Movatterモバイル変換


[0]ホーム

URL:


CN103226059A - Wavefront measuring device and method for optical system - Google Patents

Wavefront measuring device and method for optical system
Download PDF

Info

Publication number
CN103226059A
CN103226059ACN2013101221168ACN201310122116ACN103226059ACN 103226059 ACN103226059 ACN 103226059ACN 2013101221168 ACN2013101221168 ACN 2013101221168ACN 201310122116 ACN201310122116 ACN 201310122116ACN 103226059 ACN103226059 ACN 103226059A
Authority
CN
China
Prior art keywords
optical system
array
lens array
imaging
wavefront
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2013101221168A
Other languages
Chinese (zh)
Inventor
陈永权
段亚轩
李坤
赵建科
胡丹丹
赛建刚
龙江波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XiAn Institute of Optics and Precision Mechanics of CAS
Original Assignee
XiAn Institute of Optics and Precision Mechanics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by XiAn Institute of Optics and Precision Mechanics of CASfiledCriticalXiAn Institute of Optics and Precision Mechanics of CAS
Priority to CN2013101221168ApriorityCriticalpatent/CN103226059A/en
Publication of CN103226059ApublicationCriticalpatent/CN103226059A/en
Pendinglegal-statusCriticalCurrent

Links

Images

Landscapes

Abstract

The invention relates to a wavefront measuring device and a measuring method of an optical system, wherein the wavefront measuring device of the optical system comprises a laser, a small lens array, an imaging lens array, a CCD array and an acquisition control computer; the small lens array, the imaging lens array and the CCD array are sequentially arranged on an emergent light path of the laser; the CCD is electrically connected with the acquisition control computer. The invention provides an optical system wavefront measuring device and a measuring method which can quickly measure the system wavefront of a large-aperture optical system without adopting a large-aperture optical element.

Description

Optical system Wavefront measuring apparatus and measuring method
Technical field
The invention belongs to the optical detection field, relate to a kind of optical system Wavefront measuring apparatus and measuring method, relate in particular to a kind of heavy-caliber optical system Wavefront measuring apparatus.
Background technology
The wavefront of optical system is an important technology index after its system is debug, and its quality directly affects the image quality or the transmission performance of system.Along with the continuous development in China's aerospace industry, military project target range, the utilization of heavy-caliber optical system is more and more, and following, the difficulty of test of wavefront is also more and more higher.
Existing method of testing comprises following several:
1) adopt laser interferometer that the wavefront of optical system is tested, but the restriction of bore of Stimulated Light interferometer (interferometer of China's bore maximum is Ф 800mm at present) or standard reflection aperture of mirror, the wavefront measurement bore is also limited thereupon.Simultaneously, development large-caliber laser interferometer, used optical elements of large caliber difficulty of processing is big in the system, and cost is very expensive, and is less economical.
2) adopt small-bore laser interferometer scanning survey, it is bigger that this method is influenced by wavefront splicing precision, and when simultaneously heavy-caliber optical system being tested, system adjusts relative complex, and Measuring Time is longer.
3) adopt Hartmann's wavefront measurement system that the wavefront of heavy-caliber optical system is tested, the method need be developed a bore the contract beam system suitable with optical system bore to be measured, and expense is also higher relatively.
Summary of the invention
In order to solve the problems referred to above that exist in the background technology, the present invention proposes a kind of optical system Wavefront measuring apparatus and measuring method that does not adopt optical elements of large caliber to measure system's wavefront of heavy-caliber optical system fast.
Technical solution of the present invention is: the invention provides a kind of optical system Wavefront measuring apparatus, its special character is: described optical system Wavefront measuring apparatus comprises laser instrument, lenslet array, imaging len array, ccd array and acquisition controlling computing machine; Described lenslet array, imaging len array and ccd array are successively set on the emitting light path of laser instrument; Described CCD and acquisition controlling computing machine are electrical connected.
The imaging object plane of above-mentioned imaging len array is the focal plane of lenslet array.
Above-mentioned lenslet array comprises four lenslets at least; Described imaging len array comprises at least one imaging len; The imaging object plane of described imaging len array is the focal plane of the lenslet in the lenslet array.
Above-mentioned ccd array is arranged on the imaging surface place of imaging len array.
Above-mentioned ccd array comprise with the imaging len array in the corresponding to CCD of number of imaging len.
Above-mentioned laser instrument comprises optical fiber pigtail, and the fibre core of described optical fiber pigtail is less than the diffraction-limited of optical system to be measured.
The fibre core of above-mentioned optical fiber pigtail is less than one times of diffraction-limited of optical system to be measured.
A kind of measuring method that is used for the optical system Wavefront measuring apparatus, its special character is: described measuring method may further comprise the steps:
1) opens laser instrument and produce laser;
2) the resulting laser of step 1) is injected optical system to be measured and forms plane wave;
3) by lenslet array to step 2) formed plane wave carries out light beam and focuses on, and forms the array focal spot;
4) by the imaging len array the formed array focal spot of step 3) is carried out imaging, form light spot image;
5) by the ccd array synchronous acquisition by the formed light spot image of step 4);
6) by the acquisition controlling computing machine interpretation is carried out in the position of the light spot image after gathering, and calculate the wavefront slope that ccd array collects;
7) wavefront for the treatment of the photometry system restores.
Advantage of the present invention is:
1, adopt measurement mechanism provided by the present invention, can carry out the wavefront test of heavy-caliber optical system, be particularly useful for the system wavefront test of bore greater than the optical system of 1m, the system development cost is relatively low;
2, adopt wavefront slope that wavefront is restored, have the advantage that Hartmann wave front sensor is measured, but the wavefront of real time dynamic measurement heavy-caliber optical system, the measuring accuracy height;
3, according to the size and the beam sampling requirement of measuring bore, can have at design lenslet array and imaging len array, avoid using in the test macro optical elements of large caliber.
Description of drawings
Fig. 1 is the structural representation of optical system Wavefront measuring apparatus provided by the present invention;
Wherein:
The 1-laser instrument; 2-optical system to be measured; The 3-lenslet array; 4-imaging len array; The 5-CCD array; 6-acquisition controlling computing machine.
Embodiment
The present invention compriseslaser instrument 1, optical system to be measured 2,lenslet array 3, imaging len array 4, ccd array 5, acquisition controllingcomputing machine 6 as shown in Figure 1, is provided with wave front restoration software in the acquisition controlling computing machine 6.Lenslet array 3, imaging len array 4 and ccd array 5 are successively set on the emitting light path oflaser instrument 1;Optical system 2 to be measured places betweenlaser instrument 1 and thelenslet array 3; Ccd array 5 is electrical connected with acquisition controllingcomputing machine 6.
The imaging object plane of imaging len array 4 is focal planes oflenslet array 3;Lenslet array 3 comprises four lenslets at least; Imaging len array 4 comprises at least one imaging len; The imaging object plane of imaging len array 4 is focal planes of the lenslet in thelenslet array 3.
Ccd array 5 is arranged on the imaging surface place of imaging len array 4; Ccd array 5 comprise with the imaging len array in the corresponding to CCD of number of 4 imaging len.
Laser instrument 1 comprises optical fiber pigtail, and the fibre core of optical fiber pigtail is less than the diffraction-limited of optical system to be measured, especially less than one times of diffraction-limited of optical system to be measured.
The present invention is when concrete work, its working method is:open laser instrument 1, laser is exported by optical fiber pigtail, the fibre core of optical fiber is less than one times of diffraction-limited ofoptical system 2 to be measured, laser is injectedoptical system 2 to be measured, form plane wave, focus on by 3 pairs of light beams behindoptical system 2 collimations to be measured of lenslet array, form the array focal spot, by imaging len array 4 to the array focal spot imaging in its corresponding visual field, by ccd array 5 synchronous acquisition light spot images, the facula position of each subimage after gathering is carried out interpretation, treat the wavefront of photometry system and restore by calculating wavefront slope that ccd array 5 collects.

Claims (8)

Translated fromChinese
1.一种光学系统波前测量装置,其特征在于:所述光学系统波前测量装置包括激光器、小透镜阵列、成像透镜阵列、CCD阵列以及采集控制计算机;所述小透镜阵列、成像透镜阵列以及CCD阵列依次设置在激光器的出射光路上;所述CCD阵列与采集控制计算机电性相连。1. An optical system wavefront measuring device is characterized in that: said optical system wavefront measuring device comprises a laser, a small lens array, an imaging lens array, a CCD array and an acquisition control computer; said small lens array, an imaging lens array And the CCD array is sequentially arranged on the outgoing light path of the laser; the CCD array is electrically connected with the acquisition control computer.2.根据权利要求1所述的光学系统波前测量装置,其特征在于:所述成像透镜阵列的成像面是小透镜阵列的焦面。2 . The optical system wavefront measurement device according to claim 1 , wherein the imaging plane of the imaging lens array is the focal plane of the small lens array. 3 .3.根据权利要求2所述的光学系统波前测量装置,其特征在于:所述小透镜阵列至少包括四块小透镜;所述成像透镜阵列包括至少一块成像透镜;所述成像透镜阵列的成像物面是小透镜阵列中的小透镜的焦面。3. The optical system wavefront measuring device according to claim 2, characterized in that: the small lens array comprises at least four small lenses; the imaging lens array comprises at least one imaging lens; the imaging of the imaging lens array The object plane is the focal plane of the lenslets in the lenslet array.4.根据权利要求3所述的光学系统波前测量装置,其特征在于:所述CCD阵列设置在成像透镜阵列的成像面处。4. The optical system wavefront measuring device according to claim 3, characterized in that: the CCD array is arranged at the imaging plane of the imaging lens array.5.根据权利要求4所述的光学系统波前测量装置,其特征在于:所述CCD阵列包括与成像透镜阵列中的成像透镜的数目相一致的CCD。5 . The optical system wavefront measuring device according to claim 4 , wherein the CCD array includes CCDs corresponding to the number of imaging lenses in the imaging lens array. 6 .6.根据权利要求1-5任一权利要求所述的光学系统波前测量装置,其特征在于:所述激光器包括光纤尾纤,所述光纤尾纤的纤芯小于待测光学系统的衍射限。6. The optical system wavefront measurement device according to any one of claims 1-5, wherein the laser comprises a fiber pigtail, and the core of the fiber pigtail is smaller than the diffraction limit of the optical system to be measured .7.根据权利要求6所述的光学系统波前测量装置,其特征在于:所述光纤尾纤的纤芯小于待测光学系统的一倍衍射限。7. The optical system wavefront measuring device according to claim 6, characterized in that: the core of the optical fiber pigtail is smaller than one time of the diffraction limit of the optical system to be measured.8.一种用于权利要求1-7任一权利要求所述的光学系统波前测量装置的测量方法,其特征在于:所述测量方法包括以下步骤:8. A measurement method for the optical system wavefront measurement device according to any one of claims 1-7, characterized in that: the measurement method comprises the following steps:1)开启激光器产生激光;1) Turn on the laser to generate laser light;2)将步骤1)所得到的激光注入待测光学系统并形成平面波;2) Inject the laser light obtained in step 1) into the optical system to be tested and form a plane wave;3)由小透镜阵列对步骤2)所形成的平面波进行光束聚焦,形成阵列焦斑;3) The plane wave formed in step 2) is focused by the small lens array to form the focal spot of the array;4)由成像透镜阵列对步骤3)所形成的阵列焦斑进行成像,形成光斑图像;4) Imaging the focal spot of the array formed in step 3) by the imaging lens array to form a spot image;5)由CCD阵列同步采集由步骤4)所形成的光斑图像;5) The spot image formed in step 4) is collected synchronously by the CCD array;6)由采集控制计算机对采集后的光斑图像的位置进行判读,并计算CCD阵列采集到的波前斜率;6) The acquisition control computer interprets the position of the acquired spot image, and calculates the wavefront slope acquired by the CCD array;7)对待测光学系统的波前进行复原。7) Restoring the wavefront of the optical system under test.
CN2013101221168A2013-04-092013-04-09Wavefront measuring device and method for optical systemPendingCN103226059A (en)

Priority Applications (1)

Application NumberPriority DateFiling DateTitle
CN2013101221168ACN103226059A (en)2013-04-092013-04-09Wavefront measuring device and method for optical system

Applications Claiming Priority (1)

Application NumberPriority DateFiling DateTitle
CN2013101221168ACN103226059A (en)2013-04-092013-04-09Wavefront measuring device and method for optical system

Publications (1)

Publication NumberPublication Date
CN103226059Atrue CN103226059A (en)2013-07-31

Family

ID=48836587

Family Applications (1)

Application NumberTitlePriority DateFiling Date
CN2013101221168APendingCN103226059A (en)2013-04-092013-04-09Wavefront measuring device and method for optical system

Country Status (1)

CountryLink
CN (1)CN103226059A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN104075882A (en)*2014-07-012014-10-01中国科学院长春光学精密机械与物理研究所Wave-front optical dither analyzing method suitable for large-caliber photoelectric detecting system
CN104089583A (en)*2014-06-242014-10-08北京空间机电研究所Wavefront subaperture inversion method of optical system
CN104535300A (en)*2014-12-202015-04-22中国科学院西安光学精密机械研究所Large-diameter collimator wavefront and image surface position calibration device and method
CN104075882B (en)*2014-07-012016-11-30中国科学院长春光学精密机械与物理研究所It is applicable to the wavefront optics jitter analysis method of heavy caliber Photodetection system
CN110476043A (en)*2017-02-032019-11-19伍普提克斯股份有限公司For acquiring the method and optical system of the tomographic imaging distribution of the wavefront of electromagnetic field

Citations (6)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4967063A (en)*1988-06-161990-10-30The Aerospace CorporationCharge controlled adaptive-optics system
US5629765A (en)*1995-12-151997-05-13Adaptive Optics Associates, Inc.Wavefront measuring system with integral geometric reference (IGR)
CN1607379A (en)*2003-10-152005-04-20中国科学院光电技术研究所Hartmann wavefront sensor for pulse light beam quality detection based on microprism array
CN102252833A (en)*2011-06-242011-11-23北京理工大学Large-diameter wide-dynamic range collimating system wavefront quality detection device
CN102879109A (en)*2012-09-122013-01-16中国科学院西安光学精密机械研究所dynamic wavefront testing device
CN203216704U (en)*2013-04-092013-09-25中国科学院西安光学精密机械研究所Wavefront measuring device of optical system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
US4967063A (en)*1988-06-161990-10-30The Aerospace CorporationCharge controlled adaptive-optics system
US5629765A (en)*1995-12-151997-05-13Adaptive Optics Associates, Inc.Wavefront measuring system with integral geometric reference (IGR)
CN1607379A (en)*2003-10-152005-04-20中国科学院光电技术研究所Hartmann wavefront sensor for pulse light beam quality detection based on microprism array
CN102252833A (en)*2011-06-242011-11-23北京理工大学Large-diameter wide-dynamic range collimating system wavefront quality detection device
CN102879109A (en)*2012-09-122013-01-16中国科学院西安光学精密机械研究所dynamic wavefront testing device
CN203216704U (en)*2013-04-092013-09-25中国科学院西安光学精密机械研究所Wavefront measuring device of optical system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication numberPriority datePublication dateAssigneeTitle
CN104089583A (en)*2014-06-242014-10-08北京空间机电研究所Wavefront subaperture inversion method of optical system
CN104089583B (en)*2014-06-242016-08-24北京空间机电研究所A kind of sub-aperture inversion method of optical system wavefront
CN104075882A (en)*2014-07-012014-10-01中国科学院长春光学精密机械与物理研究所Wave-front optical dither analyzing method suitable for large-caliber photoelectric detecting system
CN104075882B (en)*2014-07-012016-11-30中国科学院长春光学精密机械与物理研究所It is applicable to the wavefront optics jitter analysis method of heavy caliber Photodetection system
CN104535300A (en)*2014-12-202015-04-22中国科学院西安光学精密机械研究所Large-diameter collimator wavefront and image surface position calibration device and method
CN110476043A (en)*2017-02-032019-11-19伍普提克斯股份有限公司For acquiring the method and optical system of the tomographic imaging distribution of the wavefront of electromagnetic field

Similar Documents

PublicationPublication DateTitle
CN104236856B (en)Wave aberration detection device of objective lens imaging system and system error correction method of wave aberration detection device
CN104034416B (en)High-dynamic-range laser far-field focal spot measuring device and method
CN204165736U (en)A kind of wave aberration high precision measuring device for object lens imaging system
US20160045291A1 (en)Confocal imaging apparatus with curved focal surface
CN203216702U (en)Focal length measuring device for long focal length optical system
CN103063415B (en)A kind of long focus length of lens measuring method based on Moire fringe coupling
CN101231158A (en) Rapid detection device for three-dimensional shape and size of tiny objects based on liquid zoom lens
CN103063414B (en)Focal length measuring device adopting symmetrical grating
CN105444878A (en)High-precision mass measurement device and high-precision mass measurement method of chemical oxygen iodine laser far-field beam
CN104539349B (en)Multifunctional laser space communication ground test system and static parameter test method
CN104535300A (en)Large-diameter collimator wavefront and image surface position calibration device and method
CN102914373A (en)Hartmann wave-front sensor based on micro-cylindrical lens array
CN104764593B (en)Horizontal dual-port plane Fizeau interference test device
CN112729135A (en)Area array frequency sweep distance measuring/thickness measuring device and method with active optical anti-shake function
CN103105283B (en)Focal length measuring device of single-spectrum large-caliber long-focus lens
Zhang et al.Quantum light-field microscopy for volumetric imaging with extreme depth of field
WO2024094230A1 (en)Measurement device and measurement method for transmittance and numerical aperture of optical fiber
CN102721476B (en)Large-caliber high-speed infrared laser measuring device based on PSD array
CN110906883B (en) A High-Resolution 3D Detection Method Integrating Multiocular Vision and Synthetic Aperture Imaging
CN103226059A (en)Wavefront measuring device and method for optical system
CN111220088B (en)Measurement system and method
CN203216704U (en)Wavefront measuring device of optical system
CN112097923B (en)Simple wavefront measurement method for optical element
CN204359512U (en)Wavefront and image surface position calibration device for large-diameter collimator
CN103868680A (en)Method for detecting foundation telescope out-of-focus aberration based on spot interference imaging

Legal Events

DateCodeTitleDescription
C06Publication
PB01Publication
C10Entry into substantive examination
SE01Entry into force of request for substantive examination
C02Deemed withdrawal of patent application after publication (patent law 2001)
WD01Invention patent application deemed withdrawn after publication

Application publication date:20130731


[8]ページ先頭

©2009-2025 Movatter.jp