal microstructures (that is, as shown in Figure 8, the distance between the metal microstructure and the long side or wide side of the metamaterial unit is WL /2), the line width W of the metal microstructure, and the size of the metamaterial unit; due to the limitation of the processing technology, WL is greater than or equal to 0.1mm, and similarly, the line width W must also be greater than or equal to 0.1mm. In the present invention, WL is 0.1mm, W is 0.3mm, the size of the metamaterial unit is 2.5mm in length and width, and the thickness is 0.818mm. At this time, the topological shape parameters of the metal microstructure only have two variables, a and b. The evolution of the topological shape of the metal microstructure corresponds to a specific frequency (for example, 12.5 GHZ) as shown in FIG. 8 to FIG. 9 , and a continuous range of refractive index variation can be obtained.
具体地，所述金属微结构的拓扑形状的演变包括两个阶段(拓扑形状演变的基本形状为图5所示的金属微结构)：Specifically, the evolution of the topological shape of the metal microstructure includes two stages (the basic shape of the topological shape evolution is the metal microstructure shown in Figure 5):
第一阶段：根据演变限制条件，在b值保持不变的情况下，将a值从最小值变化到最大值，此演变过程中的金属微结构均为“十”字形(a取最小值时除外)。本实施例中，a的最小值即为0.3mm(线宽W)，a的最大值为(CD-WL)，即2.5-0.1mm，则a的最大值为2.4mm。因此，在第一阶段中，金属微结构的拓扑形状的演变如图8所示，即从边长为W的正方形JX1，逐渐演变成最大的“十”字形拓扑形状JD1，在最大的“十”字形拓扑形状JD1中，第一金属线J1与第二金属线J2长度均为2.4mm，宽度W均为0.3mm。在第一阶段中，随着金属微结构的拓扑形状的演变，与其对应的超材料单元的折射率连续增大((对应紧缩场的一特定频率)，当频率为12.5GHZ时，超材料单元对应的折射率的最小值nmin为1.91。The first stage: According to the evolution constraints, under the condition that the value of b remains unchanged, the value of a is changed from the minimum value to the maximum value. except). In this embodiment, the minimum value of a is 0.3 mm (line width W), the maximum value of a is (CD-WL), that is, 2.5-0.1 mm, and the maximum value of a is 2.4 mm. Therefore, in the first stage, the evolution of the topological shape of the metal microstructure is shown in Figure 8, that is, from a square JX1 with a side length W to the largest topological shape JD1 of a "ten". In the ""-shaped topological shape JD1, the length of the first metal line J1 and the second metal line J2 are both 2.4 mm, and the width W is 0.3 mm. In the first stage, with the evolution of the topological shape of the metal microstructure, the refractive index of the corresponding metamaterial unit increases continuously ((corresponding to a specific frequency of the compact field), when the frequency is 12.5GHZ, the metamaterial unit The corresponding minimum value nmin of the refractive index is 1.91.
第二阶段：根据演变限制条件，当a增加到最大值时，a保持不变；此时，将b从最小值连续增加到最大值，此演变过程中的金属微结构均为平面雪花状。本实施例中，b的最小值即为0.3mm(线宽W)，b的最大值为(CD-WL-2W)，即2.5-0.1-2*0.3mm，则b的最大值为1.8mm。因此，在第二阶段中，金属微结构的拓扑形状的演变如图9所示，即从最大的“十”字形拓扑形状JD1，逐渐演变成最大的平面雪花状的拓扑形状JD2，此处的最大的平面雪花状的拓扑形状JD2是指，第一金属分支J1与第二金属分支J2的长度b已经不能再伸长，否则第一金属分支与第二金属分支将发生相交，b的最大值为1.8mm。此时，第一金属线与第二金属线长度均为2.4mm，宽度均为0.3mm，第一金属分支及第二金属分支的长度均为1.8mm，宽度为0.3mm。在第二阶段中，随着金属微结构的拓扑形状的演变，与其对应的超材料单元的折射率连续增大(对应紧缩场的一特定频率)，当频率为12.5GHZ时，超材料单元对应的折射率的最大值nmax为5.6。The second stage: According to the evolution constraints, when a increases to the maximum value, a remains unchanged; at this time, b is continuously increased from the minimum value to the maximum value, and the metal microstructure in this evolution process is planar snowflake shape. In this embodiment, the minimum value of b is 0.3mm (line width W), the maximum value of b is (CD-WL-2W), that is, 2.5-0.1-2*0.3mm, then the maximum value of b is 1.8mm . Therefore, in the second stage, the evolution of the topological shape of the metal microstructure is shown in Fig. 9, that is, from the largest "ten" topological shape JD1 to the largest planar snowflake-like topological shape JD2, where The largest planar snowflake topological shape JD2 means that the length b of the first metal branch J1 and the second metal branch J2 can no longer be extended, otherwise the first metal branch and the second metal branch will intersect, and the maximum value of b is 1.8mm. At this time, the length of the first metal line and the second metal line are both 2.4 mm and the width is 0.3 mm, and the length of the first metal branch and the second metal branch are both 1.8 mm and the width is 0.3 mm. In the second stage, with the evolution of the topological shape of the metal microstructure, the refractive index of the corresponding metamaterial unit increases continuously (corresponding to a specific frequency of the compact field). When the frequency is 12.5GHZ, the metamaterial unit corresponds to The maximum value nmax of the refractive index is 5.6.
通过上述演变得到超材料单元的折射率变化范围(1.91-5.6)满足设计需要。如果上述演变得到超材料单元的折射率变化范围不满足设计需要，例如最大值太小，则变动WL与W，重新仿真，直到得到我们需要的折射率变化范围。Through the above evolution, the refractive index variation range (1.91-5.6) of the metamaterial unit meets the design requirements. If the range of refractive index variation obtained from the above evolution does not meet the design requirements, for example, the maximum value is too small, then change WL and W, and re-simulate until the range of refractive index variation we need is obtained.
根据公式(1)，将仿真得到的一系列的超材料单元按照其对应的折射率排布以后(实际上就是不同拓扑形状的多个第一人造微结构在第一基材上的排布)，即能得到本发明的核心层片层。According to formula (1), after a series of metamaterial units obtained by simulation are arranged according to their corresponding refractive indices (in fact, it is the arrangement of multiple first artificial microstructures of different topological shapes on the first substrate) , that is, the core layer sheet of the present invention can be obtained.
同理，可以得到本发明的阻抗匹配层片层。Similarly, the impedance matching layer of the present invention can be obtained.
上面结合附图对本发明的实施例进行了描述，但是本发明并不局限于上述的具体实施方式，上述的具体实施方式仅仅是示意性的，而不是限制性的，本领域的普通技术人员在本发明的启示下，在不脱离本发明宗旨和权利要求所保护的范围情况下，还可做出很多形式，这些均属于本发明的保护之内。Embodiments of the present invention have been described above in conjunction with the accompanying drawings, but the present invention is not limited to the above-mentioned specific implementations, and the above-mentioned specific implementations are only illustrative, rather than restrictive, and those of ordinary skill in the art will Under the enlightenment of the present invention, many forms can also be made without departing from the gist of the present invention and the protection scope of the claims, and these all belong to the protection of the present invention.
| Application Number | Priority Date | Filing Date | Title |
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| CN201210050446.6ACN103293392B (en) | 2012-02-29 | 2012-02-29 | A kind of Compact range generation device |
| Application Number | Priority Date | Filing Date | Title |
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| CN201210050446.6ACN103293392B (en) | 2012-02-29 | 2012-02-29 | A kind of Compact range generation device |
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| CN103293392A CN103293392A (en) | 2013-09-11 |
| CN103293392Btrue CN103293392B (en) | 2017-04-05 |
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| CN201210050446.6AActiveCN103293392B (en) | 2012-02-29 | 2012-02-29 | A kind of Compact range generation device |
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