Semiconductor device fabrication
MOSFET scaling (process nodes)
020 μm – 1968 010 μm – 1971 006 μm – 1974 003 μm – 1977  1.5 μm – 1981 001 μm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2025 001 nm ~ 2027
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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The600 nanometer process (600 nm process) is a level of semiconductor process technology that was reached in the 1994–1995 timeframe, by most leading semiconductor companies, likeIntel andIBM.^[1]

• Intel 80486DX4CPU launched in 1994 was manufactured using this process.
• IBM/MotorolaPowerPC 601, the first PowerPC chip, was produced in 600 nm.
• IntelPentium (P54C) CPUs at 75 MHz, 90 MHz and 100 MHz were also manufactured using this process.

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