CN103290364A - Continuous vacuum evaporation film coating device - Google Patents
Continuous vacuum evaporation film coating deviceDownload PDFInfo
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- CN103290364A CN103290364ACN2013101968570ACN201310196857ACN103290364ACN 103290364 ACN103290364 ACN 103290364ACN 2013101968570 ACN2013101968570 ACN 2013101968570ACN 201310196857 ACN201310196857 ACN 201310196857ACN 103290364 ACN103290364 ACN 103290364A
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- 238000007738vacuum evaporationMethods0.000titleclaimsabstractdescription32
- 239000007888film coatingSubstances0.000titleabstract9
- 238000009501film coatingMethods0.000titleabstract9
- 230000007704transitionEffects0.000claimsabstractdescription220
- 239000000463materialSubstances0.000claimsabstractdescription101
- 238000000576coating methodMethods0.000claimsdescription197
- 239000011248coating agentSubstances0.000claimsdescription190
- 238000001704evaporationMethods0.000claimsdescription28
- 230000008020evaporationEffects0.000claimsdescription27
- 230000003044adaptive effectEffects0.000claimsdescription8
- 238000012544monitoring processMethods0.000claimsdescription8
- 238000010849ion bombardmentMethods0.000claimsdescription4
- 239000006200vaporizerSubstances0.000claimsdescription4
- 150000001875compoundsChemical class0.000claimsdescription3
- 238000000926separation methodMethods0.000claimsdescription3
- 238000000034methodMethods0.000abstractdescription6
- 230000008569processEffects0.000abstractdescription3
- 238000007747platingMethods0.000abstractdescription2
- 239000007789gasSubstances0.000description11
- 238000010438heat treatmentMethods0.000description10
- 238000005086pumpingMethods0.000description7
- 239000000523sampleSubstances0.000description7
- 238000010894electron beam technologyMethods0.000description6
- 230000009183runningEffects0.000description6
- 238000005566electron beam evaporationMethods0.000description5
- 238000010586diagramMethods0.000description4
- 238000012545processingMethods0.000description4
- 230000005540biological transmissionEffects0.000description3
- 238000006243chemical reactionMethods0.000description3
- 238000005516engineering processMethods0.000description3
- 238000004519manufacturing processMethods0.000description3
- 230000008859changeEffects0.000description2
- 230000004087circulationEffects0.000description2
- 238000004891communicationMethods0.000description2
- 239000013078crystalSubstances0.000description2
- 238000005240physical vapour depositionMethods0.000description2
- 238000010926purgeMethods0.000description2
- 239000010453quartzSubstances0.000description2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-Nsilicon dioxideInorganic materialsO=[Si]=OVYPSYNLAJGMNEJ-UHFFFAOYSA-N0.000description2
- 238000009987spinningMethods0.000description2
- 239000000758substrateSubstances0.000description2
- 230000003321amplificationEffects0.000description1
- 238000007630basic procedureMethods0.000description1
- 230000008901benefitEffects0.000description1
- 229910001423beryllium ionInorganic materials0.000description1
- 230000000740bleeding effectEffects0.000description1
- 238000004140cleaningMethods0.000description1
- 238000005520cutting processMethods0.000description1
- 238000013461designMethods0.000description1
- 238000011161developmentMethods0.000description1
- 238000009792diffusion processMethods0.000description1
- 230000007246mechanismEffects0.000description1
- 238000003199nucleic acid amplification methodMethods0.000description1
- 239000002245particleSubstances0.000description1
- 229910001220stainless steelInorganic materials0.000description1
- 239000010935stainless steelSubstances0.000description1
- 230000001360synchronised effectEffects0.000description1
- 238000001771vacuum depositionMethods0.000description1
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Abstract
Description
Technical field
The present invention relates to the coating technique field, especially relate to a kind of continuous vacuum evaporation coating device.
Background technology
Vacuum vapor plating (abbreviation evaporation) technology is the PVD(physical vapor deposition) in the technology development the earliest, the coating technique that Application Areas is very wide.Its principle of work: the evaporation source (be used for heating film material make it the device of steam raising) that the film material is placed vacuum coating film equipment, under high vacuum condition, make it evaporation by evaporation source heating film material and form steam, because base material temperature is lower, steam just condenses in substrate surface and forms film behind the substrate surface that steam arrival is plated.
Widespread use at present be box evaporation coating machine, this box evaporation coating machine mainly adopts the two kinds of evaporation sources in resistance heating evaporation source and electron beam heating evaporation source (being made up of electron beam gun and crucible).This coating equipment mainly comprises: vacuum chamber, air-bleed system, evaporation source, film thickness measuring system, ion source, well heater etc.
Existing box evaporation coating machine to the basic procedure of base material plated film processing is: a, loading (with base material loaded to be deposited to work rest); B, put on the shelf (work rest that will install base material is installed in the vacuum chamber); C, bleed and (close the vacuum chamber gate, by vacuum pump vacuum chamber is bled until the vacuum pressure value to set(ting)value, as be better than 10-2Pa); D, heating (heating is arrived set(ting)value until base material temperature to base material, requires also can not heat according to plated film in addition); E, ion clean (the rotational workpieces frame cleans base material by ion source, requires also can not clean according to plated film in addition); F, plated film (open evaporation source and realize plated film, reach set(ting)value until thickness); G, shutdown (stopping heating, the work rest that stops the rotation, vacuum chamber amplification gas); H, undercarriage (open door for vacuum chamber, the base material work rest behind the plated film is taken out); Return a step then and carry out next Production Flow Chart.
Above-mentioned this box evaporation coating machine carries out to base material that there are the following problems in the coating process:
1, because its cycle of modes work by start-shutdown-start; it is in full accord that the related coating process condition of different cycles such as vacuum pressure, Heating temperature, the speed of evacuation, chamber body are exitted in this working cycle, the chamber body pollution is difficult to each processing condition; and has only a rare change of processing condition; all will cause the variation of film quality, so the film quality consistence that this coating equipment is produced is difficult to be guaranteed.
2, because above-mentioned this coating equipment generally adopts the air-bleed system of oil diffusion pump+lobe pump+oil seal type sliding vane rotary pump, oil vapour is known from experience vacuum chamber certain pollution, and then meeting pollution film layer quality; In addition in the actual procedure owing to want to obtain high vacuum tightness environment, the time of bleeding can be very long, comprehensive evaporation requires and the consideration of production efficiency, generally controls vacuum tightness 10-2About Pa, namely also residual in vacuum chamber this moment have a more H2O, CO2, O2, N2, gases such as organic vapor, in coating process, these gases meetings and evaporation particle are adsorbed or combination together, pollute in film, and then influence film layer quality.
Summary of the invention
Main purpose of the present invention is to provide a kind of continuous vacuum evaporation coating device, improves plated film efficient, guarantees the consistence of product rete, prevents that rete from being polluted by foreign gas, obtains the more excellent rete of quality.
The present invention proposes a kind of continuous vacuum evaporation coating device, comprising: coating chamber, work rest and coating materials frame;
Described coating chamber one end is communicated with first transition chamber, and the other end is communicated with second transition chamber;
Be respectively equipped with first track that transmits described work rest and second track that transmits described coating materials frame in described first transition chamber, coating chamber, second transition chamber;
But the described first transition chamber two ends and the second transition chamber two ends are respectively equipped with the push-pull valve that is used for separation gas of switch;
Described first transition chamber, coating chamber, second transition chamber dispose independently air-bleed system respectively.
Preferably, first track of described first transition chamber and first track of coating chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped; First track of coating chamber and first track of second transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped;
Second track of described first transition chamber and second track of coating chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped; Second track of coating chamber and second track of second transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped.
Preferably, described first transition chamber comprises: last first transition chamber, following first transition chamber that is communicated with last first transition chamber; Be provided with described first track in last first transition chamber; Be provided with described second track in first transition chamber under described;
Described second transition chamber comprises: last second transition chamber, following second transition chamber that is communicated with last second transition chamber; Be provided with described first track in last second transition chamber; Be provided with described second track in second transition chamber under described.
Preferably, described push-pull valve comprises: go up push-pull valve and lower plugboard valve;
The described last first transition chamber two ends and the last second transition chamber two ends are provided with push-pull valve;
The described first transition chamber two ends down and the following second transition chamber two ends are provided with the lower plugboard valve.
Preferably, described first track comprises: first pulley, and a side of this first pulley is provided with first gear;
Described work rest comprises: work rest body, the top of this work rest body are provided with first slide block adaptive with described first pulley, and this first slide block, one side is provided with first tooth bar with described first gear engagement.
Preferably, described second track comprises: second pulley, and a side of this second pulley is provided with second gear; Described coating materials frame comprises: coating materials frame body, the bottom of this coating materials frame body are provided with second slide block adaptive with described second pulley, and a side of described second slide block is provided with second tooth bar with described second gear engagement.
Preferably, continuous vacuum evaporation coating device also comprises first underframe, pan carriage, and second underframe that is used for the transportation pan carriage; Described first transition chamber, coating chamber and second transition chamber place on described first underframe; The described second underframe two ends connect respectively at the two ends of described first underframe, and the outer surface of cupular part of the two is on the same horizontal plane;
Be respectively arranged with first track and second track on the described pan carriage; When described pan carriage places on second underframe when being provided with the end that an end of first transition chamber is connected with first underframe, first track of described pan carriage and first track of first transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped.
Preferably, continuous vacuum evaporation coating device also comprises:
The vaporizer that is used for the evaporation coating materials;
Be used for the well heater to last first transition chamber, coating chamber;
For the ion bombardment device that base material is cleaned.
Preferably, continuous vacuum evaporation coating device also comprises:
The film thickness monitoring instrument that is used for monitoring base material coating film thickness;
The compound vacuum gauge that is used for the vacuum tightness of monitoring first transition chamber, coating chamber, second transition chamber.
A kind of continuous vacuum evaporation coating device provided by the present invention, described coating chamber one end is communicated with first transition chamber, and the other end is communicated with second transition chamber; Be respectively equipped with first and second track of transmission work rest, coating materials frame in first transition chamber, coating chamber, second transition chamber; The first transition chamber two ends and the second transition chamber two ends are equipped with push-pull valve; First transition chamber, coating chamber, second transition chamber dispose the independently mode of air-bleed system respectively, described device is in service, and except the loading and unloading of work rest and coating materials were adopted manually, other operations were finished automatically by device, improve plated film efficient greatly, guaranteed the consistence of product rete.Can keep high vacuum state in the coating chamber simultaneously, foreign gas is few, can prevent effectively that the coating materials steam from being polluted by foreign gas, thereby can obtain the more excellent rete of quality.
Description of drawings
Fig. 1 is the perspective view of continuous vacuum evaporation coating device one embodiment of the present invention;
Fig. 2 is the main view principle synoptic diagram of continuous vacuum evaporation coating device of the present invention;
Fig. 3 is the principle schematic of overlooking of continuous vacuum evaporation coating device of the present invention;
Fig. 4 is first track of coating chamber of the present invention and the fit structure synoptic diagram of work rest;
Fig. 5 is the structural representation of work rest of the present invention;
Fig. 6 is first track of coating chamber of the present invention and another fit structure synoptic diagram of work rest;
Fig. 7 is the structural representation of coating materials frame of the present invention;
Fig. 8 is the fit structure synoptic diagram of coating materials frame of the present invention and second track.
The realization of the object of the invention, functional characteristics and advantage will be in conjunction with the embodiments, are described further with reference to accompanying drawing.
Embodiment
Should be appreciated that specific embodiment described herein only in order to explaining the present invention, and be not used in restriction the present invention.
Referring to Fig. 1, a kind of continuous vacuumevaporation coating device 100 1 embodiment of the present invention are proposed, comprising:coating chamber 110,work rest 120 andcoating materials frame 130, describedcoating chamber 110 1 ends are communicated withfirst transition chamber 140, and the other end is communicated with second transition chamber 150.Be respectively equipped withfirst track 160 that transmits describedwork rest 120 andsecond track 170 that transmits describedcoating materials frame 130 in describedfirst transition chamber 140,coating chamber 110, second transition chamber 150.But described first transition chamber, 140 two ends and second transition chamber, 150 two ends are provided with the push-pull valve (Fig. 1 is not shown) that is used for separation gas of switch.Describedfirst transition chamber 140,coating chamber 110,second transition chamber 150 dispose independently air-bleed system respectively.
Thedevice 100 that present embodiment provides in the course of the work, describedwork rest 120 andcoating materials frame 130 transporting directions are first transition chamber, 140 → coating chamber, 110 → the second transition chambers 150.Describedcoating chamber 110 is for the coating materials on the evaporatingfilm bin 130, realizes the base material in thework rest 120 is carried out the working space of plated film.
Described push-pull valve is used for cutting off or being communicated withfirst transition chamber 140,coating chamber 110 andsecond transition chamber 150, makes the conversion of finishingfirst transition chamber 140 and second transition chamber, 150 atmospheric environments and vacuum environment.Guarantee thatcoating chamber 110 described in describeddevice 100 working process is in the vacuum environment of the vacuum ranges of setting all the time.
Describedfirst transition chamber 140 is used for makingwork rest 120 andcoating materials frame 130 to be changed to vacuum environment by atmospheric environment.Second transition chamber 150 is used for makingwork rest 120 andcoating materials frame 130 to be changed to atmospheric environment by vacuum environment.
In the present embodiment, describedfirst transition chamber 140 is identical with the air-bleed system of the configuration ofsecond transition chamber 150, dried pump+lobe pump unit (being used for slightly taking out), turbomolecular pump+direct connection sliding vane rotary pump unit (being used for essence takes out) have all been adopted, pump group intermittent type is bled, and finishes the conversion betweenfirst transition chamber 140 and second transition chamber, 150 atmospheric environments and the vacuum environment.And the air-bleed system of describedcoating chamber 110 configurations has adopted turbomolecular pump+direct connection sliding vane rotary pump unit (being used for essence takes out), and the pump group continues to bleed, and makescoating chamber 110 keep high vacuum environment always, the better quality of rete during with the assurance plated film.Because describedfirst transition chamber 140,second transition chamber 150, and the off-gas pump thatcoating chamber 110 adopts is the oil-sealed rotary pump that does not have oil, can be tofirst transition chamber 140,second transition chamber 150, andcoating chamber 110 causes oil pollution, base material is plated film under the vacuum environment of cleaning, can obtain the higher rete of quality.
Further, referring to Fig. 2, Fig. 3, among above-mentioned continuous vacuumevaporation coating device 100 embodiment, described push-pull valve comprises: the push-pull valve VS40 of the push-pull valve VS30 between the push-pull valve VS20 between the push-pull valve VS10 of the end thatfirst transition chamber 140 is not connected withcoating chamber 110,first transition chamber 140 and thecoating chamber 110,coating chamber 110 andsecond transition chamber 150, the end thatsecond transition chamber 150 is not connected with coating chamber 110.First track 160 of wherein saidfirst transition chamber 140 is isolated by the space that accommodates push-pull valve VS20 withfirst track 160 ofcoating chamber 110, and the two prolongation is overlapped.First track 160 ofcoating chamber 110 andfirst track 160 ofsecond transition chamber 150 are isolated by the space that accommodates push-pull valve VS30, and the two prolongation is overlapped.Second track 170 of describedfirst transition chamber 140 is isolated by the space that accommodates push-pull valve VS20 withsecond track 170 ofcoating chamber 110, and the two prolongation is overlapped.Second track 170 ofcoating chamber 110 andsecond track 170 ofsecond transition chamber 150 are isolated by the space that accommodates push-pull valve VS30, and the two prolongation is overlapped.First track 160,first track 160 ofcoating chamber 110, second transition chamber, 150first tracks 160 that have namely guaranteed describedfirst transition chamber 140 are on the same straight line;Work rest 120 runs onfirst track 160 ofcoating chamber 110 onfirst track 160 byfirst transition chamber 140 reposefully, onfirst track 160 ofsecond transition chamber 150 that reruns.Guaranteed that in like mannersecond track 170 of describedfirst transition chamber 140,second track 170 ofcoating chamber 110,second track 170 ofsecond transition chamber 150 are on the same straight line,coating materials frame 130 runs onsecond track 170 ofcoating chamber 110 onsecond track 170 byfirst transition chamber 140 reposefully, onsecond track 170 ofsecond transition chamber 150 that reruns.
Further, referring to Fig. 1 and Fig. 2, above-mentioned continuous vacuumevaporation coating device 100 embodiment, describedfirst transition chamber 140 comprises: lastfirst transition chamber 141, followingfirst transition chamber 142 that is communicated with lastfirst transition chamber 141; Be provided with describedfirst track 160 in lastfirst transition chamber 141; Be provided with describedsecond track 170 infirst transition chamber 142 under described.Describedsecond transition chamber 150 comprises: lastsecond transition chamber 151, followingsecond transition chamber 152 that is communicated with lastsecond transition chamber 151; Be provided with describedfirst track 160 in lastsecond transition chamber 151; Be provided with describedsecond track 170 insecond transition chamber 152 under described.
Further, above-mentioned continuous vacuumevaporation coating device 100 embodiment, described push-pull valve comprises push-pull valve and lower plugboard valve, wherein said last first transition chamber, 141 two ends and lastsecond transition chamber 151 two ends are provided with push-pull valve; Described first transition chamber, 142 two ends down and following second transition chamber, 152 two ends are provided with the lower plugboard valve.Referring to Fig. 2 and Fig. 3, the push-pull valve VS40 of the push-pull valve VS30 between the push-pull valve VS20 between the push-pull valve VS10,first transition chamber 140 that described push-pull valve comprises the end thatfirst transition chamber 140 is not connected withcoating chamber 110 and thecoating chamber 110,coating chamber 110 andsecond transition chamber 150, the end thatsecond transition chamber 150 is not connected with coating chamber 110.Described VS10 comprises push-pull valve VS11 and lower plugboard valve VS12.Described VS20 comprises push-pull valve VS21 and lower plugboard valve VS22.Described VS30 comprises push-pull valve VS31 and lower plugboard valve VS32.Described VS40 comprises push-pull valve VS41 and lower plugboard valve VS42.110 of described lastfirst transition chamber second transition chamber 151 and coating chambers, and an end, lastsecond transition chamber 151 that lastfirst transition chamber 141 is not communicated with describedcoating chamber 110 are not respectively arranged with push-pull valve VS11, VS21, VS31, VS41 with the end that describedcoating chamber 110 is communicated with.Described downfirst transition chamber second transition chamber coating chamber 110 of followingfirst transition chamber 142, the end that is not communicated with describedcoating chamber 110 ofsecond transition chamber 142 is provided with lower plugboard valve VS12, VS22, VS32, VS42 down.
Further, referring to Fig. 4, Fig. 5, Fig. 6, among above-mentioned continuous vacuumevaporation coating device 100 embodiment, describedfirst track 160 comprises:first pulley 161, a side of thisfirst pulley 161 is provided with first gear 162.Describedwork rest 120 comprises:work rest 120bodies 121, the top of thesework rest 120bodies 121 are provided withfirst slide block 122 adaptive with describedfirst pulley 161, and these first slide block, 122 1 sides are provided withfirst tooth bar 123 with 162 engagements of described first gear.Afterwork rest 120 is mounted onfirst track 160, describedfirst pulley 161 andfirst slide block 122 slide adaptive, describedfirst gear first gear 162 rotates under the driving of motor,first tooth bar 123 drives describedwork rest 120 and moves along the length direction offirst tooth bar 123 along withfirst gear 162 rotates, thereby reaches the purpose of the describedwork rest 120 of transportation.
In addition, referring to Fig. 4 and Fig. 6, in the present embodiment, first slide block, the 122 top center positions of describedwork rest 120 are provided with first revolvinggear 124, described first revolvinggear 124 is fixed with describedwork rest 120 bodies, be that described work rest 120 rotates synchronously with first revolvinggear 124, be provided with second revolvinggear 163 with 124 engagements of described first revolving gear infirst track 160 of described coating chamber 110.When beginning that after describedwork rest 120 is transported tocoating chamber 110 desired locations the basis on thework rest 120 carried out plated film, described second revolvinggear 163 rotates under the startup of motor, first revolvinggear 124 is along with described second revolvinggear 163 rotates and rotates, thereby make work rest 120 rotate and rotate along with second revolvinggear 163, make plated film even film layer on the base material.
Further, referring to Fig. 7 and Fig. 8, among above-mentioned continuous vacuumevaporation coating device 100 embodiment, describedsecond track 170 comprises:second pulley 171, and a side of thissecond pulley 171 is provided withsecond gear 172; Describedcoating materials frame 130 comprises:coating materials frame 130bodies 131, the bottom of thesecoating materials frame 130bodies 131 is provided withsecond slide block 132 adaptive with describedsecond pulley 171, and a side of describedsecond slide block 132 is provided withsecond tooth bar 133 with 172 engagements of described second gear.Aftercoating materials frame 130 is mounted onsecond track 170, describedsecond pulley 171 andsecond slide block 132 slide adaptive, describedsecond gear second gear 172 rotates under the driving of motor, becausesecond tooth bar coating materials frame 130 moves along the length direction ofsecond tooth bar 133, thereby reaches the purpose of the describedcoating materials frame 130 of transportation.
In the present embodiment, what describedfirst gear 162 andsecond gear 172 adopted is that reducing motor drives, and can change the travelling speed ofwork rest 120 andcoating materials frame 130 by the adjusting motor speed.The connection of the connection of the firstadjacent gear 162, the secondadjacent gear 172 adopts synchronous band to connect respectively, therefore can guarantee the consistence that all first gears rotate, and the consistence of all second gears rotations.Make work rest 120 and 130 transmissions of coating materials frame smooth and easy, steady.
In addition, in the present embodiment, electromagnetic clutch control is all adopted in the clutch of describedfirst gear 162 andfirst tooth bar 123 andsecond gear 172 andsecond tooth bar 133, thereby makes thegear 162 of winning mesh smooth and easy withfirst tooth bar 123,second gear 172 and second tooth bar 133.This accuracy of mesh height makes that the operation of work rest 120 andcoating materials frame 130 is very steady, can not produce the situation that base material or coating materials drop.
Further, referring to Fig. 1, among above-mentioned continuous vacuumevaporation coating device 100 embodiment, saidapparatus 100 also comprisesfirst underframe 101,pan carriage 102, is used forsecond underframe 103 of transportation pan carriage 102.First transition chamber 140,coating chamber 110 andsecond transition chamber 150 place on described first underframe 101.Describedsecond underframe 103 two ends are connected with the two ends of describedfirst underframe 101 respectively, and the outer surface of cupular part of the two is on the same horizontal plane.Be respectively arranged withfirst track 160 andsecond track 170 on the described pan carriage 102.When describedpan carriage 102 places onsecond underframe 103 when being provided with the end that an end offirst transition chamber 140 is connected withfirst underframe 101,first track 160 of describedpan carriage 102 andfirst track 160 offirst transition chamber 140 are isolated by the space that accommodates push-pull valve VS10, and the two prolongation is overlapped.
Thedevice 100 that this enforcement provides needs two describedpan carriage 102, one of them is in the end thatfirst transition chamber 140 is not connectedcoating chamber 110 with mountedwork rest 120 andcoating materials frame 130,pan carriage 102 meanwhile is transported tocoating materials frame 130 onsecond track 170 offirst transition chamber 140 bysecond track 170 by onfirst track 160 offirst track 160 with work rest 120 transportationsfirst transition chamber 140 then.After the base material plated film on the describedwork rest 120 was finished, describedwork rest 120 was transported onfirst track 160 that enters on anotherempty pan carriage 102 byfirst track 160 ofsecond transition chamber 150; Meanwhile describedcoating materials frame 130 is transported onsecond track 170 that enters on anotherempty pan carriage 102 bysecond track 170 ofsecond transition chamber 150.
Further, among above-mentioned continuous vacuumevaporation coating device 100 embodiment, describeddevice 100 also comprises be used to the vaporizer (scheming not shown) that makes the coating materials evaporation, described vaporizer is resistance-type evaporation source or electron beam evaporation source, if adopt the resistance-type evaporation source, then after describedcoating materials frame 130 enterscoating chamber 110, adopt the electrode communication apparatus of air cylinder driven to the evaporation boat connection circuit of resistance-type evaporation source.Described electron beam evaporation source comprises two kinds of structures: electron beam gun and crucible integral type, electron beam gun and crucible are split type.Then adopt the electron beam evaporation source of electron beam gun and crucible integral type when the little coating materials of plated film amount; The coating materials that the plated film amount is big then adopts the split type electron beam evaporation source of electron beam gun and crucible.
In the present embodiment, describeddevice 100 is thatfirst transition chamber 140,coating chamber 110,second transition chamber 150 dispose compound vacuum gauge (scheming not shown) respectively, is respectively applied to monitor in real time the vacuum tightness offirst transition chamber 140,coating chamber 110,second transition chamber 150.
In the present embodiment, describeddevice 100 also disposes well heater (scheming not shown) respectively for lastfirst transition chamber 141, coating chamber 110.The well heater of present embodiment can adopt stainless steel tubulose well heater, and this well heater can be realized the big area homogeneous heating, and working stability, long service life.Wherein, described well heater adopts the control of PID temperature control module, and control accuracy can reach ± and 2.5 ℃.
In the present embodiment, describeddevice 100 also comprises the film thickness monitoring instrument (scheming not shown) for monitoring base material coating film thickness, and described monitor can adopt the quartz crystal probe.Wherein according to the difference of base material plated film thicknesses of layers, the quartz crystal probe can be selected single probe, two probe or many probes (two more than the probe, as six probes) for use.
In the present embodiment, describeddevice 100 comprises that also described ion bombardment device can be ion source for the ion bombardment device that base material is cleaned (scheming not shown).
Below 100 pairs of base material coating process of device of providing by above-described embodiment be that example is further detailed the present invention.Referring to Fig. 2 and Fig. 3,100 pairs of base material coating process of described device are specific as follows:
One, start
Open the direct connection sliding vane rotary pump, and unlatching molecular pump foreline valve (FV1-FV7); The molecular pump forvacuum is opened molecular pump after reaching the molecular pump trigger pressure.
Startfirst transition chamber 140,second transition chamber 150,coating chamber 110 internal heaters, make it to reach respectively design temperature (setting according to coating process).
Dried pumping set starts.
Two, advance frame
Open push-pull valve VS11, lower plugboard valve VS12, close and close push-pull valve VS21, lower plugboard valve VS22, makefirst transition chamber 141, followingfirst transition chamber 142 be in the atmospheric environment state.
With unit oneframe 120 andcoating materials frame 130 respectively on leftend pan carriage 102 linear running enter lastfirst transition chamber 141, stopfirst transition chamber 142 down, close and close push-pull valve VS11, lower plugboard valve VS12.
After pan carriage has been carried unit oneframe 120 andcoating materials frame 130, receivesecond work rest 120 andcoating materials frame 130 from 103 of spill circulations, and holding fix is waited for outside lastfirst transition chamber 141, followingfirst transition chamber 142.
Three, vacuum transition
Control heater is to base material heating on the unit oneframe 120 in lastfirst transition chamber 141.
Open the dried pumping set of first transition chamber, 140 correspondences and slightly take out valve RV1, dried pumping set is given lastfirst transition chamber 141,first transition chamber 142 is bled down, makes its vacuum pressure reach set(ting)value and (is generally 10-1The handkerchief order of magnitude).
Close dried pumping set and slightly take out valve RV1, open the molecular pump essence and take out valve HV1, HV2; Molecular pump is bled to lastfirst transition chamber 141, followingfirst transition chamber 142, makes its vacuum pressure reach set(ting)value and (is generally 10-3The Pa order of magnitude).
Open push-pull valve VS21 and lower plugboard valve VS22, unit oneframe 120 andcoating materials frame 130 enter and stop thecoating chamber 110 from lastfirst transition chamber 141, following first transition chamber, 142 linear runnings respectively, close and close push-pull valve VS21, lower plugboard valve VS22.
Open push-pull valve VS11, lower plugboard valve VS12,second work rest 120 andcoating materials frame 130 respectively onpan carriage 102 linear running enter lastfirst transition chamber 141, stopfirst transition chamber 142 down, close and close push-pull valve VS11, lower plugboard valve VS12.After this repeat unit oneframe
Four, plated film
Second revolving gear, 163 engagements in the unit oneframe 120 ofarrival coating chamber 110 onfirst track 160 of first revolvinggear 124 andcoating chamber 110, open electric motor starting second revolvinggear 163 and rotate,work rest 120 beginnings are done spinning motion incoating chamber 110.
Arrive firstcoating materials frame 130 and location, coatingchamber 110 interior evaporation source position ofcoating chamber 110, wherein the electrode communication apparatus is given evaporation boat connection circuit.
After base material cleans and finishes, according to the coating process needs, by resistance-type evaporation source or the evaporation of electron beam evaporation source coating materials, realize the base material plated film.
Five, vacuum transition
Close and slightly take out valve RV2, open the molecular pump essence and take out valve HV3, HV4, makesecond transition chamber 151, followingsecond transition chamber 152 be in the state of vacuumizing; Molecular pump is bled to lastsecond transition chamber 151, followingsecond transition chamber 152, makes its vacuum pressure reach set(ting)value and (is generally 10-3The Pa order of magnitude).
After plated film finished, unit oneframe 120 stopped spinning motion.
Open push-pull valve VS31, lower plugboard valve VS32, unit oneframe 120 andcoating materials frame 130 enter lastsecond transition chamber 151, stopsecond transition chamber 152 down from the coating chamber linear running, close and close push-pull valve VS31, lower plugboard valve VS32.
Open push-pull valve VS21, lower plugboard valve VS22,second work rest 120 andcoating materials frame 130 close and close push-pull valve VS21, lower plugboard valve VS22 from lastfirst transition chamber 141, first transition chamber, 142 linear runnings enter and stop the coating chamber down.After this repeat unit oneframe
Six, go out frame
Treat that unit oneframe 120 andcoating materials frame 130 entersecond transition chamber 151, followingsecond transition chamber 152 respectively, close and close push-pull valve VS31, lower plugboard valve VS32 that closure molecule pump essence is taken out valve HV3, HV4 then.
Open the purging valve ofsecond transition chamber 151, followingsecond transition chamber 152, lastsecond transition chamber 151, followingsecond transition chamber 152 are exitted to atmospheric condition.
Open push-pull valve VS41, lower plugboard valve VS42, unit oneframe 120 andcoating materials frame 130 are respectively from lastsecond transition chamber 151, down second transition chamber, 152 linear runnings close and close push-pull valve VS41, lower plugboard valve VS42 to pan carriage.
Open the dried pumping set ofsecond transition chamber 151, following second transition chamber, 1520 correspondences and slightly take out valve RV2, dried pumping set is given lastsecond transition chamber 151,second transition chamber 152 is bled down, makes vacuum pressure reach set(ting)value and (is generally 10-1The Pa order of magnitude).
Close dried pumping set and slightly take out valve RV2, open the molecular pump essence and take out valve HV3, HV4; Molecular pump is bled to lastsecond transition chamber 151, followingsecond transition chamber 152, makes vacuum pressure reach set(ting)value and (is generally 10-3The Pa order of magnitude).
Lastsecond transition chamber 151, downsecond transition chamber 152 is in high vacuum state, waits for thatsecond work rest 120 andcoating materials frame 130 plated films finish.
Seven, frame is walked in circulation
Unit oneframe 120 andcoating materials frame 130 move on the leftend pan carriage 102 from right-handmember pan carriage 102 by the transmission mechanism ofpan carriage underframe 103.
On leftend pan carriage 102, the workman takes off thework rest 120 that base material has plated, changes awork rest 120 that installs base material to be plated.
On leftend pan carriage 102, the workman gives the evaporation boat on thecoating materials frame 130 or crucible adds or the replacing coating materials.
For guaranteeing that describeddevice 100 can turn round continuously, according to the difference of work tempo, the number of work rest and coating materials frame can be respectively two or more; Quantity=single the work rest of minimum work rest or the configuration of coating materials frame or the circular flow of coating materials frame time ÷ work tempo (being that adjacent two work rests or coating materials frame are by the timed interval of production line same position) once.
Each operation steps in the saidapparatus 100 adopts industrial computer control interface by the PLC time variable control, and the user can arrange processing parameter and plated film prescription separately.
As from the foregoing: continuous vacuumevaporation coating device 100 provided by the present invention is in operation, and except the loading and unloading of work rest and coating materials were adopted manually, other operations were finished automatically by device, have improved plated film efficient greatly, have guaranteed the consistence of product rete.Can keep high vacuum state in the coating chamber simultaneously, foreign gas is few, can prevent effectively that the coating materials steam from being polluted by foreign gas, thereby can obtain the more excellent rete of quality.
Should be understood that; below only be the preferred embodiments of the present invention; can not therefore limit claim of the present invention; every equivalent structure or equivalent flow process conversion that utilizes specification sheets of the present invention and accompanying drawing content to do; or directly or indirectly be used in other relevant technical fields, all in like manner be included in the scope of patent protection of the present invention.
Claims (9)
1. continuous vacuum evaporation coating device comprises: coating chamber, work rest and coating materials frame, it is characterized in that,
Described coating chamber one end is communicated with first transition chamber, and the other end is communicated with second transition chamber;
Be respectively equipped with first track that transmits described work rest and second track that transmits described coating materials frame in described first transition chamber, coating chamber, second transition chamber;
But the described first transition chamber two ends and the second transition chamber two ends are respectively equipped with the push-pull valve that is used for separation gas of switch;
Described first transition chamber, coating chamber, second transition chamber dispose independently air-bleed system respectively.
2. continuous vacuum evaporation coating device according to claim 1 is characterized in that,
First track of described first transition chamber and first track of coating chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped; First track of coating chamber and first track of second transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped;
Second track of described first transition chamber and second track of coating chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped; Second track of coating chamber and second track of second transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped.
3. continuous vacuum evaporation coating device according to claim 2 is characterized in that, described first transition chamber comprises: last first transition chamber, following first transition chamber that is communicated with last first transition chamber; Be provided with described first track in last first transition chamber; Be provided with described second track in first transition chamber under described;
Described second transition chamber comprises: last second transition chamber, following second transition chamber that is communicated with last second transition chamber; Be provided with described first track in last second transition chamber; Be provided with described second track in second transition chamber under described.
4. continuous vacuum evaporation coating device according to claim 3 is characterized in that described push-pull valve comprises: go up push-pull valve and lower plugboard valve;
The described last first transition chamber two ends and the last second transition chamber two ends are provided with push-pull valve;
The described first transition chamber two ends down and the following second transition chamber two ends are provided with the lower plugboard valve.
5. according to each described continuous vacuum evaporation coating device of claim 1 to 4, it is characterized in that described first track comprises: first pulley, a side of this first pulley is provided with first gear;
Described work rest comprises: work rest body, the top of this work rest body are provided with first slide block adaptive with described first pulley, and this first slide block, one side is provided with first tooth bar with described first gear engagement.
6. according to each described continuous vacuum evaporation coating device of claim 1 to 4, it is characterized in that described second track comprises: second pulley, a side of this second pulley is provided with second gear; Described coating materials frame comprises: coating materials frame body, the bottom of this coating materials frame body are provided with second slide block adaptive with described second pulley, and a side of described second slide block is provided with second tooth bar with described second gear engagement.
7. according to each described continuous vacuum evaporation coating device of claim 1 to 4, it is characterized in that, also comprise first underframe, pan carriage, and second underframe that is used for the transportation pan carriage; Described first transition chamber, coating chamber and second transition chamber place on described first underframe; The described second underframe two ends are connected with the two ends of described first underframe respectively, and the outer surface of cupular part of the two is on the same horizontal plane;
Be respectively arranged with first track and second track on the described pan carriage; When described pan carriage places on second underframe when being provided with the end that an end of first transition chamber is connected with first underframe, first track of described pan carriage and first track of first transition chamber are isolated by the space that accommodates push-pull valve, and the two prolongation is overlapped.
8. continuous vacuum evaporation coating device according to claim 7 is characterized in that, also comprises:
The vaporizer that is used for the evaporation coating materials;
Be used for the well heater to last first transition chamber, coating chamber;
For the ion bombardment device that base material is cleaned.
9. continuous vacuum evaporation coating device according to claim 7 is characterized in that, also comprises:
The film thickness monitoring instrument that is used for monitoring base material coating film thickness;
The compound vacuum gauge that is used for the vacuum tightness of monitoring first transition chamber, coating chamber, second transition chamber.
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| CN201310196857.0ACN103290364B (en) | 2013-05-23 | 2013-05-23 | Continuous vacuum evaporation coating device |
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