AU2003243779A1 - Method and apparatus for maskless photolithography - Google Patents

Method and apparatus for maskless photolithography

Info

Publication number: AU2003243779A1
Authority: AU; Australia
Prior art keywords: maskless photolithography; maskless; photolithography
Prior art date: 2002-06-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Inventor

David P. Fries

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

University of South Florida St Petersburg

Original Assignee

University of South Florida

University of South Florida St Petersburg

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-06-25

Filing date

2003-06-24

Publication date

2004-01-06

2002-06-25Priority claimed from US10/179,083external-prioritypatent/US6544698B1/en

2003-04-07Priority claimed from US10/408,696external-prioritypatent/US7095484B1/en

2003-06-24Application filed by University of South Florida, University of South Florida St PetersburgfiledCriticalUniversity of South Florida

2004-01-06Publication of AU2003243779A1publicationCriticalpatent/AU2003243779A1/en

2004-01-06Publication of AU2003243779A8publicationCriticalpatent/AU2003243779A8/en

StatusAbandonedlegal-statusCriticalCurrent

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU2003243779A2002-06-252003-06-24Method and apparatus for maskless photolithographyAbandonedAU2003243779A1 (en)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US10/179,083US6544698B1 (en)	2001-06-27	2002-06-25	Maskless 2-D and 3-D pattern generation photolithography
US10/179,083		2002-06-25
US10/408,696US7095484B1 (en)	2001-06-27	2003-04-07	Method and apparatus for maskless photolithography
US10/408,696		2003-04-07
PCT/US2003/020019WO2004001508A2 (en)	2002-06-25	2003-06-24	Method and apparatus for maskless photolithography

Publications (2)

Publication Number	Publication Date
AU2003243779A1true AU2003243779A1 (en)	2004-01-06
AU2003243779A8 AU2003243779A8 (en)	2004-01-06

Family

ID=30002663

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2003243779AAbandonedAU2003243779A1 (en)	2002-06-25	2003-06-24	Method and apparatus for maskless photolithography

Country Status (2)

Country	Link
AU (1)	AU2003243779A1 (en)
WO (1)	WO2004001508A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7012674B2 (en)*	2004-01-13	2006-03-14	Asml Holding N.V.	Maskless optical writer
DE102006019963B4 (en)*	2006-04-28	2023-12-07	Envisiontec Gmbh	Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure
CN102036908A (en)*	2008-05-23	2011-04-27	3M创新有限公司	Fabrication of microscale tooling
US9336993B2 (en)*	2014-02-26	2016-05-10	Taiwan Semiconductor Manufacturing Company, Ltd.	Digital pattern generator (DPG) for E-beam lithography
JP6936348B2 (en)	2017-06-26	2021-09-15	アプライドマテリアルズインコーポレイテッドＡｐｐｌｉｅｄＭａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ	Image improvements for alignment through mixing of incoherent lighting
CN108646521A (en)*	2018-06-19	2018-10-12	上海频微电子科技有限公司	A kind of light source direct imaging focused photoetching device and photolithography method
CN110930316B (en)*	2019-10-24	2023-09-05	中山新诺科技股份有限公司	Gray image processing exposure method, device, system and equipment
US11366307B2 (en)	2020-08-27	2022-06-21	Kla Corporation	Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
CN116300319A (en)*	2021-12-21	2023-06-23	广东洛恩光电科技有限公司	Photoetching machine and method for manufacturing holographic master plate, holographic master plate and anti-counterfeiting element

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6816302B2 (en)*	1998-03-02	2004-11-09	Micronic Laser Systems Ab	Pattern generator
US6379867B1 (en)*	2000-01-10	2002-04-30	Ball Semiconductor, Inc.	Moving exposure system and method for maskless lithography system

2003
- 2003-06-24AUAU2003243779Apatent/AU2003243779A1/ennot_activeAbandoned
- 2003-06-24WOPCT/US2003/020019patent/WO2004001508A2/ennot_activeApplication Discontinuation

Also Published As

Publication number	Publication date
WO2004001508A3 (en)	2004-08-05
WO2004001508A2 (en)	2003-12-31
AU2003243779A8 (en)	2004-01-06

Similar Documents

Publication	Publication Date	Title
AU2003289236A1 (en)	2004-06-30	Exposure apparatus and method for manufacturing device
AU2003289273A1 (en)	2004-06-30	Exposure apparatus and method for manufacturing device
AU2003289199A1 (en)	2004-06-30	Exposure apparatus and method for manufacturing device
AU2003289237A1 (en)	2004-06-30	Exposure apparatus and method for manufacturing device
AU2003302830A1 (en)	2004-06-30	Exposure apparatus and method for manufacturing device
AU2003289271A1 (en)	2004-06-30	Exposure apparatus, exposure method and method for manufacturing device
AU2003302831A1 (en)	2004-06-30	Exposure method, exposure apparatus and method for manufacturing device
AU2003234547A1 (en)	2003-11-11	Method and apparatus for reducing transmission-link errors
AU2003253907A1 (en)	2004-02-02	Loadport apparatus and method for use thereof
AU2003284672A1 (en)	2004-06-23	Contaminant removing method and device, and exposure method and apparatus
AU2003216145A1 (en)	2003-09-29	Method and apparatus for synthesis
AU2003299155A1 (en)	2004-04-23	Methods and apparatus for ultraviolet sterilization
AU2002253574A1 (en)	2002-11-11	Exposure method and apparatus
SG108317A1 (en)	2005-01-28	Lithographic apparatus and device manufacturing method
AU2003297463A1 (en)	2004-07-22	Apparatus and method for creating new reports from discrete reports
AU2003301613A1 (en)	2004-05-13	Method and apparatus for a projection system
AU2003216530A1 (en)	2003-09-22	Method and apparatus for manufacturing silica-titania extreme ultraviolet elements
SG106138A1 (en)	2004-09-30	Lithographic apparatus and device manufacturing method
SG109555A1 (en)	2005-03-30	Lithographic apparatus and apparatus adjustment method
SG121780A1 (en)	2006-05-26	Lithographic apparatus and device manufacturing method
AU2003265176A1 (en)	2004-03-29	Exposure method, exposure mask, and exposure apparatus
SG123556A1 (en)	2006-07-26	Lithographic apparatus and device manufacturing method
AU2003297861A1 (en)	2004-07-29	Method and apparatus for bilayer photoresist dry development
SG115590A1 (en)	2005-10-28	Lithographic projection apparatus and device manufacturing method
SG111171A1 (en)	2005-05-30	Lithographic projection apparatus and device manufacturing method

Legal Events

Date	Code	Title	Description
2005-03-17	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase

Movatterモバイル変換