AU572375B2 - Transporting of workpiece to and from vacuum coating apparatus - Google Patents

Transporting of workpiece to and from vacuum coating apparatus

Info

Publication number: AU572375B2
Authority: AU; Australia
Prior art keywords: workpiece; transporting; coating apparatus; vacuum coating; vacuum
Prior art date: 1985-01-31
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Inventor

Alex Boozenny

Albany D. Grubb

Walter G. Overacker

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Messer LLC

Original Assignee

BOC Group Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-01-31

Filing date

1986-01-21

Publication date

1988-05-05

1986-01-21Application filed by BOC Group IncfiledCriticalBOC Group Inc

1986-08-28Publication of AU5253786ApublicationCriticalpatent/AU5253786A/en

1988-05-05Application grantedgrantedCritical

1988-05-05Publication of AU572375B2publicationCriticalpatent/AU572375B2/en

2006-01-21Anticipated expirationlegal-statusCritical

StatusCeasedlegal-statusCriticalCurrent

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G5/00—Storing fluids in natural or artificial cavities or chambers in the earth
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Computer Hardware Design (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Chemical Kinetics & Catalysis (AREA)
General Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
Materials Engineering (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Life Sciences & Earth Sciences (AREA)
Environmental & Geological Engineering (AREA)
General Life Sciences & Earth Sciences (AREA)
Geology (AREA)
Physical Vapour Deposition (AREA)

AU52537/86A1985-01-311986-01-21Transporting of workpiece to and from vacuum coating apparatusCeasedAU572375B2 (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US69683685A	1985-01-31	1985-01-31
US696836		1985-01-31

Publications (2)

Publication Number	Publication Date
AU5253786A AU5253786A (en)	1986-08-28
AU572375B2true AU572375B2 (en)	1988-05-05

Family

ID=24798750

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU52537/86ACeasedAU572375B2 (en)	1985-01-31	1986-01-21	Transporting of workpiece to and from vacuum coating apparatus

Country Status (5)

Country	Link
JP (1)	JPS61206722A (en)
KR (1)	KR950003597B1 (en)
AU (1)	AU572375B2 (en)
CA (1)	CA1307759C (en)
GB (1)	GB2171119B (en)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4676884A (en)*	1986-07-23	1987-06-30	The Boc Group, Inc.	Wafer processing machine with evacuated wafer transporting and storage system
DE3827343A1 (en)*	1988-08-12	1990-02-15	Leybold Ag	DEVICE ACCORDING TO THE CAROUSEL PRINCIPLE FOR COATING SUBSTRATES
DE3731444A1 (en)*	1987-09-18	1989-03-30	Leybold Ag	DEVICE FOR COATING SUBSTRATES
DE4111384C2 (en)*	1991-04-09	1999-11-04	Leybold Ag	Device for coating substrates
US5215420A (en)*	1991-09-20	1993-06-01	Intevac, Inc.	Substrate handling and processing system
US5275709A (en)*	1991-11-07	1994-01-04	Leybold Aktiengesellschaft	Apparatus for coating substrates, preferably flat, more or less plate-like substrates
DE4303462C2 (en)*	1992-03-30	1994-03-31	Leybold Ag	Multi-chamber coating system
DE19500964A1 (en)*	1995-01-14	1996-07-18	Leybold Ag	Cathode sputtering appts. for coating flat substrates, esp. optical components
KR100269097B1 (en)*	1996-08-05	2000-12-01	엔도 마코토	Substrate Processing Equipment
US6053687A (en)*	1997-09-05	2000-04-25	Applied Materials, Inc.	Cost effective modular-linear wafer processing
US6235634B1 (en)	1997-10-08	2001-05-22	Applied Komatsu Technology, Inc.	Modular substrate processing system
US6000905A (en)*	1998-03-13	1999-12-14	Toro-Lira; Guillermo L.	High speed in-vacuum flat panel display handler
US6215897B1 (en)	1998-05-20	2001-04-10	Applied Komatsu Technology, Inc.	Automated substrate processing system
US6206176B1 (en)	1998-05-20	2001-03-27	Applied Komatsu Technology, Inc.	Substrate transfer shuttle having a magnetic drive
US6213704B1 (en)*	1998-05-20	2001-04-10	Applied Komatsu Technology, Inc.	Method and apparatus for substrate transfer and processing
US6517303B1 (en)	1998-05-20	2003-02-11	Applied Komatsu Technology, Inc.	Substrate transfer shuttle
US6217272B1 (en)*	1998-10-01	2001-04-17	Applied Science And Technology, Inc.	In-line sputter deposition system
EP2587515A1 (en)	2000-06-27	2013-05-01	Ebara Corporation	Inspection system by charged particle beam and method of manufacturing devices using the system
US6821912B2 (en)	2000-07-27	2004-11-23	Nexx Systems Packaging, Llc	Substrate processing pallet and related substrate processing method and machine
US6682288B2 (en)	2000-07-27	2004-01-27	Nexx Systems Packaging, Llc	Substrate processing pallet and related substrate processing method and machine
US6530733B2 (en)	2000-07-27	2003-03-11	Nexx Systems Packaging, Llc	Substrate processing pallet and related substrate processing method and machine
JP3943022B2 (en)	2000-12-01	2007-07-11	株式会社荏原製作所	Board inspection equipment
US7100954B2 (en)	2003-07-11	2006-09-05	Nexx Systems, Inc.	Ultra-thin wafer handling system
ATE412789T1 (en)*	2004-03-31	2008-11-15	Applied Materials Gmbh & Co Kg	LOCK ARRANGEMENT FOR A VACUUM TREATMENT SYSTEM AND METHOD FOR OPERATING THE SAME
ATE437976T1 (en)*	2006-06-22	2009-08-15	Applied Materials Gmbh & Co Kg	VACUUM COATING SYSTEM
ATE480646T1 (en)	2007-02-09	2010-09-15	Applied Materials Inc	SYSTEM WITH A TRANSPORT DEVICE FOR THE TREATMENT OF SUBSTRATES
ATE555496T1 (en)	2007-03-13	2012-05-15	Applied Materials Inc	DEVICE FOR MOVING A CARRIER IN A VACUUM CHAMBER
DE102007058052B4 (en)*	2007-11-30	2013-12-05	Von Ardenne Anlagentechnik Gmbh	Vacuum coating system
CN102152031A (en)*	2011-01-26	2011-08-17	阮俊康	Automatic welding production line of lighter
CN111477582B (en)*	2020-05-28	2025-07-08	深圳市捷佳伟创新能源装备股份有限公司	Process cavity of silicon wafer, silicon wafer processing equipment and silicon wafer processing method
CN113584453B (en)*	2021-07-22	2023-01-17	深圳天成真空技术有限公司	Magnetic force driven vacuum coating conveying device and conveying method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3945903A (en)*	1974-08-28	1976-03-23	Shatterproof Glass Corporation	Sputter-coating of glass sheets or other substrates
GB1594525A (en)*	1977-06-16	1981-07-30	Allen Group	Apparatus and methods for automatically transferring articles from a continuously movable conveyor to a work station
US4405435A (en)*	1980-08-27	1983-09-20	Hitachi, Ltd.	Apparatus for performing continuous treatment in vacuum

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4047624A (en)*	1975-10-21	1977-09-13	Airco, Inc.	Workpiece handling system for vacuum processing

1986
- 1986-01-21AUAU52537/86Apatent/AU572375B2/ennot_activeCeased
- 1986-01-27GBGB08601905Apatent/GB2171119B/ennot_activeExpired
- 1986-01-29JPJP61017685Apatent/JPS61206722A/enactiveGranted
- 1986-01-30CACA000500743Apatent/CA1307759C/ennot_activeExpired - Lifetime
- 1986-01-30KRKR1019860000614Apatent/KR950003597B1/ennot_activeExpired - Fee Related

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3945903A (en)*	1974-08-28	1976-03-23	Shatterproof Glass Corporation	Sputter-coating of glass sheets or other substrates
GB1594525A (en)*	1977-06-16	1981-07-30	Allen Group	Apparatus and methods for automatically transferring articles from a continuously movable conveyor to a work station
US4405435A (en)*	1980-08-27	1983-09-20	Hitachi, Ltd.	Apparatus for performing continuous treatment in vacuum

Also Published As

Publication number	Publication date
JPS61206722A (en)	1986-09-13
KR950003597B1 (en)	1995-04-14
GB2171119B (en)	1989-01-18
JPH0336735B2 (en)	1991-06-03
GB8601905D0 (en)	1986-03-05
CA1307759C (en)	1992-09-22
GB2171119A (en)	1986-08-20
KR860005739A (en)	1986-08-11
AU5253786A (en)	1986-08-28

Publication	Publication Date	Title
AU572375B2 (en)	1988-05-05	Transporting of workpiece to and from vacuum coating apparatus
AU5965386A (en)	1986-12-24	Method and article for detection of immune complexes
GB2176808B (en)	1990-03-21	A method of coating substrates in a vacuum chamber
DE3663536D1 (en)	1989-06-29	Single torch-type plasma spray coating method and apparatus therefor
PT82226A (en)	1986-04-01	Process for the preparation of 3-aryluraciles and pesticeides therewith
AU585630B2 (en)	1989-06-22	Process for coating solid particles
GB2185249B (en)	1989-10-18	Apparatus for and process of coating glass
AU580885B2 (en)	1989-02-02	Surface coating process
AU8012387A (en)	1988-04-28	Method of painting
GB8626102D0 (en)	1986-12-03	Coating of articles
GB8600421D0 (en)	1986-02-12	Chip-cutting of workpieces
GR861024B (en)	1986-08-14	Process for the preparation of 5-pyrimidinecarboxamides and treatment of leukemia and tummors therewith
GB2178060B (en)	1989-12-13	Method of coating micro-depressions
AU573524B2 (en)	1988-06-16	(n-substituted-piperazinyl) derivatives of imidazo- pyridines and pyrido-pyrazines
GB8511666D0 (en)	1985-06-12	Means of conveyance
AU5779586A (en)	1986-11-18	Arrangement and method for measurement of articles
AU588904B2 (en)	1989-09-28	Method of processing coal gas
AU6041786A (en)	1987-01-29	Preserve of radish and process for preparation thereof
PT83908A (en)	1987-01-01	Process for the preparation of coating compounds and coating process employing those compounds
GB8623911D0 (en)	1986-11-12	Coating of articles
GB2183509B (en)	1990-01-24	Electrostatic coating apparatus and process
HUT41435A (en)	1987-04-28	Process for the surface treatment of luminous powders (ljuminescent materials)
AU586474B2 (en)	1989-07-13	A process for the isolation and purification of alpha interferons
GB8521645D0 (en)	1985-10-02	Formation of coating on workpiece
AU5851586A (en)	1986-12-18	Process for preparation of biaxially drawn poly- capramide films

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