DOI:10.1109/16.337456 - Corpus ID: 108832941
A Room Temperature 0.1 /spl mu/m CMOS on SOI
@article{Shahidi1993ART, title={A Room Temperature 0.1 /spl mu/m CMOS on SOI}, author={Ghavam G. Shahidi and C. Blair and Klaus Dietrich Beyer and Thomas J. Bucelot and Taqi N. Buti and P. Chang and Sanford Chu and Philip J. Coane and James H. Comfort and Bijan Davari and Robert H. Dennard and Stephen S. Furkay and Harold Hovel and James M. Johnson and David P. Klaus and K. Kiewtniack and R. Logan and Tom Lii and Patricia A. McFarland and N. J. Mazzeo and Dan Moy and Scott Neely and Tak H. Ning and M. D. Rodriguez and D. Sadaria and S. Stiffier and J. Y.-C. Sun and F. Swell and James D. Warnock}, journal={Symposium 1993 on VLSI Technology}, year={1993}, pages={27-28}, url={https://api.semanticscholar.org/CorpusID:108832941}}- G. ShahidiC. BlairJ. Warnock
- Published inSymposium on VLSI Technology17 May 1993
- Engineering, Physics, Materials Science, Computer Science
An advanced 0.1 /spl mu/m CMOS technology on SOI is presented, and excellent short channel effects (SCE) down to channel lengths below 0.
76 Citations
A 0.25 /spl mu/m CMOS SOI technology and its application to 4 Mb SRAM
- D. SchepisF. AssaderaghiG. Shahidi
- 1997
Computer Science, Engineering
International Electron Devices Meeting. IEDM…
This is the highest performance 0.25 /spl mu/m CMOS technology reported to date and using this SOI CMOS, a 4 Mb SRAM is demonstrated.
0.25 /spl mu/m low power CMOS devices and circuits from 8 inch SOI materials
- B. ChenA.S. YapsirB. Davari
- 1995
Engineering, Materials Science
Proceedings of 4th International Conference on…
0.25 /spl mu/m SOI-CMOS ring oscillators, various circuits and SRAM from 8-inch SIMOX wafers are reported. Both active power and stand-by leakage are compared on fully integrated lots for both SOI…
Scalability of partially depleted SOI technology for sub-0.25 /spl mu/m logic applications
- Robert ChauReza ArghavaniScott Yu
- 1997
Engineering, Computer Science
International Electron Devices Meeting. IEDM…
It is concluded that PD-SOI with a floating body will provide no speed and insignificant power advantage over bulk for sub-0.25 /spl mu/m logic applications.
A 130-nm channel length partially depleted SOI CMOS-technology
- S. PindlJ. BertholdT. HuttnerS. ReifD. SchumannH. V. Philisborn
- 1999
Engineering, Physics
A partially depleted silicon-on-insulator (PDSOI) CMOS technology employing pocket implantation and a self-aligned titanium silicidation with an effective gate length of 0.13 /spl mu/m has been…
A scalable SOI technology for three successive generations: 0.18, 0.13 and 0.1 /spl mu/m for low-voltage and low-power applications
- J. PelloieO. FaynotJ. Hartmann
- 1996
Engineering, Physics
1996 IEEE International SOI Conference…
Optimized 0.18 /spl mu/m gate length NMOSFET and PMOSFET SOI devices have been demonstrated with high electrical performances for low-voltage and low-power applications. The electrical results show…
SOI at IBM: current status of technology, modeling, design, and the outlook for the 0.1 /spl mu/m generation
- F. AssaderaghiG. Shahidi
- 2000
Engineering, Computer Science
2000 IEEE International SOI Conference…
Several aspects of this development leading to successful fabrication of high-performance microprocessors are discussed, including SOI-specific device design and process modifications; creation of compact device models for circuit simulation (SPICE-like models); and development of circuit styles and strategies employed in the design of CMOS VLSI on PD SOI.
Short-channel-effect-suppressed sub-0.1-/spl mu/m grooved-gate MOSFET's with W gate
Grooved-gate Si MOSFET's with tungsten gates are fabricated using conventional manufacturing technologies, and their short-channel-effect-free characteristics are verified down to a source and drain…
Threshold voltage sensitivity of 0.1 /spl mu/m channel length fully-depleted SOI NMOSFET's with back-gate bias
- E. LeobandungS. Chou
- 1995
Engineering, Physics
We found threshold voltage sensitivity to silicon thickness variation in 0.1 /spl mu/m channel length fully-depleted SOI NMOSFET's can be reduced with lightly-doped channel and back-gate bias.…
A high speed and low power on CMOS/SOI technology and its modelings
Reduction of parasitic capacitances has predicted two-time high speed in deep-submicron CMOS/SIMOX ring oscillators (RO), where measurements are plotted for comparison with an analytical model with…
CMOS technology for low voltage/low power applications
- B. DavariR. DennardG. Shahidi
- 1994
Engineering
Proceedings of IEEE Custom Integrated Circuits…
In this paper, the scaled CMOS as the ideal technology for the low power revolution, is discussed. It is shown that by the proper scaling of the CMOS devices, improved performance, power, and density…
...
13 References
High-performance devices for a 0.15- mu m CMOS technology
- G. ShahidiJ. WarnockB. Davari
- 1993
Engineering, Physics
Devices have been designed and fabricated in a CMOS technology with a nominal channel length of 0.15 mu m and minimum channel length below 0.1 mu m. In order to minimize short-channel effects (SCEs)…
High-performance CMOS fabricated on ultrathin BESOI with sub-10 nm ttv
- S. S. IyerM. TejwaniP. PitnerT. SedgwickG. Shahidi
- 1993
Engineering, Materials Science
Proceedings of 1993 IEEE International SOI…
Ultra thin Bond and Etch-back Silicon On Insulator (BESOI) in the thickness range of 75 to 100 nn offers the potential for performance enhancement in both CMOS and BiCMOS technology. To be useful,…
Thin-film SOI technology: the solution to many submicron CMOS problems
- J. Colinge
- 1989
Engineering, Physics
International Technical Digest on Electron…
The performances of thin-film SOI (silicon-on-insulator) MOSFETs and CMOS circuits are presented. Attention is given to the SOI material, device properties, and design and processing. It is noted…
Indium channel implant for improved short-channel behavior of submicrometer NMOSFETs
- G. ShahidiB. DavariH. Hansen
- 1993
Engineering, Physics
Indium has been used as an alternative channel implant in submicrometer-channel Si MOSFETs in order to obtain highly nonuniform channel doping. Superior device characteristics have been obtained down…
A 2-ns cycle, 3.8-ns access 512-kb CMOS ECL SRAM with a fully pipelined architecture
- T. ChappellB. ChappellRobert L. Franch
- 1991
Engineering, Computer Science
IEEE J. Solid State Circuits
The authors describe a 512 K CMOS static RAM (SRAM) with emitter-coupled-logic (ECL) interfaces which has a 2-ns cycle time and a 3.8-ns access time, both of which are valid for random READ/WRITE…
Smart body contact for SOI MOSFETs
- M. Matloubian
- 1989
Engineering, Physics
IEEE SOS/SOI Technology Conference
Summary form only given. SOI MOSFETs exhibit various floating-body effects due to the lack of a contact to the channel region. These effects can show up as a kink in the saturation region of I/sub…
Single-transistor latch in SOI MOSFETs
- C. ChenM. MatloubianR. SundaresanB. MaoC. WeiG. Pollack
- 1988
Engineering, Physics
A single-transistor latch phenomenon observed in silicon-on-insulator (SOI) MOSFETs is reported. This latch effect, which occurs at high drain biases, is an extreme case of floating-body effects…
Measurement of SOI MOSFET I-V characteristics without self-heating
- K. A. JenkinsJ. SunJ. Pelloie
- 1994
Engineering, Physics
Proceedings. IEEE International SOI Conference
In addition to offering advantages, the isolation provided by silicon-on-insulator (SOI) MOSFET device technology also poses some problems. Because the channel is thermally insulated from the…
Fabrication of CMOS on ultrathin SOI obtained by epitaxial lateral overgrowth and chemical-mechanical polishing
- G. ShahidiB. DavariT. Ning
- 1990
Engineering, Materials Science
International Technical Digest on Electron…
A novel method for obtaining ultra-thin, defect-free silicon on insulator (SOI) film is introduced. This technique uses epitaxial lateral overgrowth of Si (ELO) and chemical-mechanical polishing…
Optimization of two-dimensional collector doping profiles for submicron BiCMOS technologies
- R. TaftJ. HaydenC. Gunderson
- 1991
Engineering, Physics
International Electron Devices Meeting 1991…
The authors demonstrate that the optimal 2-D collector doping profile for BiCMOS technologies is a strong function of the intended circuit application of the BJT (bipolar junction transistor). The…
Related Papers
Showing 1 through 3 of 0 Related Papers



