CN102343631A - Brittle material chamfering method and device thereof - Google Patents

Abstract

The invention relates to a brittle material chamfering method and a device thereof. The chamfering device (1) comprises a chamfering unit (5) used for chamfering the end face (2A) of plate-shaped brittle material (2); and a moving unit (6) used for moving the chamfering unit (5). When the square brittle material (2) is moved onto an adsorption table (3), a housing (7) is moved forward by the moving unit (6) and the end face (2A) of plate-shaped brittle material (2) is inserted into the receiving part (7B) of the housing (7). In the above situation, the negative pressure is introduced into a negative pressure chamber (7A) and the voltage is applied to electrodes (11A, 11B), so that the glowing discharge is generated to heat the end face (2A). In this state, since the housing (7) is moved along the end face (2A), the whole areas of the upper edge (2C) and the lower edge (2E) of the end face (2A) are melted and chamfered. The chamfering device (1) is simpler than conventional chamfering devices.

Description

The chamfering method of fragile material and device thereof

Technical field

The present invention relates to the chamfering method and the device thereof of fragile material, more detailed, about the chamfering method and the device thereof of the fragile material that the edge part in the tabular fragile material carried out chamfering.

Background technology

The glass substrate used of LCD for example in the past with large-sized plate glass mother metal cutting and trim into the square of required size, is planted the cutter sweep of fragile material at this point, and for example known have a patent documentation 1.Through the glass plate that this cutter sweep cut, because of the edge part of its cut surface produces small scar etc. is arranged, begin to extend from this scar so have the crack.So, proposed in the prior art after fragile material is cut into required form, the edge part of the cut surface of this fragile material is carried out the device (forexample patent documentation 2～patent documentation 4) of chamfering.

In the facing attachment ofpatent documentation 2, while use grinder to supply with the end face of lapping liquid grinding glass substrate and lower edge portion on it, thus carry out the chamfering of edge part.

In the facing attachment ofpatent documentation 3, each edge part through becoming tetragonal end face to the vertical section successively is by the limit illuminating laser beam, thereby the last lower edge portion at 4 places melted and with its chamfering.

And, in the facing attachment of patent documentation 4, for the end face of glass substrate from it upper/lower positions apply the heat energy that produces by arc discharge so that the last lower edge portion fusing in the end face becomes slyness, thereby carry out chamfering.

[prior art document]

[patent documentation]

[patent documentation 1] TOHKEMY 2008-115031 communique

No. 3074145 communique of [patent documentation 2] Japan Patent

No. 3823108 communique of [patent documentation 3] Japan Patent

[patent documentation 4] TOHKEMY 2009-234856 communique

Summary of the invention

Invention needs the problem of solution

In addition, above-mentioned existing facing attachment is pointed out following shortcoming.Promptly; In the device ofpatent documentation 2 because while supplying with lapping liquid face machined flat and edge part thereof; So must being set, the matting of lapping liquid and grounds travel and the drying of cleaning fluid remove operation behind grinding step, and then the problem that has tediously longization of production line and equipment cost to increase.

Again, in the device ofpatent documentation 3, because successively laser beam is shone each edge part of process object and,, and have the huge problem of cost that is used to be provided with equipment such as laser oscillator so have the low problem of disposal ability with its chamfering.

Moreover in the device of patent documentation 4, the heat energy during arc discharge is up to thousands of degree, but generally about 700 degree, begins fusing as the glass of process object.Therefore, in the patent documentation 4, be difficult to set and utilize arc discharge to make glass be in the processing conditions of best molten state.But also, change the problem that frequency is high, equipment cost is high so have electrode because the consumption of electrode that arc discharge is used is very big.

The mode of dealing with problems

In view of the above problems; First technical scheme of the present invention provides a kind of chamfering method of fragile material, and the heat of utilizing glow discharge to produce to the end face of tabular fragile material heats; Make the edge part heating, fusing of fragile material end face and carry out chamfering, it is characterized in that:

Utilizing under the state of housing coating as the end face of the fragile material of chamfering object; Make and be in negative pressure in the housing and the pair of electrodes in this housing applies voltage; End face so that produce glow discharge between this electrode to the fragile material that is positioned at housing heats; Said electrode and fragile material are relatively moved along the length direction of the end face of said fragile material, heat, melt the edge part of this fragile material end face and give chamfering.

Again, second technical scheme of the present invention provides a kind of facing attachment of fragile material, it is characterized in that, comprises: housing coats the end face of fragile material; Negative pressure chamber is formed in this housing; Negative pressure source imports this negative pressure chamber with negative pressure; Pair of electrodes is disposed in the said negative pressure chamber; Power supply applies voltage to this pair of electrodes; And mobile unit, said pair of electrodes and fragile material are relatively moved;

Utilize this housing to coat the end face of said fragile material; And make between the pair of electrodes of end face in negative pressure chamber as the fragile material of chamfering object; Under this state; Make the negative pressure chamber of said housing be in negative pressure, and apply voltage and make and produce glow discharge between electrode to pair of electrodes from said power supply, the heat that produces through this glow discharge heats the end face of fragile material; And utilize said mobile unit that said pair of electrodes and fragile material are relatively moved along the length direction of end face, thereby the edge part of heating, fusing fragile material end face and give chamfering.

The effect of invention

According to above-mentioned formation, the formation that has than more brief in the past can be provided, and the chamfering method of the fragile material of high treatment efficiency and device thereof.

Description of drawings

Fig. 1 representes the approximate vertical view of one embodiment of the invention.

Fig. 2 is that face is looked on the right side of the pith of Fig. 1.

Fig. 3 does, along the pith amplification view of the III-III line of Fig. 1.

Fig. 4 is the pith enlarged drawing of Fig. 3.

Fig. 5 does, becomes the stereogram of fragile material of the process object of facing attachment shown in Figure 1.

Fig. 6 is that the pith longitudinal section of fragile material shown in Figure 4 is before Fig. 6 (a) expression chamfering, after Fig. 6 (b) expression chamfering.

The front view of the pith of Fig. 7 presentation graphs 1.

Fig. 8 is the vertical view of Fig. 7.

Fig. 9 representes when fragile material during with the fragile material chamfering and the position between each sealing plate relation through facing attachment shown in Figure 1, before Fig. 9 (a) expression chamfering is about to begin; When Fig. 9 (b) expression chamfering begins; In the operation of Fig. 9 (c) expression chamfering; When Fig. 9 (d) expression chamfering finishes.

[primary clustering symbol description]

1 facing attachment

2 fragile materials

The 2A end face

2C upper edge (edge part)

2E lower edge portion (edge part)

5 chamfering unit

6 move the unit

7 housings

7A negative pressure chamber

The 7B resettlement section

8 negative pressure sources

11A, 11B electrode

The specific embodiment

The optimal morphology that carries out an invention

Following according to illustrated embodiment explanation the present invention, among Fig. 1 to Fig. 3,1 is the facing attachment that the edge part in the tabularfragile material 2 is given chamfering.

At thisfragile material 2 as the process object of facing attachment 1 is described at first.As shown in Figure 5;Fragile material 2 as the process object of facing attachment 1 does; Specific thickness be foursquare liquid-crystalline glasses plate, this liquid-crystalline glasses plate isfragile material 2 cuts into given size from the liquid-crystalline glasses mother metal through the laser cutting device of not shown preposition operation a square.So in preposition operation, being laser-cut into foursquarefragile material 2 moves on the absorptive table 3 of facing attachment 1 through not shown mechanical hand or operator's direction that arrow is represented from Fig. 1.

So in preposition operation through thefragile material 2 of cut, the cut surface when itsend face 2A as four limits becomes cut.Therefore, the boundary portion between theupper surface 2B offragile material 2 and each theend face 2A is that the vertical section of upper edge 2C becomes the right angle, and the boundary portion between lower surface 2D and each theend face 2A is that the vertical section oflower edge portion 2E becomes right angle (Fig. 6 (a) with reference to).Moreover, the angle of thebight 2F offragile material 2, that is adjacent bothends face 2A, the horizontal profile of the 2G of longitudinal edge portion that becomes the boundary portion of 2A becomes the right angle.

So; The facing attachment 1 of present embodiment; Through being that upper edge 2C,lower edge portion 2E and the 2G of longitudinal edge portion heat, melt to the edge part of 1end face 2A among thefragile material 2 with the heat of glow discharge; Thereby make the glass of liquidation become circle, and give chamfering (Fig. 6 (a), Fig. 6 (b) reference) because of surface tension.Section before Fig. 6 (a) expression chamfering, the section after Fig. 6 (b) expression chamfering.Among the present embodiment, be envisioned for about 1mm, and imagination is through 1 couple of upper edge 2C of facing attachment,lower edge portion 2E and the 2G of the longitudinal edge portion circular-arc chamfering of carrying out about with radius 10～50 μ m as the thickness of thefragile material 2 of process object.

And among Fig. 1 to Fig. 4, the facing attachment 1 of present embodiment comprises: foursquare absorptive table 3, and absorption is also supported above-mentionedfragile material 2 with the mode of level; Amount to four base for supporting 4A～4D, be configured in the position in its adjacent outside along fourlimit 3A of this absorptive table 3; Fourchamfering unit 5, it is last to be disposed at each base for supporting 4A～4D, heatingfragile material 2 and upper edge 2C etc. is carried out chamfering; Moveunit 6, be arranged on eachchamfering unit 5 and its length direction along eachend face 2A offragile material 2 is moved;Negative pressure source 8 imports negative pressure in thehousing 7 of above-mentioned eachchamfering unit 5;AC power 12, a pair of electrode 11A, the 11B up and down in the housing that is configured in each chamfering unit 57 applies voltage; Andcontrol device 13, the action of control above-mentionedchamfering unit 5, movingunit 6,negative pressure source 8 andAC power 12.

Absorptive table 3 flatly is disposed on the platform base 14, and two parallel limits become parallel with the directions X of horizontal plane in the absorptive table 3, and on the other hand, all the other two parallel limits become parallel with the Y direction that is orthogonal to above-mentioned directions X in the absorptive table 3.Base for supporting 4A, 4C and the directions X of the adjacent outer fix of absorptive table 3 dispose abreast, and all the other base for supporting 4B, 4D and Y direction dispose abreast.

The inside of absorptive table 3 is formed with not shown negative pressure path, and it is most that the front difference of this negative pressure path becomes, and the leading section of this difference is to the upper surface open of absorptive table 3.After foursquarefragile material 2 moved into the upper surface of absorptive table 3, via not shown conduit negative pressure is imported the negative pressure path of absorptive table 3 fromnegative pressure source 8, sofragile material 2 is adsorbed the upper surface that remains on absorptive table 3 through negative pressure.In the present embodiment,fragile material 2 is with level location and be supported on the absorptive table 3, makes that parallel twoend face 2A, the 2A offragile material 2 are parallel with directions X, and remaining twoend face 2A, 2A are parallel with the Y direction.

To shown in Figure 3,,, become the state more outstanding like Fig. 1 than fourlimit 3A of absorptive table 3 so four limits offragile material 2 are eachend face 2A and adjacent inside part thereof because absorption remains onfragile material 2 on the absorptive table 3 greater than the area of absorptive table 3.In the present embodiment; Utilize eachend face 2A of thefragile material 2 that thehousing 7 of eachchamfering unit 5 will be so does well toward absorptive table 3 evaginations and adjacent to theupper surface 2B and lower surface 2D coating at this place; Under this state; Between two electrode 11A, 11B, produce glow discharge andheat end face 2A, and moveunit 6 through each eachchamfering unit 5 is moved synchronously and along the length direction of each end face 2A.Thus, the region-wide and 2G of longitudinal edge portion utilizes the heat of glow discharge and heats, melts with the length direction of the upper edge 2C of eachend face 2A,lower edge portion 2E, thereby its chamfering is become the section semicircle shape.

The characteristic of thechamfering unit 5 of present embodiment is different with aforesaid existing arc discharge, through than its more the glow discharge of low temperature make eachend face 2A heating, fusing and with its chamfering.

That is, to shown in Figure 4,chamfering unit 5 comprises:housing 7 forms the square shape, and is moved in the XY of horizontal plane direction and vertical direction bymobile unit 6 like Fig. 3; A pair of up and down electrode 11A, 11B are disposed in the 7A of negative pressure chamber in thishousing 7.

Inhousing 7 with absorptive table 3 sidewall 7C in opposite directions and the two adjacent sidewalls that are adjacent (with sidewall) as the length direction quadrature of theend face 2A of thefragile material 2 of chamfering object, in short transverse central authorities, be formed with the resettlement section 7B of the same and level of the degree of depth.Resettlement section 7B is formed, and also as the adjacent sidewall upper shed of above-mentioned sidewall 7C two, and links to each other with 7A of negative pressure chamber in the housing 7.The above-below direction size of resettlement section 7B (going up the interval of lower wall surface 7Ba, 7Bb) is set the size of the thickness that is a bit larger thamfragile material 2 for.Therefore, can be from horizontal direction theend face 2A offragile material 2 be inserted withupper surface 2B that is adjacent to this and lower surface 2D in the above-mentioned resettlement section 7B of side direction of the sidewall 7C fromhousing 7 and two adjacent sidewalls thereof, or extract from horizontal direction.And; When theend face 2A offragile material 2 is inserted in the 7B of resettlement section; Between the upper/lower electrode 11A ofend face 2A in the 7A of negative pressure chamber, the 11B, and through under this state, voltage being put on two electrode 11A, 11B, makeend face 2A receive the heat that glow discharge produces and be heated (with reference to Fig. 4).

Inhousing 7 near the position of sidewall 7C; Be formed with the firstnegative pressure path 15 of the vertical direction of the last lower wall surface 7Ba that is opened on resettlement section 7B, 7Bb; And, the above-mentioned firstnegative pressure path 15 inhousing 7 and the centre position of the 7A of negative pressure chamber also be formed be opened on resettlement section 7B on the secondnegative pressure path 16 of lower wall surface 7Ba, 7Bb.The firstnegative pressure path 15 and the secondnegative pressure path 16 are connected in above-mentionednegative pressure source 8 viaconduit 17.

As shown in Figure 4, be inserted into from the side in the 7B of resettlement section at theend face 2A offragile material 2 and be positioned under the state of the 7A of negative pressure chamber, theupper surface 2B offragile material 2 and lower surface 2D are near last lower wall surface 7Ba, the 7Bb of resettlement section 7B.Under this state; The not shown electromagnetic switch valve of being located atconduit 17 is controlled the instruction ofdevice 13 and when opening, via the gap of theupper surface 2B of last lower wall surface 7Ba, 7Bb and thefragile material 2 ofconduit 17 and twonegative pressure paths 15,16 and resettlement section 7B and lower surface 2D and negative pressure is imported the 7A of negative pressure chamber.Thus,, present embodiment reduces pressure about 10torr in making the 7A of negative pressure chamber.

At lower wall surface 7Ba between the front end opening of the firstnegative pressure path 15 and the 7A of negative pressure chamber, 7Bb, be formed with the 7Bc of labyrinth seal portion that constitutes by many ditches parallel with sidewall 7C.The 7Bc of this labyrinth seal portion has when via twonegative pressure paths 15,16 negative pressure being imported the 7A of negative pressure chamber as previously mentioned, suppress negative pressure in the 7A of negative pressure chamber via resettlement section 7B toward the function ofhousing 7 external leaks.

Again, the adjoining position expansion slowly up to last lower wall surface 7Ba sidewall 7C, resettlement section 7B, both intervals of 7Bb from the firstnegative pressure path 15 has formed expansion section 7Bd (with reference to Fig. 4) at interval.

At this; As shown in Figure 4; Under the state infragile material 2 is inserted into resettlement section 7B, when above-mentioned twonegative pressure paths 15,16 import negative pressure the 7A of negative pressure chamber and carry out chamfering, sometimes because certain former for example causefragile material 2 forhousing 7 toward the position deviations of top relatively.At this moment, because approaching electrode 11A,lower edge portion 2E and electrode 11B branch, opens the upper edge 2C of theend face 2A offragile material 2, so on top the 2C of edge portion is different withlower edge portion 2E for the chamfering state, so do not reach requirement.

But; Through above-mentioned interval expansion section 7Bd is set; 7Bd imports towards the inside of housing 7 from this expansion section, interval to make extraneous gas; So the spatial portion between expansion section, the interval 7Bd of the upper surface 2B of fragile material 2 and top becomes relative normal pressure, and the spatial portion between expansion section, the interval 7Bd of the lower surface 2D of fragile material 2 and below becomes relative negative pressure.Its result eliminates the pressure differential of above-mentioned two spatial portions because produced external force so that fragile material 2 and housing 7 move, so the vertical-direction length of above-mentioned two spatial portions is equated.That is, in chamfering, depart from even how many relative positions between fragile material 2 and the housing 7 has up and down; Also can be through the effect of above-mentioned interval expansion section 7Bd; Make fragile material 2 be positioned at the roughly centre position of the vertical direction of resettlement section 7B, its result can obtain to stablize the effect of chamfer machining.In other words; Even depart from because how many relative positions between fragile material 2 and the housing 7 has up and down; Also correction position skew through the effect of above-mentioned interval expansion section 7Bd; So the height setting of resettlement section 7B when stating Z pillow block 33 after utilizing and carrying out chamfer machining, housing 7, if make fragile material 2 be positioned at this resettlement section 7B vertical direction cause the centre position.

The 7A of negative pressure chamber ofhousing 7 and sidewall 7C are arranged onhousing 7 inside abreast, and are provided with upper/lower electrode 11A, 11B in opposite directions on the length direction middle position parallel with sidewall 7C in the 7A of this negative pressure chamber.And the 7A of negative pressure chamber is connected because the resettlement section 7B of the two adjacent sidewall settings of the above-mentioned sidewall 7C in edge is set to therewith, so theend face 2A offragile material 2 can be under the state in being inserted into resettlement section 7B between above-mentioned electrode 11A and 11B.

Each electrode 11A, 11B form the roller shape, and its axial region interlocking has the end of columned shaft component 21A, 21B.Again, at a pair of stepped through hole 7E, the 7E up and down that run through along horizontal direction on the housing 7 till being provided with the sidewall 7D that extends through the back side from the 7A of negative pressure chamber.And above-mentioned shaft component 21A, 21B are supported on these stepped through hole 7E, 7E through lining 22,22 with airtight conditions and free rotation mode axle.Thus, two electrode 11A, 11B the axle center is maintained at horizontal state and with opposed at upper-lower position and in the 7A of negative pressure chamber rotatable mode supported.Two electrode 11A, 11B and shaft component 21A, 21B are made up of electric conductor; And via with the slip ring 23A that is located at shaft component 21A, 21B, 23B, also have brush 24A, 24B, electric wire 25A, 25B and not shown capacitor that it contacted, and be electrically connected on above-mentioned AC power 12.In addition, this not shown capacitor uses to above-mentioned electrode 11A, 11B circulation 1 * 10^-5To 1 * 10^-2The static capacity of A left and right sides electric current.Supply to the electric current of electrode 11A, 11B through restriction like this, and can make the glow discharge that results between two electrode 11A, the 11B become so-called standard glow discharge, and prevent toward arc discharge to change, supply with stable heat energy and carry out the chamfering operation.

Negative pressure is being imported under the state in the 7A of negative pressure chamber fromnegative pressure source 8, according to from the instruction ofcontrol device 13 and fromAC power 12 when the capacitor of icon does not put on two electrode 11A, 11B with voltage, produce glow discharge between two electrode 11A, the 11B.About about 700 ℃～800 ℃ of the temperature of the glow discharge that produces across two electrode 11A, 11B, and the heat energy that produces through this glow discharge isend face 2A heating, and make upper edge 2C,lower edge portion 2E and the 2G of longitudinal edge portion fusing.

Moreoverhousing 7 runs through and is provided with big footpath hole 7F, and continuously and in the sidewall 7D at back side opening, the peristome of the sidewall 7D side of this big footpath hole 7F was usedtransparent glass plate 26 and to keep airtight state to be closed to this big footpath hole 7F from the above-mentioned 7A of negative pressure chamber.The inner space of this big footpath hole 7F constitutes the part of the 7A of negative pressure chamber.

As previously mentioned, when voltage was put on above-mentioned a pair of electrode 11A, 11B, whether the operator can have glow discharge to produce between the two fromhousing 7 visual observations across transparent glass plate 26.Again, the operator can be across the consumption situation of observing discharge place of both sides' electrode 11A, 11B as the above-mentionedglass plate 26 of observation window.The operator judges when the consumption of discharge place of two electrode 11A, 11B is violent, makes two electrode 11A, 11B rotate the required anglec of rotation through above-mentioned twoshaft component 21A, 21B.Thus, the part of not using among two electrode 11A, the 11B is positioned at discharge place toward each other.

Chamfering unit 5 constitutes in the above-described manner, and fourchamfering unit 5 that facing attachment 1 is comprised all constitute with the same manner, andcontrol device 13 makes fourchamfering unit 5 andmoves unit 6 synchronization actions.

Secondlyunit 6 is moved in explanation, and it makeschamfering unit 5 move along theend face 2A of fragile material 2.Because be disposed at eachchamfering unit 5 fourmobile unit 6 constitute identical formation, so themobile unit 6 on the base for supporting 4A is described.To shown in Figure 3, moveunit 6 and comprise:X pillow block 28 is supported on the base for supporting 4A through a pair of directions X slide rail 27,27 like Fig. 2; Y pillow block 32 is supported on theX pillow block 28 through a pair of Y direction slide rail 31,31; And Z pillow block 33, be supported on the Y pillow block 32 and support above-mentionedchamfering unit 5.

Directions X slide rail 27,27 is disposed on thebase 4A along directions X, and a pair of slide block 28A, the 28A ofX pillow block 28 are sticked in directions X slide rail 27,27 with the mode that is free to slide.Dispose the X axle ball screw of icon not on two slide rails 27, the base for supporting 4A between 27 and make the X axle motor of its positive and negative rotation, and be fixed with the nut member that is screwed with above-mentioned X axle ball screw at the lower surface of X pillow block 28.Thus, whencontrol device 13 makes the positive and negative rotation of X axle motor,X pillow block 28 and can be along directions X by thechamfering unit 5 of its support, promptly move on one side (length direction ofend face 2A) offragile material 2 on the absorptive table 3.

Secondly, Y direction slide rail 31,31 is disposed on theX pillow block 28 along the Y direction, and pair of right and left slide block 32A, the 32A of Y pillow block 32 are sticked in Y direction slide rail 31,31 with the mode that is free to slide.Dispose the Y axle ball screw of icon not on two slide rails 31, theX pillow block 28 between 31 and make the Y axle motor of its positive and negative rotation, and be fixed with the nut member that is screwed with above-mentioned Y axle ball screw at the lower surface of Y pillow block 32.Therefore, whencontrol device 13 makes the positive and negative rotation of Y axle motor, Y pillow block 32 and can be in the Y direction by thechamfering unit 5 of its support, promptly with absorptive table 3 onfragile material 2 near or the direction of separating move.

Secondly, Z pillow block 33 is the up-down aequum through up-down actuator 33A, utilizescontrol device 13 to make up-down actuator 33A action, can make Z pillow block 33 and by thechamfering unit 5 up-down aequums of its support.

Movingunit 6 constitutes in the above described manner;Control device 13 is above-mentioned X axle motor, the positive and negative rotation aequum of above-mentioned Y axle motor through making above-mentionedmobile unit 6 and make up-down actuator 33A up-down aequum when needed, thereby chamferingunit 5 is moved and the aequum that goes up and down in the XY direction on support frame 4A.In addition, the formation of above-mentionedmobile unit 6 is originally as prior art.

In the present embodiment; In stage beforefragile material 2 being moved on the absorptive table 3; Shown in Fig. 9 (a), eachchamfering unit 5 does not stop atfragile material 2 and produces absorptive table 3 outer fixs of interfering, and is positioned at the specified altitude position on the extended line of length direction of each end face 2A.That is,chamfering unit 5 stops at the adjacent outer fix of thebight 2F of the fragile material of moving into thereafter 2 in advance through moving unit 6.This stop position is the holding state of each chamfering unit 5.When eachchamfering unit 5 so is positioned at holding state; The 7A of negative pressure chamber ofchamfering unit 5 is positioned on the extended line of length direction of eachend face 2A of the fragile material of moving into thereafter on the absorptive table 32, and the resettlement section 7B of eachchamfering unit 5 is positioned on the height identical with eachend face 2A and adjoiner thereof.

Under the holding state of this eachchamfering unit 5,fragile material 2 is moved into 3 last times of absorptive table;Control device 13moves unit 6 through each moves the length direction thatchamfering unit 5 is eachend face 2A to four limits offragile material 2, andfragile material 2 is relative to the resettlement section 7B that is inserted in parallel each thechamfering unit 5 that moves of equal height (with reference to Fig. 4, Fig. 9 (a), Fig. 9 (b)).Afterwards negative pressure is imported thehousing 7 ofchamfering unit 5, thereafter voltage is put on two electrode 11A, 11B and begin chamfering.

In addition; The upper/lower electrode 11A ofchamfering unit 5,11B are disposed at the length direction central portion of the 7A of negative pressure chamber; Under above-mentioned holding state, do not have any thing and be inserted into 7A of negative pressure chamber and resettlement section 7B, so these several places become the spatial portion of horizontal direction as the front and back of electrode 11A, 11B.Therefore, under this holding state, when twonegative pressure paths 15,16 import in the 7B of resettlement section negative pressure with the 7A of negative pressure chamber, leak via the negative pressure of resettlement section 7B and the 7A of negative pressure chamber and to become violent.This problem makechamfering unit 5 alongend face 2A parallel move and the beginning chamfering after the position of the other end (bight 2F) ofend face 2A before closing to an end to chamfering also identical.

So; Forward beginning during chamfering (operation be about to begin before) in the present embodiment to from holding state in eachchamfering unit 5; And the chamfering operation is carried out and make two electrode 11A, the 11B ofchamfering unit 5 move when the terminal adjoining position ofend face 2A (operation close to an end before), uses to be the foursquare paired first sealingplate 41A and thesecond sealing plate 41B to suppress the negative pressure leakage from the resettlement section 7B and the 7A of negative pressure chamber ofhousing 7.

That is, to shown in Figure 8, the adjacent outer fix in each bight 2F of the fragile material of moving into absorptive table 32 respectively comprises into the first a pair of sealingplate 41A and thesecond sealing plate 41B to the facing attachment 1 of present embodiment like Fig. 7.Thefirst sealing plate 41A is inserted into before chamfering is about to begin in the resettlement section 7B ofhousing 7, and thesecond sealing plate 41B is inserted into before chamfering closes to an end in the resettlement section 7B of housing 7.Thefirst sealing plate 41A and thesecond sealing plate 41B have the thickness equal with fragile material (said equal thickness not only comprises the thickness that physically accurately equates, also comprises the thickness that roughly is equal to) here.

On the directions X sidewall 3B in the bight of absorptive table 3, dispose two-part cylinder 42 toward the outer side, and its piston nose is equipped with thefirst sealing plate 41A across revolvingactuator 43 with the mode that can swing.Again, also dispose two-part cylinder 42 toward the outer side on the Y direction sidewall 3C in the bight of absorptive table 3, the front end of its piston is equipped with thesecond sealing plate 41B across revolvingactuator 43 with the mode that can swing.

Be disposed at each a pair offirst sealing plate 41A in each bight of absorptive table 3, two-part cylinder that thesecond sealing plate 41B uses 42 and revolvingactuator 43, bycontrol device 13 in taking common actions.

That is, thefirst sealing plate 41A under the non-action status and thesecond sealing plate 41B stop at the end position of retreating that descends and hold up to descending towards vertical lower.Thefirst sealing plate 41A that makes non-action status is with the mode shown in the chain-dotted line among Fig. 7, and under this non-action status, each sealingplate 41A, 41B are supported on than the upper surface of absorptive table 3 lower side more.

With respect to this; If move on the absorptive table 3 to being about to begin before the chamfering fromfragile material 2; The two-part cylinder 42 that thefirst sealing plate 41A is used throughcontrol device 13 moves with revolvingactuator 43; Then shown in the solid line of Fig. 7, thefirst sealing plate 41A advances to the end position and supported with the mode of level withfragile material 2 equal heights of advancing.So, thefirst sealing plate 41A advances to when advancing end position, and thisfirst sealing plate 41A receives support (with reference to Fig. 9 (a)) with the height identical with it between the resettlement section 7B of theend face 2A of the fragile material on the absorptive table 32 andchamfering unit 5.

And; After the chamfering operation begins; Andhousing 7 is through behind the 2G of longitudinal edge portion ofbight 2F, andcontrol device 13 makes the two-part cylinder 42 of thefirst sealing plate 41A and revolvingactuator 43 stop action, makes thefirst sealing plate 41A retreat into the end position of retreating originally in the position, inlet side in the past.On the other hand; When operation proceeds to half left and right sides of length direction ofend face 2A after chamfering begins; Because two-part cylinder 42 and revolvingactuator 43 actions that controldevice 13 is used eachsecond sealing plate 41B advance end position and are supported for level so thesecond sealing plate 41B advances to.Thus, thesecond sealing plate 41B with absorptive table 3 onfragile material 2 inbight 2F equal height, and be adjacent the continuous mode of outer fix supported (with reference to Fig. 9 (c)).

The action of the facing attachment 1 that constitutes in the above-described manner is described.

At first, in the stage beforefragile material 2 being moved into absorptive table 3,control device 13 makes eachchamfering unit 5 be positioned at holding state through four mobile unit 6.As previously mentioned, under this holding state, the position (with reference to Fig. 9 (a)) infragile material 2 equal heights that eachchamfering unit 5 stops at and moves into thereafter and the adjacent outside of bight 2F.The 7A of negative pressure chamber ofchamfering unit 5 does not have the negative pressure importing at this moment, and electrode 11A, 11B do not apply voltage.Moreover in this stage, each sealingplate 41A of four jiaos of absorptive table 3,41B is failure to actuate and stop at and retreat end position.

In this state, move into and be supported on the absorptive table 3 through mechanical hand through being laser-cut into foursquare tabularfragile material 2 in the preceding operation.When this is moved into because four groups each sealingplate 41A, 41B retreat into than the upper surface of absorptive table 3 more the below retreat end position, so each sealingplate 41A, 41B can not produce withfragile material 2 and interfere.Again, it is parallel with directions X thatfragile material 2 is positioned at the both sides that make on the absorptive table 3 among its four limits when moving into, and all the other both sides are parallel with the Y direction.Thereafter, because negative pressure is directed into the negative pressure path of absorptive table 3 fromnegative pressure source 8, so former the stating under the state that mode locatees offragile material 2 is adsorbed and remains in absorptive table 3.

After this, becausecontrol device 13 makes the two-part cylinder 42 and revolvingactuator 43 actions of four jiaos first sealing plate, 41 usefulness of absorptive table 3, so each first sealing plate 41 of four jiaos of absorptive table 3 advances to the end position that advances (with reference to Fig. 2, Fig. 9 (a)).

Thus, fourfirst sealing plate 41A flatly are supported between thechamfering unit 5 of eachend face 2A and holding state of fragile material 2.In addition, eachsecond sealing plate 41B still stops at and retreats end position at this moment.

Thereafter;Control device 13 through eachmove unit 6 make eachchamfering unit 5 with the regulation translational speed obtained by experiment in advance towards the 2G of longitudinal edge portion, the same moved further ofend face 2A, and fromnegative pressure source 8 negative pressure is imported the 7A of negative pressure chamber (with reference to Fig. 9 (a)) ofchamfering unit 5.

Thus; At first in the resettlement section 7B and the 7A of negative pressure chamber of thehousing 7 of thefirst sealing plate 41A in being inserted into each thechamfering unit 5 that has moved, the 2G of longitudinal edge portion offragile material 2 and coupledend face 2A are inserted in resettlement section 7B and the 7A of negative pressure chamber (with reference to Fig. 3, Fig. 4) relatively then.So, be inserted with thefirst sealing plate 41A in the resettlement section 7B of thehousing 7 that has moved from holding state, so can make negative pressure leakage rate be suppressed at Min. from resettlement section 7B.

Through after movingunit 6chamfering unit 5 being moved,control device 13 puts on voltage via the capacitor of icon not electrode 11A, the 11B of eachchamfering unit 5 immediately fromAC power 12 so.Thus, produce glow discharge between two electrode 11A in the 7A of negative pressure chamber, the 11B, the electrode 11A under this glow discharge state, 11B are by moving thatunit 6 moves and moving alongend face 2A through the 2G of longitudinal edge portion of thebight 2F of fragile material 2.Thus, the thermic of glow discharge makes the 2G of longitudinal edge portion be heated, melt, and then upper edge 2C, thelower edge portion 2E of theend face 2A of its adjacent position be heated, melt, and makes these several places be chamfered to be the section semicircle shape.So begin to carry out chamfering.In addition, when thelongitudinal edge portion 2G ofhousing 7 throughbight 2F, becausecontrol device 13 stops the two-part cylinder 42 that thefirst sealing plate 41A uses and the action of revolvingactuator 43, so thefirst sealing plate 41A returns to the original end position of retreating.

And; Because have between the electrode 11A in the 7A of negative pressure chamber, 11B under the state of glow discharge generation; Length direction along eachend face 2A offragile material 2 moves through movingunit 6 in eachchamfering unit 5, so upper edge 2C and thelower edge portion 2E chamfering (with reference to Fig. 9 (b), Fig. 9 (c)) of theend face 2A of the position that is coated by the resettlement section 7B ofhousing 7 and the 7A of negative pressure chamber.

And, when chamferingunit 5 when eachend face 2A continues to move and move to the position aboveend face 2A central authorities, two-part cylinder 42 and revolvingactuator 43 actions that controldevice 13 is used the second sealing plate 41B.Thus, shown in Fig. 9 (c), thesecond sealing plate 41B flatly is supported on adjacent outer fix the advance end position continuous with it of eachend face 2A offragile material 2.

Thereafter; All the other parts along the length direction ofend face 2A move becausechamfering unit 5 is through movingunit 6; And continue to have glow discharge to produce from two electrode 11A, 11B, so the region-wide and 2G of longitudinal edge portion of the upper edge 2C of the 2A of end face everywhere among thefragile material 2,lower edge portion 2E receives the heating of hot institute, fusing and the chamfering (with reference to Fig. 9 (d)) of glow discharge.

And in the chamfering unit the 5 chamfering operations carried out is last, because thesecond sealing plate 41B is supported on the adjoining position of thebight 2F offragile material 2, so utilize thechamfering unit 5 that movesunit 6 and move, its resettlement section 7B is inserted with the second sealing plate 41B.Thus, last in the chamfering operation can suppress the situation that the negative pressure of the 7A of negative pressure chamber is leaked via the resettlement section 7B ofchamfering unit 5.

So; In the present embodiment; Four limits offragile material 2 are that eachend face 2A all disposeschamfering unit 5; Eachchamfering unit 5moves unit 6 and moves along eachend face 2A synchronously with fixing speed through each, and along with this moves and with upper edge 2C,lower edge portion 2E and the 2G of the longitudinal edge portion synchronous heating of eachend face 2A, fusing and chamfering becomes semicircle shape.

In addition, in this chamfering operation, the execute-in-place person can see throughglass plate 26 and observe whether produce glow discharge in the chamfering unit 5.And; In repeating between the chamfering operational period; The execute-in-place person can also see through the situation thatglass plate 26 is observed discharge place of electrode 11A, 11B, when the operator judges that the damage of discharge place is violent, will reach theoutside shaft component 21A ofhousing 7 with aequum; Rotate the end of 21B, and then the not use part that makes two electrode 11A, 11B in opposite directions.

So; In the present embodiment,, chamfering make eachfirst sealing plate 41A be positioned at the end position that advances before being about to begin, on the other hand; Even after beginning, retreat into and retreat end position, and make eachsecond sealing plate 41B be positioned at the end position that advances to a half in the chamfering operation with each first sealing plate 41A.Through the stop position of each sealingplate 41A of switching like this, 41B, and can the situation that 7B and the 7A of negative pressure chamber leak negative pressure from the resettlement section in eachchamfering unit 5 be suppressed at Min..

As with upper type, utilize facing attachment 1 to finish the chamfering operation at required place offragile material 2 after,control device 13 retreats up to the original end position of retreating it through two-part cylinder 42 grades that thesecond sealing plate 41B uses.That is, make each sealingplate 41A, 41B be positioned at thus and retreat end position.

Afterwards, stop to import negative pressure, and the fragile material after thechamfering 2 is taken out of from absorptive table 3 through not shown mechanical hand equally during with above-mentioned moving into toward absorptive table 3.At this moment, because each sealingplate 41A, 41B are positioned at and retreat end position, so thefragile material 2 of taking out of can not produce interference with each sealingplate 41A, 41B.

As previously discussed, according to the facing attachment 1 and the chamfering method of present embodiment, can carry out the chamfering that edge part is upper edge 2C,lower edge portion 2E and the 2G of longitudinal edge portion for the fragile material aftercut 2 through brief formation.Therefore, according to present embodiment, the equipment cost of facing attachment 1 is lower than uses setting of arc discharge in the past.Again, present embodiment is because the heat energy that utilizes glow discharge to produce carries out the chamfering offragile material 2, so can be that the fusing offragile material 2 begins near the heating temperature, fusingfragile material 2 and carries out the chamfering at required place at liquid-crystalline glasses.Again, can easily carry out the setting of the fusion temperature offragile material 2 through using glow discharge in the present embodiment, can prevent to locate to produce unnecessary fusing as the upper edge 2C of chamfering object etc.And, according to present embodiment, because can theend face 2A everywhere in the foursquarefragile material 2 be given chamfering synchronously, so can carry out the chamfered of extreme efficiency.

Moreover, use each sealingplate 41A, 41B can keep the reduced pressure atmosphere of the 7A of negative pressure chamber ofhousing 7, can in whole chamfering flow chart process, stably supply with the heat energy due to the glow discharge thus, so can make the chamfering stable accuracy.And, carry out chamfering through utilizing glow discharge, can prevent upper edge 2C,lower edge portion 2E and the 2G of longitudinal edge portion superheated, and then the fusion temperature that utilize to be fit to melts and with its chamfering as the chamfering object.Its result can carry out chamfering with the mode of the semicircle shape about radius 10 μ m～50 μ m according to present embodiment.And, utilize the size about this radius 50 μ m to carry out chamfering, make the residual stress of chamfering object's position (upper edge 2C,lower edge portion 2E) become very little value.Therefore, can suppress well to produce the crack from the chamfering object's position.

In addition, among above-mentioned first embodiment, with four limits of square fragile material 24chamfering unit 5 altogether are set accordingly, but, 1chamfering unit 5 can only be set as second embodiment.Particularly, set the Working position of the single chamfering ofconfiguration unit 5, and be provided with above-mentioned absorptive table 3 is revolved the rotating mechanism that turn 90 degrees at every turn, at first carry out in thefragile material 2 the chamfering operation ofend face 2A on one side in above-mentioned Working position.Thereafter; Be positioned under the state of retreating end position at two sealingplate 41A, 41B; Through above-mentioned rotating mechanism absorptive table 3 is revolved and turn 90 degrees, make theend face 2A on one side of adjoining position be positioned at above-mentioned Working position again, and carry out the chamfering operation through theend face 2A thatchamfering unit 5 will be positioned at this Working position.Below same, as long as through above-mentioned rotating mechanism one by one with absorptive table 3 revolve turn 90 degrees and make successively all the other twoend face 2A be positioned at above-mentioned Working position again throughchamfering unit 5 with its chamfering.

Again; Among above-mentioned first embodiment; Utilize resettlement section 7B coatfragile material 2 oneside end face 2A a part and with this place as the chamfering object, the electrode 11A ofhousing 7,11B are relatively moved along the length direction ofend face 2A, but also can adopt following formation as the 3rd embodiment.That is, can be region-wide as theend face 2A on one side of thefragile material 2 of chamfering object throughhousing 7 coatings, and the inside of the 7A of negative pressure chamber inhousing 7 makes electrode 11A, 11B itself move along the length direction of end face 2A.At this moment, throughmake chamfering unit 5 andfragile material 2 approaching, separate makefragile material 2 insert, break away fromhousing 7 near separating mechanism.In this 3rd embodiment; Becauseadjacent chamfering unit 5 must not produce interference, so as above-mentioned first embodiment, when thechamfering unit 5 to quantity is set on four limits; After theend face 2A on two limits carries out chamfering in opposite directions, carry out chamfering for other two limits.When carrying out chamfering bysingle chamfering unit 5, be necessary equally above-mentioned rotating mechanism to be set at absorptive table 3 like above-mentioned second embodiment again.

Moreover, among above-mentioned each embodiment, squarefragile material 2 flatly carried place absorptive table 3 and carry out the chamfering operation, but, also can keepfragile materials 2 make it uprightly carry out the chamfering operation through absorptive table 3 as the 4th embodiment.In addition; In this 4th embodiment, also can thechamfering unit 5 of respective amount be set on four limits of squarefragile material 2 like above-mentioned first embodiment; Or like above-mentioned second embodiment; Bysingle chamfering unit 5 chamfering is given on all limits, in these situations, as long as with above-mentioned rotating mechanism appropriate combination near separating mechanism or absorptive table 3.

Moreover above-mentioned each embodiment explanation is carried out through being laser-cut into the chamfering of foursquarefragile material 2, but also can the facing attachment 1 of present embodiment be applied to the chamfering of rectangular fragile material 2.Moreover facing attachment 1 also capable of using carries out chamfering for the last lower edge portion through the outer peripheral face that is laser-cut into discoideusfragile material 2, and at this moment, above-mentioned each sealingplate 41A, 41B and nonessential can omit it.Again, each sealingplate 41A, 41B among the foregoing description are also also nonessential, also can it be omitted.

Claims (3)

1. the chamfering method of a fragile material, the heat of utilizing glow discharge to produce to the end face of tabular fragile material heats, and the edge part of the end face of fragile material is heated, melts and give chamfering, it is characterized by:

Utilizing under the state of housing coating as the end face of the fragile material of chamfering object; Make and be in negative pressure in the housing and the pair of electrodes in this housing applies voltage; End face between this electrode, to produce glow discharge to the fragile material that is positioned at housing heats; Said electrode and fragile material are relatively moved along the length direction of the end face of said fragile material, thereby heating, melt the edge part of this fragile material end face and give chamfering.

2. the facing attachment of a fragile material is characterized in that, comprises: housing, the end face of coating fragile material; Negative pressure chamber is formed in this housing; Negative pressure source imports this negative pressure chamber with negative pressure; Pair of electrodes is disposed in the said negative pressure chamber; Power supply applies voltage to this pair of electrodes; And mobile unit, said pair of electrodes and fragile material are relatively moved;

Utilize said housing to coat the end face of said fragile material; And make between the pair of electrodes of end face in negative pressure chamber as the fragile material of chamfering object; Under this state; Make the negative pressure chamber of said housing be in negative pressure, and apply voltage and between this electrode, produce glow discharge to pair of electrodes from said power supply, the heat that produces through this glow discharge heats the end face of fragile material; And utilize said mobile unit that said pair of electrodes and fragile material are relatively moved along the length direction of end face, thereby the edge part of heating, fusing fragile material end face and give chamfering.

3. facing attachment as claimed in claim 2 is characterized in that,

Said fragile material is square glass plate, and is the chamfering object with the end face on the one side in four limits of this glass plate, and this housing comprises the resettlement section, and this resettlement section is used for accommodating as the part of the end face of said chamfering object and with said negative pressure chamber and is connected;

Said mobile unit moves through making said housing, and said pair of electrodes and fragile material are relatively moved along the length direction of end face;

And; When the bight on one side of said glass plate is inserted into the resettlement section of said housing, and insert sealing plate in the resettlement section of housing when the resettlement section breaks away from the bight; Thereby the negative pressure that suppresses the negative pressure chamber in this housing is leaked; Wherein, said sealing plate has the thickness equal with this fragile material, and in abutting connection with the bight that is disposed at as one side of the said glass plate of said chamfering object.

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