Off-line can steel low radiation coated glass and manufacture method thereofTechnical field
The present invention relates to a kind of glass and manufacture method thereof, particularly a kind of off-line can steel low radiation coated glass and manufacture method thereof.
Background technology
Existing common off-line low radiation coated glass adopts other material due to the configuration of film system, and rete weather resisteant, resistance to acids and bases are all poor, and rete matter is soft, is easily oxidized, and are difficult to realize strange land processing.Off-line can steel low radiation coated glass, adopts silicon nitride Si3n4rete is as protective layer, and it has very low diffusion coefficient to oxygen, has good stability, and pinhold density is very low.The silicon nitride film layer of magnetron sputtering deposition is fine and close, smooth and hardness is very high, has very strong blocking capability to mobile ion, is not oxidized, has good corrosion stability 1200 DEG C time, so, use Si3n4rete can the top layer diaphragm of steel low radiation coated glass as off-line, and realizing off-line can the resistant to elevated temperatures performance of steel low radiation coated glass, thus realizes the following process such as cutting, edging, tempering, hollow in long-range strange land.
Summary of the invention
The object of the invention is the deficiency can not heat-treated to overcome common off-line low radiation coated glass, a kind of enough very strong obstruct infrared rays are provided, have good insulative effectiveness, the off-line that simultaneously also can realize the follow-up deep processing of strange landization can steel low radiation coated glass and manufacture method thereof.
Object of the present invention is achieved through the following technical solutions: a kind of off-line can steel low radiation coated glass, and comprise glass substrate, glass substrate is provided with and is provided with silicon nitride Si successively3n4, metal nickel chromium triangle NiCr, argent Ag, metal nickel chromium triangle NiCr, silicon nitride Si3n4.The thickness of glass substrate is 3mm ~ 15mm, silicon nitride Si3n4thickness be 35nm ~ 45nm, the thickness of metal nickel chromium triangle NiCr is 1.5 ~ 2.5nm, and the thickness of argent Ag is 6 ~ 10nm, and the thickness of metal nickel chromium triangle NiCr is 2 ~ 2.5nm, silicon nitride Si3n4thickness be 55 ~ 65nm.
Further improvement of the present invention is: the thickness of glass substrate is 3mm ~ 15mm, silicon nitride Si3n4thickness be 37nm, the thickness of metal nickel chromium triangle NiCr is 1.9nm, and the thickness of argent Ag is 8nm, and the thickness of metal nickel chromium triangle NiCr is 2.1nm, silicon nitride Si3n4thickness be 57nm.
Off-line can the preparation method of steel low radiation coated glass, comprises the following steps:
A: select 3 ~ 15mm glass substrate, by preliminary dimension cutting, cleans sheet glass with cleaning machine;
B: the base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10 3Pa, linear velocity is set to 3.5 ms/min;
C: glass substrate is sent into coating chamber, the power setting gradually the first high vacuum magnetic-controlled sputtering coating equipment is 49KW ~ 60KW, sputters the silicon nitride Si3N4 of ground floor 35nm ~ 45nm on a glass substrate;
D: the power arranging the second high vacuum magnetic-controlled sputtering coating equipment is 0.5KW ~ 0.75KW, sputters the metal nickel chromium triangle NiCr of second layer 1.5nm ~ 2.5nm on a glass substrate;
E: the power arranging third high vacuum magnetron sputtering coating film equipment is 2.1KW ~ 3.2KW, sputters the argent Ag of third layer 6nm ~ 10nm on a glass substrate;
F: the power arranging the 4th high vacuum magnetic-controlled sputtering coating equipment is 0.6KW ~ 0.80KW, sputters the metal nickel chromium triangle NiCr of the 4th layer of 2nm ~ 2.5nm on a glass substrate;
G: the power arranging the 5th high vacuum magnetic-controlled sputtering coating equipment is 77KW ~ 85KW, sputters the silicon nitride Si3N4 of layer 5 55nm ~ 65nm on a glass substrate.
Further improvement of the present invention is:
In described steps A, the thickness of glass substrate is 6mm;
In described step C, the power arranging the first high vacuum magnetic-controlled sputtering coating equipment is 52KW, sputters the silicon nitride Si of ground floor 37nm on a glass substrate3n4;
In described step D, the power arranging the second high vacuum magnetic-controlled sputtering coating equipment is 0.63KW, sputters the metal nickel chromium triangle NiCr of second layer 1.9nm on a glass substrate;
In described step e, the power arranging third high vacuum magnetron sputtering coating film equipment is 2.8KW, sputters the argent Ag of third layer 8nm on a glass substrate;
In described step F, the power arranging the 4th high vacuum magnetic-controlled sputtering coating equipment is 0.69KW, sputters the metal nickel chromium triangle NiCr of the 4th layer of 2.1nm on a glass substrate;
In described step G, the power arranging the 5th high vacuum magnetic-controlled sputtering coating equipment is 80KW, sputters the silicon nitride Si of layer 5 57nm on a glass substrate3n4.
The present invention compared with prior art has the following advantages: off-line the top layer of steel low radiation coated glass can adopt the very low silicon nitride Si of diffusion coefficient3n4as protective layer; rete can be made to heat-treat in annealing furnace and not make rete destroy; and maintain original thermal property; also carried out tempering process by former simultaneously; and the off-line produced can steel low radiation coated glass can be very strong obstruct infrared ray, there is good insulative effectiveness, simultaneously also can realize the follow-up deep processing of strange landization.
detailed description of the invention:
in order to deepen the understanding to invention, below in conjunction with embodiment, the invention will be further described, and this embodiment only for explaining the present invention, does not form limiting the scope of the present invention.
Off-line of the present invention can a kind of embodiment of steel low radiation coated glass be: off-line can steel low radiation coated glass be the silicon nitride Si being provided with 35nm ~ 45nm on the glass substrate of 3mm ~ 15mm successively3n4, the metal nickel chromium triangle NiCr of 1.5 ~ 2.5nm, the metal nickel chromium triangle NiCr of the argent Ag of 6 ~ 10nm, 2 ~ 2.5nm, the silicon nitride Si of 55 ~ 65nm3n4, wherein said silicon nitride Si3n4optimum thickness be 37nm, the optimum thickness of described metal nickel chromium triangle NiCr is 1.9nm, and the optimum thickness of described argent Ag is 8nm, and the optimum thickness of described metal nickel chromium triangle NiCr is 2.1nm, described silicon nitride Si3n4optimum thickness be 57nm.
Off-line can the preparation method of steel low radiation coated glass, comprises the following steps:
A: select 3 ~ 15mm glass substrate, by preliminary dimension cutting, cleans sheet glass with cleaning machine;
B: the base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10 3Pa, linear velocity is set to 3.5 ms/min;
C: glass substrate is sent into coating chamber, the power setting gradually the first high vacuum magnetic-controlled sputtering coating equipment is 49KW ~ 60KW, sputters the silicon nitride Si of ground floor 35nm ~ 45nm on a glass substrate3n4;
D: the power arranging the second high vacuum magnetic-controlled sputtering coating equipment is 0.5KW ~ 0.75KW, sputters the metal nickel chromium triangle NiCr of second layer 1.5nm ~ 2.5nm on a glass substrate;
E: the power arranging third high vacuum magnetron sputtering coating film equipment is 2.1KW ~ 3.2KW, sputters the argent Ag of third layer 6nm ~ 10nm on a glass substrate;
F: the power arranging the 4th high vacuum magnetic-controlled sputtering coating equipment is 0.6KW ~ 0.80KW, sputters the metal nickel chromium triangle NiCr of the 4th layer of 2nm ~ 2.5nm on a glass substrate;
G: the power arranging the 5th high vacuum magnetic-controlled sputtering coating equipment is 77KW ~ 85KW, sputters the silicon nitride Si of layer 5 55nm ~ 65nm on a glass substrate3n4;
The present invention has on the basis of the low-E and low heat transfer performance that realize rete, can realize the advantage can carrying out the deep processings such as strange land heat treatment simultaneously.
Embodiment 1:
In both-end off-line high vacuum magnetic-controlled sputtering coating equipment, make its base vacuum reach 10 3Pa, when linear velocity is 3.5 ms/min, 6mm glass substrate sputters successively: the silicon nitride Si of 37nm3n4, the metal nickel chromium triangle NiCr of 1.9nm, the metal nickel chromium triangle NiCr of the argent Ag of 8nm, 2.1nm, the silicon nitride Si of 57nm3n4.
Off-line the top layer of steel low radiation coated glass can adopt the very low silicon nitride Si of diffusion coefficient3n4as protective layer; rete can be made to heat-treat in annealing furnace and not make rete destroy; and maintain original thermal property; also carried out tempering process by former simultaneously; and the off-line produced can steel low radiation coated glass can be very strong obstruct infrared ray, there is good insulative effectiveness, simultaneously also can realize the follow-up deep processing of strange landization.