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Iridium(IV) oxide

From Wikipedia, the free encyclopedia
Iridium(IV) oxide
Names
Other names
Iridium dioxide
Identifiers
3D model (JSmol)
ChemSpider
ECHA InfoCard100.031.572Edit this at Wikidata
UNII
  • InChI=1S/Ir.2O/q+4;2*-2 checkY
    Key: NSTASKGZCMXIET-UHFFFAOYSA-N checkY
  • InChI=1/Ir.2O/q+4;2*-2
    Key: NSTASKGZCMXIET-UHFFFAOYAQ
  • [Ir+4].[O-2].[O-2]
Properties
IrO2
Molar mass224.22 g/mol
Appearanceblue-black solid
Density11.66 g/cm3
Melting point1,100 °C (2,010 °F; 1,370 K) decomposes
insoluble
+224.0·10−6 cm3/mol
Structure
Rutile (tetragonal)
Octahedral (Ir); Trigonal (O)
Hazards
Flash pointNon-flammable
Related compounds
Otheranions
iridium(IV) fluoride,iridium disulfide
Othercations
rhodium dioxide,osmium dioxide,platinum dioxide
Except where otherwise noted, data are given for materials in theirstandard state (at 25 °C [77 °F], 100 kPa).
☒N verify (what is checkY☒N ?)
Chemical compound

Iridium(IV) oxide, IrO2, is the only well-characterised oxide of iridium. It is a blue-black solid, used with other rare oxides to coatanodes.

Synthesis

[edit]

As described by its discoverers, it can be formed by treating the green form ofiridium trichloride with oxygen at high temperatures:

2 IrCl3 + 2 O2 → 2 IrO2 + 3 Cl2

A hydrated form is also known.[1]

Structure

[edit]

The compound adopts the TiO2rutile structure, featuring six coordinate iridium and three coordinate oxygen.[2] It forms atetragonal lattice with lattice parameters of 4.5Å and 3.15Å.[3]

Mechanical properties

[edit]

Oxide materials are typically hard andbrittle.[4] Indeed, iridium oxide does not easily deform under stress,[5] instead cracking easily.[6] Measured deflections of a thin,cantilevered iridium oxide film indicate aYoung’s modulus of 300 ± 15 GPa,[5] substantially lower than the Young's modulus of metallic iridium (517 GPa).[7]

Applications

[edit]

Iridium dioxide can be used to make coated electrodes[8] for industrialelectrolysis or asmicroelectrodes forelectrophysiology.[9] In electrolytic applications, IrO2 films evolveO2 efficiently.[10]

Electrode manufacture typically requires high-temperatureannealing.[11]

Fracture anddelamination are well-known problems when fabricating devices that incorporate iridium oxide film. One cause of delamination islattice mismatch between iridium oxide and the substrate.Sputtering iridium oxide on aliquid crystal polymer has been proposed to avoid mismatch,[12] but sputtered films spontaneously delaminate duringcyclic voltammetry if the maximum potential bias exceeds 0.9 V.[13]

References

[edit]
  1. ^H. L. Grube (1963). "The Platinum Metals". In G. Brauer (ed.).Handbook of Preparative Inorganic Chemistry, 2nd Ed. NY: Academic Press. p. 1590.
  2. ^Greenwood, Norman N.; Earnshaw, Alan (1997).Chemistry of the Elements (2nd ed.).Butterworth-Heinemann.doi:10.1016/C2009-0-30414-6.ISBN 978-0-08-037941-8.
  3. ^Bestaoui, N.; Prouzet, E.; Deniard, P.; Brec, R. (1993)."Structural and analytical characterization of an iridium oxide thin layer".Thin Solid Films.235 (1–2):35–42.Bibcode:1993TSF...235...35B.doi:10.1016/0040-6090(93)90239-l.ISSN 0040-6090.
  4. ^Dillingham, Giles; Roberts, Rose (2023).Advances in Structural Adhesive Bonding (Second Edition) (2nd ed.). Woodhead Publishing. pp. 289–325.ISBN 9780323984379.
  5. ^abRivas, Manuel; Rudy, Ryan Q.; Sanchez, Bradley; Graziano, Milena B.; Fox, Glen R.; Sunal, Paul; Nataraj, Latha; Sandoz-Rosado, Emil; Leff, Asher C.; Huey, Bryan D.; Polcawich, Ronald G.; Hanrahan, Brendan (2020-08-01)."Iridium oxide top electrodes for piezo- and pyroelectric performance enhancements in lead zirconate titanate thin-film devices".Journal of Materials Science.55 (24):10351–10363.Bibcode:2020JMatS..5510351R.doi:10.1007/s10853-020-04766-5.ISSN 1573-4803.
  6. ^Mailley, S.C; Hyland, M; Mailley, P; McLaughlin, J.M; McAdams, E.T (2002)."Electrochemical and structural characterizations of electrodeposited iridium oxide thin-film electrodes applied to neurostimulating electrical signal".Materials Science and Engineering: C.21 (1–2):167–175.doi:10.1016/s0928-4931(02)00098-x.ISSN 0928-4931.
  7. ^"Young's Modulus, Tensile Strength and Yield Strength Values for some Materials".www.engineeringtoolbox.com. Retrieved2024-05-12.
  8. ^"改性二氧化铱电极研制--《无机盐工业》1998年03期".www.cnki.com.cn. Retrieved2021-05-21.
  9. ^Cogan, Stuart F. (August 2008)."Neural Stimulation and Recording Electrodes".Annual Review of Biomedical Engineering.10 (1):275–309.doi:10.1146/annurev.bioeng.10.061807.160518.ISSN 1523-9829.PMID 18429704.
  10. ^Wendt, Hartmut; Kolb, Dieter M.; Engelmann, Gerald E.; Ziegler, Jörg C. (15 Oct 2011). "Electrochemistry, 1: Fundamentals".Ullmann's Encyclopedia of Industrial Chemistry. Weinheim: Wiley-VCH.doi:10.1002/14356007.a09_183.pub4.ISBN 978-3-527-30673-2.
  11. ^Dong, Qiuchen; Song, Donghui; Huang, Yikun; Xu, Zhiheng; Chapman, James H.; Willis, William S.; Li, Baikun; Lei, Yu (2018)."High-temperature annealing enabled iridium oxide nanofibers for both non-enzymatic glucose and solid-state pH sensing".Electrochimica Acta.281:117–126.doi:10.1016/j.electacta.2018.04.205.ISSN 0013-4686.
  12. ^Wang, K.; Chung-Chiun Liu; Durand, D.M. (2009)."Flexible Nerve Stimulation Electrode With Iridium Oxide Sputtered on Liquid Crystal Polymer".IEEE Transactions on Biomedical Engineering.56 (1):6–14.Bibcode:2009ITBE...56....6W.doi:10.1109/TBME.2008.926691.ISSN 0018-9294.PMC 2738844.PMID 19224713.
  13. ^Cogan, Stuart F.; Ehrlich, Julia; Plante, Timothy D.; Smirnov, Anton; Shire, Douglas B.; Gingerich, Marcus; Rizzo, Joseph F. (2009)."Sputtered iridium oxide films for neural stimulation electrodes".Journal of Biomedical Materials Research Part B: Applied Biomaterials.89B (2):353–361.doi:10.1002/jbm.b.31223.ISSN 1552-4973.PMC 7442142.PMID 18837458.
Iridium(0)
Iridium(I)
Organoiridium(I)
Iridium(II)
Iridium(III)
Organoiridium(III)
Iridium(IV)
Iridium(V)
Iridium(VI)
Iridium(VII)
Iridium(VIII/IX)
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