Overview

Authors:

• Joseph I. Goldstein⁰,
• Dale E. Newbury¹,
• Joseph R. Michael²,
• Nicholas W.M. Ritchie³,
• John Henry J. Scott⁴,
• …
• David C. Joy⁵

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1. Joseph I. Goldstein

   1. University of Massachusetts, Amherst, USA
      

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2. Dale E. Newbury

   1. National Institute of Standards and Technology, Gaithersburg, USA
      

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3. Joseph R. Michael

   1. Sandia National Laboratories, Albuquerque, USA
      

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4. Nicholas W.M. Ritchie

   1. National Institute of Standards and Technology, Gaithersburg, USA
      

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5. John Henry J. Scott

   1. National Institute of Standards and Technology, Gaithersburg, USA
      

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6. David C. Joy

   1. University of Tennessee, Knoxville, USA
      

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• Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
  
• Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
  
• Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
  
• Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.
  
• Includes case studies to illustrate practical problem solving
  
• Covers Helium ion scanning microscopy
  
• Organized into relatively self-contained modules – no need to "read it all" to understand a topic
  
• Includesan online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3

Form the reviews of the third edition:

“There is no other single volume that covers as much theory and practice of SEM or X-ray microanalysis as Scanning Electron Microscopy and X-ray Microanalysis, 3rd Edition does. It is clearly written ... well organized. ... This is a reference text that no SEM or EPMA laboratory should be without.” (Thomas J. Wilson, Scanning, Vol. 27 (4), July/August, 2005)

“As the authors pointed out, the number of equations in the book is kept to a minimum, and important conceptions are also explained in a qualitative manner. A lot of very distinct images and schematic drawings make for a very interesting book and help readers who study scanning electron microscopy and X-ray microanalysis. The principal application and sample preparation given in this book are suitable for undergraduate students and technicians learning SEEM and EDS/WDS analyses. It is an excellent textbook for graduate students, and an outstanding reference for engineers, physical, and biological scientists.” (Microscopy and Microanalysis, Vol. 9 (5), October, 2003)

• University of Massachusetts, Amherst, USA

  Joseph I. Goldstein

• National Institute of Standards and Technology, Gaithersburg, USA

  Dale E. Newbury, Nicholas W.M. Ritchie, John Henry J. Scott

• Sandia National Laboratories, Albuquerque, USA

  Joseph R. Michael

• University of Tennessee, Knoxville, USA

  David C. Joy

• EBSD
• Electron backscatter diffraction
• Environmental SEM
• Focused ion beam
• Ion beam microanalysis
• Qualitative X-ray analysis
• Quantitative X-ray analysis
• SDD x-ray detectors
• SEM textbook
• Table top SEM
• Variable pressure SEM
• X-ray mapping
• X-ray microanalysis book
• X-ray spectral measurement
• dual column instruments
• Biological Microscopy

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