AU2001264825A1 - Surface tension effect dryer with porous vessel walls - Google Patents

Surface tension effect dryer with porous vessel walls

Info

Publication number: AU2001264825A1
Authority: AU; Australia
Prior art keywords: surface tension; vessel walls; tension effect; porous vessel; dryer
Prior art date: 2000-06-08
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

AU2001264825A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Semitool Inc

Original Assignee

Semitool Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-05-22Application filed by Semitool IncfiledCriticalSemitool Inc

2001-12-17Publication of AU2001264825A1publicationCriticalpatent/AU2001264825A1/en

StatusAbandonedlegal-statusCriticalCurrent

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/06—Cleaning involving contact with liquid using perforated drums in which the article or material is placed
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Cleaning Or Drying Semiconductors (AREA)

AU2001264825A2000-06-082001-05-22Surface tension effect dryer with porous vessel wallsAbandonedAU2001264825A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US09/590,724US6502591B1 (en)	2000-06-08	2000-06-08	Surface tension effect dryer with porous vessel walls
US09590724		2000-06-08
PCT/US2001/016616WO2001094038A1 (en)	2000-06-08	2001-05-22	Surface tension effect dryer with porous vessel walls

Publications (1)

Publication Number	Publication Date
AU2001264825A1true AU2001264825A1 (en)	2001-12-17

Family

ID=24363435

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2001264825AAbandonedAU2001264825A1 (en)	2000-06-08	2001-05-22	Surface tension effect dryer with porous vessel walls

Country Status (4)

Country	Link
US (2)	US6502591B1 (en)
AU (1)	AU2001264825A1 (en)
TW (1)	TWI227508B (en)
WO (1)	WO2001094038A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20030234029A1 (en)*	2001-07-16	2003-12-25	Semitool, Inc.	Cleaning and drying a substrate
US20040031167A1 (en)*	2002-06-13	2004-02-19	Stein Nathan D.	Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife
US7293571B2 (en)*	2002-09-30	2007-11-13	Lam Research Corporation	Substrate proximity processing housing and insert for generating a fluid meniscus
US7727366B2 (en)	2003-10-22	2010-06-01	Nexx Systems, Inc.	Balancing pressure to improve a fluid seal
CN1920105B (en)*	2003-10-22	2010-12-08	内克斯系统公司	Method and apparatus for fluid handling of workpieces
US7337663B2 (en)*	2004-03-12	2008-03-04	Semitool, Inc.	Sonic energy process chamber
US20050283993A1 (en)*	2004-06-18	2005-12-29	Qunwei Wu	Method and apparatus for fluid processing and drying a workpiece
US20080029123A1 (en)*	2006-08-02	2008-02-07	Brian Aegerter	Sonic and chemical wafer processor
US9279435B2 (en)	2008-02-25	2016-03-08	University of Washington through its Center for Communication	Vibration-driven droplet transport devices
US8894803B2 (en)*	2008-03-05	2014-11-25	Heateflex Corporation	Apparatus and method for etching the surface of a semiconductor substrate
US8707971B2 (en)*	2008-05-16	2014-04-29	Xyratex Corporation	Laminated walls for uniform fluid flow
JP2010267340A (en)*	2009-05-15	2010-11-25	Showa Denko Kk	Flow-through washing method and flow-through washing apparatus
CN102184838B (en)*	2011-03-09	2013-02-13	深圳深爱半导体股份有限公司	Cleaning system

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US353849A (en)*		1886-12-07		Photographic-print washer
US3456659A (en)*	1966-01-11	1969-07-22	Hobart Corp	Apparatus for treating food articles
US3543776A (en)*	1968-04-30	1970-12-01	Interlab Inc	Laminar flow rinsing and drying vessels
US4361163A (en)*	1981-01-02	1982-11-30	Seiichiro Aigo	Apparatus for washing semiconductor materials
AU558058B2 (en)*	1985-02-14	1987-01-15	Hitachi Limited	Washing machine
US5069235A (en)*	1990-08-02	1991-12-03	Bold Plastics, Inc.	Apparatus for cleaning and rinsing wafers
US5656097A (en)	1993-10-20	1997-08-12	Verteq, Inc.	Semiconductor wafer cleaning system
KR0179784B1 (en)*	1995-12-19	1999-04-15	문정환	Cleaning apparatus of semiconductor wafer
DE19618974A1 (en)*	1996-05-10	1997-11-13	Wacker Chemie Gmbh	Semiconductor material treatment in cavitating liquid bath
KR200160545Y1 (en)*	1997-01-23	1999-11-15	김재형	Alcohol vapor dryer
JP3230051B2 (en)*	1997-05-16	2001-11-19	東京エレクトロン株式会社	Drying method and apparatus
US5849091A (en)	1997-06-02	1998-12-15	Micron Technology, Inc.	Megasonic cleaning methods and apparatus
US6164297A (en)*	1997-06-13	2000-12-26	Tokyo Electron Limited	Cleaning and drying apparatus for objects to be processed
US6132523A (en)	1997-09-19	2000-10-17	Sharp Kabushiki Kaisha	Method of cleaning a substrate in a cleaning tank using plural fluid flows
US6273107B1 (en)*	1997-12-05	2001-08-14	Texas Instruments Incorporated	Positive flow, positive displacement rinse tank
JPH11257851A (en)*	1998-03-10	1999-09-24	Tokyo Electron Ltd	Apparatus and method for drying
JP3448613B2 (en)*	1999-06-29	2003-09-22	オメガセミコン電子株式会社	Drying equipment
US6497055B2 (en)*	2000-01-04	2002-12-24	Texas Instruments Incorporated	System and method for controlling a vapor dryer process
US6519869B2 (en)*	2001-05-15	2003-02-18	United Microelectronics, Corp.	Method and apparatus for drying semiconductor wafers

2000
- 2000-06-08USUS09/590,724patent/US6502591B1/ennot_activeExpired - Fee Related
2001
- 2001-05-22AUAU2001264825Apatent/AU2001264825A1/ennot_activeAbandoned
- 2001-05-22WOPCT/US2001/016616patent/WO2001094038A1/enactiveApplication Filing
- 2001-06-08TWTW090113975Apatent/TWI227508B/ennot_activeIP Right Cessation
2003
- 2003-01-03USUS10/336,193patent/US6681499B2/ennot_activeExpired - Fee Related

Also Published As

Publication number	Publication date
US6681499B2 (en)	2004-01-27
TWI227508B (en)	2005-02-01
US6502591B1 (en)	2003-01-07
US20030101616A1 (en)	2003-06-05
WO2001094038A1 (en)	2001-12-13

Publication	Publication Date	Title
SG100647A1 (en)	2003-12-26	Porous materials
AU6299401A (en)	2001-11-20	Improvements to the fluorescent polymer-qtl approach to biosensing
AU2001282921A1 (en)	2002-02-13	Self bleaching photoelectrochemical-electrochromic device
EP1350034A4 (en)	2006-08-16	Spreader roll
AU2001264825A1 (en)	2001-12-17	Surface tension effect dryer with porous vessel walls
AU148136S (en)	2002-06-12	Moist wipes container
AU2001255215A1 (en)	2001-10-08	High density porous materials
AU2001234854A1 (en)	2001-08-20	Receiver dryer with bottom inlet
GB0030232D0 (en)	2001-01-24	Porous semiconductors
EP1296884A4 (en)	2006-12-27	Winch
GB0001115D0 (en)	2000-03-08	Hand dryer
GB0002335D0 (en)	2000-03-22	Web board
AU2001240541A1 (en)	2001-08-07	Textile surface
AU2001258961A1 (en)	2001-11-20	Dewatering device
GB0022849D0 (en)	2000-11-01	Winch
AU2001232521A1 (en)	2001-08-27	Drying wood
AU5098900A (en)	2002-01-08	Call out memory with reduced surface
GB0015202D0 (en)	2000-08-09	Boat
AUPQ626300A0 (en)	2000-04-15	Drying improvements
AUPQ652800A0 (en)	2000-04-20	Surfboard improvements
GB0006813D0 (en)	2000-05-10	Extenible keel
TW459976U (en)	2001-10-11	Structure of dryer
GB0026636D0 (en)	2000-12-13	Sailing catamarans
PL111313U1 (en)	2002-02-25	Catamaran
GB0019308D0 (en)	2000-09-27	Keep it dry

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AU2001264825A1 - Surface tension effect dryer with porous vessel walls - Google Patents

Info

Links

Classifications

Landscapes

Applications Claiming Priority (3)

Publications (1)

Family

ID=24363435

Family Applications (1)

Country Status (4)

Families Citing this family (13)

Family Cites Families (19)

Also Published As

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