相关申请的交叉参考Cross References to Related Applications
本申请案主张基于2011年6月30日向韩国知识产权局提出申请的韩国专利申请案第10-2011-0065153号、2011年7月13日向韩国知识产权局提出申请的韩国专利申请案第10-2011-0069438号的权利，所述韩国专利申请案的内容以引用方式全文并入本文中。This application is based on Korean Patent Application No. 10-2011-0065153 filed with the Korean Intellectual Property Office on June 30, 2011, and Korean Patent Application No. 10-2011 filed with the Korean Intellectual Property Office on July 13, 2011. 2011-0069438, the content of which is incorporated herein by reference in its entirety.
技术领域technical field
本发明涉及一种用于传送基板的装置，更具体而言，涉及一种能够通过上面放置有基板的托盘而在真空室中传送基板的装置，所述装置包括用于控制基板传送速度的加速/减速单元。The present invention relates to an apparatus for transferring a substrate, and more particularly, to an apparatus capable of transferring a substrate in a vacuum chamber through a tray on which the substrate is placed, the apparatus including an acceleration device for controlling the transfer speed of the substrate / deceleration unit.
背景技术Background technique
一般而言，用于制造液晶显示器(liquid crystal display；LCD)器件、等离子体显示面板(plasma display panel；PDP)器件、场致发射显示器(field emissiondisplay；FED)器件、电致发光显示器(electro luminescence display；ELD)器件或类似的平板显示器(flat panel display；FPD)器件的大多数工艺均是对基板进行。Generally speaking, it is used in the manufacture of liquid crystal display (liquid crystal display; LCD) devices, plasma display panel (plasma display panel; PDP) devices, field emission display (field emission display; FED) devices, electroluminescence display (electroluminescence) display; ELD) devices or similar flat panel display (flat panel display; FPD) devices are carried out on the substrate.
在用于制造平板显示器器件的此种工艺中，多次重复进行沉积工艺、光刻工艺及蚀刻工艺，并涉及许多其他工艺，例如清洁、粘合、切割等。In such a process for manufacturing flat panel display devices, the deposition process, photolithography process, and etching process are repeated many times, and many other processes such as cleaning, bonding, dicing, etc. are involved.
因此，在执行每种工艺时，须装载或卸载基板。为装载及卸载基板，已考虑使用同轴型方法(in-line type method)，在同轴型方法中，穿过腔室来垂直地传送上面放置有基板的托盘。Therefore, substrates must be loaded or unloaded when each process is performed. For loading and unloading substrates, it has been considered to use an in-line type method in which a tray on which a substrate is placed is vertically transferred through a chamber.
图1为用于传送基板的传统装置的剖视图，图2为图1的正视图。如图1及图2所示，用于传送基板的传统装置包括腔室1、上面放置有基板S的托盘2、以及与托盘2的下端部相接触并向托盘2传递驱动力的驱动滚轮3。驱动滚轮3由电动机4带动旋转并因此向托盘2传递驱动力。FIG. 1 is a cross-sectional view of a conventional apparatus for transferring a substrate, and FIG. 2 is a front view of FIG. 1 . As shown in Figures 1 and 2, a conventional device for transferring a substrate includes a chamber 1, a tray 2 on which a substrate S is placed, and a driving roller 3 that contacts the lower end of the tray 2 and transmits a driving force to the tray 2. . The driving roller 3 is rotated by the motor 4 and thus transmits driving force to the tray 2 .
同时，提供使用磁力来引导托盘2的引导单元1a及2a，以便可防止垂直运动的托盘2坠落。具体而言，托盘永久磁铁2a设置于托盘2的上端部上，且腔室永久磁铁1a在腔室1内邻近托盘永久磁铁2a而设置。此时，托盘永久磁铁2a与腔室永久磁铁1a的极性不同，并因此相互吸引而不接触，从而可防止托盘2在被传送时坠落。换言之，用于传送基板的传统装置采用如下方法：其中排列于腔室1的下侧中的驱动滚轮3与托盘2的下端部相互接触，且通过驱动滚轮3的旋转力来移动托盘2。Meanwhile, guide units 1a and 2a that guide the tray 2 using magnetic force are provided so that the tray 2 moving vertically can be prevented from falling. Specifically, a tray permanent magnet 2 a is provided on an upper end portion of the tray 2 , and a chamber permanent magnet 1 a is provided in the chamber 1 adjacent to the tray permanent magnet 2 a. At this time, the tray permanent magnet 2a is different in polarity from the chamber permanent magnet 1a, and thus attracts each other without contacting, thereby preventing the tray 2 from falling while being conveyed. In other words, the conventional apparatus for transferring substrates employs a method in which drive rollers 3 arranged in the lower side of chamber 1 and lower ends of trays 2 contact each other and trays 2 are moved by the rotational force of drive rollers 3 .
然而，在用于传送基板的传统装置中，利用驱动滚轮3与托盘2的下端部之间的接触来传递驱动力，因此，托盘2与驱动滚轮3之间的滑动可引起失配。换言之，在传送基板S时，托盘2与驱动滚轮3可能不在正常位置上相互接触，从而会增加缺陷并降低生产力。However, in the conventional apparatus for transferring substrates, the driving force is transmitted using the contact between the driving roller 3 and the lower end portion of the tray 2 , and thus, slippage between the tray 2 and the driving roller 3 may cause misalignment. In other words, when the substrate S is transferred, the tray 2 and the driving roller 3 may not contact each other at a normal position, thereby increasing defects and reducing productivity.
同样，在用于传送基板的传统装置中，托盘2是在与用于传递驱动力的驱动滚轮3相接触的同时被传送，因而颗粒可具有有害的作用。Also, in the conventional apparatus for transferring substrates, the tray 2 is transferred while being in contact with the driving roller 3 for transferring the driving force, and thus the particles may have harmful effects.
此外，在用于传送基板的传统装置中，如果托盘2的加速/减速速度升高以通过快速地传送托盘2来减少单件工时(tact time)，则当使托盘2加速或减速时会出现因驱动滚轮3与托盘2的下端部之间滑动而引起的问题，从而使托盘2加速/减速的时间变长，这是因为托盘2自期望的位置偏离，且随着驱动滚轮3与托盘2的下端部之间的摩擦增大而产生异物(即，颗粒)。In addition, in the conventional apparatus for conveying substrates, if the acceleration/deceleration speed of the tray 2 is increased to reduce tact time by conveying the tray 2 quickly, a problem occurs when the tray 2 is accelerated or decelerated. The problem caused by sliding between the drive roller 3 and the lower end of the tray 2, so that the acceleration/deceleration time of the tray 2 becomes longer, because the tray 2 deviates from the desired position, and as the drive roller 3 and the tray 2 The friction between the lower ends of the blades increases to generate foreign matter (ie, particles).
发明内容Contents of the invention
本发明的一个方面是提供一种用于传送基板的装置，在该装置中可向托盘传递驱动力而不发生接触，即使托盘偏离正确的位置，托盘也可快速地返回至其初始位置，并可防止在传送托盘时产生颗粒。An aspect of the present invention is to provide an apparatus for transferring substrates in which a driving force can be transmitted to a tray without contact, and even if the tray deviates from a correct position, the tray can quickly return to its original position, and Prevents particle generation when transferring pallets.
本发明的另一方面是提供一种用于传送基板的装置，在该装置中，用于通过电磁力来增大/减小托盘传送速度的加速/减速单元邻近所述托盘，因而可增大托盘的传送速度并可防止异物产生。Another aspect of the present invention is to provide an apparatus for conveying a substrate, in which an acceleration/deceleration unit for increasing/decreasing a conveying speed of a tray by electromagnetic force is adjacent to the tray, thereby increasing The conveying speed of the tray can prevent foreign objects from being produced.
根据本发明的一个方面，提供一种用于传送基板的装置，所述装置包括：真空室；托盘，用于在所述真空室中传送所述基板；上部传送单元，用于向所述托盘的上部传递驱动力而不接触所述托盘的上端部；相对运动容许单元，耦合至所述托盘的下端部并可相对于所述托盘运动；以及多个引导单元，用于接触所述相对运动容许单元并引导所述托盘的运动。According to an aspect of the present invention, there is provided an apparatus for transferring a substrate, the apparatus comprising: a vacuum chamber; a tray for transferring the substrate in the vacuum chamber; an upper transfer unit for transferring the substrate to the tray The upper part of the upper part of the tray transmits the driving force without contacting the upper end part of the tray; the relative movement allowing unit is coupled to the lower end part of the tray and can move relative to the tray; and a plurality of guide units is used to contact the relative movement Permits the unit and guides the movement of the pallet.
所述相对运动容许单元可包括旋转本体，所述旋转本体是可相对旋转地耦合至所述托盘。The relative movement allowing unit may include a rotating body relatively rotatably coupled to the tray.
所述旋转本体可包括：托盘支撑轴，耦合至所述托盘的所述下端部；旋转管，用于在其中容置所述托盘支撑轴，并具有与所述引导单元相接触的外表面；以及轴承，具有耦合至所述托盘支撑轴的内圆周及耦合至所述旋转管的外圆周。The rotating body may include: a tray supporting shaft coupled to the lower end of the tray; a rotating pipe for receiving the tray supporting shaft therein and having an outer surface in contact with the guide unit; and a bearing having an inner circumference coupled to the tray support shaft and an outer circumference coupled to the rotating tube.
所述引导单元可包括引导滚轮，所述引导滚轮具有引导表面，所述引导表面具有曲率，所述曲率的直径随着接近所述引导表面的中心而减小，且所述旋转管的曲率小于所述引导滚轮的所述引导表面的所述曲率。The guide unit may include a guide roller having a guide surface having a curvature whose diameter decreases as approaching a center of the guide surface, and a curvature of the rotating tube smaller than The curvature of the guide surface of the guide roller.
所述引导单元可包括引导滚轮，所述引导滚轮具有引导表面，所述引导表面具有曲率，所述曲率的直径随着接近所述引导表面的中心而减小。The guide unit may include a guide roller having a guide surface having a curvature whose diameter decreases as approaching a center of the guide surface.
所述上部传送单元可包括：上部永久磁铁，设置于所述托盘的所述上端部上；以及上部电磁铁，邻近所述上部永久磁铁而设置于所述真空室内。The upper transfer unit may include: an upper permanent magnet disposed on the upper end of the tray; and an upper electromagnet disposed in the vacuum chamber adjacent to the upper permanent magnet.
所述上部传送单元可包括：上部永久磁铁，设置于所述托盘的所述上端部上；以及上部电磁铁，邻近所述上部永久磁铁而设置于所述真空室外。The upper transfer unit may include: an upper permanent magnet disposed on the upper end of the tray; and an upper electromagnet disposed adjacent to the upper permanent magnet outside the vacuum chamber.
所述装置还可包括安装槽，所述安装槽邻近所述托盘的所述上端部而自所述真空室的外壁上的外表面凹陷，所述上部电磁铁嵌入于并安装于所述安装槽中。The device may further include a mounting groove recessed from an outer surface on an outer wall of the vacuum chamber adjacent to the upper end of the tray, the upper electromagnet being embedded and mounted in the mounting groove middle.
所述上部电磁铁可以可拆卸地安装于所述安装槽中。The upper electromagnet may be detachably installed in the installation groove.
所述装置还可包括下部传送单元，用于向所述托盘的下部传递驱动力而不接触所述相对运动容许单元。The apparatus may further include a lower transfer unit for transferring a driving force to a lower portion of the tray without contacting the relative motion allowing unit.
所述下部传送单元可包括：下部永久磁铁，设置于所述相对运动容许单元中；以及下部电磁铁，邻近所述下部永久磁铁而设置于所述真空室内。The lower transfer unit may include: a lower permanent magnet disposed in the relative motion allowing unit; and a lower electromagnet disposed in the vacuum chamber adjacent to the lower permanent magnet.
所述下部传送单元可包括：下部永久磁铁，设置于所述相对运动容许单元中；以及下部电磁铁，邻近所述下部永久磁铁而设置于所述真空室外。The lower transfer unit may include: a lower permanent magnet disposed in the relative motion allowing unit; and a lower electromagnet disposed adjacent to the lower permanent magnet outside the vacuum chamber.
所述真空室的外壁可形成有在各所述引导单元之间向上凸起的突出部，所述真空室的所述突出部设置有自所述突出部的外表面凹陷的安装槽，且所述下部电磁铁可嵌入于并安装于所述安装槽中。The outer wall of the vacuum chamber may be formed with protrusions protruding upward between each of the guide units, the protrusions of the vacuum chamber are provided with installation grooves recessed from the outer surface of the protrusions, and the The lower electromagnet can be embedded and installed in the installation groove.
所述下部电磁铁可以可拆卸地安装于所述安装槽中。The lower electromagnet may be detachably installed in the installation groove.
根据本发明的一个方面，提供一种用于传送基板的装置，所述装置包括：托盘，装有所述基板并用于传送所述基板；传送单元，设置于所述托盘的下部中并用于传送所述托盘；以及加速/减速单元，邻近所述托盘的上端部或下端部，并通过电磁力来增大或减小所述托盘的传送速度。According to an aspect of the present invention, there is provided an apparatus for transferring a substrate, the apparatus comprising: a tray loaded with the substrate and used for transferring the substrate; a transfer unit provided in a lower portion of the tray and used for transferring the tray; and an acceleration/deceleration unit adjacent to an upper end or a lower end of the tray and increasing or decreasing a transfer speed of the tray by electromagnetic force.
所述装置还可包括引导单元，设置于所述托盘的上部中并用于引导所述托盘。The apparatus may further include a guide unit provided in an upper portion of the tray and used to guide the tray.
所述加速/减速单元可包括：至少一个旋转磁铁，邻近所述托盘的所述上端部或所述下端部，并可旋转地设置于所述托盘的传送方向上；旋转电动机，用于旋转所述旋转磁铁；以及旋转控制器，用于控制所述旋转电动机的旋转方向及速度。The acceleration/deceleration unit may include: at least one rotating magnet adjacent to the upper end portion or the lower end portion of the tray and rotatably disposed in a conveying direction of the tray; a rotating motor for rotating the tray. the rotating magnet; and a rotation controller for controlling the rotation direction and speed of the rotating motor.
所述旋转磁铁可在所述托盘的所述下端部中的横向侧处邻近所述托盘并在传送所述托盘的方向上旋转。The rotating magnet may be adjacent to the tray at a lateral side in the lower end portion of the tray and rotate in a direction in which the tray is conveyed.
所述旋转磁铁可具有圆形形状，其中N极与S极沿所述旋转磁铁的所述圆周交错设置。The rotating magnet may have a circular shape in which N poles and S poles are alternately arranged along the circumference of the rotating magnet.
所述加速/减速单元可包括：至少一个运动磁铁，邻近所述托盘的所述上端部或所述下端部并设置成靠近或远离所述托盘；驱动器，用于驱动所述运动磁铁靠近或远离所述托盘；以及驱动控制器，用于控制所述驱动器的操作。The acceleration/deceleration unit may include: at least one moving magnet adjacent to the upper end portion or the lower end portion of the tray and disposed to approach or move away from the tray; a driver for driving the moving magnet to approach or move away from the tray. the tray; and a drive controller for controlling the operation of the drive.
所述运动磁铁可在所述托盘的所述下端部中的横向侧处邻近所述托盘并设置成靠近或远离所述托盘。The moving magnet may be adjacent to the tray at a lateral side in the lower end of the tray and positioned closer to or away from the tray.
所述加速/减速单元可包括：多个静止磁铁，以特定间隔设置于所述托盘的所述下端部中；电磁铁模块，邻近所述静止磁铁并以特定间隔排列，且通过与所述静止磁铁的相互作用来产生磁力以增大/减小所述托盘的传送速度；以及模块控制器，用于控制施加至所述电磁模块的电流的供应，以选择性地改变所述电磁模块的N/S极性。The acceleration/deceleration unit may include: a plurality of stationary magnets disposed in the lower end of the tray at certain intervals; electromagnet modules arranged adjacent to the stationary magnets at certain intervals, and the interaction of magnets to generate magnetic force to increase/decrease the transport speed of the tray; and a module controller for controlling the supply of current applied to the electromagnetic module to selectively change the N of the electromagnetic module /S polarity.
所述电磁铁模块可包括：多个铁芯，邻近所述静止磁铁并与所述静止磁铁之间留有预定空间，且在所述铁芯上绕有线圈；以及连接板，用于将所述多个铁芯连接成一体。The electromagnet module may include: a plurality of iron cores, adjacent to the stationary magnets and leaving a predetermined space therebetween, and coils are wound on the iron cores; The multiple iron cores are connected into one body.
所述多个铁芯可以特定间隔进行排列，所述间隔不同于所述静止磁铁的排列间隔。The plurality of iron cores may be arranged at a certain interval different from the arrangement interval of the stationary magnets.
所述传送单元可包括：托盘下部轨道，耦合至所述托盘的所述下端部；以及多个驱动滚轮，在所述托盘下部轨道的下部中设置成在接触所述托盘下部轨道的同时进行旋转。The transferring unit may include: a tray lower rail coupled to the lower end of the tray; and a plurality of driving rollers disposed in a lower portion of the tray lower rail to rotate while contacting the tray lower rail .
所述托盘下部轨道或所述托盘的所述下部可包括嵌入于其中的高导电性金属。The tray lower rail or the lower portion of the tray may include highly conductive metal embedded therein.
所述引导单元可包括：托盘上部轨道，被设置成铁磁体并耦合至所述托盘的所述上端部；以及磁性引导单元，将所述托盘上部轨道嵌入于其中并具有极性，以产生用于在所述托盘上部轨道的相对两侧推动所述托盘上部轨道的磁力。The guide unit may include: a tray upper rail configured as a ferromagnet and coupled to the upper end of the tray; and a magnetic guide unit embedded in the tray upper rail and having a polarity to generate A magnetic force that pushes the tray upper rail on opposite sides of the tray upper rail.
如上所述，上部传送单元向托盘传递驱动力而不接触所述托盘的上端部，并与耦合至所述托盘的下端部的相对运动容许单元的引导单元相接触，且相对运动容许单元可相对运动地耦合至托盘，因而即使托盘在传送期间摇动，所述托盘也可快速地返回至其初始位置，并可在传送期间防止颗粒产生。As described above, the upper transfer unit transmits the driving force to the tray without contacting the upper end of the tray, and is in contact with the guide unit of the relative movement allowing unit coupled to the lower end of the tray, and the relative movement allowing unit can be opposed to each other. Kinematically coupled to the tray so that even if the tray shakes during transfer, the tray quickly returns to its original position and prevents particle generation during transfer.
同样，用于通过电磁力来增大/减小托盘的传送速度的加速/减速单元邻近所述托盘，因而可增大所述托盘的传送速度并可防止异物(即，颗粒)产生。Also, an acceleration/deceleration unit for increasing/decreasing the transfer speed of the tray by electromagnetic force is adjacent to the tray, so that the transfer speed of the tray can be increased and foreign matter (ie, particles) can be prevented from being generated.
附图说明Description of drawings
结合附图阅读以下详细说明，可更清楚地理解本发明的实例性实施例，在附图中：Exemplary embodiments of the present invention will be more clearly understood from the following detailed description when read in conjunction with the accompanying drawings, in which:
图1为用于传送基板的传统装置的剖视图；1 is a cross-sectional view of a conventional device for transferring a substrate;
图2为图1的正视图；Fig. 2 is the front view of Fig. 1;
图3为根据本发明第一实例性实施例的用于传送基板的装置的剖视图；3 is a cross-sectional view of an apparatus for transferring a substrate according to a first exemplary embodiment of the present invention;
图4为图3中的用于传送基板的装置的透视图；FIG. 4 is a perspective view of the device for transferring substrates in FIG. 3;
图5为显示图4的相对运动容许单元的透视图；FIG. 5 is a perspective view showing the relative motion allowing unit of FIG. 4;
图6为图3的‘A’区域的放大视图；Figure 6 is an enlarged view of the 'A' region of Figure 3;
图7为显示根据本发明第二实例性实施例的用于传送基板的装置中的上部电磁铁安装于真空室外的透视图；7 is a perspective view showing that an upper electromagnet is installed outside a vacuum chamber in an apparatus for transferring a substrate according to a second exemplary embodiment of the present invention;
图8为用于解释图7的上部电磁铁安装于真空室外的视图；Fig. 8 is a view for explaining that the upper electromagnet of Fig. 7 is installed outside the vacuum chamber;
图9为显示根据本发明第三实例性实施例的用于传送基板的装置中的下部电磁铁的透视图；9 is a perspective view showing a lower electromagnet in an apparatus for transferring a substrate according to a third exemplary embodiment of the present invention;
图10为显示根据本发明第四实例性实施例的用于传送基板的装置中的下部电磁铁安装于真空室外的透视图；10 is a perspective view showing that a lower electromagnet is installed outside a vacuum chamber in an apparatus for transferring a substrate according to a fourth exemplary embodiment of the present invention;
图11为根据本发明第五实例性实施例的用于传送基板的装置的示意性正视图；11 is a schematic front view of an apparatus for transferring a substrate according to a fifth exemplary embodiment of the present invention;
图12为用于解释图11中的用于传送基板的装置的操作的视图；FIG. 12 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 11;
图13为图11中的用于传送基板的装置的托盘下部轨道与驱动滚轮之间的接触部的侧视放大图；13 is an enlarged side view of the contact portion between the lower rail of the tray and the driving roller of the apparatus for transferring substrates in FIG. 11;
图14为用于解释图11中的旋转磁铁的操作的示意图；FIG. 14 is a schematic diagram for explaining the operation of the rotating magnet in FIG. 11;
图15为用于解释图14中的旋转磁铁的替代实例性实施例的视图；FIG. 15 is a view for explaining an alternative exemplary embodiment of the rotating magnet in FIG. 14;
图16为根据本发明第六实例性实施例的用于传送基板的装置的示意性正视图；16 is a schematic front view of an apparatus for transferring a substrate according to a sixth exemplary embodiment of the present invention;
图17为用于解释图16中的用于传送基板的装置的操作的视图；FIG. 17 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 16;
图18为图17的侧视图；Figure 18 is a side view of Figure 17;
图19为根据本发明第七实例性实施例的用于传送基板的装置的示意性正视图；19 is a schematic front view of an apparatus for transferring a substrate according to a seventh exemplary embodiment of the present invention;
图20为用于解释图19中的用于传送基板的装置的操作的视图；FIG. 20 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 19;
图21为根据本发明第八实例性实施例的用于传送基板的装置的示意性侧视图；21 is a schematic side view of an apparatus for transferring a substrate according to an eighth exemplary embodiment of the present invention;
图22为用于解释图21中的用于传送基板的装置的操作的视图；FIG. 22 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 21;
图23为根据本发明第九实例性实施例的用于传送基板的装置的示意性正视图；以及23 is a schematic front view of an apparatus for transferring a substrate according to a ninth exemplary embodiment of the present invention; and
图24为用于解释图23中的用于传送基板的装置的加速/减速单元的操作的视图。FIG. 24 is a view for explaining an operation of an acceleration/deceleration unit of the apparatus for transferring a substrate in FIG. 23 .
主要元件标记说明Description of main component marking
1：腔室1: chamber
1a：腔室永久磁铁1a: Chamber permanent magnet
2：托盘2: Tray
2a：托盘永久磁铁2a: Tray permanent magnet
3：驱动滚轮3: Drive roller
4：电动机4: Motor
S：基板S: Substrate
T1：用于传送基板的装置T1: Device for transferring substrates
T2：用于传送基板的装置T2: Device for transferring substrates
T3：用于传送基板的装置T3: Device for transferring substrates
T4：用于传送基板的装置T4: Device for transferring substrates
T5：用于传送基板的装置T5: Device for transferring substrates
T6：用于传送基板的装置T6: Device for transferring substrates
T7：用于传送基板的装置T7: Device for transferring substrates
T8：用于传送基板的装置T8: Device for transferring substrates
T9：用于传送基板的装置T9: Device for transferring substrates
10：真空室10: Vacuum chamber
11：突出部11: protrusion
20：托盘20: Tray
30：上部传送单元30: Upper transfer unit
30a：上部传送单元30a: Upper transfer unit
31：上部永久磁铁31: Upper permanent magnet
33：上部电磁铁33: Upper electromagnet
33a：上部电磁铁33a: Upper Solenoid
40：相对运动容许单元40: Relative motion allowable unit
41：托盘支撑轴41: Pallet support shaft
43：旋转管43: Swivel tube
45：轴承45: Bearing
51：引导滚轮51: guide roller
53：引导表面53: Guide Surface
60b：下部传送单元60b: Lower transfer unit
63b：下部电磁铁63b: Lower solenoid
63c：下部电磁铁63c: Lower solenoid
H：安装槽H: Mounting slot
100：托盘100: tray
200：传送单元200: Transmission unit
210：托盘下部轨道210: Tray lower rail
220：驱动滚轮220: drive roller
230：滚轮驱动电动机230: Roller drive motor
300：加速/减速单元300: Acceleration/deceleration unit
310：旋转磁铁310: Rotating Magnet
320：旋转电动机320: Rotary motor
400：引导单元400: boot unit
410：托盘上部轨道410: Tray upper rail
420：磁性引导单元420: Magnetic Guidance Unit
C：高导电性金属C: highly conductive metal
500：加速/减速单元500: Acceleration/deceleration unit
510：运动磁铁510: Moving Magnet
520：驱动器520: drive
600：加速/减速单元600: Acceleration/deceleration unit
610：静止磁铁610: Stationary Magnet
620：电磁铁模块620: Solenoid Module
621：铁芯621: iron core
622：连接板622: connecting plate
具体实施方式Detailed ways
以下将参照用于例示本发明各实施例的附图，以获得对本发明概念及其优点的充分理解。In order to gain a full understanding of the concept of the invention and its advantages, reference will now be made to the accompanying drawings illustrating various embodiments of the invention.
在下文中，将通过参照附图解释本发明各实施例来详细阐述本发明概念。图中相同的参考编号指示相同的元件。Hereinafter, the inventive concept will be explained in detail by explaining embodiments of the invention with reference to the accompanying drawings. Like reference numbers in the figures indicate like elements.
图3为根据本发明第一实例性实施例的用于传送基板的装置的剖视图，图4为图3中的用于传送基板的装置的透视图，图5为显示图4的相对运动容许单元的透视图，且图6为图3的‘A’区域的放大视图。3 is a sectional view of an apparatus for transferring a substrate according to a first exemplary embodiment of the present invention, FIG. 4 is a perspective view of the apparatus for transferring a substrate in FIG. 3 , and FIG. 5 shows a relative motion allowing unit of FIG. 4 . , and FIG. 6 is an enlarged view of the 'A' region of FIG. 3 .
如图3至图6所示，根据本发明第一实例性实施例的用于传送基板的装置T1包括真空室10、用于在真空室10中传送基板S的托盘20、用于向托盘20的上部传递驱动力而不接触托盘20的上端部的上部传送单元30、耦合至托盘20的下端部并可相对于托盘20运动的相对运动容许单元40、以及用于接触相对运动容许单元40并引导托盘20的运动的多个引导单元50。As shown in FIGS. 3 to 6 , an apparatus T1 for transferring a substrate according to a first exemplary embodiment of the present invention includes a vacuum chamber 10 , a tray 20 for transferring a substrate S in the vacuum chamber 10 , and a tray 20 for The upper transfer unit 30 that transmits the driving force without contacting the upper end of the tray 20, the relative motion allowing unit 40 coupled to the lower end of the tray 20 and movable relative to the tray 20, and the relative motion allowing unit 40 for contacting and A plurality of guide units 50 that guide the movement of the tray 20 .
真空室10将外部大气区域与内部真空区域隔开，并容许在其中传送托盘20上的基板S。The vacuum chamber 10 separates an external atmospheric area from an internal vacuum area, and allows the substrate S on the tray 20 to be transferred therein.
托盘20的形状像具有窄的宽度的平板，并在一侧处设置有用于在上面放置基板S的安放部(图中未显示)。换言之，基板S垂直地堆叠于托盘20的安放部中。在此实例性实施例中，以垂直站立状态传送托盘20。此处，托盘20的传送方向是指托盘20的纵向。The tray 20 is shaped like a flat plate having a narrow width, and is provided at one side with a seating portion (not shown in the figure) on which the substrate S is placed. In other words, the substrates S are vertically stacked in the seating portion of the tray 20 . In this exemplary embodiment, the tray 20 is conveyed in a vertically standing state. Here, the transport direction of the tray 20 refers to the longitudinal direction of the tray 20 .
基板S可包括用于制造平板显示器器件等类似器件以及液晶显示器器件的各种基板S。基板S可包括半导体的晶圆。The substrate S may include various substrates S used for manufacturing flat panel display devices and the like, as well as liquid crystal display devices. The substrate S may include a semiconductor wafer.
同时，相对运动容许单元40耦合至托盘20的下端部。具体而言，相对运动容许单元40为可相对旋转地耦合至托盘20的旋转本体。相对运动容许单元40可旋转地耦合至托盘20的下端部。换言之，相对运动容许单元40相对于托盘20的纵向(等效于下文将阐述的托盘支撑轴41的方向)旋转。相对运动容许单元40用于防止托盘20在宽度方向上偏离其正确位置时被传送，下文中将详细阐述之。Meanwhile, a relative motion allowing unit 40 is coupled to a lower end portion of the tray 20 . Specifically, the relative motion allowing unit 40 is a rotating body that is relatively rotatably coupled to the tray 20 . The relative motion allowing unit 40 is rotatably coupled to the lower end of the tray 20 . In other words, the relative motion allows the unit 40 to rotate with respect to the longitudinal direction of the tray 20 (equivalent to the direction of the tray support shaft 41 to be explained below). The relative motion allowing unit 40 is used to prevent the tray 20 from being conveyed when it deviates from its correct position in the width direction, which will be described in detail below.
如图3至图6所示，相对运动容许单元40包括耦合至托盘20的下端部的托盘支撑轴41、用于在其中容置托盘支撑轴41并具有与引导单元50相接触的外表面的旋转管43、以及具有耦合至托盘支撑轴41的内圆周及耦合至旋转管43的外圆周的轴承45。As shown in FIGS. 3 to 6 , the relative movement allowing unit 40 includes a tray support shaft 41 coupled to the lower end of the tray 20 , a tray support shaft 41 for accommodating therein and having an outer surface in contact with the guide unit 50 . A rotating tube 43 , and a bearing 45 having an inner circumference coupled to the tray support shaft 41 and an outer circumference coupled to the rotating tube 43 .
换言之，在托盘20的纵向上耦合至托盘20的下端部的托盘支撑轴41耦合至轴承45的内圆周。此时，旋转管43耦合至轴承45的外圆周，使得旋转管43可相对于托盘支撑轴41相对地旋转。In other words, the tray support shaft 41 coupled to the lower end of the tray 20 in the longitudinal direction of the tray 20 is coupled to the inner circumference of the bearing 45 . At this time, the rotation tube 43 is coupled to the outer circumference of the bearing 45 such that the rotation tube 43 can relatively rotate with respect to the tray support shaft 41 .
旋转管43的形状像空心圆筒，具有与引导单元50相接触的外圆周，并通过轴承45可相对旋转地耦合至托盘支撑轴41。The rotation pipe 43 is shaped like a hollow cylinder, has an outer circumference in contact with the guide unit 50 , and is relatively rotatably coupled to the tray support shaft 41 through a bearing 45 .
旋转管43可相对于托盘支撑轴41旋转，因而即使在传送托盘20期间由于引导单元50的引导表面上的微粒或由于加速/减速等而使托盘20在托盘20的宽度方向上偏离正确位置，托盘20也可通过旋转管43的旋转而回到其正确位置。The rotating pipe 43 is rotatable relative to the tray supporting shaft 41, so that even if the tray 20 deviates from the correct position in the width direction of the tray 20 due to particles on the guide surface of the guide unit 50 or due to acceleration/deceleration etc. during conveyance of the tray 20, The tray 20 can also be returned to its correct position by the rotation of the rotation tube 43 .
本实例性实施例中的轴承45为向心球轴承，其中球嵌入于其内圆周与外圆周之间。轴承45的内圆周耦合至托盘支撑轴41，且外圆周耦合至旋转管43，使得旋转管43可相对于托盘支撑轴41相对地旋转。The bearing 45 in this exemplary embodiment is a radial ball bearing in which balls are embedded between its inner and outer circumferences. The inner circumference of the bearing 45 is coupled to the tray support shaft 41 , and the outer circumference is coupled to the rotation tube 43 so that the rotation tube 43 can relatively rotate with respect to the tray support shaft 41 .
同时，如图3至图6所示，引导单元50可为引导滚轮51，引导滚轮51具有引导表面53，引导表面53具有曲率，所述曲率的直径随着接近中心而减小。多个引导滚轮51以预定的间隔而隔开，并可旋转地安装于真空室10的下侧处。引导滚轮51的引导表面53具有预定的曲率，以对应于旋转管43的外圆周。此时，旋转管43的曲率可小于引导滚轮51的引导表面53的曲率，以防止相对运动容许单元40自引导滚轮51偏离。Meanwhile, as shown in FIGS. 3 to 6 , the guide unit 50 may be a guide roller 51 having a guide surface 53 having a curvature whose diameter decreases as approaching the center. A plurality of guide rollers 51 are spaced at predetermined intervals, and are rotatably installed at the lower side of the vacuum chamber 10 . The guide surface 53 of the guide roller 51 has a predetermined curvature to correspond to the outer circumference of the rotary tube 43 . At this time, the curvature of the rotating tube 43 may be smaller than that of the guide surface 53 of the guide roller 51 to prevent the relative motion allowing unit 40 from deviating from the guide roller 51 .
上部传送单元30包括设置于托盘20的上端部上的上部永久磁铁31、以及邻近上部永久磁铁31而设置于真空室10内的上部电磁铁33。The upper transfer unit 30 includes an upper permanent magnet 31 provided on an upper end portion of the tray 20 , and an upper electromagnet 33 provided in the vacuum chamber 10 adjacent to the upper permanent magnet 31 .
上部电磁铁33耦合至真空室10的外壁的内表面。换言之，像托盘20的上部永久磁铁31一样，上部电磁铁33排列于真空室10内。此处，上部电磁铁33被视为定子(stator)，且上部永久磁铁31被视为动子(mover)。换言之，如果电流在上部电磁铁33中(即，在定子中)流动，则在上部永久磁铁31中(即，在动子中)会产生洛伦兹力(Lorenz force)。此时，上部永久磁铁31耦合至托盘20的上端部，使得可基于在上部永久磁铁31中产生的洛伦兹力而传送托盘20。The upper electromagnet 33 is coupled to the inner surface of the outer wall of the vacuum chamber 10 . In other words, like the upper permanent magnet 31 of the tray 20 , the upper electromagnet 33 is arranged in the vacuum chamber 10 . Here, the upper electromagnet 33 is regarded as a stator, and the upper permanent magnet 31 is regarded as a mover. In other words, if current flows in the upper electromagnet 33 (ie, in the stator), Lorenz force is generated in the upper permanent magnet 31 (ie, in the mover). At this time, the upper permanent magnet 31 is coupled to the upper end portion of the tray 20 so that the tray 20 can be conveyed based on the Lorentz force generated in the upper permanent magnet 31 .
以下，将阐述此实例性实施例中的用于传送基板的装置T1的操作。Hereinafter, the operation of the apparatus T1 for transferring a substrate in this exemplary embodiment will be explained.
当传送上面放置有基板S的托盘20时，上部传送单元30向托盘20的上部传递驱动力。换言之，如果电流在上部电磁铁33中(即，在定子中)流动，则在上部永久磁铁31中(即，在动子中)会产生洛伦兹力，并因此传送耦合至上部永久磁铁31的托盘20。When transferring the tray 20 on which the substrate S is placed, the upper transfer unit 30 transmits a driving force to the upper portion of the tray 20 . In other words, if current flows in the upper electromagnet 33 (ie, in the stator), a Lorentz force is generated in the upper permanent magnet 31 (ie, in the mover), and thus transmits coupling to the upper permanent magnet 31 of pallets 20.
同时，耦合至托盘20的下端部的相对运动容许单元40在接触引导滚轮51的同时引导对托盘20的传送。此时，引导滚轮51的引导表面53上的颗粒或托盘20的加速/减速可使托盘20在倾斜状态而非保持垂直地被传送。当托盘20倾斜时，相对运动容许单元40不位于引导滚轮51的引导表面53的中心处，而位于引导表面53的边缘处。在此实例性实施例中，相对运动容许单元40可相对于托盘支撑轴41旋转，因此，即使上述颗粒或震动使相对运动容许单元40位于引导滚轮51的引导表面53的边缘处，相对运动容许单元40也会通过旋转而移动至中心。因此，在此实例性实施例中的用于传送基板的装置T1中，托盘20可在传送期间保持其正确位置的同时而被传送。换言之，即使托盘20在传送期间摇动，托盘20也可快速地返回至其初始位置。同样，即使托盘20在传送期间摇动，也会防止颗粒产生。At the same time, the relative movement of the lower end coupled to the tray 20 allows the unit 40 to guide the transport of the tray 20 while contacting the guide rollers 51 . At this time, acceleration/deceleration of particles on the guide surface 53 of the guide roller 51 or the tray 20 may cause the tray 20 to be conveyed in an inclined state instead of being kept vertical. When the tray 20 is tilted, the relative motion allowing unit 40 is located not at the center of the guide surface 53 of the guide roller 51 but at the edge of the guide surface 53 . In this exemplary embodiment, the relative motion allowing unit 40 is rotatable with respect to the tray supporting shaft 41, and therefore, even if the above-mentioned particles or vibration make the relative motion allowing unit 40 located at the edge of the guide surface 53 of the guide roller 51, the relative motion allowing Unit 40 also moves to center by rotation. Therefore, in the apparatus T1 for transferring substrates in this exemplary embodiment, the tray 20 can be transferred while maintaining its correct position during transfer. In other words, even if the tray 20 is shaken during conveyance, the tray 20 can quickly return to its original position. Also, even if the tray 20 is shaken during conveyance, generation of particles is prevented.
此外，上部传送单元30设置于托盘20的上端部上，且用于引导托盘20运动的引导单元50设置于托盘20的下端部上。因此，即使托盘20在传送期间被加速/减速，托盘20的振动或摇动也会有利地减轻。In addition, an upper transfer unit 30 is provided on an upper end portion of the tray 20 , and a guide unit 50 for guiding the movement of the tray 20 is provided on a lower end portion of the tray 20 . Therefore, even if the tray 20 is accelerated/decelerated during conveyance, vibration or shaking of the tray 20 is advantageously mitigated.
图7为显示根据本发明第二实例性实施例的用于传送基板的装置中的上部电磁铁安装于真空室外的透视图，且图8为用于解释图7的上部电磁铁安装于真空室外的视图。7 is a perspective view showing that an upper electromagnet is installed outside a vacuum chamber in an apparatus for transferring a substrate according to a second exemplary embodiment of the present invention, and FIG. 8 is a view for explaining that the upper electromagnet of FIG. 7 is installed outside a vacuum chamber. view.
此实例性实施例显示除上部传送单元30a的构造之外与图3至图6所示第一实例性实施例的构造均相同的构造，因此，以下将仅阐述根据此实例性实施例的上部传送单元30a的构造。This exemplary embodiment shows the same configuration as that of the first exemplary embodiment shown in FIGS. 3 to 6 except for the configuration of the upper transfer unit 30a, so only the upper part according to this exemplary embodiment will be explained below. Configuration of the transfer unit 30a.
如图7及图8所示，上部传送单元30a包括设置于托盘20的上端部上的上部永久磁铁31、以及邻近上部永久磁铁31而设置于真空室10外的上部电磁铁33a。As shown in FIGS. 7 and 8 , the upper transfer unit 30 a includes an upper permanent magnet 31 disposed on the upper end of the tray 20 and an upper electromagnet 33 a disposed outside the vacuum chamber 10 adjacent to the upper permanent magnet 31 .
换言之，在此实例性实施例中的用于传送基板的装置T2中，上部电磁铁33a排列于真空室10外的大气中，此与第一实例性实施例的排列位置相反。In other words, in the apparatus T2 for transferring a substrate in this exemplary embodiment, the upper electromagnet 33a is arranged in the atmosphere outside the vacuum chamber 10, which is opposite to the arrangement position of the first exemplary embodiment.
具体而言，如图7或图8所示，自外表面凹陷的安装槽H邻近托盘20的上端部而设置于真空室10的外壁上，且因此上部电磁铁33a嵌入于并安装于安装槽H中。Specifically, as shown in FIG. 7 or FIG. 8, a mounting groove H recessed from the outer surface is provided on the outer wall of the vacuum chamber 10 adjacent to the upper end portion of the tray 20, and thus the upper electromagnet 33a is embedded and mounted in the mounting groove. H.
因此，如果上部电磁铁33a安装于真空室10外(即，大气中)，则可防止在真空室10中发生电弧现象。此种电弧现象为真空放电的形式。真空放电是由高电压在高真空状态下产生的放电现象。因此，如果上部电磁铁33a像此实例性实施例一样置于真空室10外的大气中，则可有利地防止上部电磁铁33a暴露于真空状态，并因此防止电弧产生。Therefore, if the upper electromagnet 33a is installed outside the vacuum chamber 10 (ie, in the atmosphere), an arc phenomenon can be prevented from occurring in the vacuum chamber 10 . This arc phenomenon is in the form of vacuum discharge. Vacuum discharge is a discharge phenomenon generated by high voltage in a high vacuum state. Therefore, if the upper electromagnet 33a is placed in the atmosphere outside the vacuum chamber 10 like this exemplary embodiment, it is advantageous to prevent the upper electromagnet 33a from being exposed to a vacuum state, and thus preventing arc generation.
同样，在此实例性实施例中，可拆卸地设置上部电磁铁33a。换言之，上部电磁铁33a可附装至真空室10的安装槽H并可自真空室10的安装槽H拆卸。通过此种构造，当上部电磁铁33a发生故障或性能劣化时，可有利地轻易替换真空室10外的上部电磁铁33a。Also, in this exemplary embodiment, the upper electromagnet 33a is detachably provided. In other words, the upper electromagnet 33 a is attachable to and detachable from the installation groove H of the vacuum chamber 10 . With this configuration, the upper electromagnet 33a outside the vacuum chamber 10 can advantageously be easily replaced when the upper electromagnet 33a malfunctions or deteriorates in performance.
图9为显示根据本发明第三实例性实施例的用于传送基板的装置中的下部电磁铁的透视图。9 is a perspective view showing a lower electromagnet in an apparatus for transferring a substrate according to a third exemplary embodiment of the present invention.
此实例性实施例显示除下部传送单元30b的构造之外与图3至图6所示第一实例性实施例的构造均相同的构造，因此，以下将仅阐述根据此实例性实施例的下部传送单元30b的构造。This exemplary embodiment shows the same configuration as that of the first exemplary embodiment shown in FIGS. 3 to 6 except for the configuration of the lower transfer unit 30b, so only the lower portion according to this exemplary embodiment will be explained below. Configuration of the transfer unit 30b.
如图9所示，下部传送单元60b向托盘20的下端部传递驱动力，而不接触相对运动容许单元40。详细而言，下部传送单元60b包括设置于相对运动容许单元40中的下部永久磁铁(图中未显示)、以及邻近所述下部永久磁铁而设置于真空室10内的下部电磁铁63b。可增加下部永久磁铁作为与相对运动容许单元40分开的单独元件，且托盘支撑轴41可被形成为磁体。换言之，托盘支撑轴41是由磁性材料制成，并用作下部永久磁铁。作为另一选择，下部永久磁铁可在托盘支撑轴41的安装方向上耦合至托盘支撑轴41。As shown in FIG. 9 , the lower conveying unit 60 b transmits driving force to the lower end of the tray 20 without contacting the relative movement allowing unit 40 . In detail, the lower transfer unit 60b includes a lower permanent magnet (not shown) disposed in the relative motion allowing unit 40 , and a lower electromagnet 63b disposed in the vacuum chamber 10 adjacent to the lower permanent magnet. A lower permanent magnet may be added as a separate element from the relative motion allowing unit 40, and the tray supporting shaft 41 may be formed as a magnet. In other words, the tray support shaft 41 is made of a magnetic material and functions as a lower permanent magnet. Alternatively, the lower permanent magnet may be coupled to the tray support shaft 41 in the installation direction of the tray support shaft 41 .
在此实例性实施例中，下部电磁铁63b耦合至真空室10的外壁的内表面。下部电磁铁63b设置于分开的引导滚轮51之间。下部电磁铁63b等效于定子，且设置于相对运动容许单元40中的下部永久磁铁等效于动子。换言之，下部传送单元60b像上述上部传送单元30一样基于洛伦兹力而为托盘20提供驱动力。In this exemplary embodiment, the lower electromagnet 63 b is coupled to the inner surface of the outer wall of the vacuum chamber 10 . The lower electromagnet 63b is disposed between the divided guide rollers 51 . The lower electromagnet 63b is equivalent to a stator, and the lower permanent magnet provided in the relative motion allowing unit 40 is equivalent to a mover. In other words, the lower transfer unit 60b provides the driving force for the tray 20 based on the Lorentz force like the upper transfer unit 30 described above.
根据此实例性实施例的用于传送基板的装置T3的操作如下。下部传送单元60b向托盘20的下部传递驱动力。换言之，上部传送单元30向托盘20的上部传递驱动力并同时向托盘20的下部传递驱动力，使得托盘20可被更平稳地传送。因此，驱动力是同时在托盘20的上部及下部传递，因此托盘20可基于力的平衡而更容易地保持平衡。The operation of the apparatus T3 for transferring a substrate according to this exemplary embodiment is as follows. The lower transfer unit 60 b transmits driving force to the lower portion of the tray 20 . In other words, the upper transfer unit 30 transmits the driving force to the upper portion of the tray 20 and simultaneously transmits the driving force to the lower portion of the tray 20 so that the tray 20 may be transferred more smoothly. Therefore, the driving force is simultaneously transmitted on the upper and lower portions of the tray 20, so that the tray 20 can be more easily kept balanced based on the balance of forces.
图10为显示根据本发明第四实例性实施例的用于传送基板的装置中的下部电磁铁安装于真空室外的透视图。10 is a perspective view showing that a lower electromagnet is installed outside a vacuum chamber in an apparatus for transferring a substrate according to a fourth exemplary embodiment of the present invention.
此实例性实施例显示除下部电磁铁63c的构造之外与图7及图8所示第二实例性实施例的构造及图9所示第三实例性实施例的构造均相同的构造，因此，以下将仅阐述根据此实例性实施例的下部电磁铁63c的构造。This exemplary embodiment shows the same configuration as that of the second exemplary embodiment shown in FIGS. 7 and 8 and that of the third exemplary embodiment shown in FIG. 9 except for the configuration of the lower electromagnet 63c, so , only the configuration of the lower electromagnet 63c according to this exemplary embodiment will be explained below.
在此实例性实施例中，上部传送单元30a具有与第二实例性实施例的构造相同的构造，且下部电磁铁63c设置于真空室10外，此与第三实例性实施例的设置位置相反。In this exemplary embodiment, the upper transfer unit 30a has the same configuration as that of the second exemplary embodiment, and the lower electromagnet 63c is disposed outside the vacuum chamber 10, which is opposite to that of the third exemplary embodiment. .
换言之，如图10所示，真空室10的外壁形成有在各引导单元50之间向上凸起的突出部，且真空室10的突出部设置有自其外表面凹陷的安装槽H。下部电磁铁63c嵌入于并安装于安装槽H中。In other words, as shown in FIG. 10 , the outer wall of the vacuum chamber 10 is formed with protrusions protruding upward between the guide units 50 , and the protrusions of the vacuum chamber 10 are provided with mounting grooves H recessed from the outer surface thereof. The lower electromagnet 63c is embedded and installed in the mounting groove H. As shown in FIG.
换言之，真空室10形成有欲在各引导滚轮51之间邻近相对运动容许单元40的突出部11。突出部11的外表面设置有安装槽H，在安装槽H中嵌入并安装有下部电磁铁63c，使得下部电磁铁63c设置于大气中(即，真空室10外)。设置于真空室10外的下部电磁铁63c具有与上述第二实例性实施例中设置于真空室10外的上部电磁铁33a相同的作用。In other words, the vacuum chamber 10 is formed with the protrusion 11 intended to be adjacent to the relative movement allowing unit 40 between the guide rollers 51 . The outer surface of the protruding part 11 is provided with a mounting groove H, and the lower electromagnet 63c is embedded and installed in the mounting groove H, so that the lower electromagnet 63c is disposed in the atmosphere (ie, outside the vacuum chamber 10). The lower electromagnet 63c disposed outside the vacuum chamber 10 has the same function as the upper electromagnet 33a disposed outside the vacuum chamber 10 in the second exemplary embodiment described above.
同时，可拆卸地设置根据此实例性实施例的下部电磁铁63c。换言之，下部电磁铁63c可相对于真空室10的安装槽H拆卸。通过此种构造，如果下部电磁铁63c发生故障或性能降低，则可容易地在真空室10外将其替换。Meanwhile, the lower electromagnet 63c according to this exemplary embodiment is detachably provided. In other words, the lower electromagnet 63 c is detachable relative to the mounting groove H of the vacuum chamber 10 . With this configuration, the lower electromagnet 63c can be easily replaced outside the vacuum chamber 10 if it malfunctions or degrades in performance.
图11为根据本发明第五实例性实施例的用于传送基板的装置的示意性正视图，图12为用于解释图11中的用于传送基板的装置的操作的视图，图13为图11中的用于传送基板的装置的托盘下部轨道与驱动滚轮之间的接触部的侧视放大图，图14为用于解释图11中的旋转磁铁的操作的示意图，且图15为用于解释图14中的旋转磁铁的替代实例性实施例的视图。11 is a schematic front view of an apparatus for transferring a substrate according to a fifth exemplary embodiment of the present invention, FIG. 12 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 11 , and FIG. 13 is a diagram 11 is an enlarged side view of the contact portion between the lower rail of the tray and the driving roller of the apparatus for transferring substrates, FIG. 14 is a schematic diagram for explaining the operation of the rotating magnet in FIG. 11 , and FIG. 15 is a diagram for A view explaining an alternative exemplary embodiment of the rotating magnet in FIG. 14 .
如图11至图15所示，根据本发明第五实例性实施例的用于传送基板的装置T5包括上面装有基板S并用于传送基板S的托盘100、设置于托盘100下方并用于传送托盘100的传送单元200、邻近托盘100的上端部或下端部并通过电磁力来增大/减小托盘100的传送速度的加速/减速单元300、以及设置于托盘100的上部中并用于引导托盘100的引导单元400。As shown in FIGS. 11 to 15 , an apparatus T5 for transferring a substrate according to a fifth exemplary embodiment of the present invention includes a tray 100 on which a substrate S is mounted and used for transferring the substrate S, disposed below the tray 100 and used for transferring the tray. The transfer unit 200 of 100, the acceleration/deceleration unit 300 adjacent to the upper end or lower end of the tray 100 and increasing/decreasing the transfer speed of the tray 100 by electromagnetic force, and the upper portion of the tray 100 for guiding the tray 100 The guide unit 400.
托盘100的形状像矩形框架，因此沿该矩形框架的边缘排列用于夹紧基板S的夹具单元(图中未显示)，使得基板S可附装至托盘100的中心部并可自托盘100的中心部拆卸。装有基板S的托盘100是以垂直站立状态来传送。The tray 100 is shaped like a rectangular frame, so clamp units (not shown) for clamping the substrate S are arranged along the edges of the rectangular frame so that the substrate S can be attached to the center portion of the tray 100 and removed from the tray 100. Center section disassembled. The tray 100 loaded with the substrate S is conveyed in a vertically standing state.
在此实例性实施例中，基板S可包括用于制造平板显示器器件或类似器件以及液晶显示器器件的各种基板S。基板S可包括半导体的晶圆。In this exemplary embodiment, the substrate S may include various substrates S for manufacturing flat panel display devices or the like as well as liquid crystal display devices. The substrate S may include a semiconductor wafer.
参照图11及图12，传送单元200包括耦合至托盘100的下端部的托盘下部轨道210、以及多个驱动滚轮220，所述多个驱动滚轮220在托盘下部轨道210下方设置成在接触托盘下部轨道210的同时进行旋转。Referring to FIGS. 11 and 12 , the transfer unit 200 includes a tray lower rail 210 coupled to the lower end of the tray 100 , and a plurality of driving rollers 220 disposed below the tray lower rail 210 to contact the lower portion of the tray. The track 210 rotates simultaneously.
托盘下部轨道210的形状像圆柱形杆，其耦合至托盘100的下端部并支撑托盘100，使得托盘100可接触驱动滚轮220并在驱动滚轮220上被传送。The pallet lower rail 210 is shaped like a cylindrical rod, which is coupled to the lower end of the pallet 100 and supports the pallet 100 so that the pallet 100 can contact and be conveyed on the driving roller 220 .
同时，如图13所示，高导电性金属C嵌入于托盘下部轨道210中或托盘100的下部中，从而增大由下文所将阐述的加速/减速单元300的旋转磁铁310在托盘下部轨道210中感应出的涡流的强度。在此实例性实施例中，托盘下部轨道210包括不锈钢，且高导电性金属C包括铜或铝。Meanwhile, as shown in FIG. 13 , a highly conductive metal C is embedded in the tray lower rail 210 or in the lower part of the tray 100, thereby increasing the speed of rotation of the rotating magnet 310 of the acceleration/deceleration unit 300 to be explained below on the tray lower rail 210. The strength of the induced eddy current. In this exemplary embodiment, tray lower rail 210 includes stainless steel, and highly conductive metal C includes copper or aluminum.
驱动滚轮220被设置成具有旋转轴并在传送基板的方向上旋转，并在其圆周表面上包括具有一定曲率的沟槽，以接触托盘下部轨道210的底部。驱动滚轮220以复数形式以特定间隔排列于托盘100的传送方向上，使得可稳定地传送托盘100。同样，驱动滚轮220的旋转轴可设置有用于旋转驱动滚轮220的滚轮驱动电动机230，因此，滚轮驱动电动机230可产生用于传送基板S的驱动力。The driving roller 220 is configured to have a rotation shaft and rotate in a direction of transferring the substrate, and includes a groove having a certain curvature on its circumferential surface to contact the bottom of the tray lower rail 210 . The driving rollers 220 are arranged in plural at certain intervals in the conveying direction of the tray 100 so that the tray 100 can be stably conveyed. Also, the rotation shaft of the driving roller 220 may be provided with a roller driving motor 230 for rotating the driving roller 220, and thus, the roller driving motor 230 may generate a driving force for transferring the substrate S. Referring to FIG.
接下来，加速/减速单元300包括：至少一个旋转磁铁310，其邻近托盘100的下端部并可旋转地设置于托盘100的传送方向上；旋转电动机320，用于旋转旋转磁铁310；以及旋转控制器330，用于控制旋转电动机320的旋转方向及速度。Next, the acceleration/deceleration unit 300 includes: at least one rotating magnet 310 adjacent to the lower end of the tray 100 and rotatably disposed in the conveying direction of the tray 100; a rotating motor 320 for rotating the rotating magnet 310; and a rotation control The device 330 is used to control the rotation direction and speed of the rotation motor 320 .
旋转磁铁310邻近托盘100的下端部并在托盘100的传送方向上旋转。如果旋转磁铁310旋转，则在嵌入于托盘下部轨道210或托盘100的下部中的高导体C中会感应出涡流，并因此产生力来传送托盘100。图12显示当旋转磁铁310在其中以顺时针方向旋转时，托盘100通过产生于托盘下部轨道210中的涡流而被向右传送。The rotating magnet 310 is adjacent to the lower end of the tray 100 and rotates in the conveying direction of the tray 100 . If the rotating magnet 310 rotates, an eddy current is induced in the high conductor C embedded in the tray lower rail 210 or the lower portion of the tray 100 , and thus a force is generated to transfer the tray 100 . FIG. 12 shows that the tray 100 is conveyed rightward by the eddy current generated in the tray lower rail 210 when the rotating magnet 310 rotates therein in a clockwise direction.
在另一方面，当期望托盘100减速时，使旋转磁铁310以相反的方向旋转，使得托盘100可通过在托盘下部轨道210中所感应的涡流而被减速。On the other hand, when deceleration of the tray 100 is desired, the rotating magnet 310 is rotated in the opposite direction so that the tray 100 can be decelerated by the eddy current induced in the tray lower rail 210 .
在此实例性实施例中，加速/减速单元300邻近托盘100的下端部以使托盘100加速及减速，但并不仅限于此。作为另一选择，加速/减速单元300可邻近托盘100的上端部来使托盘100加速及减速。In this exemplary embodiment, the acceleration/deceleration unit 300 is adjacent to the lower end of the tray 100 to accelerate and decelerate the tray 100, but it is not limited thereto. Alternatively, the acceleration/deceleration unit 300 may accelerate and decelerate the tray 100 adjacent to the upper end of the tray 100 .
同时，根据此实例性实施例的旋转磁铁310采用一般的永久磁铁，并在其中心上具有旋转轴。因此，当旋转磁铁310旋转时，托盘100的下部轨道中会产生涡流。然而，此种一般的永久磁铁在增大/减小其旋转时所感应的涡流方面具有大的偏差，因而托盘100可能会摇动。Meanwhile, the rotating magnet 310 according to this exemplary embodiment adopts a general permanent magnet and has a rotating shaft at its center. Therefore, when the rotating magnet 310 rotates, an eddy current is generated in the lower rail of the tray 100 . However, such a general permanent magnet has a large deviation in increasing/decreasing the eddy current induced when it rotates, and thus the tray 100 may shake.
参照图14，当旋转磁铁310在旋转的同时位于(b)处及(d)处时，在托盘下部轨道210中感应的涡流会迅速地减小，而当旋转磁铁310位于(a)处及(c)处时，所述涡流会迅速地增大。因此，当通过使用一般磁铁的旋转磁铁310来使托盘100加速/减速时，托盘100可能会摇动。Referring to Fig. 14, when the rotating magnet 310 is located at (b) and (d) while rotating, the eddy current induced in the tray lower rail 210 will decrease rapidly, and when the rotating magnet 310 is located at (a) and At (c), the vortex will increase rapidly. Therefore, when the tray 100 is accelerated/decelerated by using the rotating magnet 310 of a general magnet, the tray 100 may shake.
因此，如图15所示，如果使用具有圆形形状的经改良的旋转磁铁310’，且在所述圆形形状中使N极与S极沿旋转磁铁310的圆周交错设置，则会减小产生于托盘下部轨道210中的涡流的偏差，从而减小在托盘100中产生的摇动。Therefore, as shown in FIG. 15, if an improved rotating magnet 310' having a circular shape is used in which N poles and S poles are staggered along the circumference of the rotating magnet 310, the reduction will be reduced. The deviation of the eddy current generated in the tray lower rail 210 reduces the shaking generated in the tray 100 .
旋转电动机320连接至旋转磁铁310的旋转轴，并提供用于旋转旋转磁铁310的驱动力。The rotation motor 320 is connected to the rotation shaft of the rotation magnet 310 and provides a driving force for rotating the rotation magnet 310 .
旋转控制器330控制旋转电动机320的旋转方向及速度，从而可调整通过旋转磁铁310而在托盘下部轨道210中感应出的涡流的强度及方向，进而控制用于使托盘100加速或减速的力。The rotation controller 330 controls the rotation direction and speed of the rotation motor 320 so as to adjust the strength and direction of the eddy current induced in the tray lower rail 210 by the rotation magnet 310 , thereby controlling the force for accelerating or decelerating the tray 100 .
同时，参照图11至图15，引导单元400包括：托盘上部轨道410，其被设置成铁磁体并耦合至托盘100的上端部；以及磁性引导单元420，其将托盘上部轨道410嵌入于其中并具有极性以产生用于在托盘上部轨道410的相对两侧推动托盘上部轨道410的磁力。Meanwhile, referring to FIGS. 11 to 15 , the guide unit 400 includes: a tray upper rail 410 configured as a ferromagnetic body and coupled to the upper end of the tray 100; and a magnetic guide unit 420 that embeds the tray upper rail 410 therein and Polarized to create a magnetic force for pushing the tray upper rail 410 on opposite sides of the tray upper rail 410 .
托盘上部轨道410为形状像圆柱形杆的铁磁体并耦合至托盘100的上端部。The tray upper rail 410 is a ferromagnetic body shaped like a cylindrical rod and is coupled to the upper end of the tray 100 .
磁性引导单元420具有弯曲成像‘U’形的横截面，以在相对两侧引导托盘上部轨道410，且磁性引导单元420的邻近托盘上部轨道410的端部设置有极性与托盘上部轨道410的极性相同的铁磁体。因此，产生用于在托盘上部轨道410的相对两侧推动托盘上部轨道410的力，该力施加于托盘100的上端部，从而引导托盘100在被传送时不会坠落。The magnetic guide unit 420 has a cross-section bent into a 'U' shape to guide the tray upper rail 410 on opposite sides, and an end portion of the magnetic guide unit 420 adjacent to the tray upper rail 410 is provided with a polarity corresponding to that of the tray upper rail 410. Ferromagnets of the same polarity. Accordingly, a force for pushing the tray upper rail 410 at opposite sides of the tray upper rail 410 is generated, which is applied to the upper end of the tray 100 , thereby guiding the tray 100 not to fall while being conveyed.
对于此种构造，用于传送基板的装置T5的操作如下。With this configuration, the operation of the apparatus T5 for transferring the substrate is as follows.
当在处理室内传送装有基板S的托盘100时，以垂直站立状态传送托盘100，以防止基板S的中心部下垂。When the tray 100 loaded with the substrate S is transported within the processing chamber, the tray 100 is transported in a vertically standing state to prevent the central portion of the substrate S from drooping.
在用于传送托盘100的装置T5中，引导单元400设置于托盘100之上，并引导托盘100在被传送时不会坠落，且传送单元300设置于托盘100下方，并在支撑托盘100的同时传送托盘100。In the apparatus T5 for transferring the tray 100, the guide unit 400 is provided above the tray 100 and guides the tray 100 so as not to fall while being transferred, and the transfer unit 300 is provided below the tray 100 and supports the tray 100 while The tray 100 is transferred.
当托盘100自静止状态开始或在被传送时停止时，托盘100的速度会迅速地增大或减小，因此，托盘100可能会在驱动滚轮220上滑动且此时产生的摩擦可产生颗粒。When the tray 100 starts from rest or stops while being conveyed, the velocity of the tray 100 increases or decreases rapidly, therefore, the tray 100 may slide on the drive rollers 220 and the resulting friction may generate particles.
加速/减速单元300使旋转磁铁310在托盘100的下部中旋转，并因此在托盘下部轨道210中产生涡流，使得托盘100可通过所产生的涡流而被加速或减速。换言之，通过由旋转控制器330控制旋转磁铁310的旋转方向及速度来控制产生于托盘下部轨道210中的涡流的强度及方向，从而控制用于使托盘100加速或减速的力。The acceleration/deceleration unit 300 rotates the rotating magnet 310 in the lower portion of the tray 100 and thus generates eddy currents in the tray lower rail 210 so that the tray 100 may be accelerated or decelerated by the generated eddy currents. In other words, the force for accelerating or decelerating the tray 100 is controlled by controlling the rotation direction and speed of the rotating magnet 310 by the rotation controller 330 to control the strength and direction of the eddy current generated in the tray lower rail 210 .
因此，在根据此实例性实施例的用于传送基板的装置T5中，用于通过电磁力而增大及减小托盘100的传送速度的加速/减速单元300邻近托盘100，从而可更为精确地控制托盘100的传送速度。因此，可快速地执行对托盘100的传送及排列。此外，使用电磁力来增大或减小托盘100的传送速度，从而具有防止异物产生的效果。Therefore, in the apparatus T5 for transferring substrates according to this exemplary embodiment, the acceleration/deceleration unit 300 for increasing and decreasing the transfer speed of the tray 100 by electromagnetic force is adjacent to the tray 100, so that more accurate The conveying speed of the tray 100 is precisely controlled. Therefore, transfer and alignment of the trays 100 can be quickly performed. In addition, electromagnetic force is used to increase or decrease the transfer speed of the tray 100, thereby having an effect of preventing generation of foreign matter.
以下，将参照附图来阐述根据本发明第六实例性实施例的用于传送基板的装置T6，与根据本发明第五实例性实施例的用于传送基板的装置T5中所述者相同的构造将不再予以赘述。Hereinafter, an apparatus T6 for transferring a substrate according to a sixth exemplary embodiment of the present invention, which is the same as that described in the apparatus T5 for transferring a substrate according to the fifth exemplary embodiment of the present invention, will be explained with reference to the accompanying drawings. The structure will not be repeated.
图16为根据本发明第六实例性实施例的用于传送基板的装置的示意性正视图，图17为用于解释图16中的用于传送基板的装置的操作的视图，且图18为图17的侧视图。此处，在图11至图18的所有附图中，相同的参考编号指示相同的元件，并视需要省略重复的说明。16 is a schematic front view of an apparatus for transferring a substrate according to a sixth exemplary embodiment of the present invention, FIG. 17 is a view for explaining the operation of the apparatus for transferring a substrate in FIG. 16 , and FIG. 18 is Figure 17. Side view. Here, in all the drawings of FIGS. 11 to 18 , the same reference numerals designate the same elements, and repeated explanations are omitted as necessary.
如图所示，根据本发明第六实例性实施例的用于传送基板的装置T6包括加速/减速单元300，且加速/减速单元300包括：至少一个旋转磁铁310，其邻近托盘100的下端部并可旋转地设置于托盘100的传送方向上；旋转电动机320，用于旋转旋转磁铁310；以及旋转控制器330，用于控制旋转电动机320的旋转方向及速度。具体而言，旋转磁铁310在托盘100的下端部的横向侧处邻近托盘100并可在托盘100的传送方向上旋转。As shown in the figure, the apparatus T6 for transferring substrates according to the sixth exemplary embodiment of the present invention includes an acceleration/deceleration unit 300, and the acceleration/deceleration unit 300 includes: at least one rotating magnet 310 adjacent to the lower end of the tray 100 And it is rotatably arranged in the conveying direction of the tray 100 ; the rotation motor 320 is used to rotate the rotation magnet 310 ; and the rotation controller 330 is used to control the rotation direction and speed of the rotation motor 320 . Specifically, the rotating magnet 310 is adjacent to the tray 100 at the lateral side of the lower end portion of the tray 100 and is rotatable in the conveying direction of the tray 100 .
换言之，如果难以像第五实例性实施例一样将加速/减速单元置于托盘100的下部中，则像此实施例一样邻近托盘100的横向侧而放置加速/减速单元并使旋转磁铁310在横向侧上旋转，从而具有与第五实例性实施例的加速/减速效果相同的加速/减速效果。因此，能有效利用空间并便于器件设计。In other words, if it is difficult to place the acceleration/deceleration unit in the lower portion of the tray 100 like the fifth exemplary embodiment, the acceleration/deceleration unit is placed adjacent to the lateral side of the tray 100 like this embodiment and the rotating magnet 310 is placed in the lateral direction. Rotate sideways, thereby having the same acceleration/deceleration effect as that of the fifth exemplary embodiment. Therefore, space can be effectively used and device design can be facilitated.
以下，将参照附图来阐述根据本发明第七实例性实施例的用于传送基板的装置T7，与根据本发明第五及第六实例性实施例的用于传送基板的装置T5及T6中所述者相同的构造将不再予以赘述。Hereinafter, the apparatus T7 for transferring a substrate according to the seventh exemplary embodiment of the present invention, and the apparatuses T5 and T6 for transferring a substrate according to the fifth and sixth exemplary embodiments of the present invention will be described with reference to the accompanying drawings. The same structures as those described above will not be repeated.
图19为根据本发明第七实例性实施例的用于传送基板的装置的示意性正视图，且图20为用于解释图19中的用于传送基板的装置的操作的视图。此处，在图11至图20的所有附图中，相同的参考编号指示相同的元件，并视需要省略重复的说明。19 is a schematic front view of an apparatus for transferring a substrate according to a seventh exemplary embodiment of the present invention, and FIG. 20 is a view for explaining an operation of the apparatus for transferring a substrate in FIG. 19 . Here, in all the drawings of FIGS. 11 to 20 , the same reference numerals designate the same elements, and repeated explanations are omitted as necessary.
根据本发明第七实例性实施例的用于传送基板的装置T7包括：托盘100，上面装有基板S并用于传送基板S；传送单元200，设置于托盘100下方并用于传送托盘100；加速/减速单元500，邻近托盘100的上端部或下端部并通过电磁力来增大/减小托盘100的传送速度；以及引导单元400，设置于托盘100的上部中并用于引导托盘100。The apparatus T7 for transferring a substrate according to the seventh exemplary embodiment of the present invention includes: a tray 100 on which a substrate S is mounted and used for transferring the substrate S; a transfer unit 200 arranged below the tray 100 and used for transferring the tray 100; The deceleration unit 500 is adjacent to the upper or lower end of the tray 100 and increases/decreases the transfer speed of the tray 100 by electromagnetic force;
根据本发明的第七实例性实施例，加速/减速单元500包括：至少一个运动磁铁510，其邻近托盘100的下端部并设置成靠近或远离托盘100；驱动器520，用于驱动运动磁铁510靠近或远离托盘100；以及驱动控制器，用于驱动驱动器520的操作。According to the seventh exemplary embodiment of the present invention, the acceleration/deceleration unit 500 includes: at least one moving magnet 510, which is adjacent to the lower end of the tray 100 and arranged to approach or move away from the tray 100; a driver 520 for driving the moving magnet 510 to approach or away from the tray 100 ; and a driving controller for driving the operation of the driver 520 .
运动磁铁510邻近托盘100的下端部并由驱动器520驱动，以在靠近或远离托盘下部轨道210的方向上运动。The moving magnet 510 is adjacent to the lower end of the tray 100 and is driven by the driver 520 to move in a direction approaching or away from the tray lower rail 210 .
当运动磁铁510朝托盘下部轨道210运动时，托盘下部轨道210中会产生涡流，并因此产生制动力。相反，当运动磁铁510在远离托盘下部轨道210的方向上运动时，可不受制动力限制地传送托盘100。When the moving magnet 510 moves toward the tray lower rail 210, an eddy current is generated in the tray lower rail 210, and thus a braking force is generated. On the contrary, when the moving magnet 510 moves in a direction away from the tray lower rail 210, the tray 100 may be transferred without being limited by the braking force.
当使用涡流代替摩擦来使托盘100停止时，具有防止当托盘100停止时滑动及产生异物的效果。When the tray 100 is stopped using eddy current instead of friction, there is an effect of preventing slippage and generation of foreign matter when the tray 100 is stopped.
像第五实例性实施例一样，高导电性金属C嵌入于托盘下部轨道210中并会增大托盘下部轨道210中所感应的涡流的强度。Like the fifth exemplary embodiment, the highly conductive metal C is embedded in the tray lower rail 210 and increases the intensity of the eddy current induced in the tray lower rail 210 .
驱动器520提供驱动力，以使运动磁铁510靠近或远离托盘下部轨道210，且驱动控制器控制驱动器520来驱动运动磁铁510靠近或远离托盘100。驱动器520可由液压缸、直线电动机等实现。The driver 520 provides a driving force to make the moving magnet 510 approach or move away from the tray lower rail 210 , and the driving controller controls the driver 520 to drive the moving magnet 510 to approach or move away from the tray 100 . The driver 520 can be realized by a hydraulic cylinder, a linear motor, or the like.
在此实例性实施例中，运动磁铁510邻近托盘100的下端部。然而，运动磁铁510可视需要邻近托盘100的上端部并靠近或远离托盘100，从而具有与上述相同的作用。In this exemplary embodiment, the moving magnet 510 is adjacent to the lower end of the tray 100 . However, the moving magnet 510 can be adjacent to the upper end of the tray 100 and move closer to or farther away from the tray 100 as desired, thereby having the same effect as described above.
以下，将参照附图来阐述根据本发明第八实例性实施例的用于传送基板的装置T8，与根据本发明第五至第七实例性实施例的用于传送基板的装置T5、T6及T7中所述者相同的构造将不再予以赘述。Hereinafter, an apparatus T8 for transferring a substrate according to an eighth exemplary embodiment of the present invention, and apparatuses T5, T6 and T5 for transferring a substrate according to fifth to seventh exemplary embodiments of the present invention will be described with reference to the drawings The same structure as that described in T7 will not be repeated.
图21为根据本发明第八实例性实施例的用于传送基板的装置的示意性侧视图，且图22为用于解释图21中的用于传送基板的装置的操作的视图。此处，在图11至图21的所有附图中，相同的参考编号指示相同的元件，并视需要省略重复的说明。21 is a schematic side view of an apparatus for transferring a substrate according to an eighth exemplary embodiment of the present invention, and FIG. 22 is a view for explaining an operation of the apparatus for transferring a substrate in FIG. 21 . Here, in all the drawings of FIGS. 11 to 21 , the same reference numerals designate the same elements, and repeated explanations are omitted as necessary.
参照图21及图22，在根据第八实例性实施例的用于传送基板的装置T8中，加速/减速单元500包括：至少一个运动磁铁510，其邻近托盘100的下端部并设置成靠近或远离托盘100；驱动器520，用于驱动运动磁铁510靠近或远离托盘100；以及驱动控制器，用于驱动驱动器520的操作。具体而言，运动磁铁510在托盘100的下端部中的横向侧处邻近托盘100并设置成靠近或远离托盘100。21 and 22, in the apparatus T8 for transferring substrates according to the eighth exemplary embodiment, the acceleration/deceleration unit 500 includes: at least one moving magnet 510 adjacent to the lower end of the tray 100 and disposed close to or away from the tray 100 ; the driver 520 is used to drive the moving magnet 510 close to or away from the tray 100 ; and the driving controller is used to drive the operation of the driver 520 . Specifically, the moving magnet 510 is adjacent to the tray 100 at a lateral side in a lower end portion of the tray 100 and is disposed close to or away from the tray 100 .
换言之，如果难以像第七实例性实施例一样将加速/减速单元置于托盘100的下部中，则像此实例性实施例一样将加速/减速单元邻近托盘100的横向侧放置，并使运动磁铁510运动以在横向侧处靠近或远离托盘，从而具有与第七实例性实施例的加速/减速效果相同的加速/减速效果。因此，能有效利用空间并便于器件设计。In other words, if it is difficult to place the acceleration/deceleration unit in the lower portion of the tray 100 like the seventh exemplary embodiment, the acceleration/deceleration unit is placed adjacent to the lateral side of the tray 100 like this exemplary embodiment, and the moving magnet 510 moves to approach or move away from the tray at the lateral sides, thereby having the same acceleration/deceleration effect as that of the seventh exemplary embodiment. Therefore, space can be effectively used and device design can be facilitated.
以下，将参照附图来阐述根据本发明第九实例性实施例的用于传送基板的装置T9，与根据本发明概念的第五至第八实例性实施例的用于传送基板的装置T5、T6、T7及T8中所述者相同的构造将不再予以赘述。Hereinafter, an apparatus T9 for transferring a substrate according to a ninth exemplary embodiment of the present invention, and an apparatus T5 for transferring a substrate according to fifth to eighth exemplary embodiments of the inventive concept will be explained with reference to the accompanying drawings. The same structures as those described in T6, T7 and T8 will not be repeated.
图23为根据本发明第九实例性实施例的用于传送基板的装置的示意性正视图，且图24为用于解释图23中的用于传送基板的装置的加速/减速单元的操作的视图。此处，在图11至图21的所有附图中，相同的参考编号指示相同的元件，并视需要省略重复的说明。23 is a schematic front view of an apparatus for transferring a substrate according to a ninth exemplary embodiment of the present invention, and FIG. 24 is a diagram for explaining the operation of an acceleration/deceleration unit of the apparatus for transferring a substrate in FIG. 23. view. Here, in all the drawings of FIGS. 11 to 21 , the same reference numerals designate the same elements, and repeated explanations are omitted as necessary.
参照图23及图24，根据第九实例性实施例的用于传送基板的装置T9包括：托盘100，上面装有基板S并用于传送基板S；传送单元200，设置于托盘100下方并用于传送托盘100；加速/减速单元600，其邻近托盘100的上端部或下端部并通过电磁力来增大/减小托盘100的传送速度；以及引导单元400，设置于托盘100的上部中并用于引导托盘100。Referring to FIG. 23 and FIG. 24 , an apparatus T9 for transferring a substrate according to the ninth exemplary embodiment includes: a tray 100 on which a substrate S is mounted and used for transferring the substrate S; a transfer unit 200 disposed below the tray 100 and used for transferring the tray 100; the acceleration/deceleration unit 600 adjacent to the upper or lower end of the tray 100 and increasing/decreasing the transfer speed of the tray 100 by electromagnetic force; and the guide unit 400 provided in the upper portion of the tray 100 and used to guide Tray 100.
根据第九实例性实施例的加速/减速单元600包括：多个静止磁铁610，其以特定间隔设置于托盘100的下端部中；电磁铁模块620，其邻近静止磁铁610并以特定间隔排列且通过与静止磁铁610的相互作用来产生磁力以增大/减小托盘100的传送速度；以及模块控制器，用于控制施加至电磁模块620的电流的供应以选择性地改变电磁模块620的N/S极性。The acceleration/deceleration unit 600 according to the ninth exemplary embodiment includes: a plurality of stationary magnets 610 disposed in the lower end portion of the tray 100 at certain intervals; electromagnet modules 620 adjacent to the stationary magnets 610 and arranged at certain intervals; A magnetic force is generated by interaction with the stationary magnet 610 to increase/decrease the transport speed of the tray 100; and a module controller for controlling the supply of electric current applied to the electromagnetic module 620 to selectively change the N /S polarity.
静止磁铁610以特定间隔排列于托盘下部轨道210中并使N极及S极相互交错。静止磁铁610不是分开地附装，而是与托盘下部轨道210或托盘100的下端部设置为一体。The stationary magnets 610 are arranged in the tray lower rail 210 at a certain interval, and the N poles and S poles are interlaced. The stationary magnet 610 is not separately attached, but is integrally provided with the tray lower rail 210 or the lower end of the tray 100 .
电磁铁模块620以特定间隔排列并邻近静止磁铁610，并与静止磁铁610之间留有预定空间。电磁铁模块620包括上面绕有线圈的多个铁芯621、以及用于将所述多个铁芯621连接成一体的连接板622。The electromagnet modules 620 are arranged at specific intervals and adjacent to the stationary magnet 610 , leaving a predetermined space between them and the stationary magnet 610 . The electromagnet module 620 includes a plurality of iron cores 621 with coils wound thereon, and a connecting plate 622 for connecting the plurality of iron cores 621 into one body.
当电流在线圈中流动时，铁芯621被磁化并具有磁极，且连接板622将所述多个铁芯621连接成一体并对其静止地支撑。When current flows in the coil, the iron cores 621 are magnetized and have magnetic poles, and the connection plate 622 connects the plurality of iron cores 621 into one body and supports them statically.
如果在线圈中流动的电流改变方向，则铁芯621的极性也会改变。此处，在线圈中流动的电流的大小及方向受模块控制器控制。换言之，模块控制器控制在线圈中流动的电流的大小及方向，从而选择性地改变铁芯621的极性和磁力。If the current flowing in the coil changes direction, the polarity of the core 621 also changes. Here, the magnitude and direction of the current flowing in the coil is controlled by the module controller. In other words, the module controller controls the magnitude and direction of the current flowing in the coil, thereby selectively changing the polarity and magnetic force of the iron core 621 .
参照图24，静止磁铁610以特定间隔排列于托盘100的下端部中并使N极及S极相互交错，且电磁铁模块620排列于静止磁铁610下方，并与静止磁铁610之间留有预定空间。电磁铁模块620的铁芯621以特定间隔进行排列，所述间隔不同于静止磁铁610的排列间隔。例如，三个铁芯621以其中排列有四个静止磁铁610的间隔进行排列。作为另一选择，偶数个铁芯621以其中排列有奇数个静止磁铁610的间隔进行排列。Referring to Fig. 24, the stationary magnets 610 are arranged in the lower end of the tray 100 at specific intervals and the N poles and S poles are staggered with each other, and the electromagnet modules 620 are arranged below the stationary magnets 610, and there is a predetermined gap between them and the stationary magnets 610. space. The iron cores 621 of the electromagnet module 620 are arranged at a certain interval different from the arrangement interval of the stationary magnets 610 . For example, three iron cores 621 are arranged at intervals in which four stationary magnets 610 are arranged. Alternatively, even-numbered iron cores 621 are arranged at intervals in which odd-numbered stationary magnets 610 are arranged.
电磁铁模块620的铁芯被依序磁化，以使托盘100加速及减速，以下将参照图24详细阐述之。The iron core of the electromagnet module 620 is magnetized sequentially to accelerate and decelerate the tray 100, which will be described in detail below with reference to FIG. 24 .
如图24中的①所示，(a)被磁化成N极性且(c)被磁化成S极性，由此产生吸引静止磁铁610的力，从而使托盘100停止。接下来，如②所示，(b)被磁化成N极性且(d)被磁化成S极性，由此在与静止磁铁610的极性相同的极性中产生排斥力，而在与静止磁铁610的极性不同的极性中产生吸引力，从而使托盘100向右运动，如③所示。As shown by ① in FIG. 24 , (a) is magnetized to N polarity and (c) is magnetized to S polarity, whereby a force attracting the stationary magnet 610 is generated, thereby stopping the tray 100 . Next, as shown in ②, (b) is magnetized into N polarity and (d) is magnetized into S polarity, whereby a repulsive force is generated in the same polarity as that of the stationary magnet 610, while The different polarities of the stationary magnet 610 generate an attractive force, so that the tray 100 moves to the right, as shown in ③.
随后，如图24的④所示，(a)被磁化成S极性且(c)被磁化成N极性，由此使相同的极性相互排斥而不同的极性相互吸引，从而继续使托盘100运动，如⑤所示。Subsequently, as shown in ④ of Fig. 24, (a) is magnetized into S polarity and (c) is magnetized into N polarity, whereby the same polarities repel each other and different polarities attract each other, thereby continuing to make The pallet 100 moves, as shown in ⑤.
如上所述，如果电磁铁模块620的铁芯621的极性每隔预定的时间段连续地改变，则托盘100向前运动。相反，铁芯621的极性被相反地磁化，托盘100向后运动。换言之，对于向前运动的托盘100，可通过相反地磁化电磁铁模块620的铁芯621而使托盘100减速。As described above, if the polarity of the iron core 621 of the electromagnet module 620 is continuously changed every predetermined period of time, the tray 100 moves forward. On the contrary, the polarity of the iron core 621 is reversely magnetized, and the tray 100 moves backward. In other words, for the tray 100 moving forward, the tray 100 may be decelerated by magnetizing the iron core 621 of the electromagnet module 620 oppositely.
因此，在根据本发明实例性实施例的用于传送基板的装置中，可通过非接触方法而使托盘100加速及减速，从而可防止异物产生，并可防止驱动滚轮220与托盘下部轨道210之间的滑动，进而更快地执行加速/减速并利于对托盘100的传送及排列。Therefore, in the apparatus for transferring substrates according to an exemplary embodiment of the present invention, the tray 100 can be accelerated and decelerated by a non-contact method, thereby preventing the generation of foreign matter and preventing the contact between the driving roller 220 and the tray lower rail 210. sliding between them, so as to perform acceleration/deceleration faster and facilitate the transfer and arrangement of the tray 100.
虽然已参照本发明的各实例性实施例而具体地显示及阐述了本发明的概念，然而，应理解，可在不脱离随附权利要求书的精神及范围的条件下对其在形式及细节上作出各种改变。While the concepts of the present invention have been particularly shown and described with reference to various exemplary embodiments of the invention, it should be understood that changes may be made in form and detail without departing from the spirit and scope of the appended claims. make various changes.
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020110065153AKR101310762B1 (en) | 2011-06-30 | 2011-06-30 | Apparatus for transferring substrates |
| KR10-2011-0065153 | 2011-06-30 | ||
| KR10-2011-0069438 | 2011-07-13 | ||
| KR1020110069438AKR101318173B1 (en) | 2011-07-13 | 2011-07-13 | Apparatus for transferring substrates |
| Publication Number | Publication Date |
|---|---|
| CN102849462A CN102849462A (en) | 2013-01-02 |
| CN102849462Btrue CN102849462B (en) | 2015-04-15 |
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210224161.XAExpired - Fee RelatedCN102849462B (en) | 2011-06-30 | 2012-06-29 | Device used for conveying substrate |
| Country | Link |
|---|---|
| CN (1) | CN102849462B (en) |
| TW (1) | TWI476139B (en) |
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| CN109422079B (en)* | 2017-08-28 | 2021-05-07 | 台达电子工业股份有限公司 | Conveyor system |
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| JP7471239B2 (en)* | 2019-01-24 | 2024-04-19 | 株式会社カネカ | Substrate tray for manufacturing solar cells and method for manufacturing solar cells |
| KR102046433B1 (en)* | 2019-07-29 | 2019-12-05 | 비앤에스(주) | A Roller unit having Traveling and Guide function and Pallet Transport System Using the same |
| CN112452776A (en)* | 2020-11-16 | 2021-03-09 | 史洪扬 | Commodity circulation sorting machine permanent magnetism crawler-type bottom surface drive mechanism and commodity circulation sorting machine |
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| CN1676445A (en)* | 2004-03-31 | 2005-10-05 | 安内华株式会社 | Substrate transfer device |
| CN1810608A (en)* | 2005-01-26 | 2006-08-02 | 三发机电有限公司 | Substrate transferring apparatus |
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| KR101288599B1 (en)* | 2007-05-29 | 2013-07-22 | 엘지디스플레이 주식회사 | Apparatus for transferring substrates |
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| CN1676445A (en)* | 2004-03-31 | 2005-10-05 | 安内华株式会社 | Substrate transfer device |
| CN1810608A (en)* | 2005-01-26 | 2006-08-02 | 三发机电有限公司 | Substrate transferring apparatus |
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| TW201300303A (en) | 2013-01-01 |
| TWI476139B (en) | 2015-03-11 |
| CN102849462A (en) | 2013-01-02 |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | Granted publication date:20150415 Termination date:20200629 | |
| CF01 | Termination of patent right due to non-payment of annual fee |