AU2325900A - Exposure device, exposure method, and device manufacturing method - Google Patents

Exposure device, exposure method, and device manufacturing method

Info

Publication number: AU2325900A
Authority: AU; Australia
Prior art keywords: exposure; device manufacturing; manufacturing; exposure device; exposure method
Prior art date: 1999-03-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-02-04Application filed by Nikon CorpfiledCriticalNikon Corp

2000-10-04Publication of AU2325900ApublicationCriticalpatent/AU2325900A/en

StatusAbandonedlegal-statusCriticalCurrent

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Landscapes

General Physics & Mathematics (AREA)
Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Epidemiology (AREA)
Engineering & Computer Science (AREA)
Public Health (AREA)
Environmental & Geological Engineering (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Toxicology (AREA)
Library & Information Science (AREA)
Sustainable Development (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

AU23259/00A1999-03-122000-02-04Exposure device, exposure method, and device manufacturing methodAbandonedAU2325900A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP6673699		1999-03-12
JP11/66736		1999-03-12
PCT/JP2000/000604WO2000055891A1 (en)	1999-03-12	2000-02-04	Exposure device, exposure method, and device manufacturing method

Publications (1)

Publication Number	Publication Date
AU2325900Atrue AU2325900A (en)	2000-10-04

Family

ID=13324480

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU23259/00AAbandonedAU2325900A (en)	1999-03-12	2000-02-04	Exposure device, exposure method, and device manufacturing method

Country Status (5)

Country	Link
US (1)	US6842221B1 (en)
KR (1)	KR20020006670A (en)
AU (1)	AU2325900A (en)
TW (1)	TW473816B (en)
WO (1)	WO2000055891A1 (en)

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KR20010095087A (en)	2000-03-30	2001-11-03	시마무라 테루오	Exposure apparatus, exposure method, and method of manufacturing device
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JP2004022916A (en)*	2002-06-19	2004-01-22	Nikon Corp	Laser light source control method and apparatus, exposure method and apparatus, and device manufacturing method
KR20050085235A (en)*	2002-12-10	2005-08-29	가부시키가이샤 니콘	Exposure system and device producing method
US6765203B1 (en)*	2003-01-31	2004-07-20	Shimadzu Corporation	Pallet assembly for substrate inspection device and substrate inspection device
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KR101577555B1 (en)*	2003-04-11	2015-12-14	가부시키가이샤 니콘	Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US6876439B2 (en)*	2003-05-29	2005-04-05	Asml Holding N.V.	Method to increase throughput in a dual substrate stage double exposure lithography system
US6781674B1 (en)*	2003-05-29	2004-08-24	Asml Holding N.V.	System and method to increase throughput in a dual substrate stage double exposure lithography system
US7371287B2 (en)*	2003-05-29	2008-05-13	Perkinelmer, Inc.	Substrate handling system
TWI433212B (en)	2003-06-19	2014-04-01	尼康股份有限公司	An exposure apparatus, an exposure method, and an element manufacturing method
JP2005057154A (en)*	2003-08-07	2005-03-03	Canon Inc	Exposure equipment
US7123344B2 (en)*	2003-09-29	2006-10-17	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP4564742B2 (en)*	2003-12-03	2010-10-20	キヤノン株式会社	Exposure apparatus and device manufacturing method
US7053980B2 (en)*	2004-01-23	2006-05-30	Asml Netherlands B.V.	Lithographic alignment system
US7589822B2 (en)*	2004-02-02	2009-09-15	Nikon Corporation	Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4383911B2 (en)*	2004-02-03	2009-12-16	キヤノン株式会社	Exposure apparatus and semiconductor device manufacturing method
US7184123B2 (en)*	2004-03-24	2007-02-27	Asml Netherlands B.V.	Lithographic optical system
KR101123187B1 (en)*	2004-03-31	2012-03-19	에이에스엠엘 네델란즈 비.브이.	Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
JP2006049815A (en)*	2004-07-02	2006-02-16	Canon Inc	Aligner
US7126664B2 (en)*	2004-07-12	2006-10-24	Asml Netherlands B.V.	Lithographic apparatus and a device manufacturing method
US7253880B2 (en)*	2004-11-24	2007-08-07	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US20060199274A1 (en)*	2005-03-01	2006-09-07	Canon Kabushiki Kaisha	Atmosphere conditioning method, exposure apparatus, and device manufacturing method
US7880217B2 (en)	2005-07-30	2011-02-01	Taiwan Semiconductor Manufacturing Co., Ltd.	Programmable non-volatile memory (PNVM) device
US7665981B2 (en)*	2005-08-25	2010-02-23	Molecular Imprints, Inc.	System to transfer a template transfer body between a motion stage and a docking plate
WO2007024345A2 (en)*	2005-08-25	2007-03-01	Molecular Imprints, Inc.	System to transfer a template transfer body between a motion stage and a docking plate
JP2007281142A (en)*	2006-04-05	2007-10-25	Canon Inc	Exposure apparatus and method, and device manufacturing method
US7933000B2 (en)*	2006-11-16	2011-04-26	Asml Netherlands B.V.	Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device
US8237911B2 (en)	2007-03-15	2012-08-07	Nikon Corporation	Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
WO2009012919A1 (en)*	2007-07-20	2009-01-29	Carl Zeiss Smt Ag	Method for examining a wafer with regard to a contamination limit and euv projection exposure system
NL1036181A1 (en)*	2007-11-30	2009-06-04	Asml Netherlands Bv	A lithographic apparatus, a projection system and a device manufacturing method.
NL1036567A1 (en)*	2008-03-28	2009-09-29	Asml Netherlands Bv	A lithographic apparatus and a vacuum chamber.
US8383202B2 (en)	2008-06-13	2013-02-26	Kateeva, Inc.	Method and apparatus for load-locked printing
US12018857B2 (en)	2008-06-13	2024-06-25	Kateeva, Inc.	Gas enclosure assembly and system
US9312159B2 (en)*	2009-06-09	2016-04-12	Nikon Corporation	Transport apparatus and exposure apparatus
JP5617708B2 (en)*	2011-03-16	2014-11-05	東京エレクトロン株式会社	Lid opening / closing device
TWI611479B (en)*	2016-09-29	2018-01-11	台灣積體電路製造股份有限公司	Method for forming a thin film assembly
US10176967B2 (en)*	2017-02-23	2019-01-08	Hermes Microvision, Inc.	Load lock system for charged particle beam imaging
KR102675777B1 (en)*	2017-07-31	2024-06-18	삼성전자주식회사	Pellicle for photomask, reticle including the same and method for manufacturing the same
US10994239B2 (en)	2018-03-08	2021-05-04	Sandisk Technologies Llc	Spiral gas adsorption apparatus and method of using the same
JP7285648B2 (en)*	2019-01-31	2023-06-02	株式会社Ｓｃｒｅｅｎホールディングス	Conveying device, exposure device, and conveying method
CN114072732A (en)*	2019-07-01	2022-02-18	Asml荷兰有限公司	Surface treatment apparatus and method for surface treatment of patterned devices and other substrates
US11803129B2 (en)	2021-08-13	2023-10-31	Taiwan Semiconductor Manufacturing Company, Ltd.	Semiconductor processing tool and methods of operation
CN114280893B (en)*	2021-11-25	2023-08-01	中国科学院微电子研究所	Pollution control system and method of photoetching machine and photoetching machine
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2000
- 2000-02-04KRKR1020017011082Apatent/KR20020006670A/ennot_activeWithdrawn
- 2000-02-04WOPCT/JP2000/000604patent/WO2000055891A1/ennot_activeApplication Discontinuation
- 2000-02-04AUAU23259/00Apatent/AU2325900A/ennot_activeAbandoned
- 2000-02-04USUS09/926,149patent/US6842221B1/ennot_activeExpired - Fee Related
- 2000-02-10TWTW089102170Apatent/TW473816B/ennot_activeIP Right Cessation

Also Published As

Publication number	Publication date
WO2000055891A1 (en)	2000-09-21
TW473816B (en)	2002-01-21
KR20020006670A (en)	2002-01-24
US6842221B1 (en)	2005-01-11

Publication	Publication Date	Title
AU2325900A (en)	2000-10-04	Exposure device, exposure method, and device manufacturing method
AU1176199A (en)	1999-06-15	Aligner, exposure method and device manufacturing method
AU2003236023A1 (en)	2003-10-20	Exposure method, exposure device, and device manufacturing method
AU5653699A (en)	2001-04-24	Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices
AU3325500A (en)	2000-10-09	Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
AU4653999A (en)	2001-02-05	Exposure method and system
AU1179200A (en)	2000-06-05	Exposure method and device
AU3193800A (en)	2000-12-05	Exposure method, illuminating device, and exposure system
AU2003227194A1 (en)	2003-10-08	Exposure device, exposure method, and device manufacturing method
AU4615200A (en)	2000-12-18	Communication device and communication method
AU2746799A (en)	1999-09-27	Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method
AU2076099A (en)	1999-08-16	Exposure method and device
AU6875100A (en)	2001-04-17	Laser device and exposure method
AU2003235124A1 (en)	2003-11-10	Exposure system and device manufacturing method
AU5529499A (en)	2000-04-03	Exposure apparatus and its manufacturing method, and device producing method
AU4288100A (en)	2000-10-16	Drying device and method for producing the same
AU2002214269A1 (en)	2002-05-21	Optical device, exposure device and device manufacturing method
AU1504799A (en)	1999-07-05	Aligner, exposure method and method of manufacturing device
AU4629000A (en)	2000-11-21	Curing device and method
AU3672600A (en)	2000-11-10	Stage device and exposure device
AU4395099A (en)	2001-01-22	Exposure method and device
AU2828900A (en)	2000-11-17	Exposure method, exposure device, exposure system, mask and device manufacturingmethod
AU1301801A (en)	2001-06-06	Illuminator, aligner, and method for fabricating device
AU2002223125A1 (en)	2002-05-27	Method and device for transfer, method and device for exposure, and method of manufacturing device
AU6035000A (en)	2001-01-09	Semiconductor and manufacturing method for semiconductor

Legal Events

Date	Code	Title	Description
2002-02-28	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase

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AU2325900A - Exposure device, exposure method, and device manufacturing method - Google Patents

Info

Links

Classifications

Landscapes

Applications Claiming Priority (3)

Publications (1)

Family

ID=13324480

Family Applications (1)

Country Status (5)

Families Citing this family (49)

Family Cites Families (13)

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